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Class 414/805 - Of moving material between zones having different pressures and inhibiting change in pressure gradient therebetween


Subclass of Class 414 - Material or article handling
Definition: Process of moving or enabling gravitational movement of
No. of patents: 156
Last issue date: 12/27/2011


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NumberTitleIssue Date
8083463Mini clean room for preventing wafer pollution and using method thereof
A mini clean room for preventing wafer pollution includes a robot arm, a clean room body slidably disposed on the robot arm and at least one lock unit which is rotatably connected with the clean room body. During operation, the robot arm extends out of the clean roo...
12/27/2011
7997851Apparatus and method for a multi-level load lock chamber, transfer chamber, and robot suitable for interfacing with same
A new apparatus for processing substrates is disclosed. A multi-level load lock chamber having four environmentally isolated chambers interfaces with a transfer chamber that has a robotic assembly. The robotic assembly has two arms that each can move horizontally as...
08/16/2011
7959403Linear semiconductor processing facilities
Methods and systems are provided for handling materials, including materials used in semiconductor manufacturing systems. The methods and systems include linear semiconductor processing facilities for vacuum-based semiconductor processing and handling, as well as li...
06/14/2011
7942622Transfer/alignment method in vacuum processing apparatus, vacuum processing apparatus and computer storage medium
In a vacuum transfer chamber 10, a position detecting mechanism 33 for detecting the positions of semiconductor wafers W is arranged. The semiconductor wafers W disposed at predetermined positions in a load lock chamber 17 and vacuum processing ...
05/17/2011
7878755Load lock and method for transferring objects
A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least t...
02/01/2011
7845897Method for transporting substrates
Substrates are transported to accurate positions, while mounted on one hand of a transport robot. When substrates are to be transported from transporting chamber into processing chamber, a first mounting portion of a hand is located immediately above first processin...
12/07/2010
7798764Substrate processing sequence in a cartesian robot cluster tool
A method and apparatus for processing substrates using a cluster tool that has an increased system throughput, increased system reliability, improved device yield performance, and a reduced footprint. The various embodiments of the cluster tool may utilize two or mo...
09/21/2010
7748944Method and apparatus for semiconductor processing
A method and apparatus for semiconductor processing is disclosed. In one embodiment, a method of transporting a wafer within a cluster tool, comprises placing the wafer into a first segment of a vacuum enclosure, the vacuum enclosure being attached to a processing c...
07/06/2010
7665951Multiple slot load lock chamber and method of operation
Embodiments of the invention include a load lock chamber, a processing system having a load lock chamber and a method for transferring substrates between atmospheric and vacuum environments. In one embodiment, the method includes maintaining a processed substrate wi...
02/23/2010
7611322Processing thin wafers
There is described a wafer processing system for thinned wafers that are easily broken during handling. The system protects against breakage during handling and provides for temperature controls during processing. ...
11/03/2009
7600960Method for transfer of particulate solid products between zones of different pressure
The method invented is based on sluice system according to which the product is first conveyed through a portioning device, which produces a sequence of uniform product portions divided by uniform particle free spaces, and subsequently the product portions are conve...
10/13/2009
7458763Mid-entry load lock for semiconductor handling system
In a system having a number of semiconductor processing modules sharing a common vacuum environment, a mid-entry load lock is provided to permit insertion and removal of wafers into the vacuum environment at a point between various other robotic handlers, process mo...
12/02/2008
7422406Stacked process modules for a semiconductor handling system
Methods and systems are provided for a vacuum-based semiconductor handling system. The system may be a linear system with a four-link robotic SCARA arm for moving materials in the system. The system may include one or more vertically stacked load locks or vertically...
09/09/2008
7409257System and method for moving substrates in and out of a manufacturing process
Disclosed is a system for moving substrates in and out of a manufacturing process. The present invention comprises an automatic transfer device for automatically transferring a cassette that stores substrates, a manual transfer device for transferring the cassette a...
08/05/2008
7371683Method for carrying object to be processed
A method for carrying an object to be processed used for a processing apparatus which comprises a plurality of process chambers including a specific process chamber for a process in which the object in process is easily contaminated and a carrying mechanism having t...
05/13/2008
7360346Purging system and purging method for the interior of a portable type hermetically sealed container
A fine pressure fluctuation at short time intervals occurring when a portable type hermetically sealed container is purged is reduced to thereby prevent the deterioration or the like of a seal member due to the pressure fluctuation. In order to achieve this object, ...
04/22/2008
7359767Substrate carrier handler that unloads substrate carriers directly from a moving conveyor
In a first aspect, a substrate loading station is served by a conveyor which continuously transports substrate carriers. A substrate carrier handler that is part of the substrate loading station operates to exchange substrate carriers with the conveyor while the con...
04/15/2008
7356428Overhead traveling vehicle testing and calibration
A method, system and test fixture for allowing testing and calibration of various operation parameters of an overhead traveling vehicle (hereinafter “OTV”) are disclosed. The invention implements a test fixture that includes a rotatable bearing set for rotatably...
04/08/2008
7347656Vacuum processing apparatus and semiconductor manufacturing line using the same
A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plural...
03/25/2008
7331751Vacuum processing method
A vacuum processing method includes an atmospheric transfer step of transferring a wafer in atmospheric air to a vacuum transfer chamber using atmospheric transfer equipment disposed in atmospheric air, a vacuum transfer step of transferring the wafer received from ...
02/19/2008
7308757Intermediate product manufacturing apparatus, and intermediate product manufacturing method
An intermediate product manufacturing apparatus for carrying intermediate products and processing the intermediate products with a plurality of processing apparatuses is provided, the apparatus comprising: a plurality of carrying means for carrying the intermediate ...
12/18/2007
7291565Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl...
11/06/2007
7287964Method and system for pumping powder, and powder coating apparatus
In a pump system for supplying powder, in particular coating powder, to a powder coating apparatus, time controller is used to introduce compressed gas into a metering chamber as a function of the predetermined delay time elapsed since a predetermined operational po...
10/30/2007
7286890Transfer apparatus for target object
A processing system includes a transfer chamber, a plurality of chambers connected to the transfer chamber, a transfer apparatus disposed in the transfer chamber, and a control section configured to control the transfer apparatus. The transfer apparatus includes a b...
10/23/2007
7283226Measurement system cluster
Systems and methods are disclosed for measuring semiconductor wafers in a fabrication process using one or more of a plurality of measurement systems. A measurement system cluster is provided having a plurality of such measurement systems, along with a system for tr...
10/16/2007
7273339Powder transport method and apparatus
The present invention is directed to a powder paint delivery method and apparatus employing a pressurized reservoir pump that supplies a controlled stream of densely fluidized or dense phase powder paint to the applicator though a powder delivery conduit. The powder...
09/25/2007
7255772High pressure processing chamber for semiconductor substrate
A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical...
08/14/2007
7254458Systems and methods for metrology recipe and model generation
Systems and methodologies are disclosed for generating setup information for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument to measure an unpatterned wafer and a setup information generat...
08/07/2007
7250374System and method for processing a substrate using supercritical carbon dioxide processing
A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat...
07/31/2007
7249925System and method for reticle protection and transport
A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include...
07/31/2007
7246985Work-piece processing system
A transfer system for use with a tool for processing a work-piece at low or vacuum pressure such as an ion implanter for implanting silicon wafers. An enclosure defines a low pressure region for processing of work-pieces placed at a work-piece processing station wit...
07/24/2007
7241993Inspection system by charged particle beam and method of manufacturing devices using the system
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron im...
07/10/2007
7243003Substrate carrier handler that unloads substrate carriers directly from a moving conveyor
In a first aspect, a substrate loading station is served by a conveyor which continuously transports substrate carriers. A substrate carrier handler that is part of the substrate loading station operates to exchange substrate carriers with the conveyor while the con...
07/10/2007
7232286Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber
The present invention provides a seal device comprising a sealing passage which allows communication between a first space and a second space, and evacuation lines individually connected to the first space and the sealing passage. A gas feed line for feeding dry gas...
06/19/2007
7214027Wafer handler method and system
Systems and methods for handling wafers include retrieving a first wafer from a wafer cassette using a first arm, transferring the first wafer from the first transfer arm to a second arm, delivering the first wafer for processing to a process chamber using the secon...
05/08/2007
7204669Semiconductor substrate damage protection system
A method and apparatus for preventing substrate damage in a factory interface. In one embodiment, a method for preventing substrate damage in a factory interface includes the steps of receiving an indicia of potential substrate damage, and automatically preventing s...
04/17/2007
7196507Apparatus for testing substrates
An apparatus for testing substrates reduces the area required and the costs which arise with the testing of substrates, in particular semiconductor wafers, during the production process. The apparatus includes testing arrangements comprising a chuck, a chuck drive, ...
03/27/2007
7163586Vapor deposition apparatus
A vapor deposition apparatus for coating an item has a cleanroom side that is accessible from inside a cleanroom and a service side that is not accessible from inside the cleanroom. The apparatus has a vaporizer for vaporizing solid coating material and a pyrolysis ...
01/16/2007
7140393Non-contact shuttle valve for flow diversion in high pressure systems
A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf...
11/28/2006
7141809Method for reciprocating a workpiece through an ion beam
A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operably coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied b...
11/28/2006
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