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| Number | Title | Issue Date |
| 7431585 | Apparatus and method for heating substrates An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while su... | 10/07/2008 |
| 7419346 | Integrated system for tool front-end workpiece handling An integrated system is disclosed for workpiece handling and/or inspection at the front end of a tool. The system comprises a rigid member of unitary construction such as a metal plate which mounts to the front of a tool associated with a semiconductor process. The ... | 09/02/2008 |
| 7400158 | Test fixture and method for testing a semi-finished chip package A test fixture has a base, a positioning board, multiple probes, a cushion board, multiple springs and multiple inner bolts. The base has a recess defined in the base. The positioning board is mounted in the recess. The probe is mounted on the positioning board and ... | 07/15/2008 |
| 7399154 | Vacuum processing system being able to carry process object into and out of vacuum chamber First and second load-lock mechanisms are installed in a vacuum chamber. An external arm and first and second robot arms are disposed outside of the vacuum chamber. The external arm can hold a process object and can carry the held process object either into the firs... | 07/15/2008 |
| 7394520 | Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when ... | 07/01/2008 |
| 7387484 | Wafer positioning systems and methods thereof An wafer positioning system comprises a wafer handling chamber with a vacuum sealable opening catching wafers. At least one processing chamber disposed adjacent to the wafer handling chamber has an opening catching wafers, sealed with a gate. A wafer transfer robot ... | 06/17/2008 |
| 7384228 | Insertion device, lithographic apparatus with said insertion device and device manufacturing method A robot arm is configured to insert and remove an object from a conditioned environment using a carrier connected to the robot arm. The robot arm is positioned in a conditionable vessel, a wall of which vessel may deform when the interior is conditioned. Since the t... | 06/10/2008 |
| 7381969 | Load lock control A control for pressurizing a load lock. The control initiates pressurization of the loadlock interior by coupling a source of gas to the loadlock interior. A representative load lock includes a pressure sensor and multiple valves to atmosphere where at least one suc... | 06/03/2008 |
| 7367769 | Semiconductor production system, cluster tool, control method of semiconductor production system and maintenance method of cluster tool PS control sections MC1, MC2 configured to independently control the operations in process ships PS1, PS2 are provided respectively, and an LM control section MC3 configured to control the operation in a loader module LM is provide... | 05/06/2008 |
| 7367139 | Vacuum processing apparatus and method operation thereof This vacuum processing apparatus has a fixed processing chamber 24 and two movable load lock chambers 28a and 28b. A gate valve 26 is provided on the processing chamber 24, and gate valves 30 are respectively p... | 05/06/2008 |
| 7351292 | Assembly for processing substrates An assembly for processing substrates, which processing comprises a vacuum deposition process, such as, for instance, sputtering, CVD or PECVD, which vacuum deposition process is carried out in at least one process chamber, the assembly being provided with a conveyi... | 04/01/2008 |
| 7347656 | Vacuum processing apparatus and semiconductor manufacturing line using the same A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plural... | 03/25/2008 |
| 7335277 | Vacuum processing apparatus A vacuum processing apparatus comprising a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas; and a mass flow con... | 02/26/2008 |
| 7331751 | Vacuum processing method A vacuum processing method includes an atmospheric transfer step of transferring a wafer in atmospheric air to a vacuum transfer chamber using atmospheric transfer equipment disposed in atmospheric air, a vacuum transfer step of transferring the wafer received from ... | 02/19/2008 |
| 7329299 | Plate-shaped work piece transporting apparatus It is an object of the present invention to provide a plate-shaped work piece transporting apparatus that has a fan, a dust-removal filter disposed above this fan, and a plate-shape porous member disposed above the dust-removal filter. By forming a chamber in which ... | 02/12/2008 |
| 7318697 | Universal reticle transfer system A specially adapted SMIF pod (20) receives and holds one particular type of reticle cassette (36) or reticle holder (132) selected from among dozens of different configurations thereof. The SMIF pod (20) may be interrogated to determine t... | 01/15/2008 |
| 7314068 | Apparatus for replacing gas in storage container and method for replacing gas therewith While gas in a general storage container with no gas inlet and in the storage container with the gas inlet is replaced in a short time, the semiconductor wafer surface is cleaned. In an apparatus for replacing gas in a semiconductor wafer storage container which inc... | 01/01/2008 |
| 7293950 | Universal modular wafer transport system The present invention is a wafer transfer system that transports individual wafers between chambers within an isolated environment. In one embodiment, a wafer is transported by a wafer shuttle that travel within a transport enclosure. The interior of the transport e... | 11/13/2007 |
| 7258520 | Methods and apparatus for using substrate carrier movement to actuate substrate carrier door opening/closing A system for opening a substrate carrier includes a substrate carrier having an openable portion. The substrate carrier also has an opening mechanism coupled to the openable portion. A substrate transfer location has a support adapted to support a substrate carrier.... | 08/21/2007 |
| 7246984 | Method and apparatus for transferring an article to be processed and processing apparatus A transferring apparatus transfers an article to be processed, which is carried by a carrier device, to a holder provided in a processing chamber defined by a processing vessel and adapted to hold the article at a specified processing position. The transferring appa... | 07/24/2007 |
| 7246985 | Work-piece processing system A transfer system for use with a tool for processing a work-piece at low or vacuum pressure such as an ion implanter for implanting silicon wafers. An enclosure defines a low pressure region for processing of work-pieces placed at a work-piece processing station wit... | 07/24/2007 |
| 7247207 | Vacuum processing apparatus A vacuum processing apparatus includes a vacuum processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas. The vacuum processing chamber has an axisymmetric structure, including a double wall struct... | 07/24/2007 |
| 7244086 | Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates A vacuum transport chamber has a transport robot arrangement. A processing arrangement has at least one processing station communicating by at least one workpiece pass-through opening with the vacuum transport chamber. A loadlock arrangement communicates by at least... | 07/17/2007 |
| 7245987 | Cluster tool and transfer control method At a time Tp when a wafer W is transferred into either a load lock chamber LL1 or LL2, periods PSL for the load lock chambers LL1 and LL2 to get ready to permit a transfer of a next wafer W thereinto are calculated based on a timing for e... | 07/17/2007 |
| 7236229 | Load lock chamber, processing system A load lock chamber provided between a port that accommodates an object to be processed and is maintained at an ambient pressure, and a process chamber that is maintained at a reduced pressure or vacuum environment and performs a predetermined process for the object... | 06/26/2007 |
| 7232284 | Device for loading substrates into and unloading them from a clean room The invention relates to a device for loading substrates into and unloading them from a clean room, comprising a lock device onto which a transport box for receiving the substrates can be placed and which is fitted with a hermetically sealing lock opening, and a pro... | 06/19/2007 |
| 7232286 | Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber The present invention provides a seal device comprising a sealing passage which allows communication between a first space and a second space, and evacuation lines individually connected to the first space and the sealing passage. A gas feed line for feeding dry gas... | 06/19/2007 |
| 7226512 | Load lock system for supercritical fluid cleaning A substrate is transferred from an environment at about vacuum into a load lock through a first door. The substrate is then sealed within the load lock. The pressure within the load lock is raised to a high pressure above vacuum. A second door coupling the load lock... | 06/05/2007 |
| 7217076 | Semiconductor material handling system The semiconductor material handling system is an EFEM that may either mount to the front end of a processing tool or be integrated into the processing tool. The EFEM is built from a unified frame that the EFEM components, such as a wafer engine and a SMIF pod advanc... | 05/15/2007 |
| 7218382 | Load-lock technique A load-lock system which includes a chamber housing and a capacity changing system for continuously changing the capacity of the chamber housing. ... | 05/15/2007 |
| 7214274 | Method and apparatus for thermally insulating adjacent temperature controlled processing chambers A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is l... | 05/08/2007 |
| 7214027 | Wafer handler method and system Systems and methods for handling wafers include retrieving a first wafer from a wafer cassette using a first arm, transferring the first wafer from the first transfer arm to a second arm, delivering the first wafer for processing to a process chamber using the secon... | 05/08/2007 |
| 7207763 | Semiconductor manufacturing system and wafer holder for semiconductor manufacturing system A semiconductor manufacturing system and wafer holder for a semiconductor manufacturing system which prevents a semiconductor wafer from being exposed to a process reaction and which includes a reaction tube for providing a sealed process space and a dual boat and w... | 04/24/2007 |
| 7207766 | Load lock chamber for large area substrate processing system A load lock chamber and method for transferring large area substrates is provided. In one embodiment, a load lock chamber suitable for transferring large area substrates includes a plurality of vertically stacked single substrate transfer chambers. The configuration... | 04/24/2007 |
| 7208047 | Apparatus and method for thermally isolating a heat chamber An apparatus through which a substrate may be transferred between a first chamber and a second chamber in which the first chamber is maintained at a high temperature relative to the ambient temperature of the second chamber. The apparatus comprises a passageway for ... | 04/24/2007 |
| 7201551 | Vacuum processing apparatus and semiconductor manufacturing line using the same A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plural... | 04/10/2007 |
| 7201823 | High throughput plasma treatment system A method for the plasma treatment of parts. The method includes sending loading signals from an electronic control to a transfer mechanism and loading the parts from a position outside of the treatment chamber to a plurality of treatment positions within the treatme... | 04/10/2007 |
| 7198448 | Vacuum process system A vacuum process system comprises: a load port on which an object to be processed is set; a common transfer chamber disposed adjacent to the load port, having an internal space set at an atmospheric pressure level, and including a first transfer device that is movab... | 04/03/2007 |
| 7198447 | Semiconductor device producing apparatus and producing method of semiconductor device A semiconductor device producing apparatus is disclosed. The apparatus includes a carrier-holding stage for placing a carrier; first, second and third stages each for holding first and second boats one at a time, each boat holding one or more substrates; a boat tran... | 04/03/2007 |
| 7151589 | Lithographic apparatus and patterning device transport According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterni... | 12/19/2006 |
