Quotables
"Without question, the greatest invention in the history of mankind is beer. Oh, I grant you that the wheel was also a fine invention, but the wheel does not go nearly as well with pizza."
Dave Barry
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8017198 | Thin film deposition via charged particle-depleted plasma achieved by magnetic confinement A method and apparatus for forming thin film materials via a plasma deposition process in the presence of a magnetic field. A precursor is delivered to a deposition chamber and activated to form a plasma. The plasma may be initiated in the presence of a magnetic fie... | 09/13/2011 |
| 7838086 | Magnetic enhancement for mechanical confinement of plasma A method for processing a substrate is provided. The substrate is placed in a process chamber. A gas is provided from a gas source to the process chamber. A plasma is generated from the gas in the process chamber. The gas flows through a gap adjacent to at least one... | 11/23/2010 |
| 7368729 | Method, apparatus and system for specimen fabrication by using an ion beam A method and system for separating and preparing a sample for analysis from a wafer without contaminating the wafer with an element such as Ga. A first ion beam is irradiated on a sample and scanned to fabricate a micro sample from a part of the sample. A probe for ... | 05/06/2008 |
| 7367119 | Method for forming a reinforced tip for a probe storage device Systems and methods in accordance with the present invention can include a tip contactable with a media. In an embodiment, the tip comprises a substantially hollow structure formed of a metal. The tip can be formed by depositing a first metal layer over silicon ther... | 05/06/2008 |
| 7361387 | Plasma enhanced pulsed layer deposition A process system and a deposition method for depositing a highly controlled layered film on a workpiece is disclosed. The basic component of the apparatus is a pulsing plasma source that is capable of either exciting or not-exciting a first precursor. The pulsing pl... | 04/22/2008 |
| 7355951 | High density data recording/reproduction method utilizing electron emission and phase change media, and data recording system adopting the same, and media for the system A rapid data recording/reproducing method, a data recording system adopting the same, media for the system, and a tracking method, wherein the recording/reproducing method includes preparing media having a data recording layer in which a phase change is generated th... | 04/08/2008 |
| 7336524 | Atomic probes and media for high density data storage A device in accordance with embodiments of the present invention comprises a contact probe for high density data storage reading, writing, erasing, or rewriting. In one embodiment, the contact probe can include a silicon core having a conductive coating. Contact pro... | 02/26/2008 |
| 7323218 | Synthesis of composite nanofibers for applications in lithium batteries Methods of fabricating one-dimensional composite nanofiber on a template membrane with porous array by chemical or physical process are disclosed. The whole procedures are established under a base concept of “secondary template”. First of all, tubular first nano... | 01/29/2008 |
| 7310466 | Photonic crystal waveguides and systems using such waveguides In general, in one aspect, the invention features a waveguide that includes a core extending along a waveguide axis and a confinement region surrounding the core. The confinement region includes a spiral portion and a non-spiral portion, wherein the spiral portion a... | 12/18/2007 |
| 7309630 | Method for forming patterned media for a high density data storage device Systems in accordance with the present invention can include a tip contactable with a media, the media including a substrate and a plurality of cells disposed over the substrate, one or more of the cells being electrically isolated from the other of the cells by a m... | 12/18/2007 |
| 7303790 | Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber comprising a magnetic confinement structure with a magnetic mirror, and... | 12/04/2007 |
| 7300559 | Filtered cathodic arc deposition method and apparatus An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma s... | 11/27/2007 |
| 7300742 | Data storage medium and method for the preparation thereof A data storage medium includes a substrate, a reflective metal layer, and a haze-prevention layer between the substrate and the reflective metal layer. The substrate includes an amorphous thermoplastic resin having a heat distortion temperature of at least about 140... | 11/27/2007 |
| 7301887 | Methods for erasing bit cells in a high density data storage device Methods in accordance with the present invention can be applied, in an embodiment, to a media comprising a phase change material to alter a resolved portion of the phase change material to have a resistance different from a resistance of the bulk material. A tip hav... | 11/27/2007 |
| 7294404 | Graded photocatalytic coatings The invention provides graded photocatalytic coatings. In one aspect, the invention provides a substrate carrying a photocatalytic coating that includes a first graded film region and a second graded film region. The first graded film region has a substantially cont... | 11/13/2007 |
| 7276266 | Functionalization of carbon nanotubes Method and system for functionalizing a collection of carbon nanotubes (CNTs). A selected precursor gas (e.g., H2 or F2 or CnHm) is irradiated to provide a cold plasma of selected target particles, such as atomic H or F, i... | 10/02/2007 |
| 7252745 | Filtered cathodic arc deposition method and apparatus An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma s... | 08/07/2007 |
| 7226312 | Micro coated electrical feedthru A method and apparatus for electrically interfacing between two or more distinct environments. The method and apparatus are directed to an electrical feedthru with one or more electrical transmission lines coated with one or more thin dielectric layers of material t... | 06/05/2007 |
| 7220683 | Transparent amorphous carbon structure in semiconductor devices A transparent amorphous carbon layer is formed. The transparent amorphous carbon layer has a low absorption coefficient such that the amorphous carbon is transparent in visible light. The transparent amorphous carbon layer may be used in semiconductor devices for di... | 05/22/2007 |
| 7211708 | Exhaust processing method, plasma processing method and plasma processing apparatus A chemical-reaction inducing means is provided in an exhaust line connecting a processing space for subjecting a substrate or a film to plasma processing to an exhaust means, and at least either an unreacted gas or byproduct exhausted from the processing space are c... | 05/01/2007 |
| 7199328 | Apparatus and method for plasma processing A plasma processing system including a process chamber, a substrate holder provided within the process chamber, and a gas injection system configured to supply a first gas and a second gas to the process chamber. The system includes a controller that controls the ga... | 04/03/2007 |
| 7182842 | Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device A device (1) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized (2) and associated with a magnetic circuit (3) producing a magnetic field (4) which... | 02/27/2007 |
| 7167622 | Photonic crystal fibers and medical systems including photonic crystal fibers In general, in one aspect, the invention features systems, including a photonic crystal fiber including a core extending along a waveguide axis and a dielectric confinement region surrounding the core, the dielectric confinement region being configured to guide radi... | 01/23/2007 |
| 7163721 | Method to plasma deposit on organic polymer dielectric film A method for protecting an organic polymer underlayer during a plasma assisted process of depositing a subsequent film on the organic polymer underlayer is disclosed. The method provides the deposition of a protective continuous layer using organic polymer damage-fr... | 01/16/2007 |
| 7160616 | DLC layer system and method for producing said layer system The invention describes a device and a process that render possible the production of a layer system for wear protection, corrosion protection and improvement of the slipping properties and the like with an adhesion layer to be arranged on a substrate, a transition ... | 01/09/2007 |
| 7160585 | Process for making at least one nanotube between two electrically conducting elements and device for implementing such a process A process makes at least one nanotube between two electrically conducting elements located on a substrate, using, inside a deposition chamber, a microwave power, a magnetic field, and at least one electronic cyclotron resonance zone faciliting ionization and/or diss... | 01/09/2007 |
| 7156960 | Method and device for continuous cold plasma deposition of metal coatings A method for the deposition of a metal layer on a substrate (1) uses a cold plasma inside an enclosure (7) heated to avoid the formation of a metal deposit at its surface. The enclosure has an inlet (21) and an outlet (22) for the substra... | 01/02/2007 |
| 7157123 | Plasma-enhanced film deposition Methods and equipment for depositing films. In certain embodiments, there is provided a deposition chamber having a substrate-coating region and an electrode-cleaning region. In these embodiments, an electrode is positioned in the deposition chamber and has an inter... | 01/02/2007 |
| 7156922 | Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor A multi-chamber installation (1) treats objects under vacuum. An evacuation system (5) is connected to a plurality of chambers (2, 3, 4). To reduce the complexity of the evacuation process, a forepump (5) has several stages (11, 12, 13... | 01/02/2007 |
| 7132201 | Transparent amorphous carbon structure in semiconductor devices A transparent amorphous carbon layer is formed. The transparent amorphous carbon layer has a low absorption coefficient such that the amorphous carbon is transparent in visible light. The transparent amorphous carbon layer may be used in semiconductor devices for di... | 11/07/2006 |
| 7125588 | Pulsed plasma CVD method for forming a film A method of forming an insulating ceramic film or a metallic film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power for generating the plasma has a pulsed waveform. The electric power t... | 10/24/2006 |
| 7118782 | Method for manufacturing diamond coatings A method of manufacturing diamond coatings, at low temperature and low pressure on a substrate utilizing chemical vapor transport (CVT) comprising the steps of: providing a wire-wrapped graphite assembly component and the substrate into a chamber; filling the chambe... | 10/10/2006 |
| 7112354 | Electron spin mechanisms for inducing magnetic-polarization reversal An apparatus includes a low magnetic-coercivity layer of material (LMC layer) having a majority electron-spin-polarization (M-ESP), an energy-gap coupled with the LMC layer, wherein a flow of spin-polarized electrons having an electron-spin-polarization anti-paralle... | 09/26/2006 |
| 7097501 | Micro coated electrical feedthru A method and apparatus for electrically interfacing between two or more distinct environments. The method and apparatus are directed to an electrical feedthru with one or more electrical transmission lines coated with one or more thin dielectric layers of material t... | 08/29/2006 |
| 7095179 | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed powe... | 08/22/2006 |
| 7092611 | Method for manufacturing a bar-shaped preform as well as a method for manufacturing optical fibres from such a bar-shaped preform The present invention relates to a method for manufacturing a bar-shaped preform. The present invention further relates to a method for manufacturing optical fibers using the manufactured bar-shaped preform. ... | 08/15/2006 |
| 7087525 | Methods of forming layers over substrates The invention includes methods of forming films over substrates. A substrate is provided within a reaction chamber, and a mixture is also provided within the chamber. The mixture comprises a precursor of a desired material within a supercritical fluid. The precursor... | 08/08/2006 |
| 7070657 | Method and apparatus for depositing antireflective coating This invention provides a stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that d... | 07/04/2006 |
| 7067436 | Method of forming silicon oxide film and forming apparatus thereof In a method of forming a silicon oxide film, the silicon oxide film is formed on a substrate by the use of a plasma CVD method. A plasma-generating region is separated from a deposition region which includes excitation oxygen molecules and excitation oxygen atoms. P... | 06/27/2006 |
| 7067414 | Low k interlevel dielectric layer fabrication methods A low k inter-level dielectric layer fabrication method includes providing a substrate having integrated circuitry at least partially formed thereon. An oxide-comprising inter-level dielectric layer including carbon and having a dielectric constant no greater than 3... | 06/27/2006 |
