Did You Know...
...that the x-ray was discovered purely by accident? When German physicist Wilhelm Konrad von Roentgen was experimenting with cathode rays in 1895, he put an activated Crookes tube in a book and went out to lunch. When he returned, he discovered that a key that had also been placed in the book showed up as an image on the developed film!
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| Number | Title | Issue Date |
| 7434856 | Gripper and method of operating the same The invention relates to a gripper for handling frames (2) that are covered with a film (3) that is intended for the transport of wafers (6). The gripper comprises at least two flat fingers (10) that carry flattened finger tips (8)... | 10/14/2008 |
| 7416405 | Vertical type of thermal processing apparatus and method of using the same A vertical type of thermal processing apparatus of the present invention includes a thermal processing furnace having a furnace opening at a lower portion thereof. A boat holding objects to be processed in a tier-like manner in a vertical direction is adapted to be ... | 08/26/2008 |
| 7406360 | Method for detecting transfer shift of transfer mechanism and semiconductor processing equipment A dummy substrate (17) differs from a substrate to be processed in having a first guide (G1) for assisting centering, however, it can be handled as a substitute of the substrate to be processed. In a process chamber (2), a second guide (G2 | 07/29/2008 |
| 7394520 | Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when ... | 07/01/2008 |
| 7377736 | Cylinder, load port using it, and production system A cylinder which can precisely feed a piston rod 3 into three different positions. The cylinder includes a spring receiving member 14 which is placed coaxially with the piston rod in a piston room. Movement of the piston 4 is limited by one end ... | 05/27/2008 |
| 7367139 | Vacuum processing apparatus and method operation thereof This vacuum processing apparatus has a fixed processing chamber 24 and two movable load lock chambers 28a and 28b. A gate valve 26 is provided on the processing chamber 24, and gate valves 30 are respectively p... | 05/06/2008 |
| 7367446 | Methods and apparatus for transporting substrate carriers According to a first aspect, a first conveyor system is provided that is adapted to deliver substrate carriers within a semiconductor device manufacturing facility. The first conveyor system includes a ribbon that forms a closed loop along at least a portion of the ... | 05/06/2008 |
| 7357846 | Substrate processing apparatus and substrate processing method In a resist-removing process system 1 for removing a resist film formed on a wafer W, the resist film is denatured so as to make the resist film soluble in water and, then, the resist film is removed from the wafer by applying a water-wash processing to the d... | 04/15/2008 |
| 7344349 | Pod cover removing-installing apparatus A pod cover removing-installing apparatus can open and close any covers for a variety of pods made by a various manufactures, can satisfy an allowable distortion error capable of being normally operated even if conditions such as temperature, humidity, and can remov... | 03/18/2008 |
| 7335277 | Vacuum processing apparatus A vacuum processing apparatus comprising a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas; and a mass flow con... | 02/26/2008 |
| 7336015 | Method of manipulating wafers A method of manipulating preferable thin wafers, preferably having a thickness of less than 200 μm, wherein the wafers are placed prior to polishing or another processing step for reducing the thickness thereof on a transportable electrostatic carrier. The wafers r... | 02/26/2008 |
| 7331751 | Vacuum processing method A vacuum processing method includes an atmospheric transfer step of transferring a wafer in atmospheric air to a vacuum transfer chamber using atmospheric transfer equipment disposed in atmospheric air, a vacuum transfer step of transferring the wafer received from ... | 02/19/2008 |
| 7329947 | Heat treatment jig for semiconductor substrate When a two-division structure heat treatment jig for semiconductor substrate that includes a silicon first jig that comes into direct contact with a semiconductor substrate that is heat treated and supports the semiconductor substrate, and a second jig (holder) that... | 02/12/2008 |
| 7329299 | Plate-shaped work piece transporting apparatus It is an object of the present invention to provide a plate-shaped work piece transporting apparatus that has a fan, a dust-removal filter disposed above this fan, and a plate-shape porous member disposed above the dust-removal filter. By forming a chamber in which ... | 02/12/2008 |
| 7313262 | Apparatus for visualization of process chamber conditions An apparatus and method for visualization of process conditions in a process chamber or chambers, particularly during the fabrication of integrated circuits on substrates in the process chambers. The apparatus includes an inspection chamber which is installed adjace... | 12/25/2007 |
| 7313452 | Substrate transfer controlling apparatus and substrate transferring method A substrate transfer controlling apparatus can easily maximize throughput of a substrate processing apparatus such as a semiconductor fabrication apparatus, and can satisfy a demand for immediacy of actions of a transfer device. The substrate transfer controlling ap... | 12/25/2007 |
| 7293642 | Methods and apparatus for transporting substrate carriers According to a first aspect, a first conveyor system is provided that is adapted to deliver substrate carriers within a semiconductor device manufacturing facility. The first conveyor system includes a ribbon that forms a closed loop along at least a portion of the ... | 11/13/2007 |
| 7292909 | Substrate processing apparatus and management method A variety of maintenance work is performed for each of operation units in a substrate processing apparatus. Doors are provided at given positions on sides of an apparatus space, each of which is provided with an interlock switch. An interlock release unit is provide... | 11/06/2007 |
| 7289230 | Wireless substrate-like sensor A wireless substrate-like sensor is provided to facilitate alignment and calibration of semiconductor processing systems. The wireless substrate-like sensor includes an optical image acquisition system that acquires one or more images of targets placed within the se... | 10/30/2007 |
| 7287920 | Semiconductor manufacturing apparatus and method A semiconductor manufacturing apparatus includes a transfer mechanism including a moving part for holding a substrate to be processed and moving along a longitudinal transferring passage and a plurality of processing units for performing respective processes on the ... | 10/30/2007 |
| 7287560 | Door device comprising a double bayonet socket for an insulator A door fixture to be fastened to a frame of an isolator includes a door and a double bayonet closure with two bayonet locks for reciprocally transferring the isolator from a first state, in which the door, which opens from inside the isolator, is open and detached f... | 10/30/2007 |
| 7281869 | Coating and developing system and coating and developing method A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist fil... | 10/16/2007 |
| 7282675 | Integrated thermal unit having a shuttle with a temperature controlled surface An integrated thermal unit comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate transfer shuttle configured to transfe... | 10/16/2007 |
| 7279067 | Port structure in semiconductor processing system In a port structure 16A in a semiconductor processing system 2, a door 20A is disposed in a port 12A defined by upright wall 52 and 54. A table 48 opposed to the port is disposed outside the system. Defined on the tab... | 10/09/2007 |
| 7274971 | Methods and apparatus for electronic device manufacturing system monitoring and control In a first aspect, a computer program product is provided. The computer program product includes a medium readable by a computer. The computer readable medium has computer program code adapted to (1) create a band map that indicates an expected status of one or more... | 09/25/2007 |
| 7274429 | Integrated lithographic fabrication cluster An integrated lithographic fabrication cluster system, as presented herein, comprises an exposure apparatus to expose a pattern onto a substrate with an associated exposure controller to control the exposure apparatus and a track apparatus interconnecting a pluralit... | 09/25/2007 |
| 7266887 | Substrate transportation apparatus, component mounting apparatus and substrate transportation method in component mounting operation A component-mounted substrate moved to a specified substrate position by a substrate holding-and-moving device is delivered from a top of the substrate holding-and-moving device to a substrate discharge holder, and then while the substrate discharge holder is not mo... | 09/11/2007 |
| 7250084 | Downward mechanism for support pins A downward mechanism for support pins is applicable to a reactor of removable type. Support pins are located on the base of the reactor, and each support pin has a base thereunder. The downward mechanism has an elevator mechanism and a board fixed thereto. The board... | 07/31/2007 |
| 7244088 | FOUP door transfer system A device (12) picks up at least one semi-conductor wafer (11) from a container (14) of wafers fitted on one side (15) of an aperture (13) in the transfer station (10) of a semi-conductor wafer processing plant. The device is... | 07/17/2007 |
| 7243003 | Substrate carrier handler that unloads substrate carriers directly from a moving conveyor In a first aspect, a substrate loading station is served by a conveyor which continuously transports substrate carriers. A substrate carrier handler that is part of the substrate loading station operates to exchange substrate carriers with the conveyor while the con... | 07/10/2007 |
| 7236229 | Load lock chamber, processing system A load lock chamber provided between a port that accommodates an object to be processed and is maintained at an ambient pressure, and a process chamber that is maintained at a reduced pressure or vacuum environment and performs a predetermined process for the object... | 06/26/2007 |
| 7232286 | Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber The present invention provides a seal device comprising a sealing passage which allows communication between a first space and a second space, and evacuation lines individually connected to the first space and the sealing passage. A gas feed line for feeding dry gas... | 06/19/2007 |
| 7233841 | Vision system A vision system and method for calibrating motion of a robot disposed in a processing system is provided. In one embodiment, a vision system for a processing system includes a camera and a calibration wafer that are positioned in a processing system. The camera is p... | 06/19/2007 |
| 7231273 | Substrate processing apparatus and method including obstacle detection A camera is fixed to a camera fixture extending forward and upward from a rear end of an arm mechanism. The camera picks up the direction of extension of the arm mechanism when the substrate is carried in and out. If a normal still image in a hot plate unit previous... | 06/12/2007 |
| 7229240 | Substrate processing apparatus and substrate processing method When the processing temperature in a heater should be changed between lots, for example, a foremost substrate in a subsequent lot is transported to a position close to the heater such as a substrate holding part, and is held in standby thereat until adjustment of a ... | 06/12/2007 |
| 7224442 | Supply control system and method, program, and information storage medium A supply control apparatus is provided and includes a memory for storing lot control data for controlling a plurality of lots, reticule control data for controlling a plurality of masks, and inline photo device control data; an update section for updating the data; ... | 05/29/2007 |
| 7214283 | Working range setting method for bonding device for fabricating liquid crystal display devices A working range setting method of a bonding device includes identifying a model of a first substrate, extracting a set value corresponding to a working range of working elements according to the identified model, and setting the working range of the corresponding wo... | 05/08/2007 |
| 7214274 | Method and apparatus for thermally insulating adjacent temperature controlled processing chambers A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is l... | 05/08/2007 |
| 7210864 | Coating and developing apparatus A wafer flow recipe is prepared. Based on this wafer flow recipe, there are estimated and calculated respectively a PCD time from a time point at which a process for coating a resist liquid on a substrate by a coating unit has been terminated to a time point at whic... | 05/01/2007 |
| 7210924 | Heat treatment system and a method for cooling a loading chamber There is provided a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer trans... | 05/01/2007 |
