Celebrity Inventors
Glam girl Heddy Lamar may have used her good looks to good effect on the silver screen, but she put her smarts to better use as an inventor. During World War II, she co-patented a frequency-switching system for torpedo guidance that was considered years ahead of its time.
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| Number | Title | Issue Date |
| 8158216 | Spinulose titanium nanoparticulate surfaces Vapor plasma deposition of titanium (Ti) metal onto a substrate forms a structured surface that exhibits enhanced cell attachment properties. Initially deposited round nanoparticulate surface structures develop tentacles with a spine or thorn-like appearance upon co... | 04/17/2012 |
| 8133555 | Method for forming metal film by ALD using beta-diketone metal complex A method of forming a single-metal film on a substrate by plasma ALD includes: contacting a surface of a substrate with a β-diketone metal complex in a gas phase; exposing molecule-attached surface to a nitrogen-hydrogen mixed plasma; and repeating the above steps,... | 03/13/2012 |
| 8114483 | Photon induced formation of metal comprising elongated nanostructures The preferred embodiments provide a method for forming at least one metal comprising elongated nanostructure on a substrate. The method comprises exposing a metal halide compound surface to a photon comprising ambient to initiate formation of the at least one metal ... | 02/14/2012 |
| 8092870 | Preparation of metal oxide thin film via cyclic CVD or ALD A cyclic deposition process to make a metal oxide film on a substrate, which comprises the steps: introducing a metal ketoiminate into a deposition chamber and depositing the metal ketoiminate on a heated substrate; purging the deposition chamber to remove unreacted... | 01/10/2012 |
| 8084105 | Method of depositing boron nitride and boron nitride-derived materials Methods for forming boron-containing films are provided. The methods include introducing a boron-containing precursor and a nitrogen or oxygen-containing precursor into a chamber and forming a boron nitride or boron oxide film on a substrate in the chamber. In one a... | 12/27/2011 |
| 7976909 | Method for deposition of titanium oxide by a plasma source Process for depositing, on a substrate, a coating based on titanium oxide, which is characterized in that the coating with photocatalytic properties is deposited by chemical vapor deposition, especially from a gas mixture comprising at least one organometallic precu... | 07/12/2011 |
| 7959986 | Organometallic compounds, processes for the preparation thereof and methods of use thereof This invention relates to organometallic precursor compounds represented by the formula (Cp(R′)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide lay... | 06/14/2011 |
| 7931945 | Film forming method The present invention provides a particle measuring system which is provided in a processing system 40 which generates an atmosphere obtained by exhausting air or a gas in a processing chamber 48 by a vacuum pump 98 and applies a process concern... | 04/26/2011 |
| 7829158 | Method for depositing a barrier layer on a low dielectric constant material A method of forming a tantalum containing multi-layer film. In one embodiment, the method includes disposing a substrate in a process chamber, heating the substrate, exposing the substrate to a tantalum containing precursor to adsorb at least a portion of the tantal... | 11/09/2010 |
| 7824743 | Deposition processes for titanium nitride barrier and aluminum Embodiments described herein provide a method for forming two titanium nitride materials by different PVD processes, such that a metallic titanium nitride layer is initially formed by a PVD process in a metallic mode and a titanium nitride retarding layer is formed ... | 11/02/2010 |
| 7790246 | Ultra hydrophilic Ti-O-C based nano film and fabrication method thereof An ultra-hydrophilic Ti—O—C based nano-film of which deposition thickness was improved and deposition uniformity was excellent was fabricated by mixing a Ti precursor and a liquid having a low boiling point and a high volatility—at a uniform ratio. The catalys... | 09/07/2010 |
| 7744965 | Method and apparatus for manufacturing a zinc oxide thin film at low temperatures The present invention provides a method and apparatus for forming a zinc oxide thin film with high transparency and high conductivity on a surface of a flexible substrate such as plastic without the indispensable requirement of doping impurities. In the method of fo... | 06/29/2010 |
| 7740917 | Method for forming thin film and base and having thin film formed by such method A method for forming a film comprising a first process and a second process, the first process comprising the steps of: supplying a discharge gas to a first discharge space where high frequency electric field A is generated at or near atmospheric pressure, whereby t... | 06/22/2010 |
| 7651741 | Processes for forming a support and organic electroluminescence element including the support A support that includes a flexible substrate and provided thereon, one or two or more polymer layers and one or two or more sealing layers, wherein at least one of the polymer layers and the sealing layers is formed by a process including exciting a reactive gas at ... | 01/26/2010 |
| 7632550 | Film forming method employing reactive and reducing gases and substrate formed by the method A film forming method comprising: supplying a reactive gas comprising a compound including a metal atom between facing electrodes; arranging a substrate between the electrodes; making the reactive gas in a plasma state by applying a voltage between the electrodes un... | 12/15/2009 |
| 7597941 | Tubular carbon nano/micro structures and method of making same A method of synthesizing and controlling the internal diameters, conical angles, and morphology of tubular carbon nano/micro structures. Different morphologies can be synthesized included but not limited to cones, straight tubes, nozzles, cone-on-tube (funnels), tub... | 10/06/2009 |
| 7541070 | Method of vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that,... | 06/02/2009 |
| 7438955 | Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source A procedure for the synthesis of titanium nitride (TiN) thin films on metal substrate by vapor deposition using a magnetized sheet plasma source is disclosed. TiN films on metal substrate exhibiting the stoichiometric TiN and Ti2N were synthesized in a mi... | 10/21/2008 |
| 7435454 | Plasma enhanced atomic layer deposition system and method A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the PEALD process, introducing a first process material within the process ch... | 10/14/2008 |
| 7407686 | Optical film, polarizing plate and display device utilising the film, and production method of optical film An optical film is disclosed having minimal curl, minimal coating unevenness and no cracks. The optical film is obtained by casting a dope comprising a cellulose ester and a non-chlorinated solvent on a metal support, the cellulose ester having a total acyl substitu... | 08/05/2008 |
| 7389580 | Method and apparatus for thin-film battery having ultra-thin electrolyte A method and system for fabricating solid-state energy-storage devices including fabrication films for devices without an anneal step. A film of an energy-storage device is fabricated by depositing a first material layer to a location on a substrate. Energy is suppl... | 06/24/2008 |
| 7368343 | Low leakage MIM capacitor Capacitor structures for use in integrated circuits and methods of their manufacture. The capacitor structures include a bottom electrode, a top electrode and a dielectric layer interposed between the bottom electrode and the top electrode. The capacitor structures ... | 05/06/2008 |
| 7361387 | Plasma enhanced pulsed layer deposition A process system and a deposition method for depositing a highly controlled layered film on a workpiece is disclosed. The basic component of the apparatus is a pulsing plasma source that is capable of either exciting or not-exciting a first precursor. The pulsing pl... | 04/22/2008 |
| 7361568 | Embedded capacitors and methods for their fabrication and connection Embedded capacitors comprise a bimetal foil (500) that includes a first copper layer (205) and an aluminum layer (210) on the first copper layer. The aluminum layer has a smooth side adjacent the first copper layer and a high surface area textur... | 04/22/2008 |
| 7361313 | Methods for uniform metal impregnation into a nanoporous material The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhi... | 04/22/2008 |
| 7361302 | Oxidation and fatigue resistant metallic coating The present invention relates to a metallic coating to be deposited on gas turbine engine components. The metallic coating comprises up to 18 wt % cobalt, 3.0 to 18 wt % chromium, 5.0 to 15 wt % aluminum, 0.1 to 1.0 wt % yttrium, up to 0.6 wt % hafnium, up to 0.3 wt... | 04/22/2008 |
| 7348042 | Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD) The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conduct... | 03/25/2008 |
| 7341942 | Method for forming metal line of semiconductor device A method for forming a metal line of a semiconductor device forms an aluminum line having an excellent orientation. A specific resistance of a metal line is reduced, thereby enabling sufficient supply of a desired electric current. The method includes steps of formi... | 03/11/2008 |
| 7338582 | Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure It is an object of the present invention to provide an oxygen reduction electrode having excellent oxygen reduction catalysis ability. In a method of manufacturing a manganese oxide nanostructure having excellent oxygen reduction catalysis ability and composed of se... | 03/04/2008 |
| 7338900 | Method for forming tungsten nitride film A method for forming a tungsten nitride film including a first material gas supply step of supplying a first material gas composed of a tungsten compound gas, a reduction step of supplying a reducing gas, a second material gas supply step of supplying a second mater... | 03/04/2008 |
| 7329608 | Method of processing a substrate The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded,... | 02/12/2008 |
| 7323231 | Apparatus and methods for plasma vapor deposition processes One aspect of the invention is directed toward a method of forming a conductive layer on a microfeature workpiece. In one embodiment, the method comprises placing a microfeature workpiece in a vapor reaction chamber, depositing an electrically conductive material on... | 01/29/2008 |
| 7323220 | Gas phase growth system, method of operating the system, and vaporizer for the system A method of operating a gas phase growth system is disclosed. The method includes a processing stage and a stabilizer feeding stage. In a non-limiting embodiment of the disclosure, an organometallic complex is vaporized by a vaporizer, and subsequently fed to a reac... | 01/29/2008 |
| 7323400 | Plasma processing, deposition and ALD methods A plasma processing method includes providing a substrate in a processing chamber, the substrate having a surface, and generating a plasma in the processing chamber. The plasma provides at least two regions that exhibit different plasma densities. The method include... | 01/29/2008 |
| 7323581 | Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition A metalorganic complex composition comprising a metalorganic complex selected from the group consisting of: metalorganic complexes comprising one or more metal central atoms coordinated to one or more monodentate or multidentate organic ligands, and complexed with o... | 01/29/2008 |
| 7323230 | Coating for aluminum component A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the aluminum oxide layer having a surface comprising penetrating surface fe... | 01/29/2008 |
| 7318948 | Light transmissive films A thin film of zinc oxide is deposited by sputter deposition in a partial pressure of oxygen on a suitable at a low temperature, such as less than 300 degrees Centigrade, to provide an amorphous film. This should take place in a sputtering environment which will pro... | 01/15/2008 |
| 7311946 | Methods for depositing metal films on diffusion barrier layers by CVD or ALD processes A process is described for depositing a metal film on a substrate surface having a diffusion barrier layer deposited thereupon. In one embodiment of the present invention, the process includes: providing a surface of the diffusion barrier layer that is substantially... | 12/25/2007 |
| 7307772 | Hybrid process for depositing electrochromic coating A method of producing an electrochromic device, includes the steps of: providing a first electron conducting layer on a substrate, providing a working electrode in communication with the first electron conducting layer, providing an ion conducting layer in communica... | 12/11/2007 |
| 7294574 | Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement An integrated sputtering method and reactor for copper or aluminum seed layers in which a plasma sputter reactor initially deposits a thin conformal layer onto a substrate including a high-aspect ratio hole subject to the formation of overhangs. After the seed depos... | 11/13/2007 |
