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| Number | Title | Issue Date |
| 8116618 | Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices A heating apparatus comprises a wall for surrounding and defining a heating space, a heating element mounted on the inner side of the wall, reflecting members for reflecting the heat emitted from the heating element. Also, a moving unit joined to one end of each of ... | 02/14/2012 |
| 8111978 | Rapid thermal processing chamber with shower head Apparatus and methods for thermally processing a substrate are provided. A chamber containing a levitating support assembly configured to position the substrate at different distances from a plate during the heating and cooling of a substrate. In one embodiment a pl... | 02/07/2012 |
| 8090245 | Apparatus for heat-treating substrate and method for heat-treating substrate An apparatus for heat treating a substrate includes a substrate holder unit including a substrate stage on which a substrate is to be placed and which is made of one of a carbon and a carbon covered material, and a heating unit which is provided above the substrate ... | 01/03/2012 |
| 8073316 | Oven for semiconductor wafer An oven is described that can more evenly heat the semiconductor wafer, even though the wafer may warp during heating. The oven may provide relatively uniform heating even though the type and location of warping may be unpredictable for any given wafer. The oven may... | 12/06/2011 |
| 8041196 | Heat radiating plate storage tray A heat radiating plate storage tray has a plate main body, and a plurality of first projection portions provided on a first surface of the plate main body. A heat radiating plate having a rectangular recessed portion on a surface thereof is capable of being mounted ... | 10/18/2011 |
| 8032015 | Heating apparatus, heating method, and semiconductor device manufacturing method A heating apparatus including a filament arranged in a vacuum heating vessel comprises a base plate arranged in the vacuum heating vessel to fix the filament at a predetermined position with respect to a conductive heater forming one surface of the vacuum heating ve... | 10/04/2011 |
| 8023806 | Heat processing furnace and vertical-type heat processing apparatus There is provided a heat processing furnace capable of quickly increasing and decreasing a temperature, while achieving improvement in durability. A heat processing furnace 2 comprises: a processing vessel 3 for accommodating an object to be processed ... | 09/20/2011 |
| 8005351 | Irradiance pulse heat-treating methods and apparatus A method of heat-treating a workpiece includes generating an initial heating portion and a subsequent sustaining portion of an irradiance pulse incident on a target surface area of the workpiece. A combined duration of the initial heating portion and the subsequent ... | 08/23/2011 |
| 7986871 | Processing multilayer semiconductors with multiple heat sources A method of adjusting the heat transfer properties within a processing chamber is presented. Chamber properties may be determined and adjusted by adjusting the thermal mass of an edge ring disposed in the processing chamber. ... | 07/26/2011 |
| 7978964 | Substrate processing chamber with dielectric barrier discharge lamp assembly A thermal processing chamber with a dielectric barrier discharge (DBD) lamp assembly and a method for using the same are provided. In one embodiment, a thermal processing chamber includes a chamber body and a dielectric barrier discharge lamp assembly. The dielectri... | 07/12/2011 |
| 7974525 | Heat processing furnace and vertical-type heat processing apparatus The present invention is a heat processing furnace comprising: a processing vessel for accommodating an object to be processed and performing thereto a heat process; and a cylindrical heater disposed to surround a circumference of the processing vessel, for heating ... | 07/05/2011 |
| 7965927 | Heat treatment apparatus and heat treatment method In a heat treatment apparatus, a holding part moves upwardly to receive a semiconductor wafer transported into a chamber and placed on support pins. The semiconductor wafer held in close proximity to a light-transmittable plate by the holding part is preheated by a ... | 06/21/2011 |
| 7962019 | System, method and apparatus for controlling drift of a main magnetic field in an MRI system An apparatus for controlling the temperature of a warm bore of a superconducting magnet in a magnetic resonance imaging (MRI) includes a plurality of warm bore thermal sensors positioned on a surface of the warm bore and a plurality of heater elements positioned on ... | 06/14/2011 |
| 7949237 | Heating configuration for use in thermal processing chambers An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the... | 05/24/2011 |
| 7941039 | Pedestal heat transfer and temperature control Provided herein are assemblies that, when coupled to an object, are capable of keeping the object at a uniform elevated temperature while removing large amounts of heat from an external source. Applications include various integrated circuit fabrication processes th... | 05/10/2011 |
| 7873265 | Filament lamp and light irradiation type heat treatment apparatus A filament lamp comprising a bulb which has a hermetically sealed portion on at least one end and multiple filament assemblies, each filament assembly comprising a coiled filament and connected leads to supply power to that filament, the filament assemblies being se... | 01/18/2011 |
| 7865070 | Heat treating apparatus To prevent both slips caused by damage from projections, and slips caused by adhesive force occurring due to excessive smoothing. The heat treating apparatus includes a processing chamber for heat treating wafers and a boat for supporting the wafers in the pr... | 01/04/2011 |
| 7860379 | Temperature measurement and control of wafer support in thermal processing chamber The present invention provides apparatus and methods for achieving uniform heating to a substrate during a rapid thermal process. More particularly, the present invention provides apparatus and methods for controlling the temperature of an edge ring supporting a sub... | 12/28/2010 |
| 7853128 | Method for toasting a food product with infrared radiant heat A toaster uses radiant heat at infrared wavelengths optimized for producing rapid and uniform toasting of a food product. The infrared wavelengths of the radiated heat are selected for optimum speed and quality (browning and moisture content) of the food product. Th... | 12/14/2010 |
| 7844171 | Rapid thermal processing apparatus and method of manufacture of semiconductor device A rapid thermal processing apparatus comprises a processing chamber which subjects a semiconductor substrate to rapid thermal processing. A substrate support part is arranged in the processing chamber and supports the substrate. A lamp part optically irradiates the ... | 11/30/2010 |
| 7831135 | Method and system for controlling bake plate temperature in a semiconductor processing chamber A method of operating a bake plate disposed in a semiconductor processing chamber having a face plate opposing the bake plate includes providing a temperature control signal to the bake plate and measuring a face plate temperature associated with the face plate. The... | 11/09/2010 |
| 7805064 | Rapid thermal firing IR conveyor furnace having high intensity heating section Isolation IR heat lamp module and method of firing multi-zone IR furnaces for solar cell processing comprising lamps disposed in individual parallel channels in a reflector/insulator body to provide a cooling air channel surrounding each tube; the channels are cover... | 09/28/2010 |
| 7769279 | Heat treatment apparatus A processing gas is prevented from entering into a space below a placement table. A supporting surface 62 for supporting the lower face of a placement table 58 is provided at an inner circumferential portion of the upper end of a support 56. A c... | 08/03/2010 |
| 7764871 | Infrared heat irradiating device An infrared irradiating device (1) comprising: a lamp-holder of a material adapted to withstand the thermal and mechanical stresses to which it is exposed in the conditions of use and adapted to house an irradiating system, ... | 07/27/2010 |
| 7725012 | Movable radiant heat sources A semiconductor processing apparatus including a processing chamber and a plurality of radiant heat sources. The radiant heat sources heat a workpiece within the chamber. At least one of the radiant heat sources is movable during processing in an oscillatory motion ... | 05/25/2010 |
| 7643736 | Apparatus and method for manufacturing semiconductor devices An apparatus for manufacturing a semiconductor device includes a treatment chamber in which a working substrate is disposed; a plurality of lamps provided above the treatment chamber; and a reflector provided behind the lamps relative to a direction towards the work... | 01/05/2010 |
| 7639930 | Filament lamp and light-irradiation-type heat treatment device A filament lamp that allows independent control of the state of luminescence of multiple filaments and that reliably prevents the occurrence of unwanted discharge between adjacent portions of neighboring filaments, even when a high voltage is injected into the filam... | 12/29/2009 |
| 7616872 | Temperature measurement and heat-treating methods and systems Temperature measurement and heat-treating methods and systems. One method includes identifying a temperature of a first surface of a workpiece, and controlling energy of an irradiance flash incident on the first surface of the workpiece, in response to the temperatu... | 11/10/2009 |
| 7570876 | Method and system for loading substrate supports into a substrate holder Wafer supports are provided that have a diameter smaller than the diameter of the wafer that they are to support in a wafer boat. The perimeter of the wafer support is preferably continuous, extending completely around in a 360° span, and is sized to fit between th... | 08/04/2009 |
| 7522822 | Halogen lamp assembly with integrated heat sink A halogen lamp assembly 20 for a substrate processing chamber 100 has a halogen lamp 22 and a ceramic heat sink monolith 24. The halogen lamp 22 includes a filament 28 and a pair of electrical connectors 30 encapsulat... | 04/21/2009 |
| 7509035 | Lamp array for thermal processing exhibiting improved radial uniformity A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them. The radiance pattern includes a variation in diffuseness or collimat... | 03/24/2009 |
| 7489858 | Heater assembly A heater is disclosed. The comprises a housing; a reflector; and a pair of opposite connectors supported by the reflector and configured to support opposite ends of a heating element. The reflector is movable between a plurality of positions relative to the housing.... | 02/10/2009 |
| 7466907 | Annealing process and device of semiconductor wafer A device for use in a thermal annealing process for a wafer (T) of material chosen among the semiconductor materials for the purpose of detaching a layer from the wafer at an weakened zone. During annealing, the device applies (1) a basic thermal budget to the wafer... | 12/16/2008 |
| 7432475 | Vertical heat treatment device and method controlling the same A vertical heat processing apparatus includes a process chamber (5) defining a process field (A1) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating fu... | 10/07/2008 |
| 7429717 | Multizone heater for furnace The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor processing chamber. The furnace comprises a heater surrounding side walls ... | 09/30/2008 |
| 7429718 | Heating and cooling of substrate support A substrate support assembly and method for controlling the temperature of a substrate within a process chamber are provided. A substrate support assembly includes an thermally conductive body comprising a stainless steel material, a substrate support surface on the... | 09/30/2008 |
| 7414224 | Backside rapid thermal processing of patterned wafers Apparatus and methods of thermally treating a wafer or other substrate, such as rapid thermal processing (RTP) apparatus and methods are disclosed. An array of radiant lamps directs radiation to the back side of a wafer to heat the wafer. In one or more embodiments,... | 08/19/2008 |
| 7409850 | Systems and methods for maximizing heat transfer efficiency to and minimizing thermal gradients in an analytic column An improved gas chromatograph system includes a radiant source, an insert located to receive an output of the radiant source, and an analytic column wound on a concave surface of the insert so that successive coils of the wound analytic column are in direct contact ... | 08/12/2008 |
| 7402782 | Baking device and baking method of baking a chemically amplified resist film containing an acid (H) generator before exposure but after development A heat treatment device for baking a chemically amplified resist film formed on a substrate after exposure but before development includes a table that supports the substrate, a heater that heats the substrate, a magnetic field generating unit that generates a magne... | 07/22/2008 |
| 7393797 | Method for thermal processing a semiconductor wafer A method for thermal processing a semiconductor wafer is disclosed. A rapid thermal processing (RTP) chamber encompasses a heating means, a rotation means, and a cooling system for cooling walls of said RTP chamber. A semiconductor wafer is loaded into the RTP chamb... | 07/01/2008 |
