Bizarre Patents
Mouthguard made at least partially from an edible candy
A mouthguard includes a U-shaped upper bite plate which removably fits over upper teeth of a person, with the entire upper bite plate being made from a soft, deformable and edible gummi candy.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7609805 | Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process. The method for manufacturing the microstructure using the LIGA process contemplate... | 10/27/2009 |
| 7440078 | Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference ... | 10/21/2008 |
| 7433015 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection ... | 10/07/2008 |
| 7430731 | Method for electrochemically fabricating three-dimensional structures including pseudo-rasterization of data Some embodiments of the invention are directed to techniques for electrochemically fabricating multi-layer three-dimensional structures where selective patterning of at least one or more layers occurs via a mask which is formed using data representing cross-sections... | 09/30/2008 |
| 7428037 | Optical component that includes a material having a thermal longitudinal expansion with a zero crossing There is provided an optical component. The optical component includes a material having a surface that heats to a maximum temperature (Tmax) when subjected to radiation. The material has a temperature-dependent coefficient of thermal expansion (α(T)) of... | 09/23/2008 |
| 7423721 | Lithographic apparatus A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing... | 09/09/2008 |
| 7420650 | Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium In the present invention, in the photolithography process in which a certain processing condition has been already set, a resist film on a substrate is exposed to light using a mask, which reduces only zero-order light of a light source at a predetermined light redu... | 09/02/2008 |
| 7418694 | Method for generating test patterns utilized in manufacturing semiconductor device A method for generating test patterns utilized in manufacturing a semiconductor device includes creating mini-data concerning a partial area pattern used in designing the semiconductor device, subjecting the mini-data to data processing in accordance with a conditio... | 08/26/2008 |
| 7417707 | Introduction of an intermediary refractive layer for immersion lithography An intermediary layer is introduced between a lens and a wafer for an immersion lithography process. A non-supercritical gas is provided and condensed to form a layer of liquid between the lens and the wafer. The substrate may be irradiated through the lens and inte... | 08/26/2008 |
| 7413831 | Reflective exposure mask, and method for producing and using the same When producing an exposure mask including a stack of reflective layers for reflecting extreme ultraviolet light, an absorber film for covering a light reflection plane of the stack of reflective layers with a predetermined pattern, and a buffer film interposed there... | 08/19/2008 |
| 7414700 | Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2... | 08/19/2008 |
| 7405809 | Illumination system particularly for microlithography An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an ima... | 07/29/2008 |
| 7403262 | Projection optical system and exposure apparatus having the same A projection optical system used for an exposure apparatus to projecting a reduced size of an image of an object onto an image plane includes plural refractive elements that dispense with a reflective element having a substantial optical power, wherein the projectio... | 07/22/2008 |
| 7404167 | Method for improving design window A method of forming photo masks having rectangular patterns and a method for forming a semiconductor structure using the photo masks is provided. The method for forming the photo masks includes determining a minimum spacing and identifying vertical conductive featur... | 07/22/2008 |
| 7401319 | Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design A hierarchical representation encapsulates the detailed internal composition of a sub-circuit using the notion of a cell definition (a CellDef). The CellDef serves as a natural unit for operational reuse. If the computation required for the analysis or manipulation ... | 07/15/2008 |
| 7379154 | Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under th... | 05/27/2008 |
| 7368744 | Photon sieve for optical systems in micro-lithography The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color correction system in the projection system; or as a transmitting diffrac... | 05/06/2008 |
| 7352438 | Lithographic apparatus and device manufacturing method The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps... | 04/01/2008 |
| 7339653 | System for a pellicle frame with heightened bonding surfaces A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines... | 03/04/2008 |
| 7322100 | Method for producing a micromachined layered device Methods for producing micromachined layered devices having a membrane layer and a first and second layer on both sides of the membrane layer are disclosed. The method includes applying a membrane layer to a substrate, opening a window in the substrate so as to enabl... | 01/29/2008 |
| 7315999 | Method and apparatus for identifying assist feature placement problems One embodiment of the present invention provides a system that identifies an area in a mask layout which is likely to cause manufacturing problems due to a missing or an improperly placed assist feature. During operation, the system receives an uncorrected or correc... | 01/01/2008 |
| 7315032 | Lithographic apparatus and a device manufacturing method A lithographic apparatus including an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning configured to impart the projection beam with a pattern in its cross-section; a substrate table c... | 01/01/2008 |
| 7311850 | Method of forming patterned thin film and method of fabricating micro device In a method of forming a patterned thin film, first, an etching stopper film and a film to be patterned are formed in this order on a base layer. Next, a patterned first film is formed on the film to be patterned. Next, a second film is formed over an entire surface... | 12/25/2007 |
| 7312459 | Apparatus for evaluating EUV light source, and evaluation method using the same Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent poin... | 12/25/2007 |
| 7309871 | Collector for EUV light source An apparatus/method may comprise, a multi-layer reflecting coating forming an EUV reflective surface which may comprise an inter-diffusion barrier layer which may comprise a carbide selected from the group ZrC and NbC or a boride selected from the group ZrB2 | 12/18/2007 |
| 7304720 | System for using a two part cover for protecting a reticle A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle... | 12/04/2007 |
| 7291849 | Calibration standard for transmission electron microscopy A calibration standard includes a silicon substrate having a plurality of defined regions and a plurality of calibration marks placed on respective defined regions of the silicon substrate. Each calibration mark comprises a different calibration dimension indicator ... | 11/06/2007 |
| 7290242 | Pattern generation on a semiconductor surface A method of forming a pattern of elements is shown. In one embodiment, the method is used to create a reticle. In another embodiment, the method is used to further form a number of elements on a surface of a semiconductor wafer. A pattern on a reticle is first gener... | 10/30/2007 |
| 7287240 | Designing method and device for phase shift mask A planar pattern (11), having a plurality of apertures of the same size (Wx×Wy), is determined by a two-dimensional layout determination tool (10), and a three-dimensional structure, having a depth d and an undercut amount Uc for making the phase of t... | 10/23/2007 |
| 7279252 | Substrate for the micro-lithography and process of manufacturing thereof The invention relates to the manufacture of a substrate which is particularly suitable for EUV micro-lithography and comprises a base layer of low coefficient of thermal expansion (CTE) onto which at least one cover layer made of a semiconductor material is applied.... | 10/09/2007 |
| 7262075 | High-aspect-ratio metal-polymer composite structures for nano interconnects A low-temperature process that combines high-aspect-ratio polymer structures with electroless copper plating to create laterally compliant MEMS structures. These structures can be used as IC-package interconnects that can lead to reliable, low-cost and high-performa... | 08/28/2007 |
| 7261980 | X-ray mask blank and x-ray mask An x-ray mask blank and an x-ray mask wherein, assuming that Ramax and Ramin are defined as a maximum value of Ra and a minimum value of Ra of a surface roughness (Ra: center-line average roughness) on a plurality of points within a predetermin... | 08/28/2007 |
| 7256407 | Lithographic projection apparatus and reflector assembly for use therein A lithographic projection apparatus includes reflector assembly, a foil trap, and a housing that is constructed and arranged to contain the reflector assembly and the foil trap. The reflector assembly is connected to the housing via a first wall, and the foil trap i... | 08/14/2007 |
| 7251013 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus in which, for example, immersion liquid is supplied to a localized space, a plate is provided to divide the space into two parts. Such a division of the space may facilitate reduction of stray radiation, a temperature gradient, ... | 07/31/2007 |
| 7245349 | Exposure apparatus An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stag... | 07/17/2007 |
| 7235801 | Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby A grazing incidence mirror includes a mirror substrate and a mirror surface layer, the mirror surface layer including a first layer and a second layer, the first layer being positioned between the mirror substrate and the second layer. The first layer includes a mat... | 06/26/2007 |
| 7236916 | Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask A structure and method are provided for correcting the optical proximity effects on a tri-tone attenuated phase-shifting mask. An attenuated rim, formed by an opaque region and an attenuated phase-shifting region, can be kept at a predetermined width across the mask... | 06/26/2007 |
| 7230675 | Lithographic apparatus, device manufacturing method and device manufactured therewith The invention relates to a lithographic apparatus, a device manufacturing method and a device thus manufactured. The lithographic apparatus is of the scanning type, in which a target portion of a substrate is scanned through a patterned radiation beam. Inhomogeneiti... | 06/12/2007 |
| 7227615 | Exposure apparatus and method An exposure method includes the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the ... | 06/05/2007 |
| 7224439 | Method and imaging apparatus for imaging a structure onto a semiconductor wafer by means of immersion lithography The hydrodynamic effects—which occur during immersion lithography as a result of the movement of the semiconductor wafer—in a liquid preferably provided between the last lens surface of the projection system and the semiconductor wafer can be avoided by means of... | 05/29/2007 |
