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Method and apparatus for making a drink hop along a bar or counter
A method for generating a drink which appears to hop from a remote spot on the bar or counter and take one or more leaps, before landing in a patron's glass.
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| Number | Title | Issue Date |
| 7622150 | Oxidation resistant coatings for molybdenum silicide-based composite articles An environmentally resistant coating comprising silicon, titanium, chromium, and a balance of niobium and molybdenum for turbine components formed from molybdenum silicide-based composites. The turbine component may further include a thermal barrier coating disposed... | 11/24/2009 |
| 7622151 | Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions Briefly described, methods of forming diamond are described. A representative method, among others, includes: providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system; introducing, in the absence of a gas stream, a liquid precursor... | 11/24/2009 |
| 7622152 | MoSi-SiNcomposite coating and manufacturing method thereof A MoSi2—Si3N4 composite coating which is coated on a surface of base materials. The MoSi2—Si3N4 composite coating on the surface of the base material can be formed by forming a Mo2N dif... | 11/24/2009 |
| 7618680 | Oxidative chemical vapor deposition of electrically conductive and electrochromic polymers Remarkably, disclosed herein is a solvent-less chemical vapor deposition (CVD) method for the oxidative polymerization and deposition of thin films of electrically-conducting polymers. In a preferred embodiment, the method provides poly-3,4-ethylenedioxythiophene (P... | 11/17/2009 |
| 7615250 | Organoaluminum precursor compounds This invention relates to organoaluminum precursor compounds represented by the formula: wherein R1, R2, R3 and R4 are the same or different and each represents hydrogen or an alk... | 11/10/2009 |
| 7608300 | Methods and devices to reduce defects in dielectric stack structures A variety of techniques may be employed alone or in combination to reduce the incidence of defects arising in dielectric stack structures formed by chemical vapor deposition (CVD). Incidence of a first defect type attributable to reaction between an unreacted specie... | 10/27/2009 |
| 7608299 | Process for the deposition by CVD of a silver film on a substrate The invention relates to the deposition of thin silver films on various substrates, particularly superconductor substrates. The method consists of CVD deposition of silver on a substrate with the aid of a silver precursor solution. The silver precursor is an RCO | 10/27/2009 |
| 7608301 | Process for forming a protective coating containing aluminium and zirconium on a metal This relates to an improvement to the process of aluminization or activated cementation in which a donor cement containing the aluminium is attacked at high temperature and in a neutral or reducing atmosphere by a gaseous ammonium halide to form a gaseous aluminium ... | 10/27/2009 |
| 7604840 | Atomic layer deposition of copper using surface-activation agents The present invention relates to a novel atomic layer deposition process for the formation of copper films on substrates or in or on porous solids in an atomic layer deposition process. ... | 10/20/2009 |
| 7601393 | Controlling the temperature of a substrate in a film deposition apparatus A system and method for that allows one part of an atomic layer deposition (ALD) process sequence to occur at a first temperature while allowing another part of the ALD process sequence to occur at a second temperature. In such a fashion, the first temperature can b... | 10/13/2009 |
| 7601392 | Organic-metal precursor material and method of manufacturing metal thin film using the same Provided are an organic-metal precursor material that can be readily decomposed without reacting with an oxidant, a method of manufacturing a metal thin film using the organic-metal precursor material, and a metal thin film prepared using the organic-metal precursor... | 10/13/2009 |
| 7595088 | Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology A method of depositing a silicon oxide layer over a substrate having a trench formed between adjacent raised surfaces. In one embodiment the silicon oxide layer is formed in a multistep process that includes depositing a first portion of layer over the substrate and... | 09/29/2009 |
| 7595089 | Deposition method for semiconductor laser bars using a clamping jig A clamping jig for mounting semiconductor laser bars includes: multiple supporting bars for holding laser bars therebetween; a pair of supporting plates each of which has a mounting face for mounting the supporting bars in a row; a pressing member for pressing the s... | 09/29/2009 |
| 7592043 | Method and apparatus for coating a patterned thin film on a substrate from a fluid source with continuous feed capability A method and apparatus for forming patterned coatings of thin film, non-polymerizable compounds on a substrate. A mixture of the non-polymerizable compound and a liquid carrier is pumped into the interior of a heated evaporation box having an internal temperature su... | 09/22/2009 |
| 7585547 | Method and apparatus to form thin layers of materials on a base The present invention relates to method and apparatus for preparing thin films of materials for various applications including electronic devices such as solar cells. In one aspect, each of the method and apparatus passing an electrical current through at least one ... | 09/08/2009 |
| 7585546 | Surface passivation and sealing of micro-optics devices for improved performance in harsh environments Methods and structures for reducing and/or eliminating moisture penetration in an optical package. The optical package may include (1) a layer of inorganic material placed over the points of the optical package susceptible moisture penetration of the optical package... | 09/08/2009 |
| 7585545 | Hydrogen sulfide injection method for phosphor deposition The invention is a method of vacuum evaporation of a multi-element sulfur bearing thin film compositions onto a substrate. The method comprises targeting a source of gas or vapour sulfur species at one or more source materials that make up at least part of the thin ... | 09/08/2009 |
| 7579042 | Methods for the fabrication of thermally stable magnetic tunnel junctions Magnetic tunnel junctions and method for making the magnetic tunnel junctions are provided. The magnetic tunnel junctions are characterized by a tunnel barrier oxide layer sandwiched between two ferromagnetic layers. The methods used to fabricate the magnetic tunnel... | 08/25/2009 |
| 7566477 | Method for saturating a carrier gas with precursor vapor A system and method for vaporizing a solid film precursor and transporting the film precursor vapor using a precursor valve system to control delivery. The film precursor vaporization system is positioned above and coupled to the process chamber. The precursor valve... | 07/28/2009 |
| 7563481 | Method and apparatus for processing polysilazane film A method of processing a polysilazane film includes a first heat process and a subsequent second heat process performed on a target substrate with a polysilazane coating film formed thereon. The first heat process is performed by supplying water vapor into a process... | 07/21/2009 |
| 7560138 | Oxidation resistant coatings for ultra high temperature transition metals and transition metal alloys The invention provides oxidation resistant coatings for transition metal substrates and transition metal alloy substrates and method for producing the same. The coatings may be multilayered, multiphase coatings or gradient multiphase coatings. In some embodiments th... | 07/14/2009 |
| 7560139 | Thermostructural composite structure with a compositional gradient, its manufacturing process Thermostructural composite structure having a compositional gradient, formed from a porous core (5) made of a refractory having a pore volume content of greater than or equal to 80%. The core (5) lies between two intermediate layers (6a, ... | 07/14/2009 |
| 7556839 | Method of manufacturing semiconductor device and apparatus for processing substrate A process for producing a semiconductor device, in which in the formation of a boron doped silicon film from, for example, monosilane and boron trichloride by vacuum CVD technique, there can be produced a film excelling in inter-batch homogeneity with respect to the... | 07/07/2009 |
| 7553516 | System and method of reducing particle contamination of semiconductor substrates Particle contamination of semiconductor substrates due to particles coming off of wafer boat rods is reduced. A gas flow is established with the boat rods downstream of the substrates, to blow particles from the boat rods away from the substrates. The boat rods can ... | 06/30/2009 |
| 7550178 | Method of dyeing or reforming injection, blow or compression molding A molding method providing a homogeneous surface without any patch by dyeing or reforming a resin surface in a die concurrently to molding, in injection-, blow-, or compression molding, after thermoplastic resin is filled in a die cavity. After blow-molding, or afte... | 06/23/2009 |
| 7544388 | Methods of depositing materials over substrates, and methods of forming layers over substrates The invention includes methods of utilizing supercritical fluids to introduce precursors into reaction chambers. In some aspects, a supercritical fluid is utilized to introduce at least one precursor into a chamber during ALD, and in particular aspects the supercrit... | 06/09/2009 |
| 7544389 | Precursor for film formation and method for forming ruthenium-containing film Precursor for ruthenium film deposition, comprising ruthenium tetroxide dissolved in at least one non-flammable solvent, preferably a fluorinated solvent having the general formula CxHyFzOtNu wherein: 2x+... | 06/09/2009 |
| 7541061 | Vacuum chamber load lock structure and article transport mechanism A vacuum chamber used for processing articles, such as integrated circuit wafers, display panels, and the like, has a small load lock chamber formed at an opening in a wall of the chamber by a moveable article supporting surface within the chamber and a cover outsid... | 06/02/2009 |
| 7534469 | Semiconductor-processing apparatus provided with self-cleaning device A CVD apparatus comprising an optical unit detecting the mass of contaminants adhering to an inner surface of a CVD reactor by irradiating an inner surface of the reactor with light having monochromaticity through an optical window provided on an inner wall of the r... | 05/19/2009 |
| 7534468 | Process for obtaining spatially-organised nanostructures on thin films A process for forming nanostructures comprising the step of applying on localised regions of a smooth thin film of bistable or multistable molecules an external perturbation with preset magnitude thereby said film undergoes a collective morphological transformation ... | 05/19/2009 |
| 7524532 | Process for depositing thin layers on a substrate in a process chamber of adjustable height A process for depositing thin layers on a substrate in a process chamber arranged in a reactor housing, the bottom of the process chamber consisting of a temperable substrate holder which can be rotatably driven about its vertical axis, and the cover of the chamber ... | 04/28/2009 |
| 7517557 | Oxide films, a method of producing the same and structures having the same An object of the present invention is to produce an oxide film having good surface morphology and crystal quality, by a metal organic chemical vapor deposition using two or more raw material gases of metal organic compounds and oxygen gas. It is used a film forming ... | 04/14/2009 |
| 7507441 | Method for making a photonic structure A method for making a photonic structure, including creating a first vapor stream of a first vapor material, the first vapor stream having a first non-uniform flux in at least one direction; and moving a substrate in at least a portion of the vapor stream. In additi... | 03/24/2009 |
| 7501153 | Alkoxide compound, thin film-forming material and method for forming thin film The alkoxide compound of the present invention is represented by general formula (I) below. The alkoxide compound of the present invention is an iron compound that can be delivered in a liquid state and is easily vaporized due to its high vapor pressure. The compoun... | 03/10/2009 |
| 7501151 | Delivering particulate material to a vaporization zone A method for vaporizing particulate material and condensing it onto a surface to form a layer provides a quantity of first particulate material in a first container and a quantity of second particulate material in a second container spaced apart from the first conta... | 03/10/2009 |
| 7501152 | Delivering particulate material to a vaporization zone A method for vaporizing particulate materials and condensing them onto a surface to form a layer provides a quantity of particulate material in a first container having an opening, dimensioned to allow free flow of the particulate material through the opening. The p... | 03/10/2009 |
| 7498057 | Deposition methods A deposition method includes positioning a substrate within a deposition chamber defined at least in part by chamber walls. At least one of the chamber walls comprises a chamber surface having a plurality of purge gas inlets to the chamber therein. A process gas is ... | 03/03/2009 |
| 7485339 | Method for chemical vapor deposition capable of preventing contamination and enhancing film growth rate A method for chemical vapor deposition (CVD) comprises injecting a purge gas into a reaction chamber where substrates are located; and supplying a source material of vapor phase participating directly in forming a film on the substrates to an inside of the reaction ... | 02/03/2009 |
| 7485338 | Method for precursor delivery A method for precursor delivery includes transferring a precursor vapor from a precursor vaporization system to an intermediate precursor chamber, collecting the precursor vapor in the intermediate precursor chamber, flowing a process gas containing the collected pr... | 02/03/2009 |
| 7479301 | Method for modifying a metallic surface The invention relates to a method for modifying a metallic surface, which method comprises chemical vapour deposition on a substrate in a chamber adapted for CVD and involves at least the step of interrupting the chemical vapour deposition by cutting off the flow of... | 01/20/2009 |
