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| Number | Title | Issue Date |
| 4530064 | Exposure method utilizing an energy beam According to the present invention, a simplified process is provided for drawing a picture pattern and an alignment pattern on a substrate at a scaling factor by utilizing an energy beam exposure device. According to the invention, a scale convers... | 07/16/1985 |
| 4522842 | Boron nitride X-ray masks with controlled stress It has been found that stress in X-ray transparent films used to form masks for X-ray lithography also cause distortions of the film and of the high-resolution X-ray-absorptive pattern formed thereon. A method is disclosed which anneals boron nitride film... | 06/11/1985 |
| 4515876 | X-Ray lithography mask and method for fabricating the same An X-ray absorber layer in the form of single layer of high melting point metal such as Ta, W is formed with granular crystal grains on a mask substrate, so that an internal stress of the layer is reduced. A fine pattern is formed from the absorber layer ... | 05/07/1985 |
| 4516254 | X-Ray lithographic apparatus The present invention consists in an X-ray lithographic apparatus having an X-ray generator which generates X-rays, and a gastight chamber which is gastightly coupled to the X-ray generator and which holds a mask to be exposed to the X-rays, on its surfac... | 05/07/1985 |
| 4516253 | Lithography system A lithography system for X-ray or other beam printing on a substrate such as a silicon semiconductor wafer comprises a beam chamber (301), a beam source (302), means (309) for mounting a mask, means (308) for mounting an image sensing means (342) interior... | 05/07/1985 |
| 4468799 | Radiation lithography mask and method of manufacturing same The manufacture of semiconductor systems by means of radiation lithography requires low-stress masks when it is important to achieve very fine structures. In accordance with the invention, such a mask comprises a carrier of boron-doped silicon, a radiatio... | 08/28/1984 |
| 4454209 | High resolution soft x-ray or ion beam lithographic mask A lithographic process utilizing soft x-rays or ions to achieve high resolution is disclosed. The process is particularly useful and semiconductor processing where high resolution is required to achieve a high density. The process utilizes a mask to selec... | 06/12/1984 |
| 4451544 | Mask structure for X-ray lithography and method for manufacturing the same The invention provides a mask structure for X-ray lithography, having a mask substrate of an X-ray transmitting material, a mask pattern of an X-ray absorbing material which is formed on the surface of the mask substrate or therein, a support ring for sup... | 05/29/1984 |
| 4436797 | X-Ray mask An improved X-ray lithography mask has been fabricated by forming an X-ray absorbing lithography pattern on a supporting foil of hydrogenated amorphous carbon. The substrate foil is formed by depositing a carbon film in the presence of hydrogen onto a sur... | 03/13/1984 |
| 4425423 | Auger microlithography with regard to Auger window An Auger microlithography process wherein a beam of substantially monochromatic X-rays is passed through a photomask to induce Auger electrons from a selected atomic element within a photosensitive layer which Auger electrons act on a material in that lay... | 01/10/1984 |
| 4411013 | System for transferring a fine pattern onto a target An X-ray system for transferring a fine pattern onto a target has a mask, on the surface of which is formed an X-ray absorbing layer in a predetermined pattern and which is made of a single crystal of high regularity. Parallel monochromic X-rays become in... | 10/18/1983 |
| 4403336 | X-Ray exposure apparatus An X-ray exposure apparatus making use of a soft X-ray. An atmospheric chamber charged with a gas having a high permeability to X-ray is disposed between the X-ray source and the mask having the pattern to be replicated, such that the mask is supported by... | 09/06/1983 |
| 4401738 | X-Ray lithography mask An X-ray mask including a pattern of X-ray absorbing material on a thin membrane is provided. The mask includes overlapping first and second patterns of X-ray absorbing material. This permits X-ray lithography printing of lines in complex patterns require... | 08/30/1983 |
| 4393127 | Structure with a silicon body having through openings A structure for shaping or masking energetic radiation is described. The structure comprises a shallow silicon body having at least one through opening, and a metal silicide layer covering the surface of the structure. The structure characterized by havin... | 07/12/1983 |
| 4384919 | Method of making x-ray masks An x-ray mask is made by forming a thin polyimide membrane on a silicon wafer substrate which is then back-etched to form a mask supporting ring of the substrate.... | 05/24/1983 |
| 4360586 | Spatial period division exposing Soft carbon-K X-rays (38) expose a PMMA photoresist (31) on an oxide layer (32) of a silicon substrate (33) through a parent mask (30) separated a distance S from the resist by a spacer (34) with the parent mask slits (12, 17) defining a spatial period p ... | 11/23/1982 |
| 4349621 | Process for X-ray microlithography using thin film eutectic masks A process for X-ray microlithography useful in the manufacture of microelectronic devices is provided. In the process, a mask in the form of a thin film of a eutectic is interposed between a source of X-rays and a substrate to selectively expose a layer o... | 09/14/1982 |
| 4329410 | Production of X-ray lithograph masks A method of depositing X-ray absorber patterns on a mask membrane to achieve minimum pattern feature dimensions less than 1 μm. The membrane is covered with an ultraviolet (VU) sensitive photoresist which carries a thin metallic film. The metallic film i... | 05/11/1982 |
| 4301237 | Method for exposing substrates to X-rays An X-ray transparent mask (51) is comprised of a support ring (42) with a planar substrate stabilizer (41) thereon, the stabilizer having a plurality of apertures (43) therethrough, arranged in a "checkerboard" fashion. A thin X-ray transparent mask subst... | 11/17/1981 |
| 4293624 | Method for making a mask useful in X-ray lithography In order to make a mask for use in lithography a layer of reflective material is first deposited on a substrate which is transparent to the radiation with which the mask is to be used; a layer of photoresist then deposited; the photoresist exposed with th... | 10/06/1981 |
| 4268563 | Radiation mask for producing structural configurations in photo-sensitive resists by X-ray exposure A radiation mask having a masking structure and a carrier therefore, for the production of structural configurations in photosensitive resists by x-ray radiation, with the carrier having registration marks thereon, in which the carrier comprises a layer o... | 05/19/1981 |
| 4260670 | X-ray mask An X-ray transparent mask (51) is comprised of a support ring (42) with a planar substrate stabilizer (41) thereon, the stabilizer having a plurality of apertures (43) therethrough, arranged in a "checkerboard" fashion. A thin X-ray transparent mask subst... | 04/07/1981 |
| 4254174 | Supported membrane composite structure and its method of manufacture A process for fabricating polyimide membrane x-ray lithography masks is described. Thin membrane of polyimide is formed by spinning polyamic acid on a glass substrate and polymerizing in situ. The glass substrate acts as a holder and efficient heat sink d... | 03/03/1981 |
| 4253029 | Mask structure for x-ray lithography A mask substrate for use in an x-ray lithographic system comprises a boron nitride member (32, FIG. 2) coated with a polyimide layer (20) whose thickness is approximately the same as that of the boron nitride member. The substrate is mechanically strong a... | 02/24/1981 |
| 4218503 | X-ray lithographic mask using rare earth and transition element compounds and method of fabrication thereof There is described a unique mask and method of making same. The mask is especially useful in high resolution fabrication techniques such as in making magnetic bubble domain structures, semiconductor device structures and the like. The mask includes a suit... | 08/19/1980 |
| 4198263 | Mask for soft X-rays and method of manufacture A mask for soft X-rays comprising a silicon film which permits the penetration of soft X-rays, a soft X-ray mask pattern deposited on one surface of the silicon film, and a supporting member composed of silicon layers and disposed marginally on the other ... | 04/15/1980 |
| 4171489 | Radiation mask structure The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing su... | 10/16/1979 |
| 4170512 | Method of manufacture of a soft-X-ray mask A process for fabricating polyimide membrane x-ray lithography masks is described. Thin membrane of polyimide is formed by spinning polyamic acid on a glass substrate and polymerizing in situ. The glass substrate acts as a holder and efficient heat sink d... | 10/09/1979 |
| 4152601 | X-ray lithography mask and method for manufacturing the same An x-ray lithography mask including a thick silicon peripheral rib with a window formed therein and a multi-layered membrane transparent to x-rays and visible light supported by the rib and covering the window. The membrane consists essentially of at leas... | 05/01/1979 |
| 4088896 | Actinic radiation emissive pattern defining masks for fine line lithography and lithography utilizing such masks An actinic radiation emissive mask for a high resolution lithography emits actinic radiation which originates within the mask. The mask patterns the actinic radiation to expose resist in accordance with a desired pattern. The actinic radiation originating... | 05/09/1978 |
| 4061829 | Negative resist for X-ray and electron beam lithography and method of using same A class of chlorinated or brominated polymeric negative resists for high resolution X-ray or electron lithographic processes is described. Chlorine and bromine atoms have a generally high mass absorption coefficient for X-rays and can be incorporated into... | 12/06/1977 |
| 4037111 | Mask structures for X-ray lithography It has been observed that the deposition and patterning of metallic layers on a supported X-ray-transparent film to form a mask for X-ray lithography introduce stresses in the mask structure. In turn these stresses cause distortions of the film and of the... | 07/19/1977 |
| 4035522 | X-ray lithography mask An X-ray mask for variable resist exposure for use with X-ray lithography so that multi-level devices, using a single exposure of X-rays, can be made.... | 07/12/1977 |
| 4022927 | Methods for forming thick self-supporting masks A method of constructing a relatively thick, self-supporting mask suitable for electron beam projection processes. Thickness is achieved by multiple steps of coating with resist, exposure and development. Either positive or negative resist may be used for... | 05/10/1977 |
| 4018938 | Fabrication of high aspect ratio masks A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially... | 04/19/1977 |
| 3953303 | Process for the manufacture of mesh screen for X-ray photography sensitization A process for the manufacture of mesh screen for the sensitization of X-ray photography which comprises forming a heavy metal layer and a sensitive polymer layer on a support, to form a support having layers thereon, exposing said support through a negati... | 04/27/1976 |
