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| Number | Title | Issue Date |
| 8182870 | Method for generating small and ultra small apertures, slits, nozzles and orifices A method and device for one or more small apertures, slits, nozzles and orifices, preferably having a high aspect ratio. In one embodiment, one or more alternating layers of sacrificial layers and blocking layers are deposited onto a substrate. Each sacrificial laye... | 05/22/2012 |
| 8084089 | Wear resistant coating for brake disks with unique surface appearance and method for coating A brake disk including carbon steel, stainless steel or a ceramic composite material and coated with a coating material that is wear and corrosion resistant and when applied properly allows for the coated surface to have a variety of “textured” appearances. For ... | 12/27/2011 |
| 7976898 | Atomic layer deposition apparatus The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD appara... | 07/12/2011 |
| 7438948 | Method for coating a substrate with an undercoating and a functional coating A method for forming a coated substrate is disclosed. The method comprises depositing an undercoating layer and depositing a functional coating comprising a material which can be present in more than one crystal structure over the undercoating layer, wherein there i... | 10/21/2008 |
| 7431964 | Method of forming a porous metal catalyst on a substrate for nanotube growth A method is provided for forming a porous metal catalyst (44) on a substrate (42) for nanotube (84) growth in an emissive display. The method comprises depositing a metal (44) onto a surface of a substrate (12) at an angle (Θ) to ... | 10/07/2008 |
| 7425349 | Method of manufacturing a low temperature polysilicon film A method of manufacturing a low temperature polysilicon film is provided. A first metal layer is formed on a substrate; and openings have been formed in the first metal layer. A second metal layer is formed on the first metal layer: and a hole corresponding to each ... | 09/16/2008 |
| 7422771 | Methods for applying a hybrid thermal barrier coating A method for applying a hybrid thermal barrier coating, comprising masking at least a portion of a first surface of a component with a first maskant; applying a first coating material to at least a portion of a second surface of said component; removing said first m... | 09/09/2008 |
| 7419702 | Method for processing a substrate A method for processing a substrate on a ceramic substrate heater in a process chamber. The method includes forming a protective coating on the ceramic substrate heater in the process chamber and processing a substrate on the coated substrate heater. The processing ... | 09/02/2008 |
| 7410670 | Process and apparatus for depositing single-component or multi-component layers and layer sequences using discontinuous injection of liquid and dissolved starting substances via a multi-channel injection unit The invention relates to a method and device for depositing at least one layer on at least one substrate in a process chamber. Said layer comprises several components and is insulating, passivating or electrically conductive. The components are vaporized in a temper... | 08/12/2008 |
| 7404985 | Noble metal layer formation for copper film deposition A method of noble metal layer formation for high aspect ratio interconnect features is described. The noble metal layer is formed using a cyclical deposition process. The cyclical deposition process comprises alternately adsorbing a noble metal-containing precursor ... | 07/29/2008 |
| 7399500 | Rapid process for the production of multilayer barrier layers A process for applying alternating layers by chemical vapor deposition comprises the process steps of depositing an adhesion-promoter layer on a substrate and applying a barrier layer. Alternating layers comprising organic and inorganic materials are deposited alter... | 07/15/2008 |
| 7399499 | Methods of gas delivery for deposition processes and methods of depositing material on a substrate Methods for depositing material onto workpieces, methods of controlling the delivery of gases in deposition processes, and apparatus for depositing materials onto workpieces. One embodiment of a method for depositing material onto a workpiece comprises placing a mic... | 07/15/2008 |
| 7396565 | Multiple precursor cyclical deposition system Embodiments of the present invention relate to an apparatus and method of cyclical deposition utilizing three or more precursors in which delivery of at least two of the precursors to a substrate structure at least partially overlap. One embodiment of depositing a t... | 07/08/2008 |
| 7393561 | Method and apparatus for layer by layer deposition of thin films A method of increasing ALP briefly, a preferred embodiment of the present invention includes a method of increasing ALP throughput by continuously modulating gas flow in a reactor to achieve layer by layer growth on a wafer. A first reactant is introduced with a per... | 07/01/2008 |
| 7387816 | Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD A method of making a scratch resistant coated article is provided, the coated article also being resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, the method includes using flame pyrolysis ... | 06/17/2008 |
| 7371428 | Duplex gas phase coating Method of forming different diffusion aluminide coatings on different surface regions of the same superalloy substrate involves positioning the substrate in a coating chamber having a aluminum-bearing coating gas flowing therein with a first substrate surface region... | 05/13/2008 |
| 7344755 | Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers The present disclosure provides methods and apparatus that may be used to process microfeature workpieces, e.g., semiconductor wafers. Some aspects have particular utility in depositing TiN in a batch process. One implementation involves pretreating a surface of a p... | 03/18/2008 |
| 7326438 | Method for depositing nitride film using chemical vapor deposition apparatus of single chamber type The present invention relates to a method for depositing a nitride film using a chemical vapor deposition apparatus of single chamber type, and more particularly to a method for depositing a nitride film that is capable of depositing the nitride film in which an are... | 02/05/2008 |
| 7323218 | Synthesis of composite nanofibers for applications in lithium batteries Methods of fabricating one-dimensional composite nanofiber on a template membrane with porous array by chemical or physical process are disclosed. The whole procedures are established under a base concept of “secondary template”. First of all, tubular first nano... | 01/29/2008 |
| RE39999 | Coated turning insert and method of making it A coated turning insert particularly useful for turning in stainless steel is disclosed. The insert is characterized by a WC—Co-based cemented carbide substrate having a highly W-alloyed Co-binder phase and a coating including an inner layer of TiCxN | 01/08/2008 |
| 7311946 | Methods for depositing metal films on diffusion barrier layers by CVD or ALD processes A process is described for depositing a metal film on a substrate surface having a diffusion barrier layer deposited thereupon. In one embodiment of the present invention, the process includes: providing a surface of the diffusion barrier layer that is substantially... | 12/25/2007 |
| 7311938 | Ultra low residual reflection, low stress lens coating A method is provided for coating optical lenses and other optical articles with anti-reflection (AR) coatings. The lenses have low reflectivity, provide a substantially white light reflection and have a low stress AR coating and are ideally suited for optical lenses... | 12/25/2007 |
| 7306852 | Gas barrier film It is an object of the present invention to provide a gas barrier film improved in gas barrier characteristics by decreasing the adsorbent of the surface of a gas barrier layer to water and the like. The present invention attains the above object by providing a gas ... | 12/11/2007 |
| 7294360 | Conformal coatings for micro-optical elements, and method for making the same A micro-optical element is produced through vapor deposition techniques, such as atomic layer deposition. An optical structure having a surface with uneven structures is exposed to one or more precursor vapors to create a self-limiting film growth on the surface of ... | 11/13/2007 |
| 7291216 | Platelet-shaped pigments The present invention relates to platelet-shaped pigments comprising (a) a layer obtained by calcination of a layer comprising SiOz wherein 0.03≦z≦2.0 and a metal, to a process for the production thereof, and to the use thereof in paints, text ink-jet... | 11/06/2007 |
| 7288286 | Delivering organic powder to a vaporization zone A method for vaporizing organic material and condensing it onto a surface to form a layer, comprising: providing a quantity of first organic material in a powdered form in a first container and a quantity of second organic material in a second container spaced from ... | 10/30/2007 |
| 7288285 | Delivering organic powder to a vaporization zone A method for vaporizing organic materials and condensing them onto a surface to form a layer, comprising: providing a quantity of organic material in a powdered form in a first container; fluidizing the organic material in the first container and transferring such f... | 10/30/2007 |
| RE39884 | Coated milling insert and method of making it A coated milling insert particularly useful for milling in low and medium alloyed steels with or without raw surface zones during wet or dry conditions. The insert is characterized by a WC-Co cemented carbide with a low content of cubic carbides and a highly W alloy... | 10/16/2007 |
| 7282274 | Integral composite structural material The present invention is an integral composite structural (ICS) material comprising an open metal structure having at least one external side and internal surfaces defining a plurality of open shapes with a ceramic matrix composite bonded to at least one external si... | 10/16/2007 |
| 7279047 | Reactor for extended duration growth of gallium containing single crystals An apparatus for growing bulk GaN and AlGaN single crystal boules, preferably using a modified HVPE process, is provided. The single crystal boules typically have a volume in excess of 4 cubic centimeters with a minimum dimension of approximately 1 centimeter. If de... | 10/09/2007 |
| 7270848 | Method for increasing deposition rates of metal layers from metal-carbonyl precursors A method for increasing deposition rates of metal layers from metal-carbonyl precursors by mixing a vapor of the metal-carbonyl precursor with CO gas. The method includes providing a substrate in a process chamber of a deposition system, forming a process gas contai... | 09/18/2007 |
| 7264846 | Ruthenium layer formation for copper film deposition A method of ruthenium layer formation for high aspect ratios, interconnect features is described. The ruthenium layer is formed using a cyclical deposition process. The cyclical deposition process comprises alternately adsorbing a ruthenium-containing precursor and ... | 09/04/2007 |
| 7261919 | Silicon carbide and other films and method of deposition A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlle... | 08/28/2007 |
| 7256425 | Methods of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof A product produced in a PVD method is described, which consists of thin plane-parallel structures having a thickness in the range from 20 to 2000 nm and small dimensions in the range below one mm. Production is carried out by condensation of silicon suboxide onto a ... | 08/14/2007 |
| 7245463 | Apparatus for extended self-pinned layer for a current perpendicular to plane head A Giant Magneto-Resistive (GMR) sensor (900) having Current Perpendicular to Plane (CPP) structure provides an extended first pinned layer (914) as compared to second pinned layer (912) and free layer (910). Increased magnetoresistance ch... | 07/17/2007 |
| 7241472 | Method for producing antireflection film-coated plastic lens, and antireflection film-coated plastic lens The method produces a plastic lens with an antireflection film which have the advantages of good adhesion of the antireflection film to any type of hard coat film that underlies it and good abrasion resistance and provides a plastic lens with an antireflection film.... | 07/10/2007 |
| 7239444 | Display front plane, display lenticular lens, and display fresnel lens A display front plane having an anti-reflection film in thickness uniformity and good adhesion between the anti-reflection film and the base material is supplied. Each of a display lenticular lens and a display fresnel lens having a sophisticated anti-reflection fun... | 07/03/2007 |
| 7217440 | Process for replacing an initial outermost coating layer of a coated optical lens with a different coating layer or by depositing thereon a different coating layer The invention concerns a process for replacing an initial outermost coating layer of a coated optical lens with a layer of a new final coating having surface properties different from those of said initial outermost coating which comprises: (a) providing a co... | 05/15/2007 |
| 7211144 | Pulsed nucleation deposition of tungsten layers A method of forming a tungsten nucleation layer using a sequential deposition process. The tungsten nucleation layer is formed by reacting pulses of a tungsten-containing precursor and a reducing gas in a process chamber to deposit tungsten on the substrate. Thereaf... | 05/01/2007 |
| 7208195 | Methods and apparatus for deposition of thin films A method for depositing a thin film includes the steps of providing a vapor including at least one selected vapor phase component into an evacuated chamber and condensing the vapor onto a heated substrate to form a liquid phase deposit wherein a temperature of the s... | 04/24/2007 |
