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| Number | Title | Issue Date |
| 8158199 | Method for making individually coated and twisted carbon nanotube wire-like structure A method for making an individually coated and twisted carbon nanotube wire-like structure, the method comprising the steps of: providing a carbon nanotube structure having a plurality of carbon nanotubes; forming at least one conductive coating on the plurality of ... | 04/17/2012 |
| 8137750 | Catalytically active gold supported on thermally treated nanoporous supports The present invention provides technology for controlling, or tuning, the catalytic activity of gold provided upon nanoporous supports such as those derived from nanoparticulate titania. It has been discovered that the nature of the surfaces of the nanoparticles use... | 03/20/2012 |
| 8097299 | Organic ruthenium compound for chemical vapor deposition, and chemical vapor deposition method using the organic ruthenium compound The present invention is an organoruthenium compound for use in production of a ruthenium or ruthenium compound thin film by chemical vapor deposition, including ruthenium and an arene group and norbornadiene both coordinated to the ruthenium and represented by the ... | 01/17/2012 |
| 8075954 | Coating method and apparatus, a permanent magnet, and manufacturing method thereof The object of the present invention is to improve the productivity of a permanent magnet and to manufacture it at a low cost by effectively coating Dy and Tb on a surface of the magnet of Fe—B-rare earth elements having a predetermined configuration. The permanent... | 12/13/2011 |
| 8012536 | Method of forming metal-containing layer using organometallic compounds Methods of forming metal-containing layers are provided where heteroleptic organometallic compounds containing at least one formamidinate ligand are conveyed in a gaseous form to a reactor; and films comprising a metal are deposited on a substrate. These heterolepti... | 09/06/2011 |
| 7985449 | Methods for depositing metal films onto diffusion barrier layers by CVD or ALD processes A process is described for depositing a metal film on a substrate surface having a diffusion barrier layer deposited thereupon. In one embodiment of the present invention, the process includes: providing a surface of the diffusion barrier layer that is substantially... | 07/26/2011 |
| 7943194 | Process for preparing flake-form pigments based on aluminum and on Sioz(Z=0.7-2.0) comprising forming a layer of separating agent The present invention relates to process for the production of plane-parallel platelets, comprising the steps of: a) vapor-deposition of a separating agent onto a carrier to produce a separating agent 5 layer, b) vapor-deposition of at least one product layer onto t... | 05/17/2011 |
| 7879399 | CV method using metal carbonyl gas A CVD method for forming a metal film on a substrate by using a metal carbonyl gas includes a preparing step for setting a vacuum chamber at a vacuum pressure and heating the substrate in the vacuum chamber to a first temperature where the metal carbonyl gas is deco... | 02/01/2011 |
| 7862856 | Method for making high temperature polymer dielectric compositions incorporating diamond-like hydrocarbon units for capactive energy storage applications The present invention provides a method for making a polymer dielectric composition incorporating diamondoids or diamond-like hydrocarbon units. The method includes forming a polymer solution from the cardo-diol 9,9-bis(4-hydroxyphenyl)fluorene and a diacid chloride... | 01/04/2011 |
| 7846498 | Resin product, production method for the same, and deposition method for a metallic coating The present invention provides a metallic coating having a sheen and discontinuous structure and a resin product having the metallic coating by using a physical vapor deposition method at high productivity and low cost. ... | 12/07/2010 |
| 7807223 | Precursors having open ligands for ruthenium containing films deposition Ruthenium containing precursors for ruthenium containing films deposition comprising a ruthenium precursor selected from the group essentially consisting of Ru(XOp)(XCp), Ru(XOp)2, Ru(allyl)3, RuX(allyl)2, RuX2(allyl)... | 10/05/2010 |
| 7785664 | Method of depositing thin film A method is provided for depositing thin films in which the thin films are continuously deposited into one chamber and 1-6 wafers are loaded into the chamber. In the method, a process gap between a shower head or a gas injection unit and a substrate is capable of be... | 08/31/2010 |
| 7776395 | Method of depositing catalyst assisted silicates of high-k materials A high-k silicate atomic layer deposition method is disclosed. To produce a hafnium silicate layer, a substrate may be exposed to a pulse of a hafnium precursor, a pulse of an oxidizer, a pulse of a silicon precursor, and a pulse of another oxidizer. A catalyst may ... | 08/17/2010 |
| 7678421 | Method for increasing deposition rates of metal layers from metal-carbonyl precursors A method for increasing deposition rates of metal layers from metal-carbonyl precursors by mixing a vapor of the metal-carbonyl precursor with CO gas. The method includes providing a substrate in a process chamber of a deposition system, forming a process gas contai... | 03/16/2010 |
| 7670645 | Method of treating metal and metal salts to enable thin layer deposition in semiconductor processing Techniques for vaporizing and handling a vaporized metallic element or metallic element salt with a heated inert carrier gas for further processing. The vaporized metallic element or salt is carried by an inert carrier gas heated to the same temperature as the vapor... | 03/02/2010 |
| 7651731 | Niobium-based compositions and coatings, niobium oxides and their alloys applied by thermal spraying and their use as an anticorrosive The novelty proposed herein describes the application of niobium-based compositions and coatings, niobium oxides and their alloys capable of associations with other oxides and alloys by means of the thermal spraying technique for the purpose of an anticorrosive prot... | 01/26/2010 |
| 7651732 | Magnesium-titanium solid solution alloys Films of magnesium mixed with titanium are produced by non-equilibrium alloying processes such as electron beam evaporation of magnesium and titanium ingots in a very low pressure chamber. Such magnesium-titanium films form as single phase solid solutions. Titanium ... | 01/26/2010 |
| 7588799 | Metal film production apparatus A source gas is supplied into a chamber through a nozzle, and electromagnetic waves are thrown from a plasma antenna into the chamber. The resulting Cl2 gas plasma causes an etching reaction to a plurality of copper protrusions, which are arranged between... | 09/15/2009 |
| 7524533 | Diffusion barrier layers and processes for depositing metal films thereupon by CVD or ALD processes A process is described for depositing a metal film on a substrate surface having a diffusion barrier layer deposited thereupon. In one embodiment, the process includes: providing a surface of the diffusion barrier layer that is substantially free of an elemental met... | 04/28/2009 |
| 7491421 | Graphite base for heat sink, method of making graphite base and heat sink A graphite base is made by: mixing nanometered graphite powder with a bonding agent to form a graphite mixture and then grinding the graphite mixture and processing the graphite mixture into a graphite mass with a high pressure by means of hot press, cold press and ... | 02/17/2009 |
| 7442414 | Methods for producing reinforced carbon nanotubes Methods for producing reinforced carbon nanotubes having a plurality of microparticulate carbide or oxide materials formed substantially on the surface of such reinforced carbon nanotubes composite materials are disclosed. In particular, the present invention provid... | 10/28/2008 |
| 7438949 | Ruthenium containing layer deposition method An exemplary apparatus and method of forming a ruthenium tetroxide containing gas to form a ruthenium containing layer on a surface of a substrate is described herein. The method and apparatus described herein may be especially useful for fabricating electronic devi... | 10/21/2008 |
| 7438955 | Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source A procedure for the synthesis of titanium nitride (TiN) thin films on metal substrate by vapor deposition using a magnetized sheet plasma source is disclosed. TiN films on metal substrate exhibiting the stoichiometric TiN and Ti2N were synthesized in a mi... | 10/21/2008 |
| 7435363 | Method for manufacturing diamond film A method for manufacturing a diamond film is provided. The material with a low thermal decomposition point is used as a substrate. A buffer layer is formed on the substrate by coating or deposition, and then a diamond film is coated thereon, fitting the shape of the... | 10/14/2008 |
| 7431964 | Method of forming a porous metal catalyst on a substrate for nanotube growth A method is provided for forming a porous metal catalyst (44) on a substrate (42) for nanotube (84) growth in an emissive display. The method comprises depositing a metal (44) onto a surface of a substrate (12) at an angle (Θ) to ... | 10/07/2008 |
| 7429403 | Gas distributor for vapor coating method and container A method for introducing an inert carrier gas into a coating container used to provide a metallic coating on articles. The method includes introducing the inert carrier gas into the coating container as a plurality of carrier gas streams proximate the top of the coa... | 09/30/2008 |
| 7427426 | CVD method for forming metal film by using metal carbonyl gas A CVD method for forming a metal film on a substrate by using a metal carbonyl gas includes a preparing step for setting a vacuum chamber at a vacuum pressure and heating the substrate in the vacuum chamber to a first temperature where the metal carbonyl gas is deco... | 09/23/2008 |
| 7419702 | Method for processing a substrate A method for processing a substrate on a ceramic substrate heater in a process chamber. The method includes forming a protective coating on the ceramic substrate heater in the process chamber and processing a substrate on the coated substrate heater. The processing ... | 09/02/2008 |
| 7404986 | Multi-component deposition Physical vapor deposition is augmented by chemical vapor deposition from one or more organometallic compounds to deposit multi-component materials. The organometallic compounds may be carbonyls. The process may be used to deposit coatings and repair material on supe... | 07/29/2008 |
| 7390535 | Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings A chemical vapor deposition (CVD) system and method for applying an aluminide coating constituted by two or more extrinsic metal components on a jet engine component. The aluminide coating is capable of forming a protective complex oxide upon subsequent heating in a... | 06/24/2008 |
| 7387815 | Metallization of substrate(s) by a liquid/vapor deposition process A process for depositing a substantially pure, conformal metal layer on one or more substrates through the decomposition of a metal-containing precursor. During this deposition process, the substrate(s) is maintained at a temperature greater than the decomposition t... | 06/17/2008 |
| 7374941 | Active reactant vapor pulse monitoring in a chemical reactor A method and apparatus for determining changes in a supply system, designed to supply repeated pulses of a vapor phase reactant to a reaction chamber is disclosed. One embodiment involves providing the reactant source, and a gas conduit to connect the reactant sourc... | 05/20/2008 |
| 7374794 | Metallized film, method for the production thereof, and use thereof A vapor-deposited metallized film is disclosed including a metallized film that is vapor-deposited across the entire surface, and a metallized film that has been coated a number of times and also a method for producing a vapor-deposited metallized film, a metallized... | 05/20/2008 |
| 7371428 | Duplex gas phase coating Method of forming different diffusion aluminide coatings on different surface regions of the same superalloy substrate involves positioning the substrate in a coating chamber having a aluminum-bearing coating gas flowing therein with a first substrate surface region... | 05/13/2008 |
| 7371426 | Method for repairing components using environmental bond coatings and resultant repaired components According to an embodiment of the invention, a repaired component is disclosed. The repaired component comprises an engine run component having a base metal substrate, a portion of the base metal substrate between about 1-3 mils in thickness and an overlying bond co... | 05/13/2008 |
| 7372152 | Copper interconnect systems An integrated circuit (IC) may include a substrate, a first dielectric layer adjacent the substrate, and at least one trench in the first dielectric layer. The IC may also include a metal liner within the at least one trench, and a first conductive region including ... | 05/13/2008 |
| 7361589 | Copper interconnect systems which use conductive, metal-based cap layers An integrated circuit (IC) may include a substrate, a first dielectric layer adjacent the substrate, and at least one trench in the first dielectric layer. The IC may also include a metal liner within the at least one trench, and a first conductive region including ... | 04/22/2008 |
| 7357958 | Methods for depositing gamma-prime nickel aluminide coatings Methods for depositing an overlay coating on articles intended for use in hostile thermal environments. The coating has a predominantly gamma prime-phase nickel aluminide (Ni3Al) composition suitable for use as an environmental coating and as a bond coat ... | 04/15/2008 |
| 7354622 | Method for forming thin film and apparatus for forming thin film A shower head having a plurality of ejection holes for supplying an organic metal gas at uniform density to the surface of a substrate and a plurality of ejection holes for supplying an oxidizing gas at uniform density to the same is provided in a reaction furnace o... | 04/08/2008 |
| 7351285 | Method and system for forming a variable thickness seed layer A method and system for forming a variable thickness seed layer on a substrate for a subsequent metal electrochemical plating process, where the seed layer thickness profile improves uniformity of the electroplated metal layer compared to when using a constant thick... | 04/01/2008 |
