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| Number | Title | Issue Date |
| 8147909 | Method of making and using alloy susceptor with improved properties for film deposition Provided is a method for processing a wafer that includes providing an alloy susceptor including an exterior surface and a wafer contact surface. The exterior surface of the alloy susceptor is treated to produce a roughness of the exterior surface. The roughened ext... | 04/03/2012 |
| 7625603 | Crack and residue free conformal deposited silicon oxide with predictable and uniform etching characteristics A silicon oxide layer is formed by oxidation or decomposition of a silicon precursor gas in an oxygen-rich environment followed by annealing. The silicon oxide layer may be formed with slightly compressive stress to yield, following annealing, an oxide layer having ... | 12/01/2009 |
| 7510742 | Multilayered boron nitride/silicon nitride fiber coatings A composite is described which has particular utility in the formation of components for gas turbine engines. The composite broadly comprises a substrate having a surface and at least one layer of a BN/Si3N4 coating on the substrate surface. Th... | 03/31/2009 |
| 7462375 | Method of making a stick resistant multi-layer ceramic coating A foodware article having a multilayer, stick resistant, ceramic coating. The foodware article of the present invention includes a metal foodware article having an inner food-contacting surface and an outer surface; a bonding layer deposited on the food-contacting s... | 12/09/2008 |
| 7396783 | Fibrous structure and absorbent article comprising said fibrous structure A fibrous structure testable in a series of run-off tests, wherein each run-off test includes exposing the fibrous structure to a volume of a test solution and the fibrous structure initially is hydrophobic and has been treated to be hydrophilic, wherein the fibrous... | 07/08/2008 |
| 7294360 | Conformal coatings for micro-optical elements, and method for making the same A micro-optical element is produced through vapor deposition techniques, such as atomic layer deposition. An optical structure having a surface with uneven structures is exposed to one or more precursor vapors to create a self-limiting film growth on the surface of ... | 11/13/2007 |
| 7229669 | Thin-film deposition methods and apparatuses Described are structures useful in microelectronic or MEMS devices such as atomic clocks, sensors, and RF switches, wherein a first material is deposited onto a substrate to define a first material area of coverage and a second material is deposited over the first m... | 06/12/2007 |
| 7157111 | MOCVD selective deposition of C-axis oriented PBGEOthin films on InOoxides A method of selectively depositing a ferroelectric thin film on an indium-containing substrate in a ferroelectric device includes preparing a silicon substrate; depositing an indium-containing thin film on the substrate; patterning the indium containing thin film; a... | 01/02/2007 |
| 7141500 | Methods for forming aluminum containing films utilizing amino aluminum precursors A method of forming an aluminum containing film on a substrate includes providing a precursor having the chemical structure: Al(NR1R2)(NR3R4)(NR5R6); where each of R1, R2, R... | 11/28/2006 |
| 7138186 | Hydrophobic coatings and methods Substrates have a hydrophobic surface coating comprised of the reaction products of methyltrichlorsilane (MTCS) and dimethyldichlorosilane (DMDCS). Most preferably the substrate is glass. An anchor layer is most preferably formed directly onto the glass substrate su... | 11/21/2006 |
| 7097878 | Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiOfilms A method employing rapid vapor deposition (RVD) deposits a dielectric material on small features of a substrate surface. The resulting dielectric film is thicker, faster growing, shows better gap fill performance and has improved film properties compared to films re... | 08/29/2006 |
| 7084076 | Method for forming silicon dioxide film using siloxane A method is provided for forming a silicon dioxide film using atomic layer deposition (ALD), wherein a halogen- or NCO-substituted siloxane is used as a Si source. The method includes feeding a substituted siloxane as a first reactant onto a substrate to form a chem... | 08/01/2006 |
| 7067351 | Selectively-etched nanochannel electrophoretic and electrochemical devices Nanochannel electrophoretic and electrochemical devices having selectively-etched nanolaminates located in the fluid transport channel. The normally flat surfaces of the nanolaminate having exposed conductive (metal) stripes are selectively-etched to form trenches a... | 06/27/2006 |
| 7037555 | Method of manufacturing a glazing panel A method of manufacturing a glazing panel having a solar factor (FS) of less than 70% and being composed of a vitreous substrate and a tin/antimony oxide coating layer provided on the vitreous substrate and having a Sb/Sn molar ratio ranging from 0.01 to 0.5, prefer... | 05/02/2006 |
| 7025501 | Tracking temperature change in birefringent materials A method for tracking change in Temperature of Uniaxial or Biaxial Anisotropic Samples utilizing polarized electromagnetic radiation. ... | 04/11/2006 |
| 6992019 | Methods for forming silicon dioxide layers on substrates using atomic layer deposition Improved methods are disclosed for catalyst-assisted atomic layer deposition (ALD) to form a silicon dioxide layer having superior properties on a semiconductor substrate by using a first reactant component consisting of a silicon compound having at least two silico... | 01/31/2006 |
| 6905737 | Method of delivering activated species for rapid cyclical deposition A method for providing activated species for a cyclical deposition process is provided. In one aspect, the method includes delivering a gas to be activated into a plasma generator, activating the gas to create a volume of reactive species, delivering a fraction of t... | 06/14/2005 |
| 6902763 | Method for depositing nanolaminate thin films on sensitive surfaces The present method provides tools for growing conformal metal nitride, metal carbide and metal thin films, and nanolaminate structures incorporating these films, from aggressive chemicals. The amount of corrosive chemical compounds, such as hydrogen halides, is redu... | 06/07/2005 |
| 6899954 | Cadmium-free optical steep edge filters A cadmium-free optical steep edge filter comprising I-III-VI compound semiconductor systems of stoichiometric or non-stoichiometric composition, where the I-III-VI compound semiconductors are systems with one or more of the following elements: ... | 05/31/2005 |
| 6896970 | Corrosion resistant coating giving polished effect The process for coating a substrate with a coating giving a polished effect and improved corrosion resistance and coatings produced from this process. The process includes the steps of applying an atomized metal layer onto the substrate and applying a corrosion inhi... | 05/24/2005 |
| 6869636 | Method of evaporating film used in an organic electro-luminescent display In evaporating thin film used in organic electro-luminescent (EL) display, a mask having a plurality of openings is placed below a display substrate, and a plane evaporation source is placed below the mask. The plane evaporation source has a plurality of evaporating... | 03/22/2005 |
| 6827796 | High strength alloys and methods for making same A family of extremely fine-grained alloys are used to make coatings or free-standing bodies having desirable properties for use as a heat-resistant and wear-resistant material. In an illustrative embodiment, the alloys are comprised of a multiplicity of alternate, m... | 12/07/2004 |
| 6818250 | Method for forming SIO2 by chemical vapor deposition at room temperature Silicon dioxide (SiO2) films are deposited at room temperature using a chemical vapor deposition (CVD) reaction catalyzed by ammonia or a Lewis base. The SiO2 film growth is accomplished through the reaction of water and certain silicon precurs... | 11/16/2004 |
| 6808746 | Multilayer carbon nanotube films and method of making the same This invention relates to a process for the preparation of a substrate-free aligned nanotube film, comprising: (a) synthesizing a layer of aligned carbon nanotubes on a quartz glass substrate by pyrolysis of a carbon-containing material, in the presence of a suitabl... | 10/26/2004 |
| 6808816 | Method and coating system for reducing carbonaceous deposits on surfaces exposed to hydrocarbon fuels at elevated temperatures A coating system and method for reducing the tendency for hydrocarbon fluids, such as fuels and oils, to form carbonaceous deposits that adhere to the walls of a containment article. Of particular concern are carbonaceous deposits that form at temperatures below abo... | 10/26/2004 |
| 6808758 | Pulse precursor deposition process for forming layers in semiconductor devices A process for producing thin layers in electronic devices such as integrated circuit chips, is provided. The process includes the steps of injecting a precursor fluid into a thermal processing chamber containing a substrate, such as a semiconductor wafer. The precur... | 10/26/2004 |
| 6805903 | Method of forming optical thin film A method for forming an optical thin film used for optical elements of laser systems including high-energy lasers and an optical element of optical apparatuses is provided. The optical thin film can be easily formed on a desired substrate with reproducibility by vap... | 10/19/2004 |
| 6797340 | Method for depositing refractory metal layers employing sequential deposition techniques A method for forming a tungsten layer on a substrate surface is provided. In one aspect, the method includes positioning the substrate surface in a processing chamber and exposing the substrate surface to a boride. A nucleation layer is then deposited on the substra... | 09/28/2004 |
| 6736942 | Freestanding reactive multilayer foils Reactive foils and their uses are provided as localized heat sources useful, for example, in ignition, joining and propulsion. An improved reactive foil is preferably a freestanding multilayered foil structure made up of alternating layers selected from materials th... | 05/18/2004 |
| 6669989 | Method for producing by evaporation a functionally graded coating with an outer ceramic layer on a metal substrate The invention relates to a method and apparatus for the production of protective coatings on parts. A coating formed in accordance with the invention has a chemical composition and structure gradient across its thickness. The coating is obtained by heatin... | 12/30/2003 |
| 6610361 | Multi-layer assemblies with predetermined stress profile and method for producing same Multi-layer assemblies of polysilicon thin films having predetermined stress characteristics and techniques for forming such assemblies are disclosed. In particular, a multi-layer assembly of polysilicon thin films may be produced that has a stress level ... | 08/26/2003 |
| 6586056 | Silicon based films formed from iodosilane precursors and method of making the same A method for near atmospheric pressure chemical vapor deposition of a silicon based film onto a substrate includes introducing into a deposition chamber at about atmospheric pressure: (i) a substrate; (ii) an iodosilane precursor in the vapor state having... | 07/01/2003 |
| 6582834 | Anti-stick coating for internal passages of turbine components An anti-stick coating that inhibits the adhesion of contaminants that form deposits on the internal cooling passages of gas turbine engine components. The anti-stick coating is formed as an outer coating of the internal cooling passages, and preferably ov... | 06/24/2003 |
| 6558741 | Aluminum reflecting mirror and method of making the same Within a chamber in a vacuum atmosphere, SiO is deposited on a glass substrate so as to form a first layer as a protective film, Al is deposited on the first layer so as to form a second layer as an aluminum reflective film, MgF2 is deposited o... | 05/06/2003 |
| 6537910 | Forming metal silicide resistant to subsequent thermal processing A metal suicide film and method of forming the same are provided. The method comprises depositing metal silicide layers onto a substrate assembly with alternating layers of silicon. The resulting metal silicide film has a disrupted grain structure and sma... | 03/25/2003 |
| 6534431 | Process and apparatus for preparing heterogeneous catalysts The invention relates to a process and to an apparatus for preparing a heterogeneous catalyst having at least one catalytically active species bound to the surface of a support material. According to the process, the surface of the support is first pretre... | 03/18/2003 |
| 6524402 | Passivation method for metallic articles of nickel and iron-based superalloy A passivation method for the metallic surface of a nickel and iron-based superalloy which is used as the constituent material of reactor or furnace walls is described, in which the superalloy is coated on at least one of its surfaces which comes into cont... | 02/25/2003 |
| 6513435 | Process for modifying and printing on the surface of a compact substrate A process for modifying the surface of a solid substrate includes modifying the surface with at least one oxidizing flame and modifying the surface with at least one silicatising flame. The process is particularly beneficial in preparing glass and other s... | 02/04/2003 |
| 6511703 | Protective overcoat for replicated diffraction gratings An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be cracked or have relatively th... | 01/28/2003 |
| 6503563 | Method of producing polycrystalline silicon for semiconductors from saline gas A rod-form high-purity polycrystalline silicon capable of preventing defects from occurring to a newly deposited silicon layer. To this end, a method of producing a rod-form high-purity polycrystalline silicon, depositing silicon on a rod-form silicon cor... | 01/07/2003 |
