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| Number | Title | Issue Date |
| 8057114 | Wet-processing apparatus, wet-processing method and storage medium A wet-processing apparatus includes module groups each including plural processing modules and a shared nozzle device to be used in common by the processing module of the module group. The wet-processing apparatus includes plural processing modules not less than fou... | 11/15/2011 |
| 8021062 | Developing apparatus and developing method A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing sol... | 09/20/2011 |
| 7997813 | Coating and developing system with a direct carrying device in a processing block, coating and developing method and storage medium A coating and developing system includes processing blocks of the same construction each built by stacking up a plurality of unit blocks including a film forming unit block and a developing unit block in layers. The processing blocks are arranged longitudinally betw... | 08/16/2011 |
| 7955011 | Coating and developing apparatus, substrate processing method, and storage medium A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units a... | 06/07/2011 |
| 7938587 | Substrate processing method, computer storage medium and substrate processing system In the present invention, when dense and sparse resist patterns are formed above a substrate, respective resist pattern dimensions are measured, and a correction value for a first processing unit is calculated based on the dimension measurement result of the dense r... | 05/10/2011 |
| 7934880 | Coating and developing apparatus, coating and developing method, and storage medium Disclosed herein is a coating and developing apparatus 1 whose decreases in substrate-conveying accuracy can be suppressed. A processing block S2 of the coating and developing apparatus 1 includes multiple resist-film forming blocks G2, G... | 05/03/2011 |
| 7922405 | Developing apparatus and developing method A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a ... | 04/12/2011 |
| 7901149 | Substrate processing method, program, computer-readable recording medium, and substrate processing system A substrate on which a resist film has been formed is transferred to an aligner and subjected to exposure processing. The substrate is then subjected to post-exposure baking in a second processing system. The substrate is then transferred again to the aligner and su... | 03/08/2011 |
| 7896562 | Developing method, developing apparatus and storage medium A method of supplying a developing solution is provided. The method includes supplying a developing solution onto a substrate from a first developing solution nozzle, so as to form a ribbon-like region on the surface of the substrate, while rotating the substrate ab... | 03/01/2011 |
| 7896563 | Photo spinner apparatus and wafer carrier loading/unloading method using the same A photo spinner apparatus, including a spin coater for coating a plurality of wafers with photoresist, a bake device for hardening the photoresist coated by the spin coater, a developer for developing the photoresist hardened in the bake device, a transfer unit for ... | 03/01/2011 |
| 7871211 | Coating and developing system, coating and developing method and storage medium A coating and developing system has a first processing block, a second processing block, and a transfer block interposed between the first and the second processing block. A first direct carrying means carries substrates from a carrier block to the transfer block. T... | 01/18/2011 |
| 7841788 | Substrate processing apparatus and substrate processing method In a substrate processing apparatus of the present invention, a buffer bath is provided at any point in a supplying passage of a processing solution supplying part, and a micro bubble generator is provided in the buffer bath. When a substrate is processed, large qua... | 11/30/2010 |
| 7828488 | Developing apparatus, developing method, coating and developing system and storage medium A developing apparatus includes two rotating members respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism extended between the rotating members to form a carrying passage, a... | 11/09/2010 |
| 7828487 | Post-exposure baking apparatus and related method A post-exposure baking apparatus comprising a supporting member, a heating member, and a cooling member is disclosed. A wafer is disposed on the supporting member and a photoresist layer is formed on the wafer. The heating member comprises electrical heating wires a... | 11/09/2010 |
| 7819594 | Development processing device A device includes a rotary base; an approach stage; a substrate holding table and a nozzle head. The substrate holding table holds the work by suction, and comes into intimate contact with the approach stage and the rotary base through first and second annular seal ... | 10/26/2010 |
| 7789576 | PEB embedded exposure apparatus The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed for post exposure baking (PEB); and a control module designed to control... | 09/07/2010 |
| 7789577 | Coating and developing system, coating and developing method and storage medium A coating and developing system that includes two rotating members having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism extended between the rotating members to form a carrying passage, ... | 09/07/2010 |
| 7775729 | Developing apparatus, developing processing method, developing processing program, and computer readable recording medium recording the program A developing apparatus, a developing processing method, a developing processing program, and a computer readable recording medium recording the program, which can reduce the consumption amount of the developing solution and the developing processing time irrespectiv... | 08/17/2010 |
| 7766566 | Developing treatment apparatus and developing treatment method In the present invention, a substrate transfer unit into/from which a substrate is transferred from/to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment ... | 08/03/2010 |
| 7766565 | Substrate drying apparatus, substrate cleaning apparatus and substrate processing system A substrate processing system includes a substrate processing apparatus and a cleaning/drying apparatus. The substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing ... | 08/03/2010 |
| 7740410 | Developing apparatus and developing method A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing sol... | 06/22/2010 |
| 7726891 | Substrate processing apparatus and substrate processing method A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An... | 06/01/2010 |
| 7690853 | Substrate processing apparatus A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An... | 04/06/2010 |
| 7665918 | Developing apparatus, developing method and storage medium A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the sub... | 02/23/2010 |
| 7665916 | Coater/developer and coating/developing method Accurate coating and developing having high intrasurface uniformity is achieved by suppressing the influence of components of a resist that may be eluted while a substrate coated with the resist is processed by immersion exposure. A coating unit coats a surface of a... | 02/23/2010 |
| 7665917 | Heat treatment apparatus and methods for thermally processing a substrate using a pressurized gaseous environment Apparatus and methods for heating a substrate in a pressurized environment inside of a thermal processing system. The substrate is placed in a gaseous environment inside a processing chamber of the thermal processing system. The substrate is supported in the gaseous... | 02/23/2010 |
| 7661894 | Coating and developing apparatus, and coating and developing method A processing block S2 includes unit blocks, a BCT layer B3, COT layer B4 and TCT layer B5, for forming coating films, and further includes DEV layers B1, B2 layered with the unit blocks B3, B4, B5 and us... | 02/16/2010 |
| 7658560 | Substrate processing apparatus An interface transport mechanism uses an upper hand when transporting a substrate from a substrate platform to an exposure device before exposure processing by an exposure device, and uses a lower hand when transporting the substrate from the exposure device to the ... | 02/09/2010 |
| 7651284 | Development apparatus and development method A development apparatus has a holder which horizontally holds a substrate, a nozzle which supplies a developer to a resist film on the substrate held by the holder, a liquid flow suppressing member whose size in a two-dimensional plane viewing field is equal to or l... | 01/26/2010 |
| 7651285 | Edge exposure apparatus, coating and developing apparatus, edge exposure method and coating and developing method, and storage medium An edge exposure apparatus performing an exposure process on an edge portion of a wafer having a coating film (resist film) formed thereon includes position detection means for detecting positional data of an outer edge of a wafer held by a spin chuck, an exposure p... | 01/26/2010 |
| 7645081 | Coating and developing apparatus, coating and developing method, and storage medium Disclosed herein is a coating and developing apparatus 1 whose decreases in substrate-conveying accuracy can be suppressed. A processing block S2 of the coating and developing apparatus 1 includes multiple resist-film forming blocks G2, G... | 01/12/2010 |
| 7641405 | Substrate processing apparatus with integrated top and edge cleaning unit A substrate processing apparatus arranged adjacent to an exposure device includes a processing section that subjects a substrate to processing and an interface provided adjacent to one end of the processing section configured to transfer and receive the substrate be... | 01/05/2010 |
| 7641406 | Bevel inspection apparatus for substrate processing A substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. The... | 01/05/2010 |
| 7632028 | Substrate transfer apparatus A substrate transfer apparatus that is designed provide an inclined transfer function that improves liquid saving efficiency of a process solution (developing solution) during the transfer of the substrate. The substrate transfer apparatus includes a first transfer ... | 12/15/2009 |
| 7618203 | Substrate processing method, substrate processing apparatus, and computer readable storage medium In the present invention, when trouble occurs and the operation of a substrate processing apparatus is stopped, substrate information containing positions and processing states of the substrates located in the apparatus at that time is stored, and the power supply o... | 11/17/2009 |
| 7604424 | Substrate processing apparatus A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film remova... | 10/20/2009 |
| 7600933 | Substrate processing apparatus A substrate processing apparatus includes a substrate holding stage to hold a substrate having a surface facing up, the substrate having an exposed and developed resist pattern over the surface, a rotation driving mechanism to rotate the substrate holding stage arou... | 10/13/2009 |
| 7597492 | Coating and developing system, coating and developing method and storage medium A buffer module is installed in a coating film forming unit block of a coating and developing system to reduce the number of interface arms needed by an interface block, and the manufacturing cost and footprint of the coating and developing system. For example, buff... | 10/06/2009 |
| 7597491 | Apparatus for and method of processing substrate A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a devel... | 10/06/2009 |
| 7591601 | Coater/developer, coating/developing method, and storage medium A coater/developer is disclosed that includes a heating module having a pair of rotary bodies configured to rotate about respective horizontal axles, the rotary bodies being spaced apart from each other in a direction along the conveyance path of a substrate so that... | 09/22/2009 |
