"The idea that cavalry will be replaced by these iron coaches is absurd. It is little short of treasonous."
Aide-de-camp to Field Marshal Haig ; At a tank demonstration, 1916
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| Number | Title | Issue Date |
| 8158217 | CNT-infused fiber and method therefor A carbon nanotube-infused fiber and a method for its production are disclosed. Nanotubes are synthesized directly on a parent fiber by first applying a catalyst to the fiber. The properties of the carbon nanotube-infused fiber will be a combination of those of the p... | 04/17/2012 |
| 8147927 | Methods of making multilayered structures The present invention relates to a multilayered structure including at least one diamond layer and methods of making the multilayered structures. The multilayered structure includes a diamond layer having a top surface and a bottom surface, a first thin adhesion lay... | 04/03/2012 |
| 8110255 | Method for preparation of hybrid comprising magnetite nanoparticles and carbon nitride nanotubes The present invention discloses a method for preparation of a hybrid comprising magnetite nanoparticles and carbon nitride nanotubes, comprising: preparing carbon nitride nanotubes by plasma chemical vapor deposition (CVD); dissolving the prepared carbon nitride nan... | 02/07/2012 |
| 8080289 | Method for making an aligned carbon nanotube A method for making an aligned carbon nanotube includes the steps of a) applying a layer of a ferrosilicon alloy film onto a substrate, b) etching the layer of the ferrosilicon film to form a plurality of fine ferrosilicon alloy particles that are distributed proper... | 12/20/2011 |
| 8048494 | Diamond shell fabricated by using porous particle and the fabrication method thereof A hollow diamond shell with a size of a few micrometer to hundreds of micrometer and having a geometrical shape and its fabrication method are disclosed. A diamond film is deposited by a CVD method and porous grits are used as a victim substrate to be etched later, ... | 11/01/2011 |
| 8007875 | Method of forming a carbon nano-tube In a method of forming carbon nano-tubes, a catalytic film is formed on a substrate. The catalytic film is then transformed into preliminary catalytic particles. Thereafter, the preliminary catalytic particles are transformed into catalytic particles. Carbon nano-tu... | 08/30/2011 |
| 7939141 | Method of production of fluorinated carbon nanostructures A method for the production of fluorinated carbon nanostructures such as carbon black is disclosed, wherein a plasma is generated in a plasma chamber and a fluorocarbon, or a fluorocarbon containing mixture, is supplied to the plasma to convert at least some of the ... | 05/10/2011 |
| 7879412 | Diamond thin film coating method and diamond-coated cemented carbide member A diamond thin film coating method is provided that enables, with no need for an intermediate layer, the formation of a diamond thin film, which has conventionally been considered difficult because cobalt contained in a binding phase of a cemented carbide provides a... | 02/01/2011 |
| 7875323 | Method of manufacturing a substrate and method of crystal display panel having the same In a method of manufacturing a substrate and a method of manufacturing a liquid crystal display panel, a conductive is formed on a base substrate, and a buffer layer is formed on the base substrate having the conductive layer. The buffer layer includes a polymer-lik... | 01/25/2011 |
| 7867579 | Method for forming carbon protective film and method for producing magnetic recording medium, magnetic recording medium and magnetic recording/reproducing apparatus The present invention provides a method for forming a carbon protective film and a method for producing a magnetic recording medium, that decreases the generation of particles in a plasma CVD apparatus thereby improving flatness of the surface of a carbon protective... | 01/11/2011 |
| 7842356 | Substrate processing methods Substrate processing methods involve forming an insulating film of amorphous carbon on a substrate by supplying acetylene gas and hydrogen gas with a volume ratio of 4:3 to 4:1, or alternatively, butyne gas, into a process vessel in which the substrate is accommodat... | 11/30/2010 |
| 7803433 | Amorphous carbon film forming method and device An amorphous carbon film forming apparatus according to the present invention is characterized by being provided with a film forming furnace 11; plural workpiece fixtures 23 for supporting plural plate-like workpieces 22 in a state that the same... | 09/28/2010 |
| 7744966 | Production process of perpendicular magnetic recording medium A production process of magnetic recording media is provided in which, when using an oxide magnetic material as a perpendicular magnetic recording layer and forming a carbon protective layer using a plasma CVD method, stripping of the carbon protective layer and sep... | 06/29/2010 |
| 7601405 | DLC coating system and process and apparatus for making coating system A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a ... | 10/13/2009 |
| 7435454 | Plasma enhanced atomic layer deposition system and method A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the PEALD process, introducing a first process material within the process ch... | 10/14/2008 |
| 7422776 | Low temperature process to produce low-K dielectrics with low stress by plasma-enhanced chemical vapor deposition (PECVD) Low K dielectric films exhibiting low mechanical stress may be formed utilizing various techniques in accordance with the present invention. In one embodiment, carbon-containing silicon oxide films are formed by plasma-assisted chemical vapor deposition at low tempe... | 09/09/2008 |
| 7390537 | Methods for producing low-k CDO films with low residual stress Methods of preparing a carbon doped oxide (CDO) layer with a low dielectric constant and low residual stress are provided. The methods involve, for instance, providing a substrate to a deposition chamber and exposing it to a chemical precursor having molecules with ... | 06/24/2008 |
| 7381452 | Amorphous hydrogenated carbon film The present invention concerns an improved process for the deposition of amorphous hydrogenated carbon film, more specifically an improved low temperature, low power and low vacuum cathodic sputtering process. The invention also concerns the film produced by said pr... | 06/03/2008 |
| 7357697 | Superhard material article of manufacture The invention relates to abrasive water jet systems comprising an abrasive water jet mixing tube having a longitudinal bore lined with a superhard material, including such systems which use cubic boron carbide (CBN), diamond, or other materials with a hardness great... | 04/15/2008 |
| 7354631 | Chemical vapor deposition apparatus and methods This invention includes chemical vapor deposition apparatus, methods of chemical vapor depositing an amorphous carbon comprising layer on a substrate, and methods of chemical vapor depositing at least one of Si3N4 and SixOy | 04/08/2008 |
| 7351981 | Method and apparatus for measuring purity of noble gases A device for detecting impurities in a noble gas includes a detection chamber and a source of pulsed ultraviolet light. The pulse of the ultraviolet light is transferred into the detection chamber and onto a photocathode, thereby emitting a cloud of free electrons i... | 04/01/2008 |
| 7337216 | Electronic system architecture An electronic system architecture comprises a plurality of client devices connected in a hierarchical structure in which the client devices form nodes in the structure interconnected by communications links. One client device at the top of the hierarchical structure... | 02/26/2008 |
| 7329608 | Method of processing a substrate The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded,... | 02/12/2008 |
| 7323116 | Methods and apparatus for monitoring a process in a plasma processing system by measuring self-bias voltage A method for in-situ monitoring a process in a plasma processing system having a plasma processing chamber is disclosed. The method includes positioning a substrate in the plasma processing chamber. The method also includes striking a plasma within the plasma proces... | 01/29/2008 |
| 7323219 | Apparatus and method for applying diamond-like carbon coatings The invention relates to a coating and apparatus and method for applying the same, said coating including Diamond Like Carbon (DLC) applied by chemical vapor deposition using a pulsed DC biased power supply, typically having an initial metal layer and followed by a ... | 01/29/2008 |
| 7314540 | Diamond-coated electrode and method for producing same A diamond electrode having a sufficiently low resistance is disclosed which is realized by increasing the amount of boron added thereto. A method for producing a high-performance, high-durability electrode is also disclosed by which adhesiveness between a diamond co... | 01/01/2008 |
| 7309446 | Methods of manufacturing diamond capsules Capsules and similar objects are made from materials having diamond (sp3) lattice structures, including diamond materials in synthetic crystalline, polycrystalline (ordered or disordered), nanocrystalline and amorphous forms. The capsules generally includ... | 12/18/2007 |
| 7309526 | Diamond like carbon coating on nanofillers In one embodiment the present invention provides for a diamond like coating on small particles. This comprises small particles 10 in the size range of approximately 1-1000 nm and a diamond like coating on the small particles. The diamond like coating is distr... | 12/18/2007 |
| 7303790 | Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber comprising a magnetic confinement structure with a magnetic mirror, and... | 12/04/2007 |
| 7303789 | Methods for producing thin films on substrates by plasma CVD Methods are provided to form a thin film reproducibly in a process for forming the thin film on the inner wall surface facing a space formed in a substrate by plasma CVD. A thin film is produced on an inner wall surface of a substrate facing a space formed in the su... | 12/04/2007 |
| 7303991 | Atomic layer deposition methods The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic layer deposition chamber. On the substrate, an intermediate composition ... | 12/04/2007 |
| 7300684 | Method and system for coating internal surfaces of prefabricated process piping in the field The coating of internal surfaces of a workpiece is achieved by connecting a bias voltage such that the workpiece functions as a cathode and by connecting an anode at each opening of the workpiece. A source gas is introduced at an entrance opening, while a vacuum sou... | 11/27/2007 |
| 7294583 | Methods for the use of alkoxysilanol precursors for vapor deposition of SiOfilms A method for depositing conformal dielectric films uses alkoxy silanol or silanediol precursors and oxidizing and/or hydrolyzing agents. The method produces a material with liquid-like flow properties capable of achieving improved high aspect ratio gap fill more eff... | 11/13/2007 |
| 7294209 | Apparatus and method for depositing material onto a substrate using a roll-to-roll mask A battery-operated device provided on a thin-film battery and a method for making. Some embodiments provide a system that includes a vacuum chamber, a plurality of pairs of source and take-up reels within the vacuum chamber, including a first source reel that suppli... | 11/13/2007 |
| 7294404 | Graded photocatalytic coatings The invention provides graded photocatalytic coatings. In one aspect, the invention provides a substrate carrying a photocatalytic coating that includes a first graded film region and a second graded film region. The first graded film region has a substantially cont... | 11/13/2007 |
| 7294578 | Use of a plasma source to form a layer during the formation of a semiconductor device A method used to form a semiconductor device having a capacitor comprises placing a semiconductor wafer assembly into a chamber of a plasma source, the wafer assembly comprising a layer of insulation having at least one contact therein and a surface, and further com... | 11/13/2007 |
| 7291568 | Method for fabricating a nitrided silicon-oxide gate dielectric A method of fabricating a gate dielectric layer, including: providing a substrate; forming a silicon dioxide layer on a top surface of the substrate; performing a plasma nitridation in a reducing atmosphere to convert the silicon dioxide layer into a silicon oxynitr... | 11/06/2007 |
| 7289701 | Integrated platform for passive optical alignment of semiconductor device with optical fiber A platform for converting a signal between optical and electrical form and vice versa is provided. The platform includes a dielectric mount, a semiconductor light source and optical fibers. Some of these components are fabricated separately and then brought together... | 10/30/2007 |
| 7288292 | Ultra low k (ULK) SiCOH film and method The present invention provides a multiphase, ultra low k film which exhibits improved elastic modulus and hardness as well as various methods for forming the same. The multiphase, ultra low k dielectric film includes atoms of Si, C, O and H, has a dielectric constan... | 10/30/2007 |
| 7288293 | Process for plasma surface treatment and device for realizing the process A process for plasma treatment of an object's surface to be treated comprising the creation of a plasma, the application of the plasma to the surface to be treated, and the excitation of the surface to be treated, such that it vibrates and undulates. The energy for ... | 10/30/2007 |