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| Number | Title | Issue Date |
| 5485495 | X-ray mask, and exposure apparatus and device production using the mask A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the a... | 01/16/1996 |
| 5482802 | Material removal with focused particle beams The present invention provides a process for locally removing at least a portion of a material layer structure in which first and second materials are provided, the second material having a higher etch rate by an activated reaction gas than the first mate... | 01/09/1996 |
| 5468337 | Method of mending a defect in a phase shift pattern A method to mend a black defect and a white defect of a phase shift mask pattern so that the mended phase shift mask pattern has an accurately defined pattern. In the vicinity of a black defect and the area around the same, a mending phase shifter is form... | 11/21/1995 |
| 5469489 | Production method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structure The present invention provides a simple and easy processing method for producing an X-ray mask structure having an X-ray absorber whose side walls have waviness. More specifically, in accordance with the present invention, the method for producing an X-ra... | 11/21/1995 |
| 5464711 | Process for fabricating an X-ray absorbing mask A process for the fabrication of an X-ray absorbing mask includes providing a silicon substrate (10) having a front surface (16) and a back surface (18). A membrane layer (12) is formed on the front surface (16). In one embodiment of the invention, an etc... | 11/07/1995 |
| 5459001 | Low stress electrodeposition of gold for x-ray mask fabrication An electrodeposition process for producing gold masks for X-ray lithography of integrated circuits is disclosed. The process produces a gold layer of tightly controlled grain size and arsenic content which results in minimum stress in the gold film and th... | 10/17/1995 |
| 5457006 | Method of manufacturing photo-mask and photo-mask manufactured thereby A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching... | 10/10/1995 |
| 5455850 | X-ray lithography using holographic images A non-contact X-ray projection lithography method for producing a desired X-ray image on a selected surface of an X-ray-sensitive material, such as photoresist material on a wafer, the desired X-ray image having image minimum linewidths as small as 0.063 ... | 10/03/1995 |
| 5444753 | X-ray lithography mask, light exposure apparatus and process therefore Disclosed are an X-ray lithography mask, an exposure apparatus and an exposure process such as an X-ray lithography exposure apparatus and an X-ray lithography exposure process. An X-ray lithography mask includes an X-ray transmission membrane, a transfer... | 08/22/1995 |
| 5439781 | Device fabrication entailing synchrotron radiation Devices built to design rules ࣘ0.25 μm are pattern delineated by use of synchrotron-emitted x-ray radiation using a condenser which collects over a collection arc of at least 100 mrad. Condenser designs provide for processing of collected radiation to ... | 08/08/1995 |
| 5436096 | Method of manufacturing X-ray exposure mask The present invention can precisely manufacture an X-ray mask pattern at intervals of less than 10 nm by using a thin film crystalline growth method, applying a laminated layer body of a fine structure having a precision of less than 1 atomic layer onto a... | 07/25/1995 |
| 5422921 | X-ray mask structure and manufacturing methods including forming a metal oxide film on a portion of an X-ray permeable film having no X-ray absorber thereon An X-ray mask structure includes an X-ray absorber having a masking pattern, an X-ray permeable film for supporting the X-ray absorber on a surface of the X-ray permeable film, and a supporting frame for supporting the X-ray permeable film. The X-ray mask... | 06/06/1995 |
| 5414746 | X-ray exposure mask and fabrication method thereof An X-ray exposure mask comprises an X-ray transmission layer and an X-ray absorption layer formed on the X-ray transmission layer and being patterned. The X-ray absorption layer has a first region having a first thickness and a second region having a seco... | 05/09/1995 |
| 5409790 | Process for fabricating masks for use in X-ray lithography A process for fabricating a mask for use in X-ray lithography which comprises dry etching, with high selectivity, an X-ray absorbing metal layer on an X-ray transmitting film. The process comprises etching a tungsten film (an X-ray absorbing metal layer) ... | 04/25/1995 |
| 5390228 | Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measure... | 02/14/1995 |
| 5375157 | X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structure The present invention provides an X-ray mask structure a production method thereof, and an exposure method therefor, whereby patterns can be formed faithfully to designed device line widths regardless of the thickness distribution of an X-ray transmissive... | 12/20/1994 |
| 5372916 | X-ray exposure method with an X-ray mask comprising phase shifter sidewalls In an X-ray exposure method, consideration was made to application of a concept of a phase shift method which is used for a light exposure method, in order to improve the resolution. As a result, phase shift layers made of a material having an appropriate... | 12/13/1994 |
| 5364717 | Method of manufacturing X-ray exposure mask The present invention relates to a method of manufacturing an exposure mask having an unprecedented supermicrostructure for an X-ray exposure method favorable for conventional supermicro exposure using lithography techniques. The method of manufacturing a... | 11/15/1994 |
| 5362575 | Lithographic mask, comprising a membrane having improved strength A membrane is supported at its edge by an annular, tapered skirt structure. The skirt strengthens the attachment of the membrane to the support ring and reinforces the edge region where the membrane would otherwise tend to fail. Stress concentrations are ... | 11/08/1994 |
| 5358808 | Exposure mask, method of manufacturing the same, and exposure method using the same An exposure mask for lithography, a method of manufacturing the same, and an exposure method using the same are disclosed. A light-transmitting opening of the exposure mask has a main light-transmitting region located in the middle of the opening and havi... | 10/25/1994 |
| 5356686 | X-ray mask structure An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is for... | 10/18/1994 |
| 5353323 | X-ray exposure apparatus Disclosed is an X-ray exposure apparatus comprising a chamber, filled with X-ray low attenuation gas for guiding X-rays, generated from an X-ray source, to an X-ray window, a gas supplying portion, provided to supply X-ray low attenuation gas into the cha... | 10/04/1994 |
| 5335256 | Semiconductor substrate including a single or multi-layer film having different densities in the thickness direction An X-ray mask support has an X-ray permeable film and a support frame supporting the film and the X-ray permeable film mainly includes a single-layer film having different densities in its thickness direction or a multi-layer laminate film of layers havin... | 08/02/1994 |
| 5334466 | X-ray mask and process comprising convex-concave alignment mark with alignment reflection film An X-ray transmission film 2 of a SiN film is formed on the surface of a mask base 1. Formed on the surface of the X-ray transmission film 2 are an LSI pattern 3, and an alignment mark 4 composed of a convex portion 4a and a concave portion 4b. On the sur... | 08/02/1994 |
| 5333167 | Mask structure for x-ray exposure and x-ray exposure device and method using it A mask structure for X-ray exposure comprises a retaining frame, a supporting frame, a mask support and an absorber pattern. The mask structure possesses a function for detecting a state change of the mask structure from its steady state.... | 07/26/1994 |
| 5328784 | Reflection mask, method of producing mask and method of forming pattern using the mask By using a reflection mask for reflective reduction projection exposure which uses vacuum ultraviolet rays or soft X-rays of wavelength λ, there is enhancement of the resolution of the projection exposure by making the height of adjacent or neighboring r... | 07/12/1994 |
| 5326649 | X-ray transmitting membrane for mask in x-ray lithography and method for preparing the same Disclosed is an X-ray transmitting frame-supported membrane of silicon nitride suitable as a mask blank of an X-ray lithographic mask having outstandingly high resistance against irradiation with high-energy radiations and high transmission of light of a ... | 07/05/1994 |
| 5327475 | Soft x-ray submicron lithography using multiply charged ions Apparatus and methods for submicron lithography of semiconductor materials, circuits and other objects. A source of multiply charged ions is applied to a thin layer of electrically conductive material. The recombination of ions and free electrons in the l... | 07/05/1994 |
| 5325414 | X-ray mask alignment method and apparatus therefor as well as X-ray mask to be used to said method and said apparatus X-ray alignment method and apparatus therefor characterized by separately irradiating alignment light to alignment patterns of an X-ray mask and detecting reflected light therefrom, and directly irradiating alignment light to alignment patterns of a wafer... | 06/28/1994 |
| 5323440 | X-ray lithography apparatus including a dose detectable mask An X-ray exposure apparatus using radiation light as exposure light, wherein the apparatus includes: a display device; a detecting device for detecting in each exposure the amount of exposure absorbed by a mask during the exposure; a memory for memorizing... | 06/21/1994 |
| 5318869 | Method and apparatus for repairing defects in emulsion masks and the like Defective portions, such as black dot defects, in an emulsion layer of an emulsion mask such as a photomask are repaired or removed by irradiating an ultraviolet laser beam from a laser oscillator, preferably an excimer laser. The laser beam is passed thr... | 06/07/1994 |
| 5314768 | Thin film mask for use in an x-ray lithographic process and its method of manufacture by forming opaque pattern of ions in a diamond layer A thin film mask for use in an X-ray lithographic process is disclosed herein along with a method of making the mask which is comprised of a diamond thin film layer supported on one surface of an X-ray transparent non-diamond substrate, for example silico... | 05/24/1994 |
| 5308991 | Method and apparatus for making a predistorted reticle to compensate for lens distortions A method and apparatus for making predistorted masks or reticles which compensate for lens field errors for use in the fabrication of integrated circuit devices. The lens error is first expressed as distortion data. The data is used to produce correction ... | 05/03/1994 |
| 5307394 | Device for producing X-ray images on objects composed of photo or X-ray sensitive materials A device for forming an X-ray image in objects composed of a photo or an X-ray sensitive material has a plurality of layers each having X-ray non-transmitting areas and X-ray transmitting areas, each of the areas of each of the layers having transverse si... | 04/26/1994 |
| 5304437 | Mask for x-ray pattern delineation Fabrication of reflective masks, designed for use with x-ray delineating radiation in the construction of sub-micron devices, is expedited by use of a barrier layer intermediate the multilayer reflector and the absorber layer. The barrier is designed to r... | 04/19/1994 |
| 5298351 | Ablation mask and use thereof An ablation mask that includes a transparent substrate having a patterned layer located between two dielectric transparent material coatings thereon is provided. Also, the ablation mask is useful in dry etching processes to provide patterned layers, and o... | 03/29/1994 |
| 5291536 | X-ray mask, method for fabricating the same, and pattern formation method A method for forming an X-ray exposure mask having an X-ray permeable film with a high visible-light transmissivity. The method includes the steps of forming an aluminum oxide anti-reflective film on an x-ray permeable film, placing an x-ray absorber on t... | 03/01/1994 |
| 5272744 | Reflection mask In a reflection mask, there is formed at least one laminate structure comprising a high reflectivity portion, a middle portion and a high reflectivity portion. When there is a defect in the high reflectivity portion as the top layer, this high reflectivit... | 12/21/1993 |
| 5270125 | Boron nutride membrane in wafer structure A laminated structure includes a wafer member with a membrane attached thereto, the membrane being formed of substantially hydrogen-free boron nitride having a nominal composition B3 N. The structure may be a component in a mechanical device fo... | 12/14/1993 |
| 5267292 | X-ray exposure apparatus An X-ray exposure apparatus for exposing a semiconductor wafer to a mask with X-rays, to print a pattern of the mask onto the wafer, is disclosed. The ambience within a stage accommodating chamber, accommodating a mask, a semiconductor wafer, and the like... | 11/30/1993 |
