Did You Know...
...that Thomas Edison's patent application on his phonograph was approved by the Patent Office in just seven weeks? In contrast, it took Gordon Gould, the inventor of the laser, 30 years to obtain his patent -- finally awarded in 1988!
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| Number | Title | Issue Date |
| 8173212 | Method for manufacturing carbon nano tube A method for manufacturing a carbon nano tube by a CVD method includes: supplying a carbon atom to a catalyzer for forming the carbon nano tube; and controlling an amount of carbon supply with time. In this method, super saturation of the carbon atom in the catalyze... | 05/08/2012 |
| 8163341 | Methods of forming metal-containing structures, and methods of forming germanium-containing structures Some embodiments include methods of forming metal-containing structures. A first metal-containing material may be formed over a substrate. After the first metal-containing material is formed, and while the substrate is within a reaction chamber, hydrogen-containing ... | 04/24/2012 |
| 8114479 | Diptube apparatus and delivery method This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened oppo... | 02/14/2012 |
| 8101235 | Vaporization apparatus with precise powder metering Apparatus for vaporizing a particulate material, comprising a metering apparatus including: a reservoir; a housing having an internal volume and first and second openings for respectively receiving and discharging the particulate material; a rotatable shaft disposed... | 01/24/2012 |
| 8084087 | Fabrication method of size-controlled, spatially distributed nanostructures by atomic layer deposition A method of growing spatially-separated and size-controlled particles on substrate surfaces is provided. The method utilizes chemical modification of the substrate surface, an atomic layer deposition (ALD) system, providing a modified layer to the substrate surface ... | 12/27/2011 |
| 7981473 | Transient enhanced atomic layer deposition A process in which a wafer is exposed to a first chemically reactive precursor dose insufficient to result in a maximum saturated ALD deposition rate on the wafer, and then to a second chemically reactive precursor dose, the precursors being distributed in a manner ... | 07/19/2011 |
| 7879401 | Organic vapor jet deposition using an exhaust Methods and systems for organic vapor jet deposition are provided, where an exhaust is disposed between adjacent nozzles. One or more carrier gases may be provided and ejected from a plurality of nozzles. An exhaust may be provided to create a localized vacuum betwe... | 02/01/2011 |
| 7867560 | Method for performing a vapor deposition process A method for performing a vapor deposition process is described. The vapor deposition process involves the deposition of a thin film, such as a ruthenium (Ru), rhenium (Re) or rhodium (Rh) film, on a substrate using a solid-phase or liquid-phase precursor. The metho... | 01/11/2011 |
| 7838072 | Method and apparatus for monolayer deposition (MLD) An adaptive real time thermal processing system is presented that includes a multivariable controller. The method includes creating a dynamic model of the MLD processing system and incorporating virtual sensors in the dynamic model. The method includes using process... | 11/23/2010 |
| 7829145 | Methods of uniformity control for low flow process and chamber to chamber matching Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the method for processing a substrate includes delivering a processing gas into a chemical vapor deposition chamber through a first gas pathway that includes flo... | 11/09/2010 |
| 7794788 | Method for pre-conditioning a precursor vaporization system for a vapor deposition process A method for pre-conditioning a film precursor vaporization system configured to supply a film precursor vapor to a deposition system for performing a deposition process is described. Prior to the deposition process, the gas pressure within the film precursor vapori... | 09/14/2010 |
| 7781018 | Method of making vapor deposited oxygen-scavenging particles This invention discloses a method of making an oxygen scavenging particle comprised of an activating component and an oxidizable component wherein one component is deposited upon the other component from a vapor phase and is particularly useful when the activating c... | 08/24/2010 |
| 7763318 | Method for improving heat stability of polyparaxylylene and derivative film thereof and polyparaxylylene derivative A method for improving the heat stability of polyparaxylylene and a derivative film thereof to improve the heat resistance of the polyparaxylylene and the derivative film thereof without deteriorating deposition characteristics or profitability, and a polyparaxylyle... | 07/27/2010 |
| 7722926 | Organometallic compounds and methods of forming thin films including the use of the same The present invention provides organometallic compounds and methods of forming thin films including using the same. The organometallic compounds include a metal and a ligand linked to the metal. The ligand can be represented by the following formula (1): | 05/25/2010 |
| 7641939 | Chemical vapor deposition reactor having multiple inlets A chemical vapor deposition reactor has a wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber and a plurality of injectors configured in flow controllable zones so as to mitigate depletion. ... | 01/05/2010 |
| 7625604 | Heat treatment method and heat treatment apparatus The present invention relates to a thermal processing method includes a first thermal processing step that carries out thermal processing steps using a plurality of first substrates, wherein thin films are formed on surfaces of the plurality of first substrates by m... | 12/01/2009 |
| 7622153 | Method of making vapour deposited oxygen-scavenging particles This invention discloses a method of making an oxygen scavenging particle comprised of an activating component and an oxidizable component wherein one component is deposited upon the other component from a vapour phase and is particularly useful when the activating ... | 11/24/2009 |
| 7597932 | Mesoporous permeation layers for use on active electronic matrix devices The present invention provides improved synthetic polymer hydrogel permeation layers for use on active electronic matrix devices for biological assays. The present invention includes methods for forming a permeation layer on an array of microelectrodes including the... | 10/06/2009 |
| 7501154 | Surface modification of CVD polymer films The present invention relates to a method for forming a conformal coating having a reactive surface. In the method, an ultrathin layer composed of a polymer having repeating units derived from unsubstituted p-xylylene, substituted p-xylylene, phenylene vinylene, phe... | 03/10/2009 |
| 7498059 | Method for growing thin films The invention relates to a method and apparatus for growing a thin film onto a substrate, in which method a substrate placed in a reaction space (21) is subjected to alternately repeated surface reactions of at least two vapor-phase reactants for the purpose ... | 03/03/2009 |
| 7442415 | Modulated temperature method of atomic layer deposition (ALD) of high dielectric constant films A method of forming a layer of high-k dielectric material in an integrated circuit includes preparing a silicon substrate; forming a high-k dielectric layer by a sequence of ALD cycles including: depositing a first layer of metal ligand using ALD with an oxygen-cont... | 10/28/2008 |
| 7431967 | Limited thermal budget formation of PMD layers A method of filling a gap on a substrate includes providing flows of silicon-containing processing gas oxidizing processing gas, and phosphorous-containing processing gas to a chamber housing the substrate and depositing a first portion of a P-doped silicon oxide fi... | 10/07/2008 |
| 7431969 | Chemical vapor deposition of hydrogel films In one embodiment of the invention, iCVD is used to form linear thin films using a radical initiator and an alkene. In another embodiment, iCVD is used to form crosslinked thin films by the addition of a crosslinking agent (e.g., a diacrylate or a dimethyacrylate). ... | 10/07/2008 |
| 7431966 | Atomic layer deposition method of depositing an oxide on a substrate The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is chemisorbed onto the substrate to form a first species monolayer within the... | 10/07/2008 |
| 7431998 | Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member The invention relates to a tool, especially a cutting tool, comprising a substrate member onto which at least one layer is deposited by means of CVD, and a method for the chemical vapor deposition of a two-phase layer on a sintered part. According to the invention, ... | 10/07/2008 |
| 7427425 | Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces. In one embodiment, a reactor for depositing materials onto a micro-device w... | 09/23/2008 |
| 7425350 | Apparatus, precursors and deposition methods for silicon-containing materials A method for making a Si-containing material comprises transporting a pyrolyzed Si-precursor to a substrate and polymerizing the pyrolyzed Si-precursor on the substrate to form a Si-containing film. Polymerization of the pyrolyzed Si-precursor may be carried out in ... | 09/16/2008 |
| 7422805 | Cutting tool for bimetal machining Coated cemented carbide cutting tool inserts for bimetal machining under wet conditions at moderate cutting speeds, and in particular, cutting tool inserts for face milling of engine blocks formed from alloys of cast iron and aluminium and/or magnesium. The inserts ... | 09/09/2008 |
| 7422770 | Forming a thin film structure A method and apparatus of forming a microcrystalline thin film comprises supplying a first gas and a second gas into a chamber containing a substrate during a first process, and supplying the second gas but not the first gas into the chamber during a second process.... | 09/09/2008 |
| 7419888 | Method of forming a silicon-rich nanocrystalline structure by an atomic layer deposition process and method of manufacturing a non-volatile semiconductor device using the same In a method of forming a silicon-rich nanocrystalline structure by an ALD process, a first gas including a first silicon compound is provided onto an object to form a silicon-rich chemisorption layer on the object. A second gas including oxygen is provided onto the ... | 09/02/2008 |
| 7413776 | Method of depositing a metal-containing film A method of depositing a Group IV metal-containing film on a substrate by conveying one or more of certain Group IV organometallic compounds in a gaseous phase to a deposition reactor containing a substrate and decomposing the one or more Group IV organometallic com... | 08/19/2008 |
| 7410666 | Metal nitride carbide deposition by ALD The present methods provide tools for growing conformal metal thin films, including metal nitride, metal carbide and metal nitride carbide thin films. In particular, methods are provided for growing such films from aggressive chemicals. The amount of corrosive chemi... | 08/12/2008 |
| 7404983 | Method and apparatus for open-air coating by laser-induced chemical vapor deposition The present inventions pertain to a method of applying a solid protective coating to articles, to a system capable of depositing a solid film layer on articles, and to hermetically sealed articles. In particular, films are deposited on fused quartz substrates, optic... | 07/29/2008 |
| 7404984 | Method for growing thin films The invention relates to a method and apparatus for growing a thin film onto a substrate, in which method a substrate placed in a reaction space (21) is subjected to alternately repeated surface reactions of at least two vapor-phase reactants for the purpose ... | 07/29/2008 |
| 7396563 | Ceramic thin film on various substrates, and process for producing same The process of Polymer Assisted Chemical Vapor Deposition (PACVD) and the semiconductor, dielectric, passivating or protecting thin films produced by the process are described. A semiconductor thin film of amorphous silicon carbide is obtained through vapor depositi... | 07/08/2008 |
| 7393562 | Deposition methods for improved delivery of metastable species A method of providing material into a deposition chamber is provided. A reservoir is in fluid communication with the deposition chamber. A metastable specie is provided and contained within the reservoir prior to flowing the metastable specie from the reservoir into... | 07/01/2008 |
| 7390535 | Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings A chemical vapor deposition (CVD) system and method for applying an aluminide coating constituted by two or more extrinsic metal components on a jet engine component. The aluminide coating is capable of forming a protective complex oxide upon subsequent heating in a... | 06/24/2008 |
| 7390536 | Method for fabricating composite gas separation modules The present invention relates to a method for fabricating a composite gas separation module and to gas separation modules formed by the method. In one embodiment, the method for fabricating a composite gas separation module includes depositing a first material on a ... | 06/24/2008 |
| 7384486 | Chamber cleaning method A method for cleaning a process chamber in such a manner that chamber-cleaning chemicals or agents are incapable of remaining in the chamber after cleaning and chemically interfering with semiconductor fabrication or other processes subsequently carried out in the c... | 06/10/2008 |
| 7384665 | Formation of protective coatings for color filters A structure and method for producing color filters with a protective silation layer is described. In one embodiment, each filter is coated with a silation layer to prevent bleeding of material between closely spaced filters during the fabrication process. In a secon... | 06/10/2008 |
