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| Number | Title | Issue Date |
| 7208195 | Methods and apparatus for deposition of thin films A method for depositing a thin film includes the steps of providing a vapor including at least one selected vapor phase component into an evacuated chamber and condensing the vapor onto a heated substrate to form a liquid phase deposit wherein a temperature of the s... | 04/24/2007 |
| 7201937 | Methods for forming composite coatings on MEMS devices The present invention provides unique methods of coating and novel coatings for MEMS devices. In general a two step process includes the coating of a first silane onto a substrate surface followed by a second treatment with or without a second silane and elevated te... | 04/10/2007 |
| 7201803 | Valve control system for atomic layer deposition chamber A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication wi... | 04/10/2007 |
| 7195798 | Method of manufacturing a low temperature polysilicon film A method of manufacturing a low temperature polysilicon film is provided. A first metal layer is formed on a substrate; and openings have been formed in the first metal layer. A second metal layer is formed on the first metal layer: and a hole corresponding to each ... | 03/27/2007 |
| 7192623 | Thin layer of hafnium oxide and deposit process A thin layer of hafnium oxide or stacking of thin layers comprising hafnium oxide layers for producing surface treatments of optical components, or optical components, in which at least one layer of hafnium oxide is in amorphous form and has a density less than 8 gm... | 03/20/2007 |
| 7189431 | Method for forming a passivated metal layer A method for forming a passivated metal layer that preserves the properties and morphology of an underlying metal layer during subsequent exposure to oxygen-containing ambients. The method includes providing a substrate in a process chamber, exposing the substrate t... | 03/13/2007 |
| 7186582 | Process for deposition of semiconductor films Chemical vapor deposition processes utilize higher order silanes and germanium precursors as chemical precursors. The processes have high deposition rates yet produce more uniform films, both compositionally and in thickness, than films prepared using conventional c... | 03/06/2007 |
| 7182976 | Process for forming a thin film and apparatus therefor A process for forming a thin film is described that enables automatic formation of thin films having constant optical properties reliably and in large quantities with excellent reproducibility suitable for mass production. An apparatus for performing the process is ... | 02/27/2007 |
| 7183208 | Methods for treating pluralities of discrete semiconductor substrates The invention includes a method for treating a plurality of discrete semiconductor substrates. The discrete semiconductor substrates are placed within a reactor chamber. While the substrates are within the chamber, they are simultaneously exposed to one or more of H... | 02/27/2007 |
| 7179505 | Manufacturing method of MoSi-SiC nanocomposite coating The embodiments of the invention relate to a MoSi2-SiC nanocomposite coating layer formed on surfaces of refractory metals such as Mo, Nb, Ta, W and their alloys. The MoSi2-SiC nanocomposite coating layer is manufactured by forming a molybdenum... | 02/20/2007 |
| 7175878 | Cold antireflection layer deposition process The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different... | 02/13/2007 |
| 7169441 | Method for making a UV-reflecting interference layer system There is provided a UV-reflective interference layer system for transparent substrates with broadband anti-reflection properties in the visible wavelength range. The interference layer system includes at least four individual layers. Successive layers have different... | 01/30/2007 |
| 7166323 | Method of coating catalyst carrier layer of metal-metal oxide, method of depositing active catalyst particles onto metal substrates for preparing metal monolith catalyst modules, and module thereby Disclosed is a method of coating a porous carrier layer of metal-metal oxide and depositing an active catalyst component on metal substrates, and a monolith module useful as a catalytic reactor with low pressure drop prepared using the metal substrate having the dep... | 01/23/2007 |
| 7163719 | Method of depositing thin film using hafnium compound A method of depositing a thin film using a hafnium compound includes depositing a primary thin film and depositing a secondary thin film. The depositing of the primary thin film and the depositing of the secondary thin film are repeated once or more. The depositing ... | 01/16/2007 |
| 7160578 | Method for depositing aluminum oxide coatings on flat glass A chemical vapor deposition process for laying down an aluminum oxide coating on a glass substrate through the use of an organic ester having a β hydrogen on the alkyl group bonded to the carboxylate oxygen and an inorganic aluminum halide. The resulting article ha... | 01/09/2007 |
| 7157116 | Method for the production of plane-parallel platelets by using organic separating agents A new method is proposed for the production of plane-parallel platelets, comprising the steps a) vapor-deposition, at a pressure below atmospheric pressure, of a separating agent onto a carrier to produce a separating agent layer, b) vapor-deposition, at a pressure ... | 01/02/2007 |
| 7157111 | MOCVD selective deposition of C-axis oriented PBGEOthin films on InOoxides A method of selectively depositing a ferroelectric thin film on an indium-containing substrate in a ferroelectric device includes preparing a silicon substrate; depositing an indium-containing thin film on the substrate; patterning the indium containing thin film; a... | 01/02/2007 |
| 7153651 | Flow-through optical assay devices providing laminar flow of fluid samples, and methods of construction thereof An optical assay device for the detection of an analyte of interest in a sample comprising a support containing channels, an optically functional layer positioned on the support such that the optically functional layer and the support allow for laminar flow of the s... | 12/26/2006 |
| 7151653 | Depositing a pinned layer structure in a self-pinned spin valve The pinned layer structure in a self-pinned spin valve is deposited using a DC aligning field. The deposition of each of the Reference and Keeper layer in the pinned layer occurs within two different polarity DC aligning fields. Thus, a first portion of the Referenc... | 12/19/2006 |
| 7145709 | Apparatus and methods for modulating refractive index An iono-refractive structure that includes one or more ion insertion layers having a real portion and an imaginary portion of the dielectric constant is provided. While both the real portion and the imaginary portion of the dielectric constant change, the change in ... | 12/05/2006 |
| 7141095 | Precursor material delivery system for atomic layer deposition A precursor delivery system includes a flow path from a precursor container to a reaction space of a thin film deposition system, such as an atomic layer deposition (ALD) reactor. A staging volume is preferably established between the precursor container and the rea... | 11/28/2006 |
| 7138189 | Heat-resistant Ti alloy material excellent in resistance to corrosion at high temperature and to oxidation Disclosed is a heat-resistant Ti alloy material excellent in high-temperature corrosion resistance and oxidation resistance, which comprises a base made of a heat-resistant Ti alloy and a surface layer formed on the surface of the base. The surface layer has a multi... | 11/21/2006 |
| 7132130 | Method for providing a chrome finish on a substrate An environmentally-friendly process for applying a chrome finish on a substrate is provided. The chrome finish comprises a thin film of aluminum and chromium deposited onto the substrate by physical vapor deposition (PVD) techniques. The thin layer can consist of th... | 11/07/2006 |
| 7132309 | Semiconductor-on-diamond devices and methods of forming The present invention provides semiconductor-on-diamond devices, and methods for the formation thereof. In one aspect, a mold is provided which has an interface surface configured to inversely match a configuration intended for the device surface of a diamond layer.... | 11/07/2006 |
| 7112544 | Method of atomic layer deposition on plural semiconductor substrates simultaneously The invention includes a method for treating a plurality of discrete semiconductor substrates. The discrete semiconductor substrates are placed within a reactor chamber. While the substrates are within the chamber, they are simultaneously exposed to one or more of H... | 09/26/2006 |
| 7101795 | Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer A method and system to form a refractory metal layer on a substrate features nucleating a substrate using sequential deposition techniques in which the substrate is serially exposed to first and second reactive gases followed by forming a layer, employing vapor depo... | 09/05/2006 |
| 7097878 | Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiOfilms A method employing rapid vapor deposition (RVD) deposits a dielectric material on small features of a substrate surface. The resulting dielectric film is thicker, faster growing, shows better gap fill performance and has improved film properties compared to films re... | 08/29/2006 |
| 7087179 | Optical integrated circuits (ICs) In one aspect, the invention provides methods and apparatus for forming optical devices on large area substrates. The large area substrates are preferably made of quartz, silica or fused silica. The large area substrates enable larger optical devices to be formed on... | 08/08/2006 |
| 7083827 | Nickel-base superalloy having an optimized platinum-aluminide coating A nickel-base superalloy substrate includes a surface region having an integrated aluminum content of from about 18 to about 24 percent by weight and an integrated platinum content of from about 18 to about 45 percent by weight, with the balance components of the su... | 08/01/2006 |
| 7085616 | Atomic layer deposition apparatus A method and apparatus for atomic layer deposition (ALD) is described. The apparatus comprises a deposition chamber and a wafer support. The deposition chamber is divided into two or more deposition regions that are integrally connected one to another. The wafer sup... | 08/01/2006 |
| 7078083 | Optical recording film, method for manufacturing the same, optical recording medium, information recording/reproducing device, computer system and video signal recording/reproducing system An optical recording film in the form of a monomolecular layer, includes chemisorptive molecules that are chemically bonded by covalent bonding to a surface of a substrate. The optical recording film has the property that, when irradiated with polarized light, a lon... | 07/18/2006 |
| 7077918 | Stripping apparatus and method for removal of coatings on metal surfaces A coating is stripped off a work piece by applying a chromous and aluminiforous coat directly on the work piece and stripping the work piece with an alkaline solution containing a strong oxidant. A single-compartment system can be used, which includes a spray chambe... | 07/18/2006 |
| 7067175 | Method of making heat treatable coated article with diamond-like carbon (DLC) inclusive layer A method of making a coated article includes providing a protective layer on a substrate over a coating in order to protect the coating. The protective layer may protect the coating before or during heat treatment in certain example embodiments of this invention. | 06/27/2006 |
| 7067351 | Selectively-etched nanochannel electrophoretic and electrochemical devices Nanochannel electrophoretic and electrochemical devices having selectively-etched nanolaminates located in the fluid transport channel. The normally flat surfaces of the nanolaminate having exposed conductive (metal) stripes are selectively-etched to form trenches a... | 06/27/2006 |
| 7048967 | Organic film vapor deposition method and a scintillator panel An organic film vapor deposition method includes a first step of supporting a substrate formed with a scintillator on at least three protrusions of a target-support element disposed on a vapor deposition table so as to keep a distance from the vapor deposition table... | 05/23/2006 |
| 7048968 | Methods of depositing materials over substrates, and methods of forming layers over substrates The invention includes methods of utilizing supercritical fluids to introduce precursors into reaction chambers. In some aspects, a supercritical fluid is utilized to introduce at least one precursor into a chamber during ALD, and in particular aspects the supercrit... | 05/23/2006 |
| 7022403 | Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating The inventive coating for diamond and diamond-containing materials represents a coupling of an internal layer, made of tungsten carbide, with an external tungsten layer, both layers being fluorine alloyed. The inventive coating makes it possible to ensure a good adh... | 04/04/2006 |
| 7022948 | Chamber for uniform substrate heating Embodiments of the invention generally provide an apparatus and a method for providing a uniform thermal profile to a plurality of substrates during heat processing. In one embodiment, a cassette containing one or more heated substrate supports is moveably disposed ... | 04/04/2006 |
| 7013560 | Process for fabricating a substrate A substrate comprises at least a semi-finished substrate, a circuit line, a contact and a solder mask layer. The circuit line and the contact are formed on the semi-finished substrate. The circuit line and the contact are connected together non-integrally. The solde... | 03/21/2006 |
| 7011867 | α-alumina coated cutting tool A coated cutting tool is composed of one or more layers of refractory compounds of which at least one layer is single-phase α-alumina with a pronounced columnar grain-structure and strong texture in the [300]-direction. The alumina layer is preferably deposited by ... | 03/14/2006 |
