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An armor with rollers is provided that enables a user to move in all positions by rolling on a hard and smooth surface while constantly varying his bearing points on the ground.
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| Number | Title | Issue Date |
| 6600138 | Rapid thermal processing system for integrated circuits In a rapid thermal processing system an array of heat lamps generate radiant heat for heating the surfaces of a semiconductor substrate, such as a semiconductor wafer, to a selected temperature or set of temperatures while held within an enclosed chamber.... | 07/29/2003 |
| 6596973 | Pyrometer calibrated wafer temperature estimator A wafer temperature estimator calibrates contact-type temperature sensor measurements that are used by a temperature controller to control substrate temperature in a high temperature processing chamber. Wafer temperature estimator parameters provide an es... | 07/22/2003 |
| 6594446 | Heat-treating methods and systems Methods and systems for heat-treating a workpiece are disclosed. A first method involves increasing a temperature of the workpiece over a first time period to an intermediate temperature, and heating a surface of the workpiece to a desired temperature gre... | 07/15/2003 |
| 6590186 | Heat treatment apparatus and method A baking unit of the present invention comprises: a hot plate on which the substrate is placed; a casing; a gas supply tubes; a baffle ring which surrounds the wafer and is provided with a plurality of gas blowing apertures; and a rotation motor. An inert... | 07/08/2003 |
| 6580059 | Control apparatus for a light radiation-type rapid heating and processing device There is provided a control apparatus for a light radiation-type rapid heating and processing device in which a power factor can be improved, the influence of a higher harmonics strain can be eliminated and a rapid temperature increase of a heated substra... | 06/17/2003 |
| 6570134 | Heat treatment device of the light irradiation type and heat treatment process of the irradiation type To enable uniform heating of the wafer and to carry out heating of the guard ring with high efficiency using lamps of a light source part formed of wafer heating lamps and guard ring heating lamps, the distance between the guard ring heating lamps and the... | 05/27/2003 |
| 6566630 | Thermal processing apparatus for introducing gas between a target object and a cooling unit for cooling the target object A thermal processing apparatus capable of rapidly increasing and decreasing a temperature of a target object in a process chamber being thermally treated. A heat source heats the target object and a cooling arrangement including a bottom part of the proce... | 05/20/2003 |
| 6563092 | Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry Methods and an apparatus for providing a non-contact probe for accurately measuring the temperature of a substrate in a process chamber are disclosed. One exemplary apparatus is a processing chamber, which includes a heating source, where the heating sour... | 05/13/2003 |
| 6559424 | Windows used in thermal processing chambers An apparatus for heat treating semiconductor wafers in a thermal processing chamber using light energy is provided. In one embodiment, the apparatus contains a window located between the semiconductor wafer and the energy source. The window contains a mem... | 05/06/2003 |
| 6555790 | Semiconductor manufacturing apparatus, method for cleaning the semiconductor manufacturing apparatus, and light source unit There is described a semiconductor manufacturing apparatus for coating the surface of a semiconductor wafer with an organic coating, such as anti-reflective coating, which shortens a down time required in association with removal of compounds that tend to... | 04/29/2003 |
| 6534748 | Semiconductor purification apparatus and method A method for protecting at least one wafer from contamination, the method including the steps of heating the wafer in an apparatus for semiconductor processing having a reaction core (102), providing a first voltage level to a wafer transfer device (108),... | 03/18/2003 |
| 6534752 | Spatially resolved temperature measurement and irradiance control A method, apparatus and system for producing a desired spatial temperature distribution across a workpiece. The method includes irradiating a plurality of areas on a surface of the workpiece to create localized heating of the workpiece in those areas, to ... | 03/18/2003 |
| 6528767 | Pre-heating and load lock pedestal material for high temperature CVD liquid crystal and flat panel display applications An apparatus for supporting a glass substrate is provided. In one embodiment, a substrate support is provided having a base structural member and an upper top portion having a surface thereon adapted to minimize friction and/or chemical reactions between ... | 03/04/2003 |
| 6528772 | Speed cooking oven and control apparatus The present invention relates to an oven that includes both radiant cooking elements and a microwave cooking element. The cooking elements are controlled to provide reduced cooking time as compared to known radiant ovens, yet a wide variety of foods can b... | 03/04/2003 |
| 6529686 | Heating member for combination heating and chilling apparatus, and methods Described are heating members and related methods, the heating members being usefully for processing substrates such as microelectronic devices, the heating members optionally and preferably comprising a thermal conductive layer prepared to a superior fla... | 03/04/2003 |
| 6519417 | Semiconductor wafer baking apparatus The present invention discloses a semiconductor wafer baking apparatus comprising a heating plate, a wafer guide, and an exhaust heat compensator. The heating plate is loaded with a wafer and the wafer guide arranges the wafer on the heating plate. The ex... | 02/11/2003 |
| 6518547 | Heat treatment apparatus A substrate heat treatment apparatus irradiating a substrate such as a semiconductor wafer with light and performing heat treatment is provided. 19 lamps 82 are arranged on a plane in the form of a honeycomb to form a lamp group 81. The lamp group 81 has ... | 02/11/2003 |
| 6515261 | Enhanced lift pin An apparatus and method for thermally processing a substrate employs lift pin for supporting or contacting the substrate while conveying radiation from the substrate to a detector and/or processor through a hollow member. The lift pin comprises a contact ... | 02/04/2003 |
| 6512206 | Continuous process furnace The present invention provides a furnace which heat treats substrates. The furnace includes a heating section and working components. The heating section includes heating coils having spacers disposed within the heating coils where a mass of the heating c... | 01/28/2003 |
| 6501191 | Heat treatment apparatus and method A heat treatment apparatus for applying a predetermined heat treatment to a substrate includes: for example, a dielectric low oxygen controlled cure unit (DLC unit) for forming an interlayer insulating film on a semiconductor wafer W; a hot plate for supp... | 12/31/2002 |
| 6495802 | Temperature-controlled chuck and method for controlling the temperature of a substantially flat object The present invention generally relates to a method for controlling the temperature of a substantially flat object and to a temperature-controlled chuck comprising a chuck body (20) having an object support side (21) and a back side (22). Said object supp... | 12/17/2002 |
| 6495803 | Sleeve shrinking quick dip system A system and method for quickly heating a shrinkable casing around a relatively non-shrinkable object. The system may be referred to as a sleeve shrinking quick dip heat system. As one example, the present invention may be used to shrink a sleeve around a... | 12/17/2002 |
| 6496648 | Apparatus and method for rapid thermal processing An apparatus for rapid thermal processing is described and includes a cylindrical lamp array structure (13) surrounding a cylindrical process tube (16). The cylindrical process tube (16) has a lengthwise central axis (22). The cylindrical lamp array struc... | 12/17/2002 |
| 6495805 | Method of determining set temperature trajectory for heat treatment system This invention is a method of determining set temperature trajectories for a heat treatment system that conducts a first heat treatment process and a second heat treatment process to an object to be processed. The method comprises the steps of: conducting... | 12/17/2002 |
| 6492621 | Hot wall rapid thermal processor An apparatus for heat treatment of a wafer is disclosed. The apparatus includes a heating chamber having a heat source. A cooling chamber is positioned adjacent to the heating chamber and includes a cooling source. A wafer holder is configured to move bet... | 12/10/2002 |
| 6491757 | Wafer support system An apparatus for processing a substrate comprises a susceptor for supporting the substrate, an upper heat source spaced above the susceptor, a lower heat source spaced below the susceptor, and a controller. The controller provides power to the heat source... | 12/10/2002 |
| 6488407 | Radiation temperature measuring method and radiation temperature measuring system The present invention intends to improve the accuracy of temperature measurement when measuring the temperature of a semiconductor wafer by a radiation thermometer on the basis of the idea of virtual blackbody simulated by multiple reflection of light. A ... | 12/03/2002 |
| 6486444 | Load-lock with external staging area The present invention generally provides a vacuum system having a small-volume load-lock chamber for supporting a substrate set of only two rows of substrates, which provides for quick evacuation and venting of the load-lock chamber to provide a continuou... | 11/26/2002 |
| 6485297 | Thermal treatment furnace having gas leakage preventing function A thermal treatment furnace is described in which gas leakage does not occur during thermal treatment at a high temperature. A thermal treatment furnace having a reaction tube is provided with an opening at one end and a flange surrounding the opening and... | 11/26/2002 |
| 6483068 | Apparatus for hard baking photoresist pattern A hard baking apparatus which is capable of evenly heating a semiconductor substrate when a photoresist pattern of the semiconductor substrate is hard baked. The apparatus for hard baking a photoresist pattern including: a chamber; a chuck installed at a ... | 11/19/2002 |
| 6483081 | In-line cure furnace and method for using the same A system and method for thermal curing of substrates are provided. In one example, a pair of vertical furnace tubes are configured with a hot plate positioned between the lower regions of the furnace tubes and connected to each tube by a passageway. A coo... | 11/19/2002 |
| 6483083 | Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface A substrate to be processed on which a thin film is formed is supported by a support member. The substrate to be processed is heated by a heating section. The surface temperature is measured by a radiation thermometer, and the heating temperature of the h... | 11/19/2002 |
| 6483989 | Substrate processing apparatus and semiconductor device producing method A substrate processing apparatus is disclosed for heating a substrate by a heater through a susceptor in a state in which the substrate is placed on the susceptor, to process the substrate. The heater is divided into a plurality of respectively controlled... | 11/19/2002 |
| 6479801 | Temperature measuring method, temperature control method and processing apparatus A temperature measuring method measures the temperature of an object of measurement placed in a multiple reflection environment by using a radiation thermometer that uses an effective emissivity &3xb5;eff for measurement. The effective emissivi... | 11/12/2002 |
| 6476362 | Lamp array for thermal processing chamber A lamp array for a thermal processing chamber. The lamp array includes a plurality of lamps arranged in a generally circular array. The plurality of lamps can be arranged in one or more concentric rings to form a generally circular array. Additional lamp ... | 11/05/2002 |
| 6472639 | Heat treatment method and heat treatment apparatus Uniformity of temperature is established within a wafer, and a higher throughput is achieved while the wafer heating time is dramatically reduced by combining lamp heating with hot-wall heating. Lamps 10 are provided outside the furnace body 3 of a hot-wa... | 10/29/2002 |
| 6469284 | Lamp annealer and method for controlling processing temperature thereof A fluctuation of a transistor characteristic is calculated based on deviation of the value measured for each of specified steps, and total fluctuation of the transistor characteristic is calculated for the previous steps prior to an annealing step. The pr... | 10/22/2002 |
| 6465761 | Heat lamps for zone heating A reactor chamber is positioned between a top array of heat lamps and a bottom array of heat lamps. At least one of the heat lamps forming the top and bottom arrays features a segmented filament such that power output along the length of the heat lamp dif... | 10/15/2002 |
| 6462310 | Hot wall rapid thermal processor An apparatus for heat treatment of a wafer is disclosed. The apparatus includes a heating chamber having a heat source. A cooling chamber is positioned adjacent to the heating chamber and includes a cooling source. A wafer holder is. configured to move be... | 10/08/2002 |
| 6461155 | Method and apparatus for heating substrates in supercritical fluid reactor A heater for heating a substrate in a supercritical fluid reactor includes a heater body having a heater chamber initially open to the interior of the reactor. The heater chamber is sized to match the substrate and includes a seal around its perimeter tha... | 10/08/2002 |
