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| Number | Title | Issue Date |
| 8124181 | Oxidation method providing parallel gas flow over substrates in a semiconductor process An oxidation method includes supplying oxidizing and deoxidizing gases to a process field by spouting the gases in lateral directions respectively from first and second groups of gas spouting holes. Each group of holes is disposed adjacent to target substrates on on... | 02/28/2012 |
| 7968147 | Method of forming a diffusion bonding enhanced layer on AlOceramic tools The present invention relates to ceramic cutting tools, such as, an aluminum oxide with zirconium oxide ceramic cutting tool with diffusion bonding enhanced layer and CVD coatings, particularly useful for machining modern metal materials. The method comprises a chem... | 06/28/2011 |
| 7431967 | Limited thermal budget formation of PMD layers A method of filling a gap on a substrate includes providing flows of silicon-containing processing gas oxidizing processing gas, and phosphorous-containing processing gas to a chamber housing the substrate and depositing a first portion of a P-doped silicon oxide fi... | 10/07/2008 |
| 7429404 | Methods of selectively incorporating metals onto substrates A method for forming multi-metallic sites on a substrate is disclosed and described. A substrate including active groups such as hydroxyl can be reacted with a pretarget metal complex. The target metal attached to the active group can then be reacted with a secondar... | 09/30/2008 |
| 7410671 | Sequential chemical vapor deposition The present invention provides for sequential chemical vapor deposition by employing a reactor operated at low pressure, a pump to remove excess reactants, and a line to introduce gas into the reactor through a valve. A first reactant forms a monolayer on the part t... | 08/12/2008 |
| 7404984 | Method for growing thin films The invention relates to a method and apparatus for growing a thin film onto a substrate, in which method a substrate placed in a reaction space (21) is subjected to alternately repeated surface reactions of at least two vapor-phase reactants for the purpose ... | 07/29/2008 |
| 7371426 | Method for repairing components using environmental bond coatings and resultant repaired components According to an embodiment of the invention, a repaired component is disclosed. The repaired component comprises an engine run component having a base metal substrate, a portion of the base metal substrate between about 1-3 mils in thickness and an overlying bond co... | 05/13/2008 |
| 7323230 | Coating for aluminum component A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the aluminum oxide layer having a surface comprising penetrating surface fe... | 01/29/2008 |
| 7294360 | Conformal coatings for micro-optical elements, and method for making the same A micro-optical element is produced through vapor deposition techniques, such as atomic layer deposition. An optical structure having a surface with uneven structures is exposed to one or more precursor vapors to create a self-limiting film growth on the surface of ... | 11/13/2007 |
| 7241345 | Cylinder for thermal processing chamber The cylinder includes a core and a coating covering most of the core. The core is made from a heat-resistant or insulating material. The core has inner and outer side walls and opposing first and second ends. The outer side wall is further away from a central longit... | 07/10/2007 |
| 7239444 | Display front plane, display lenticular lens, and display fresnel lens A display front plane having an anti-reflection film in thickness uniformity and good adhesion between the anti-reflection film and the base material is supplied. Each of a display lenticular lens and a display fresnel lens having a sophisticated anti-reflection fun... | 07/03/2007 |
| 7217398 | Deposition reactor with precursor recycle A reactor vessel is provided with a solvent in a supercritical PVT state for use in depositing films on a deposition substrate. A metal organic precursor is dissolved in the supercritical solvent, as is a reaction agent. A chemical reaction deposits a film, such as ... | 05/15/2007 |
| 7138187 | Polyvinyl alcohol-based film exhibiting improved adhesion Modifications to the surface of polyvinyl alcohol-based films are disclosed that result in improved adhesion to optical materials. Specifically, the surface chemistry of the polyvinyl alcohol-based film is altered to include fluorine bonds, which surprisingly improv... | 11/21/2006 |
| 7132130 | Method for providing a chrome finish on a substrate An environmentally-friendly process for applying a chrome finish on a substrate is provided. The chrome finish comprises a thin film of aluminum and chromium deposited onto the substrate by physical vapor deposition (PVD) techniques. The thin layer can consist of th... | 11/07/2006 |
| 7125582 | Low-temperature silicon nitride deposition A method including combining a silicon source precursor and a nitrogen source precursor at a temperature up to 550° C.; and forming a silicon nitride film. A system including a chamber; a silicon precursor source coupled to the chamber; a controller configured to c... | 10/24/2006 |
| 7118779 | Reactor surface passivation through chemical deactivation Protective layers are formed on a surface of an atomic layer deposition (ALD) or chemical vapor deposition (CVD) reactor. Parts defining a reaction space for an ALD or CVD reactor can be treated, in situ or ex situ, with chemicals that deactivate reactive sites on t... | 10/10/2006 |
| 7115304 | High throughput surface treatment on coiled flexible substrates One or more substrates may be coiled into one or more coils in such a way that adjacent turns of the coils do not touch one another. The one or more coiled substrates are placed in a treatment chamber where substantially an entire surface of the one or more coiled s... | 10/03/2006 |
| 7070833 | Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments A method of passivating the surface of a substrate to protect the surface against corrosion, the surface effects on a vacuum environment, or both. The substrate surface is placed in a treatment environment and is first dehydrated and then the environment is evacuate... | 07/04/2006 |
| 7067351 | Selectively-etched nanochannel electrophoretic and electrochemical devices Nanochannel electrophoretic and electrochemical devices having selectively-etched nanolaminates located in the fluid transport channel. The normally flat surfaces of the nanolaminate having exposed conductive (metal) stripes are selectively-etched to form trenches a... | 06/27/2006 |
| 7048603 | Method for manufacturing organic light-emitting diodes A method for manufacturing organic light-emitting diodes (OLEDs) is disclosed, by adding nitrogen (N2) into the material of a hole transport layer (HTL) and evaporating the nitrogen and the material of the hole transport layer while growing the hole trans... | 05/23/2006 |
| 6958174 | Solid material comprising a thin metal film on its surface and methods for producing the same The present invention provides a solid material comprising a solid substrate having a thin metal film and methods for producing the same. The method generally involves using a plurality self-limiting reactions to control the thickness of the metal film. ... | 10/25/2005 |
| 6939612 | Fluorinated polymer sheets The present invention is in the field of polymer sheet anti-blocking and adhesion control compositions and methods, and more specifically, the present invention is in the field of polymer sheets, for example polyvinyl butyral sheets, having improved anti-blocking an... | 09/06/2005 |
| 6933053 | Alpha Al2O3 and Ti2O3 protective coatings on aluminide substrates In accordance with one aspect of the present invention, a process for forming a specific reactive element barrier on a titanium and aluminum containing substrate is provided. The process includes creating a dry air atmosphere with a concentration of water vapor belo... | 08/23/2005 |
| 6908639 | Mixed composition interface layer and method of forming An interface forming method includes forming a first layer containing a first chemical element and chemisorbing on the first layer an interface layer containing at least one monolayer of the first chemical element intermixed with a second chemical element different ... | 06/21/2005 |
| 6905730 | Aluminide coating of turbine engine component A method for forming an aluminide coating on a turbine engine component having an external surface and an internal cavity defined by an internal surface that is connected to the external surface by at least one hole. The method is conducted in a vapor coating contai... | 06/14/2005 |
| 6902763 | Method for depositing nanolaminate thin films on sensitive surfaces The present method provides tools for growing conformal metal nitride, metal carbide and metal thin films, and nanolaminate structures incorporating these films, from aggressive chemicals. The amount of corrosive chemical compounds, such as hydrogen halides, is redu... | 06/07/2005 |
| 6878406 | Dynamic use of process temperature A process for reacting a gaseous species with a substrate includes placing the substrate in a space, heating the space, introducing the gaseous species into the space, and cooling the space. Introducing the gaseous species into the space includes introducing the gas... | 04/12/2005 |
| 6852406 | Anti-static, anti-reflection coating An anti-static, anti-reflection, transparent coating for a transpatent substrate, the coating including at least one electrically conductive layer, wherein the sheet resistance of the coating is less than about 1010 ohm/square. The coating is preferably h... | 02/08/2005 |
| 6838122 | Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers The invention comprises a chemical vapor deposition method of forming a barium strontium titanate comprising dielectric layer. A substrate is positioned within a reactor. Barium and strontium are provided within the reactor by flowing at least one metal organic prec... | 01/04/2005 |
| 6821566 | Method and apparatus for forming insulating film containing silicon oxy-nitride A method of forming an insulating film containing silicon oxy-nitride includes a loading step, temperature raising step, oxidation step, cycle purge step, and annealing step, in this order. The temperature raising step is performed while supplying nitrogen gas and o... | 11/23/2004 |
| 6773749 | Method of controlling gas flow to a semiconductor processing reactor A method of controlling gas flow to a semiconductor processing reactor includes opening a first gas manifold inlet valve coupled between a first regulator and a gas manifold; regulating a flow rate of a flow of a first process gas through the first gas manifold inle... | 08/10/2004 |
| 6758917 | High temperature gaseous oxidation for passivation of austenitic alloys A method for forming a chromium-rich layer on the surface of a nickel alloy workpiece containing chromium includes heating the workpiece to a stable temperature of about 1100° C., and then exposing the workpiece to a gaseous mixture containing water vapor and one o... | 07/06/2004 |
| 6743474 | Method for growing thin films A method of forming a layer over a substrate is provided. Generally, a layer of a first reactive species is deposited over the substrate. The layer of the first reactive species is reacted with a second reactive species to create a first product. Unreacted reactive ... | 06/01/2004 |
| 6709608 | Semiconductor processing component A semiconductor processing component includes a quartz body characterized by silicon oxide filled micro cracks. The component is utilized as a processing component in a semiconductor furnace system. The quartz body is prepared by cleaning the component to remove a b... | 03/23/2004 |
| 6706320 | Method for surface engineering A process for modifying the surface of a substrate containing a polymeric material by contacting the surface with the modifying agent to bond the modifying agent to the surface the process comprising providing a solution of the modifying agent in a solvent and subje... | 03/16/2004 |
| 6696107 | Nanostructures The present invention relates to a method for producing an ordered array of nanoparticles on a substrate surface and to a nanomaterial having such an ordered array of nanoparticles. Particularly, but not exclusively, the invention relates to the provision... | 02/24/2004 |
| 6669989 | Method for producing by evaporation a functionally graded coating with an outer ceramic layer on a metal substrate The invention relates to a method and apparatus for the production of protective coatings on parts. A coating formed in accordance with the invention has a chemical composition and structure gradient across its thickness. The coating is obtained by heatin... | 12/30/2003 |
| 6630200 | Method of making a ceramic with preferential oxygen reactive layer A method of forming an article. The method comprises forming a silicon-based substrate that is oxidizable by reaction with an oxidant to form at least one gaseous product and applying an intermediate layer/coating onto the substrate, wherein the intermedi... | 10/07/2003 |
| 6630199 | Ceramic layer produced by reacting a ceramic precursor with a reactive gas A structure protected by a ceramic coating is prepared by providing a substrate having a surface, and depositing a layer of a sacrificial ceramic precursor material, preferably silica, onto the surface of the substrate. The method further includes furnish... | 10/07/2003 |
| 6610373 | Magnetic film-forming device and method In a device for forming magnetic film which deposits magnetic material on a substrate 12, a device is provided which, before the magnetic film is formed in a magnetic film-forming chamber 11, cleans one or both of the film-forming face and reverse face of... | 08/26/2003 |
