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...that Kleenex tissue was originally designed to be a gas mask filter? It was developed at the beginning of World War I to replace cotton, which was then in short supply as a surgical dressing.
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| Number | Title | Issue Date |
| 6086959 | Boron and nitrogen containing coating and method for making A coating scheme comprising a boron and nitrogen containing layer that satisfactorily adheres to a substrate is disclosed. The satisfactorily adherent coating scheme comprises a base layer, a first intermediate layer, a second intermediate layer and the b... | 07/11/2000 |
| 6086953 | Ceramic-coated metal guide pin A method for manufacturing a guide pin is disclosed, which comprises machining a metal substrate core; optionally depositing an intermediate coating onto the substrate core; and depositing an insulative ceramic coating onto the intermediate coating by a c... | 07/11/2000 |
| 6083568 | Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds In one aspect, a deposition method comprises the following steps: a) forming a layer on a semiconductive substrate, the layer comprising predominately an inorganic material, the layer also comprising incorporated carbon; b) generating a plasma adjacent th... | 07/04/2000 |
| 6080445 | Method of forming films over insulating material A method of forming films over an insulating material is provided whereby an underlayer film having electric conductivity is formed on the surface of the insulating material constituting a base member, and a hard carbon film is formed over the underlayer ... | 06/27/2000 |
| 6077573 | Plasma enhanced chemical vapor deposition methods of forming hemispherical grained silicon layers A method of forming a microelectronic device includes the step of forming an impurity doped amorphous silicon layer on a microelectronic substrate using plasma-enhanced chemical vapor deposition. The impurity doped amorphous silicon layer is patterned so ... | 06/20/2000 |
| 6077571 | Conformal pure and doped aluminum coatings and a methodology and apparatus for their preparation The present invention relates to a process and apparatus for the formation of conformal pure aluminum and doped aluminum coatings on a patterned substrate. It is directed to the use of low temperature thermal and plasma-promoted chemical vapor deposition ... | 06/20/2000 |
| 6071556 | Method of coating an article of manufacturing having a substrate formed of a nickel or cobalt-based superalloy A nickel-based or cobalt-based superalloy substrate is covered with a protective system which is resistant to thermal, corrosive and erosive attack. An anchoring layer is disposed on the substrate. The anchoring layer is formed as an oxide compound, in pa... | 06/06/2000 |
| 6071552 | Insitu formation of TiSi2 /TiN bi-layer structures using self-aligned nitridation treatment on underlying CVD-TiSi2 layer The present invention provides a method of forming a contact structure comprised of: a silicon substrate, a titanium silicide layer, a barrier layer (i.e., TiN or TiNO), and a metal layer (e.g., Al or W). There are three embodiments of the invention for f... | 06/06/2000 |
| 6069093 | Process of forming metal films and multi layer structure In a process of forming a metal film, when metal wiring is formed on a diffusion layer (an electrode, etc.) of a circuit element formed on a silicon semiconductor wafer, a Ti film is deposited on a surface of a processed body by PECVD using TiCl4 | 05/30/2000 |
| 6069053 | Formation of conductive rugged silicon The present invention provides methods of forming in situ doped rugged silicon and semiconductor devices incorporating conductive rugged silicon. In one aspect, the methods involve forming a layer of doped amorphous silicon on a substrate at a substantial... | 05/30/2000 |
| 6066358 | Blanket-selective chemical vapor deposition using an ultra-thin nucleation layer The present invention relates generally to an improved apparatus and process for providing uniform step coverage on a substrate and planarization of conducting layers to form continuous, void-free interconnects in sub-half micron, high aspect ratio apertu... | 05/23/2000 |
| 6063179 | Goniochromatic gloss pigments based on coated silicon dioxide platelets Goniochromatic luster pigments based on silicon dioxide platlets, CVD coated with A) a nonselectively absorbing filmlike layer at least partially transparent to visible light, and B) if desired an outer layer which consists essentially of colorless or sel... | 05/16/2000 |
| 6054191 | Method of forming an electrical contact to a silicon substrate A method of forming an electrical contact to a substrate includes, a) placing a substrate having a silicon node to which electrical connection is to be made within a chemical vapor deposition reactor; b) injecting a first titanium organometallic precursor... | 04/25/2000 |
| 6054188 | Non-ideal barrier coating architecture and process for applying the same to plastic substrates The present invention is a non-ideal barrier coating composition and the method for applying the coating composition to substrates. The non-ideal barrier coating is useful for providing an effective barrier against gas permeability in containers and for e... | 04/25/2000 |
| 6054185 | Substrate with superhard coating containing boron and nitrogen and method of making the same A cutting tool includes a substrate and a coating on the substrate. The coating includes a base adhesion layer that is on at least a portion of the substrate. A first intermediate adhesion layer, which includes boron and a first element, that is on the ba... | 04/25/2000 |
| 6054184 | Method for forming a multilayer thermal barrier coating A method and apparatus for forming a multilayer thermal barrier coating such that the coating is composed of substantially homogeneous layers of different ceramic materials. The method entails supporting an article within a coating apparatus and in proxim... | 04/25/2000 |
| 6054183 | Method for making CVD diamond coated substrate for polishing pad conditioning head A flat substrate polishing and polishing pad conditioning head for a chemical-mechanical-planarization apparatus is provided which has been shown to double the useable life of a polishing pad used to planarize and/or polish both oxide and metal outer laye... | 04/25/2000 |
| 6051282 | Surface treatment of antireflective layer in chemical vapor deposition process In a chemical vapor deposition process a surface layer is formed on an antireflective layer to prevent amines in the antireflective layer from neutralizing acid components formed during the exposure of an overlying photoresist layer. The surface layer is ... | 04/18/2000 |
| 6051281 | Method of forming a titanium film and a barrier metal film on a surface of a substrate through lamination A method of forming a titanium film and a titanium nitride film on a substrate by lamination which method is capable of suppressing contamination of the substrate due to the by-product and of reducing a contact resistance value of the titanium film. By ca... | 04/18/2000 |
| 6042900 | CVD method for forming diamond films Method is provided for forming CVD nano diamond films for use as cold cathodes in microelectronic devices. Conditions for forming the film outside the plasma region between the cathode and a grid anode are disclosed. Heating of the grid anode makes possib... | 03/28/2000 |
| 6040012 | Process for the preparation by chemical vapor deposition (CVD) of a Ti-A1-N based multilayer coating The invention relates to a process for the preparation of a multilayer coating, comprising a stack, on a substrate, of several layers chosen from among layers constituting by TiN and layers constituted by (Ti,Al)N, also known as Ti1-x Alx | 03/21/2000 |
| 6040001 | Method of manufacturing a diamond vacuum device This invention discloses a method of manufacturing a diamond vacuum device, and more particularly a method of manufacturing a diamond vacuum device which uses a diamond thin film as an electron emitter by electric field. The present invention presents a m... | 03/21/2000 |
| 6040017 | Formation of multilayered photonic polymer composites The fabrication of linear and non-linear optical materials including photoconductive, photorefractive, and optical limiting polymer composite films from radiation curable homogeneous solutions or heterogeneous slurries via vacuum flash evaporation techniq... | 03/21/2000 |
| 6037272 | Apparatus and method for low pressure chemical vapor deposition using multiple chambers and vacuum pumps An apparatus for low pressure chemical vapor deposition for fabricating a semiconductor device comprises a group of reaction chambers, a group of high-vacuum pumps connected to the reaction chambers, a group of gate valves connected to the high-vacuum pum... | 03/14/2000 |
| 6037018 | Shallow trench isolation filled by high density plasma chemical vapor deposition A method for filling shallow trenches 28 with a HDPCVD oxide 50. The invention has two liners: (a) a thermal oxide liner 36 and (b) an overlying conformal O3 -TEOS protective liner 40. The O3 -TEOS protective liner 40 prevents the HD... | 03/14/2000 |
| 6037013 | Barrier/liner with a SiNx-enriched surface layer on MOCVD prepared films A barrier/liner structure (10) and method. First, a porous nitride layer (12) is formed over a structure (18), for example, by metal-organic CVD (MOCVD). Then, the porous nitride layer (12) is exposed to a silicon- (or dopant-) containing ambient to obtai... | 03/14/2000 |
| 6037001 | Method for the chemical vapor deposition of copper-based films A method for depositing copper-based films and a copper source precursor for use in the chemical vapor deposition of copper-based films are provided. The precursor includes a mixture of at least one ligand-stabilized copper (I) ଲ-diketonate precurso... | 03/14/2000 |
| 6027766 | Photocatalytically-activated self-cleaning article and method of making same A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or m... | 02/22/2000 |
| 6025094 | Protective coatings for negative electrodes Disclosed is an alkali metal negative electrode having a protective layer. Specifically, the disclosed negative electrode includes a glassy or amorphous surface protective layer which conducts alkali metal ions but effectively blocks the alkali metal in t... | 02/15/2000 |
| 6022587 | Method and apparatus for improving film deposition uniformity on a substrate A method and apparatus for depositing a film on a substrate. According to the present invention a prewafer reaction layer is deposited onto a susceptor placed in the reaction chamber to form a prewafer reaction layer coated susceptor prior to film deposit... | 02/08/2000 |
| 6022586 | Method and apparatus for forming laminated thin films or layers Pre-coating films are formed in a pretreatment by supplying first film-forming gases into a process chamber of a process vessel while heating the process chamber so as to form a first pre-coating film on the inner surface of the process vessel exposed to ... | 02/08/2000 |
| 6020024 | Method for forming high dielectric constant metal oxides A method for forming a metal gate (20) structure begins by providing a semiconductor substrate (12). The semiconductor substrate (12) is cleaned to reduce trap sites. A nitrided layer (14) having a thickness of less than approximately 20 Angstroms is form... | 02/01/2000 |
| 6020025 | Method of manufacturing a crank shaft A crank shaft is constructed only at the surface layer of a journal portion with a hard nitride layer, so that the resultant crank shaft is available at a low cost, not so heavy and excellent in durability in comparison with a case employing a hard materi... | 02/01/2000 |
| 6013338 | CVD apparatus An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical c... | 01/11/2000 |
| 6013337 | Blood collection tube assembly The present invention is a plastic container coated with a multi-layer barrier coating. The multi-layer barrier coating is useful for providing an effective barrier against gas permeability in containers and for extending shelf-life of containers, especia... | 01/11/2000 |
| 6010756 | Rugate filter and method of making same The invention is a method of depositing a rugate filter coating on a substrate, with the coating having an index of refraction that varies with the depth thereof. In detail, the method comprising the steps of: a) placing the substrate in an apparatus capa... | 01/04/2000 |
| 6010751 | Method for forming a multicolor interference coating Several techniques for forming a colored interference filter coating on a substrate such as polyester film. The interference filter has two metal reflective films, at least one of which is semi-transparent. A layer of transparent acrylate polymer dielectr... | 01/04/2000 |
| 6007875 | Method and apparatus for applying protective coatings on reflective layers A process for applying a protective coating on the reflective layer of projector reflectors by means of plasma polymerization is provided, where a first protective layer which was applied on the reflective layer in a vacuum chamber by plasma polymerizatio... | 12/28/1999 |
| 6007871 | Method of surface treatment for a fishing tackle part made of alloy steel containing chrome The object of the present invention is to provide a simple, inexpensive method of surface treatment capable of improving the strength and smoothness of fishing tackle parts made of alloy steel containing chrome. The method of surface treatment for a fishi... | 12/28/1999 |
| 6004885 | Thin film formation on semiconductor wafer A starting gas feeding apparatus for forming a gaseous starting material from a liquid starting material and feeding the gaseous starting material into a reaction chamber of a CVD apparatus, comprises; a container that holds the liquid starting material, ... | 12/21/1999 |
