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| Number | Title | Issue Date |
| 7615251 | Processing device using shower head structure and processing method A processing device, comprising a processing container, a shower head structure provided at the ceiling part of the processing container and having a plurality of gas jetting holes for jetting specified processing gas into the processing container formed in the gas ... | 11/10/2009 |
| 7381446 | Sprayed preforms to forming structural members A preform and method for forming preforms and structural members are provided. The preform can be formed by cold spraying a structural material onto a base member, such that the preform has dimensions approximating the dimensions of the machined structural member to... | 06/03/2008 |
| 7371428 | Duplex gas phase coating Method of forming different diffusion aluminide coatings on different surface regions of the same superalloy substrate involves positioning the substrate in a coating chamber having a aluminum-bearing coating gas flowing therein with a first substrate surface region... | 05/13/2008 |
| 7204885 | Deposition system to provide preheating of chemical vapor deposition precursors Chemical vapor deposition systems include elements to preheat reactant gases prior to reacting the gases to form layers of a material on a substrate, which provides devices and systems with deposited layers substantially free of residual compounds from the reaction ... | 04/17/2007 |
| 7105441 | Preheating of chemical vapor deposition precursors Chemical vapor deposition systems include elements to preheat reactant gases prior to reacting the gases to form layers of a material on a substrate, which provides devices and systems with deposited layers substantially free of residual compounds from the reaction ... | 09/12/2006 |
| 7064052 | Method of processing a transistor gate dielectric film with stem A method of fabricating a semiconductor device includes depositing a dielectric film and subjecting the dielectric film to a wet oxidation in a rapid thermal process chamber. The technique can be used, for example, in the formation of various elements in an integrat... | 06/20/2006 |
| 7056623 | Photomask and method for manufacturing the same A photomask and method for manufacturing the same are disclosed. A first material is deposited on at least a portion of a substrate to form a first material layer. Before completion of the deposition of the first material, a thermal treatment is applied to the subst... | 06/06/2006 |
| 7037603 | Material and method to prevent low temperature degradation of zirconia in biomedical implants The invention is directed to a material and a method of producing the material that is unaffected by the low-temperature degradation, humidity-enhanced phase transformation typical of yttria-stabilized zirconia in general, as well as of yttria-stabilized tetragonal ... | 05/02/2006 |
| 6969541 | Method and device for structuring a surface to form hydrophilic and hydrophobic regions A method for structuring a surface includes, by an assigned modification device, creating a latent structure of at least a first layer of the surface, which has a polymer therein, so as to form hydrophilic and hydrophobic regions for producing a printing form for of... | 11/29/2005 |
| 6962881 | Method for fabricating semiconductor integrated circuit device A method for fabricating a semiconductor integrated circuit device of the invention comprises feeding oxidation species containing a low concentration of water, which is generated from hydrogen and oxygen by the catalytic action, to the main surface of or in the vic... | 11/08/2005 |
| 6962858 | Method for reducing free surface roughness of a semiconductor wafer The invention provides a method of reducing the roughness of the free surface of a wafer of semiconductor material by applying a rapid thermal annealing process under a pure argon atmosphere for a time sufficient to uniformly heat and smooth the free surface of the ... | 11/08/2005 |
| 6905730 | Aluminide coating of turbine engine component A method for forming an aluminide coating on a turbine engine component having an external surface and an internal cavity defined by an internal surface that is connected to the external surface by at least one hole. The method is conducted in a vapor coating contai... | 06/14/2005 |
| 6878406 | Dynamic use of process temperature A process for reacting a gaseous species with a substrate includes placing the substrate in a space, heating the space, introducing the gaseous species into the space, and cooling the space. Introducing the gaseous species into the space includes introducing the gas... | 04/12/2005 |
| 6864125 | Process for growing a dielectric layer on a silicon-containing surface using a mixture of N2O and O3 This invention is embodied in an improved process for growing high-quality silicon dioxide layers on silicon by subjecting it to a gaseous mixture of nitrous oxide (N2O) and ozone (O3). The presence of O3 in the oxidizing ambiance gr... | 03/08/2005 |
| 6821578 | Method of manufacturing an article with a protective coating system including an improved anchoring layer A method of placing a ceramic coating on an article of manufacture comprising a substrate formed of a nickel or cobalt-based superalloy, which includes the steps of placing a bonding layer on the substrate and placing an anchoring layer, which is chemically differen... | 11/23/2004 |
| 6821562 | Method of forming an electrically insulating sealing structure for use in a semiconductor manufacturing apparatus In accordance with the present invention, an insulating sealing structure useful in physical vapor deposition apparatus is provided. The insulating sealing structure is capable of functioning under high vacuum and high temperature conditions. The apparatus is a thre... | 11/23/2004 |
| 6808760 | Method for preparing α-dialuminum trioxide nanotemplates A method for preparing an α-Al2O3 nanotemplate of fully crystalline α-Al2O3 directly on the surface of a metal alloy is provided. Also provided is a related apparatus. ... | 10/26/2004 |
| 6753043 | Patterning of high coercivity magnetic media by ion implantation A servo-patterned magnetic recording medium, comprising: a magnetic layer having a surface with substantially uniform topography, the magnetic layer including a data zone and a servo pattern, the servo pattern comprising: (a) a first patterned pluralit... | 06/22/2004 |
| 6716663 | Method for removing foreign matter, method for forming film, semiconductor device and film forming apparatus A semiconductor substrate is placed within a housing. By supplying organometallic complexes and carbon dioxide in a supercritical state into the housing, a BST thin film is formed on a platinum thin film, while at the same time, carbon compounds, which are produced ... | 04/06/2004 |
| 6713316 | Method for removing foreign matter, method for forming film, semiconductor device and film forming apparatus A semiconductor substrate is placed within a housing. By supplying organometallic complexes and carbon dioxide in a supercritical state into the housing, a BST thin film is formed on a platinum thin film, while at the same time, carbon compounds, which are produced ... | 03/30/2004 |
| 6696107 | Nanostructures The present invention relates to a method for producing an ordered array of nanoparticles on a substrate surface and to a nanomaterial having such an ordered array of nanoparticles. Particularly, but not exclusively, the invention relates to the provision... | 02/24/2004 |
| 6645570 | Surface treatment method In a surface treatment method of treating the surface of a material to be treated, by irradiating with light the material to be treated and a mediating material in contact with each other, the mediating material itself causes substantially no interaction ... | 11/11/2003 |
| 6632477 | SiCN compositions and methods The present invention provides a method for making a superabrasive composite material having the general formula Six Cy Nz, and tools containing such a material. In one aspect, vapor forms of Si, C, and N elements are depo... | 10/14/2003 |
| 6630199 | Ceramic layer produced by reacting a ceramic precursor with a reactive gas A structure protected by a ceramic coating is prepared by providing a substrate having a surface, and depositing a layer of a sacrificial ceramic precursor material, preferably silica, onto the surface of the substrate. The method further includes furnish... | 10/07/2003 |
| 6607946 | Process for growing a dielectric layer on a silicon-containing surface using a mixture of N2O and O3 This invention is embodied in an improved process for growing high-quality silicon dioxide layers on silicon by subjecting it to a gaseous mixture of nitrous oxide (N2 O) and ozone (O3). The presence of O3 in the oxidizing... | 08/19/2003 |
| 6602548 | Ceramic turbine blade attachment having high temperature, high stress compliant layers and method of fabrication thereof A nickel base single crystal compliant layer on a ceramic blade has the capability to sustain high stresses and high operating temperature. Layers of nickel and platinum bonded on a single crystal superalloy over a sputtered gold-chromium layer support th... | 08/05/2003 |
| 6599588 | Method for surface treatment of metal enclosure A method for treating a metal enclosure to prevent the enclosure from being contaminated, comprises the steps of: (a) sand-blasting the enclosure; (b) preheating the enclosure to a predetermined temperature, and putting the enclosure into the space in a v... | 07/29/2003 |
| 6548113 | Vacuum/gas phase reactor for dehydroxylation and alkylation of porous silica Vacuum/gas phase reactor embodiments used in gas phase dehydroxylation and alkylation reactions are described in which the substrate could be subjected to high vacuum, heated to target temperature, and treated with silane as quickly and efficiently as pos... | 04/15/2003 |
| 6541278 | Method of forming film for semiconductor device with supercritical fluid A semiconductor substrate is placed within a housing. By supplying organometallic complexes and carbon dioxide in a supercritical state into the housing, a BST thin film is formed on a platinum thin film, while at the same time, carbon compounds, which ar... | 04/01/2003 |
| 6537621 | Method of forming a titanium film and a barrier film on a surface of a substrate through lamination A method for forming a titanium film and a titanium nitride film on a surface of a substrate by lamination, by which contamination of the substrate due to the by-product is suppressed and the contact resistance of the titanium film is reduced. The method ... | 03/25/2003 |
| 6524651 | Oxidized film structure and method of making epitaxial metal oxide structure A stable oxidized structure and an improved method of making such a structure, including an improved method of making an interfacial template for growing a crystalline metal oxide structure, are disclosed. The improved method comprises the steps of provid... | 02/25/2003 |
| 6514557 | Synthesis of superconducting magnesium diboride objects A process to produce magnesium diboride objects from boron objects with a similar form is presented. Boron objects are reacted with magnesium vapor at a predetermined time and temperature to form magnesium diboride objects having a morphology similar to t... | 02/04/2003 |
| 6503562 | Semiconductor fabrication apparatus and fabrication method thereof An epitaxial growth system is provided with a susceptor driving mechanism for rotationally driving a susceptor in a process chamber and this susceptor driving mechanism has a support shaft coupled to the susceptor, a driven portion, and an annular member ... | 01/07/2003 |
| 6485783 | Chemical vapor deposition system A chemical vapor deposition (CVD) system is provided for processing a substrate 110. The system 100 includes a heated muffle 115, a chamber 120 having an injector assembly 130 for introducing chemical vapor to process the substrate 110, and a belt 105 for... | 11/26/2002 |
| 6478888 | Preheat method for EBPVD coating A method is described for reducing surface oxide growth which heating aluminum containing surfaces in a vacuum environment prior to the deposition of a ceramic coating. The method comprises flowing an inert or non reactive gas into the coating apparatus a... | 11/12/2002 |
| 6448178 | Heat treating method for thin film and forming method for thin film A heat treatment method for heat treating a thin film is a method for heat treating the thin film having a metallic silicide layer, comprising a heating step, a temperature keeping step and a cooling step. Among these steps, the thin film is heated in an ... | 09/10/2002 |
| 6428863 | Selected adjustment of dropwise condensation on ion implanted surfaces Process for selected adjustment of dropwise condensation on a surface comprising implanting nitrogen ions with a theoretically predicted minimum dose concentration of 1015 cm-2, the wetting characteristics of the surface being adjust... | 08/06/2002 |
| 6423372 | Tailoring the grafting density of organic modifiers at solid/liquid interfaces A method of depositing a functional group on a surface portion of an elastic substrate comprises the steps of: (a) stretching an elastic substrate having an initial surface portion to form an enlarged surface portion from the initial surface portion; then (b) ... | 07/23/2002 |
| 6423946 | Apparatus for and method of developing fingerprints An apparatus for and method of developing fingerprints on an object by cyanoacrylate fuming. The apparatus includes a container having a chamber, an opening to the chamber and a mechanism for evacuating air from the chamber. The apparatus also includes a ... | 07/23/2002 |
| 6410456 | Method and apparatus for insitu vapor generation A method of forming an oxide on a substrate. According to the method of the present invention a substrate is placed in a chamber. An oxygen containing gas and a hydrogen containing gas are then fed into the chamber. The oxygen containing gas and the hydro... | 06/25/2002 |
