Bizarre Patents
Microwave Oven With Removable Storage Cassette in Dashboard of Motor Vehicle
A microwave oven adapted for use within a motor vehicle dashboard area. The microwave oven has a removable storage cassette, and slidable platforms for securing and serving containers of beverages and foods.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8105660 | Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component A method of forming a diamond-like carbon coating by plasma enhanced chemical vapor deposition on an internal surface of a hollow component having an inner surface. A reduced atmospheric pressure is created within a pipe or other hollow component to be treated. A di... | 01/31/2012 |
| 8029875 | Plasma immersion ion processing for coating of hollow substrates The present disclosure relates to a method for plasma ion deposition and coating formation. A vacuum chamber may be supplied, wherein the vacuum chamber is formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the... | 10/04/2011 |
| 7811641 | Method of forming carbon nanotubes, field emission display device having carbon nanotubes formed through the method, and method of manufacturing field emission display device There are provided a method of forming carbon nano tubes, a field emission display device having the carbon nanotubes formed using the method, and a method of manufacturing the field emission display device. The method of forming carbon nanotubes includes forming a ... | 10/12/2010 |
| 7597940 | Methods for preparing titania coatings by plasma CVD at atmospheric pressure A method for deposition of titania, and titania-containing, thin films by CVD, using an atmospheric pressure glow discharge plasma as a major source of reaction, which leads to film properties, and film growth rates, normally only achievable (by atmospheric pressure... | 10/06/2009 |
| 7354629 | Method of forming a protective film and a magnetic recording medium having a protective film formed by the method A method of forming a protective film that restrains gas adsorption while preserving durability and corrosion resistance of a plasma CVD carbon film is disclosed. A protective film of a slide-resistant member is deposited by means of a plasma CVD method using a raw ... | 04/08/2008 |
| 7347915 | Plasma in-situ treatment of chemically amplified resist A method for creating semiconductor devices by etching a layer over a wafer is provided. A photoresist layer is provided on a wafer. The photoresist layer is patterned. The wafer is placed in a process chamber. The photoresist is hardened by providing a hardening pl... | 03/25/2008 |
| 7335185 | Protective coatings for medical devices A dilatation balloon formed of a first material and further including at least one first plasma polymerized layer which forms the top most surface of the balloon, and a method of making the same. ... | 02/26/2008 |
| 7250729 | Method of spark-processing silicon and resulting materials The subject invention pertains to a method of spark processing silicon and resulting materials. The subject invention also relates to electroluminescent devices incorporating the materials produced by the subject method. The subject method for spark-processing can e... | 07/31/2007 |
| 7244474 | Chemical vapor deposition plasma process using an ion shower grid A chemical vapor deposition process is carried out in a reactor chamber with an ion shower grid that divides the chamber into an upper ion generation region and a lower process region, the ion shower grid having plural orifices oriented in a non-parallel direction r... | 07/17/2007 |
| 7242012 | Lithography device for semiconductor circuit pattern generator General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor ... | 07/10/2007 |
| 7220463 | Method for obtaining nanoparticles The method is intended for obtaining nanosize amorphous particles, which find use in various fields of science and technology; in particular, metallic nanostructures can be regarded as a promising material for creating new sensors and electronic and optoelectronic d... | 05/22/2007 |
| 7211145 | Substrate processing apparatus and substrate processing method A substrate processing apparatus include a spin chuck capable of holding a semiconductor wafer in a horizontal position, a drive motor for driving the spin chuck for rotation, and a processing vessel accommodating the spin chuck and the drive motor 50 therein... | 05/01/2007 |
| 7160616 | DLC layer system and method for producing said layer system The invention describes a device and a process that render possible the production of a layer system for wear protection, corrosion protection and improvement of the slipping properties and the like with an adhesion layer to be arranged on a substrate, a transition ... | 01/09/2007 |
| 7157151 | Corrosion-resistant layered coatings In general, the present invention provides coating systems and processes for applying a selected coating system on a metallic substrate. The coating system includes two or more coating layers. A first layer comprises a MCrAl(Y,Hf)-type coating. The MCrAl(Y,Hf) coati... | 01/02/2007 |
| 7147900 | Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation A silicon-containing insulation film is formed on a substrate by plasma reaction using a reaction gas including (i) a source gas comprising a silicon-containing hydrocarbon compound containing multiple cross-linkable groups, (ii) a cross-linking gas, and (iii) an in... | 12/12/2006 |
| 7078074 | Lens plasma coating system The invention provides a method for plasma coating of optical lenses, particularly lenses made of silicone-containing polymer. The method of the invention comprising selectively depressurizing and pressurizing an entry hold chamber and an exit hold chamber while con... | 07/18/2006 |
| 7070657 | Method and apparatus for depositing antireflective coating This invention provides a stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that d... | 07/04/2006 |
| 7067191 | Method to increase wear resistance of a tool or other machine component A layer system in particular for tools or machine components operated under insufficient lubrication or under dry operation conditions, is proposed, which system, starting from the base body, comprises a hard substance layer system, subsequently a metallic layer and... | 06/27/2006 |
| 7060322 | Method of making heat treatable coated article with diamond-like carbon (DLC) coating A method of making a coated article (e.g., window unit), and corresponding coated article are provided. A layer of or including diamond-like carbon (DLC) is formed on a glass substrate, preferably over at least one barrier layer. Then, a protective layer is formed o... | 06/13/2006 |
| 7014889 | Process and apparatus for plasma activated depositions in a vacuum Plasma deposition apparatus (1) and method that allows metal or nonmetal vapor (6) to be generated by electron-beam evaporation, guides that vapor using a noble gas stream (containing reactive gases in cases of reactive evaporation), ionizes the dense ... | 03/21/2006 |
| 6955745 | Method of spark-processing silicon and resulting materials The subject invention pertains to a method of spark processing silicon and resulting materials. The subject invention also relates to electroluminescent devices incorporating the materials produced by the subject method. The subject method for spark-processing can e... | 10/18/2005 |
| 6938815 | Heat-resistant electronic systems and circuit boards Methods of making improved electronic systems and circuits boards, and more specifically to methods of making improved electronic systems and circuits boards using heat-resistant composite materials having superior mechanical, thermal, and electrical properties.... | 09/06/2005 |
| 6926934 | Method and apparatus for deposited film In a deposited-film formation method or apparatus according to the present invention, which comprises providing a discharge electrode in a vacuum vessel equipped with exhaust means, supplying a hydrogen gas and a raw material gas for forming a deposited film which c... | 08/09/2005 |
| 6918352 | Method for producing coated workpieces, uses and installation for the method A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma... | 07/19/2005 |
| 6919107 | Method and device for treating surfaces using a glow discharge plasma In a process for treating a surface with the aid of a glow discharge plasma sustained in a gas of substantially ambient pressure between two electrodes (10, 10′) unwanted effects of plasma filaments occurring in such a plasma are prevented by positioning th... | 07/19/2005 |
| 6861105 | Method of making automotive trim with chromium inclusive coating thereon, and corresponding automotive trim product A method is provided for making vehicle trim components that have a layer(s) including chromium (Cr), in metallic, oxide, nitride, and/or carbide form. In certain embodiments, a Cr inclusive gas is used in conjunction with a vapor deposition apparatus (e.g., PECVD a... | 03/01/2005 |
| 6811956 | Line edge roughness reduction by plasma treatment before etch One aspect of the present invention relates to a system and method for mitigating LER as it may occur on short wavelength photoresists. The method involves forming a short wavelength photoresist over a substrate having at least one dielectric layer formed thereon, e... | 11/02/2004 |
| 6777037 | Plasma processing method and apparatus A plasma processing method and apparatus are provided for processing the surface of a semiconductor device or the like through the effect of plasma. A pulsed plasma discharge is performed by switching on and off the high frequency electric power for generating the p... | 08/17/2004 |
| 6767590 | Poled plasma deposition A poled polymer material is formed on the surface of a substrate by poling a nonlinear optical reactant during a plasma polymerizing deposition of the reactant onto the surface. The substrate is fixed between the positive plasma-generating and ground electrodes in a... | 07/27/2004 |
| 6767593 | Apparatus and process for forming a deposited film A deposited film-forming apparatus comprising a reaction chamber capable of being vacuumed in which glow discharge is caused by means of a high frequency power supplied by a high frequency power introduction means to form a deposited film on a substrate positioned i... | 07/27/2004 |
| 6756085 | Ultraviolet curing processes for advanced low-k materials Low dielectric constant materials with improved elastic modulus and material hardness. The process of making such materials involves providing a dielectric material and ultraviolet (UV) curing the material to produce a UV cured dielectric material. UV curing yields ... | 06/29/2004 |
| 6730365 | Method of thin film deposition under reactive conditions with RF or pulsed DC plasma at the substrate holder Method of thin film deposition especially in reactive conditions. Optical coatings with negligible optical absorption, of high quality and low cost even on unheated substrates are deposited using an RF/pulsed DC plasma RF/pulsed DC bias generates a plasma in front o... | 05/04/2004 |
| 6699788 | Method for integrated nucleation and bulk film deposition An integrated nucleation and bulk deposition process is disclosed for forming a CVD metal film over a semiconductor substrate that has structures formed thereon. In the integrated deposition process of the present invention, nucleation seed deposition and... | 03/02/2004 |
| 6696108 | Vacuum processing method A vacuum processing method comprises placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to the same high-frequency electrode to generate plasma i... | 02/24/2004 |
| 6676741 | Methods for producing enhanced interference pigments Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material that smoothly replicates the surface microstructure of the... | 01/13/2004 |
| 6649222 | Modulated plasma glow discharge treatments for making superhydrophobic substrates A method for treating substrates including the steps of: providing a substrate; exposing said substrate to a plasma glow discharge in the presence of a fluorocarbon gas; maintaining said gas at a pressure between about 50 mTorr and about 400 mTorr;... | 11/18/2003 |
| 6638569 | Apparatus and method for coating substrates with vacuum depositable materials An apparatus for coating a substrate with a diamond like coating or other vacuum depositable material comprises a chamber 11 having, or acting as, an anode, means for supporting a substrate 15 in the chamber, means for establishing a low pressure atmosphe... | 10/28/2003 |
| 6616987 | Procedure and device for specific particle manipulation and deposition A process for manipulating particles distributed substantially non-uniformly in a plasma of a carrier or reaction gas, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasmacrystalline state, and ... | 09/09/2003 |
| 6613400 | Cream A cream for use as a topping on beverages, such that the cream floats on the surface of the beverage, whether hot or cold. The cream contains a hydrocolloid fluid gelling agent at a concentration sufficient to form a fluid gel which is subsequently sheare... | 09/02/2003 |
| 6569501 | Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD) The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and ot... | 05/27/2003 |
