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| Number | Title | Issue Date |
| 7422775 | Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing A method of processing a workpiece includes introducing an optical absorber material precursor gas into a chamber containing the workpiece, generating an RF oscillating toroidal plasma current in a reentrant path that includes a process zone overlying the workpiece ... | 09/09/2008 |
| 7301149 | Apparatus and method for determining a thickness of a deposited material Method and apparatus for determining a thickness of a deposited material. Energy is passed through the deposited material, wherein some of the energy is transmitted. The transmitted energy is received, and the received energy is used to determine a thickness of the ... | 11/27/2007 |
| 7278831 | Apparatus and method for control, pumping and abatement for vacuum process chambers The present invention is an apparatus and method for controlling pressure, pumping a vacuum and providing abatement for a plurality of vacuum processing chambers. The system may be used in semiconductor manufacture. Multiple vacuum processing chambers are exhausted ... | 10/09/2007 |
| 7223448 | Methods for providing uniformity in plasma-assisted material processes A method for providing uniformity in plasma-assisted material processes. A shielding plate is implemented within a plasma chamber above a substrate. The dimensions, geometry, and location of the shielding plate are optimized to generate a desired ion flux in a plasm... | 05/29/2007 |
| 7153444 | Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor Provided is a method and apparatus for controlling a bias voltage over a wide range and for de-coupling dual radio frequency (RF) currents to allow for independent control of plasma density and ion energy of a plasma for processing a substrate. An exemplary apparatu... | 12/26/2006 |
| 7105059 | Reaction apparatus for atomic layer deposition A reaction apparatus for atomic layer deposition includes a vacuum chamber having a gas inlet, a gas outlet, and a gas flow path for connecting the gas inlet and the gas outlet; a reactor located in the vacuum chamber, including a reaction chamber where a first gas,... | 09/12/2006 |
| 7067414 | Low k interlevel dielectric layer fabrication methods A low k inter-level dielectric layer fabrication method includes providing a substrate having integrated circuitry at least partially formed thereon. An oxide-comprising inter-level dielectric layer including carbon and having a dielectric constant no greater than 3... | 06/27/2006 |
| 7063871 | CVD process capable of reducing incubation time A metal CVD process includes a step (A) of introducing a gaseous source material containing a metal carbonyl compound into a process space adjacent to a surface of a substrate to be processed in such a manner that the metal carbonyl compound has a first partial pres... | 06/20/2006 |
| 7052552 | Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD A method and apparatus are disclosed for depositing a dielectric film in a gap having an aspect ratio at least as large as 6:1. By cycling the gas chemistry of a high-density-plasma chemical-vapor-deposition system between deposition and etching conditions, the gap ... | 05/30/2006 |
| 7033952 | Apparatus and method using a remote RF energized plasma for processing semiconductor wafers Chemical generator and method for generating a chemical species at a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The species is generated by creating free radicals, and combining the free radic... | 04/25/2006 |
| 7026764 | Plasma producing apparatus and doping apparatus An object of the present invention is to provide an apparatus for producing stable plasma. Another object of the present invention is to provide an apparatus having a long-lasting cathode electrode which is superior in field emission characteristic since the plasma ... | 04/11/2006 |
| 7021903 | Fore-line preconditioning for vacuum pumps The present invention is an apparatus and method for evacuating a number of vacuum processing chambers containing incompatible gases. The gases are directed to a subatmospheric abatement chamber containing preconditioning devices. The gases are treated in the abatem... | 04/04/2006 |
| 7001831 | Method for depositing a film on a substrate using Cat-PACVD A non-Si non-C-based gas is heated by a thermal catalysis body provided in a gas introduction channel, and the heated non-Si non-C-based gas and a material-based gas comprising Si and/or C are separately introduced into a film deposition space through a showerhead h... | 02/21/2006 |
| 6958112 | Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation Methods and systems are provided for depositing silicon oxide in a gap on a substrate. The silicon oxide is formed by flowing a process gas into a process chamber and forming a plasma having an overall ion density of at least 1011 ions/cm3. The... | 10/25/2005 |
| 6953739 | Method for manufacturing a semiconductor device having hemispherical grains at very low atmospheric pressure using first, second, and third vacuum pumps An apparatus and method for forming a HSG silicon layer on a capacitor lower electrode of a semiconductor memory device. The apparatus includes a processing chamber having a plurality of source gas supply nozzles, the lengths of the nozzles being different from one ... | 10/11/2005 |
| 6926934 | Method and apparatus for deposited film In a deposited-film formation method or apparatus according to the present invention, which comprises providing a discharge electrode in a vacuum vessel equipped with exhaust means, supplying a hydrogen gas and a raw material gas for forming a deposited film which c... | 08/09/2005 |
| 6926933 | Method of manufacturing water-repelling film A water-repelling film is formed by using a vacuum ultraviolet rays chemical vapor deposition (CVD) system (100) comprising a vacuum ultraviolet rays generating section (102), a reaction room (106), and a window (104) for separating the r... | 08/09/2005 |
| 6919107 | Method and device for treating surfaces using a glow discharge plasma In a process for treating a surface with the aid of a glow discharge plasma sustained in a gas of substantially ambient pressure between two electrodes (10, 10′) unwanted effects of plasma filaments occurring in such a plasma are prevented by positioning th... | 07/19/2005 |
| 6733848 | Thin film forming equipment and method A thin film forming equipment and a method for forming thin films are provided which are capable of forming the thin film of high quality and of effectively preventing CVD material gas from leaking to surroundings at a low cost. The thin film equipment contains a su... | 05/11/2004 |
| 6677001 | Microwave enhanced CVD method and apparatus A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for chemical vapor reaction. In the new proposed resonance, t... | 01/13/2004 |
| 6673524 | Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method An exemplary method of forming an attenuating extreme ultraviolet (EUV) phase-shifting mask is described. This method can include providing a multi-layer mirror over an integrated circuit substrate or a mask blank, providing a buffer layer over the multi-... | 01/06/2004 |
| 6616987 | Procedure and device for specific particle manipulation and deposition A process for manipulating particles distributed substantially non-uniformly in a plasma of a carrier or reaction gas, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasmacrystalline state, and ... | 09/09/2003 |
| 6558757 | Method and device for coating substrates in a vacuum The invention relates to a method and a device for coating substrates in a vacuum, in which a plasma is generated from a target using a laser beam and ionized particles of the plasma are deposited on the substrate in the form of a layer, inert reactive ga... | 05/06/2003 |
| 6524517 | Methods for molding and grafting highly uniform polymer layers onto electronic microchips Microreaction molds and methods of molding very thin films onto substrate surfaces are provided. The molds and molding methods allow for consistency and uniformity in the thicknesses of the films that are applied to the substrate surfaces. The molds may b... | 02/25/2003 |
| 6517912 | Particle manipulation In a method for manipulating particles arranged in a plasma-cristalline state in a plasma of a carrier gas, the particles are at least partially subject to plasma treatment and/or applied to a substrate surface. A device for manipulating of particles in p... | 02/11/2003 |
| 6509070 | Laser ablation, low temperature-fabricated yttria-stabilized zirconia oriented films Formation of for example yttria stabilized zirconia films of significant 001 orientation on a variety of substrates including amorphous material and room temperature limited material is disclosed. The yttria stabilized zirconia film formation is achieved ... | 01/21/2003 |
| 6480074 | Method and system for wafer-level tuning of bulk acoustic wave resonators and filters by reducing thickness non-uniformity A method and system for tuning a bulk acoustic wave device at wafer level by reducing the thickness non-uniformity of the topmost surface of the device using a chemical vapor deposition process. A light beam is used to enhance the deposition of material o... | 11/12/2002 |
| 6375860 | Controlled potential plasma source The occurrence of internally-formed contaminants or negatively-charged particulates within a plasma is minimized by preventing such from becoming trapped in the plasma. The plasma is formed in a plasma chamber having control electrodes and reference elect... | 04/23/2002 |
| 6338778 | Vacuum coating system with a coating chamber and at least one source chamber The invention relates to a device, in particular for a laser-induced vacuum are discharge evaporator for depositing of multiple layers with a high level of purity and high deposition rates on large-area components. According to the invention, the material... | 01/15/2002 |
| 6149984 | Laser irradiation method In processing an object by irradiating it with laser light, a laser irradiation chamber is evacuated to a pressure value suitable for the intended laser light processing and the laser light processing is performed with the pressure in the chamber kept con... | 11/21/2000 |
| 6130118 | Plasma reaction apparatus and plasma reaction A process for depositing a film at a high rate and with superior step coverage properties, which comprises installing a pair of electrodes crossing with another pair of electrodes making a right angle with respect to the another pair, and applying a high ... | 10/10/2000 |
| 6110542 | Method for forming a film A method for forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field is described, characterized by that the electric power for generating the plasma has a pulsed waveform. The electric power ... | 08/29/2000 |
| 6099783 | Photopolymerizable compositions for encapsulating microelectronic devices A novel method for producing thick composite parts based upon photopolymerizable compositions is disclosed. Also disclosed are novel methods for encapsulation of microelectronic devices based upon novel photopolymerizable compositions. The constituents of... | 08/08/2000 |
| 5980999 | Method of manufacturing thin film and method for performing precise working by radical control and apparatus for carrying out such methods A first reactive gas is introduced into a vacuum chamber and a plasma of the thus introduced reactive gas is produced. A second reactive gas is introduced into a radical generating chamber and is dissociated to generate radicals whose density and composit... | 11/09/1999 |
| 5925421 | Laser irradiation method In processing an object by irradiating it with laser light, a laser irradiation chamber is evacuated to a pressure value suitable for the intended laser light processing and the laser light processing is performed with the pressure in the chamber kept con... | 07/20/1999 |
| 5776557 | Method for forming a film on a substrate by activating a reactive gas A thin film forming method which comprises the steps of supporting a substrate to be treated, having a trench or an unevenness thereon, in a reaction vessel; introducing a reactive gas into the reaction vessel; activating the reactive gas to form a deposi... | 07/07/1998 |
| 5763002 | Methods of manufacture of master disk for making a die for pressing optical disks Master disks for providing dies in particular for pressing optical disks, methods of manufacturing same, pressing dies obtained from such master disks and optical disks obtained from the latter and such pressing dies, the master disks consisting of a supp... | 06/09/1998 |
| 5753320 | Process for forming deposited film A process for forming a deposited film on a substrate according to the chemical vapor deposition method comprises previously forming excited species of a gas phase compound containing atoms which become constituents constituting said deposited film, suppl... | 05/19/1998 |
| 5725914 | Process and apparatus for producing a functional structure of a semiconductor component In order to improve a process and an apparatus for producing a functional structure of a semiconductor component, which comprises layers arranged on a base substrate and defining the entire functions of the semiconductor component, such that the functiona... | 03/10/1998 |
| 5654043 | Pulsed plate plasma implantation system and method Method and apparatus for treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. An implantation chamber defines a chamber interior into which one or more workpieces can be inserted. A support positions one ... | 08/05/1997 |
