U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Icon_funbox Quotables

"Man will not fly for 50 years."

Wilbur Wright ; 1901

Newsletter  PatentStorm News

Make the Most of Our Site

See this month's Top Inventors and Most Cited Patents.

Stay on top of the latest innovations by subscribing to an RSS feed.

Registered users: Manage your profile.

 

Class 422/186.06 - Surface is metal


Subclass of Class 422 - Chemical apparatus and process disinfecting, deodorizing, preserving, or sterilizing
Definition: Subject matter wherein the solid is a metal.
No. of patents: 61
Last issue date: 08/10/2010


1    
NumberTitleIssue Date
7771673Plasma generating electrode and plasma reactor
A plasma generating electrode of the present invention includes a pair of unit electrodes 2, each of the pair of unit electrodes 2 including a plate-like ceramic body 19 and a conductive film 12 disposed inside the ceramic body 19 ...
08/10/2010
7323146Air purifier
An air purifier provides various air purification functions relating to various environmental conditions by increasing a purification function relative to specific contaminants through replacement of a filter based on the environment to be purified. The air purifier...
01/29/2008
7294207Gas-admission element for CVD processes, and device
The invention relates to a method for depositing especially, crystalline layers onto especially, crystalline substrates. At least two process gases are led into a process chamber of a reactor separately from each other, through a gas inlet mechanism above a heated s...
11/13/2007
7279088Catalytic electrode, cell, system and process for storing hydrogen/deuterium
A catalytic electrode, cell, system and process for absorbing and storing hydrogen (H2) and deuterium (D2) from the gaseous to the solid ionic form. The cell includes a non-conductive sealed housing and a conductive catalytic electrode position...
10/09/2007
7279732Enhanced atomic layer deposition
A method of enhanced atomic layer deposition is described. In an embodiment, the enhancement is the use of plasma. Plasma begins prior to flowing a second precursor into the chamber. The second precursor reacts with a prior precursor to deposit a layer on the substr...
10/09/2007
7208804Crystalline or amorphous medium-K gate oxides, Y0and Gd0
A gate oxide and method of fabricating a gate oxide that produces a more reliable and thinner equivalent oxide thickness than conventional SiO2 gate oxides are provided. Also shown is a gate oxide with a conduction band offset of 2 eV or greater. Gate oxi...
04/24/2007
7205620Highly reliable amorphous high-k gate dielectric ZrON
A gate dielectric and method of fabricating a gate dielectric that produces a more reliable and thinner equivalent oxide thickness than conventional SiO2 gate oxides are provided. Gate dielectrics formed from metals such as zirconium are thermodynamically...
04/17/2007
7205218Method including forming gate dielectrics having multiple lanthanide oxide layers
A dielectric film having a layer of a lanthanide oxide and a layer of another lanthanide oxide, and a method of fabricating such a dielectric film produce a reliable gate dielectric with a equivalent oxide thickness thinner than attainable using SiO2. A g...
04/17/2007
7199023Atomic layer deposited HfSiON dielectric films wherein each precursor is independendently pulsed
A dielectric film containing atomic layer deposited HfSiON and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than attainable using SiO2. The HfSiON layer thickness is contro...
04/03/2007
7193893Write once read only memory employing floating gates
Structures and methods for write once read only memory employing floating gates are provided. The write once read only memory cell includes a floating gate transistor formed in a modified dynamic random access memory (DRAM) fabrication process. The floating gate tra...
03/20/2007
7135421Atomic layer-deposited hafnium aluminum oxide
A dielectric film containing HfAlO3 and a method of fabricating such a dielectric film produce a reliable gate dielectric having an equivalent oxide thickness thinner than attainable using SiO2. A gate dielectric is formed by atomic layer depos...
11/14/2006
7101813Atomic layer deposited Zr-Sn-Ti-O films
A dielectric film containing atomic layer deposited Zr—Sn—Ti—O and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than attainable using SiO2. Depositing titanium and ox...
09/05/2006
7061173Amalgam-doped low mercury low-pressure UV irradiator
A UV lamp unit is provided and comprises a lamp in the form of a mercury low pressure amalgam lamp that is provided with at least one amalgam deposit. A cladding tube surrounds the lamp in such a way that an air gap is provided between the lamp and the cladding tube...
06/13/2006
7056806Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
The present disclosure provides methods and apparatus useful in depositing materials on batches of microfeature workpieces. One implementation provides a method in which a quantity of a first precursor gas is introduced to an enclosure at a first enclosure pressure....
06/06/2006
7017594Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices. ...
03/28/2006
6967154Enhanced atomic layer deposition
A method of enhanced atomic layer deposition is described. In an embodiment, the enhancement is the use of plasma. Plasma begins prior to flowing a second precursor into the chamber. The second precursor reacts with a prior precursor to deposit a layer on the substr...
11/22/2005
6958302Atomic layer deposited Zr-Sn-Ti-O films using TiI4
A dielectric film containing Zr—Sn—Ti—O formed by atomic layer deposition using a TiI4 precursor and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than attainable usin...
10/25/2005
6955041Exhaust gas purifying apparatus for internal combustion engine
An exhaust gas purifying apparatus for an internal combustion engine, wherein the efficiency of exhaust gas purification is enhanced by optimally controlling the operating condition of a plasma generator mounted in an exhaust passage in accordance with the exhaust g...
10/18/2005
6955725Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
Reactors having isolated gas connectors, systems that include such reactors, and methods for depositing materials onto micro-devices workpieces are disclosed herein. In one embodiment, a reactor for depositing material onto a micro-device workpiece includes a reacti...
10/18/2005
6953730Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics
A gate oxide and method of fabricating a gate oxide that produces a more reliable and thinner equivalent oxide thickness than conventional SiO2 gate oxides are provided. Gate oxides formed from alloys such as cobalt-titanium are thermodynamically stable s...
10/11/2005
6930346Evaporation of Y-Si-O films for medium-K dielectrics
A gate oxide and method of fabricating a gate oxide that produces a more reliable and thinner equivalent oxide thickness than conventional SiO2 gate oxides are provided. Gate oxides formed from yttrium, silicon, and oxygen are thermodynamically stable suc...
08/16/2005
6921702Atomic layer deposited nanolaminates of HfO2/ZrO2 films as gate dielectrics
A dielectric film containing HfO2/ZrO2 nanolaminates and a method of fabricating such a dielectric film produce a reliable gate dielectric having an equivalent oxide thickness thinner than attainable using SiO2. A gate dielectric is ...
07/26/2005
6805775Method and apparatus for the removal of harmful substances from various objects or materials
The present invention relates generally to the removal of harmful substances from various objects or materials. More specifically, this invention relates to an improved method and apparatus for removing the harmful substances (i.e., toxins), from a variety of materi...
10/19/2004
6713027Ozonator for sterilizing, decontaminating, disinfecting, and/or sanitizing surgical instruments
An apparatus and method for the use of ozone as a sterilant for many classes of surgical instruments which are at least partially metallic. Three features are the connection of a voltage carrying part of the instrument to be sterilized as the electrode of an ozone g...
03/30/2004
6403031Method for mineralization of organic pollutants in water by catalytic ozonization
A process of catalytic ozonization with molecular ozone or with a gas containing ozone, for the purification of polluted waters, comprising the step of activating the ozone with a catalyst consisting at least of cobalt atoms, in order to achieve the advan...
06/11/2002
6342130Method of treating a base material for obtaining specific properties
Method of treating a base material for obtaining one or more specific properties, excluding ionomeric properties by diffusing a specific substance into the base material. The base material can be a synthetic or natural polymer, a ceramic material, an oil ...
01/29/2002
6332959Method and device for producing a controlled atmosphere with low oxygen partial pressure
The present invention concerns a method for producing a controlled atmosphere having an oxygen partial pressure of below 10-13 Pa and an operating temperature above 1000° C. According to the invention a furnace is vented by a gas mixture havin...
12/25/2001
6310266Method and apparatus for the removal of harmful substances from various objects or materials
The present invention relates generally to the removal of harmful substances from various objects or materials. More specifically, this invention relates to an improved method and apparatus for removing the harmful substances (i.e., toxins), from a variet...
10/30/2001
6221216Technique for interior electron sterilization of an open mouthed container
Commercial sterilization of the interior surfaces of containers, cups or bottles by the use of energetic electrons is accomplished by directing electrons of moderate energies through the open mouth of such containers. Electrons which would normally illumi...
04/24/2001
6083356Method and device for pre-treatment of substrates
Process and apparatus for pre-treatment of a substrate surface in a vacuum by a glow discharge for a subsequent coating process in a vacuum. The process includes maintaining a low pressure glow discharge between the substrate to be pre-treated and a count...
07/04/2000
5985101Method and apparatus for the removal of harmful substances from various objects or materials
The present invention relates generally to the removal of harmful substances from various objects or materials. More specifically, this invention relates to an improved method and apparatus for removing the harmful substances (i.e., toxins), from a variet...
11/16/1999
5869188Electrostatographic member and system for electrostatographic reproduction and method for preparing same
An electrostatographic member for use in electrostatographic processes is prepared by directly applying an elastomeric layer to a metal support (or core) that has been treated with corona discharge without primers or intermediate treatments. Adhesion of t...
02/09/1999
5742051Micro sized ion generating device
A copier/printer includes a micro sized ion generating device that includes an insulated support substrate having an edge portion. An AC coronode covered by an insulated member is mounted on the edge portion of the support substrate, and a DC biased scree...
04/21/1998
5573732Method and apparatus for sterilizing medical devices using glow discharges
A medical device having a regular or irregular shape is sterilized in a sterilizing apparatus comprising a means for moveably supporting the medical device, and a electrode having an anode tip at one end thereof which is positioned to form a gap with a pr...
11/12/1996
5324434Water purifying apparatus
A filter of a water purifying apparatus main body which is housed in a sink is made as a positive electrode, and a DC voltage is applied, by a dry battery cell, between the filter and a negative electrode in a purified water passage. Thus, microbes are pr...
06/28/1994
5215636Pulsed discharge surface treatment apparatus and process
A pulsed surface discharge apparatus for treating dielectric surfaces, such as polymers, having a pair of electrodes spaced apart adjacent to a surface to be treated, means for supplying an inert gas, or a predominantly inert gas mixture, adjacent to the ...
06/01/1993
5194291Corona discharge treatment
Corona discharge treatment apparatus for treating or coating a surface of a conductive substrate includes a high voltage radio frequency power supply and a cable having a number of flexible conductors and other components. The cable has a first end connec...
03/16/1993
5190703Plasma reactor chamber
The present invention includes a plasma reactor chamber, which is generally constructed such that a large opening exists in a wall of the chamber. The reactor chamber is deployed remotely from a control console, such as on a robotic arm. A plasma generati...
03/02/1993
5171369Device for glow potential processing, in particular ionic carburation
In a device for glow potential processing the metallic workpieces are placed on an electroconductive charging plate. The device has an oven located within a chamber that can be evacuated. At least three supports of the charging plate are arranged in the i...
12/15/1992
5069885Photocatalytic fluid purification apparatus having helical nontransparent substrate
Apparatus for the purification of a fluid, such as water, which in the presence of light of an activating wavelength brings the fluid into contact with surfaces with fixed photoreactive coatings of anatase (TiO2) or other photoreactive semicond...
12/03/1991
1    
 
Sign InRegister
Username  
Password   
forgot password?