Did You Know...
...that Kleenex tissue was originally designed to be a gas mask filter? It was developed at the beginning of World War I to replace cotton, which was then in short supply as a surgical dressing.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7064804 | Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method An exposure apparatus having an illumination optical unit for emitting exposure light, a stage for supporting a substrate, and a main controller for controlling exposure operation of transferring a pattern formed on a master to the substrate. The apparatus includes ... | 06/20/2006 |
| 7063267 | Portable electronic device A portable electronic device includes a card base having a holding recess and an IC module having a substrate, an LSI mounted on the substrate, and a protection member which covers the LSI. The IC module is held in the holding recess from the protection member. The ... | 06/20/2006 |
| 7061580 | Exposure apparatus and device fabrication method An exposure apparatus includes a reflective element for reflecting and introducing light from a light source to a plate, at least one first driver for providing the reflective element with a force and/or a displacement in at least one directions, and at least one se... | 06/13/2006 |
| 7060994 | Exposure apparatus and method An exposure apparatus includes a projection optical element that includes at least one reflection element and projects light from a reticle that forms a pattern onto an object, and a drive part that moves at least one of the reticle and the reflection element. ... | 06/13/2006 |
| 7062010 | Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus There is provided a method of making a gap between first and second objects have a predetermined value. The method includes steps of introducing light to an entry window on the first object, detecting an intensity of light from an exit window on the first object, th... | 06/13/2006 |
| 7060993 | Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, wh... | 06/13/2006 |
| 7057703 | Exposure apparatus An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation ... | 06/06/2006 |
| 7053017 | Reduced striae extreme ultraviolet elements Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed. ... | 05/30/2006 |
| 7052808 | Transmission mask with differential attenuation to improve ISO-dense proximity An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask having light-transmissive open... | 05/30/2006 |
| 7052825 | Substrate having fine lines, method for manufacturing the same, electron-source substrate, and image display apparatus A substrate includes fine lines. The fine lines are obtained according to a fine-line forming process, which includes a process of projecting light from above the substrate onto predetermined regions on a photosensitive material provided on the substrate and a devel... | 05/30/2006 |
| 7050540 | X-ray micro-target source X-ray generation apparatus including an elongated target body and a mount from which the body projects to a tip remote from the mount. The target body includes a substance that, on being irradiated by a beam of electrons of suitable energy directed onto the target b... | 05/23/2006 |
| 7050543 | Microfocus X-ray tube A microfocus X-ray tube is provided, and comprises a head that during operation of the X-ray tube faces an object that is to be inspected. The head has an outer surface with a cross-section that tapers toward a free end of the head. A target is disposed on or in the... | 05/23/2006 |
| 7050237 | High-efficiency spectral purity filter for EUV lithography An asymmetric-cut multilayer diffracts EUV light. A multilayer cut at an angle has the same properties as a blazed grating, and has been demonstrated to have near-perfect performance. Instead of having to nano-fabricate a grating structure with imperfections no grea... | 05/23/2006 |
| 7046768 | Shutter-shield for x-ray protection A shutter-shield system for radiation protection is applied to a an x-ray generator in a shielded station for inspecting products moving through the station on a conveyor. Deployed in a sliding attachment on a collimator housing of the x-ray generator, a shutter pla... | 05/16/2006 |
| 7046341 | Method and apparatus for forming pattern on thin substrate or the like A substrate processing apparatus of the present invention has a retaining base which retains a substrate, a device detecting undulation or thickness unevenness, and a control device which operates the detecting device. The substrate is deformed in a range of a field... | 05/16/2006 |
| 7045791 | Column simultaneously focusing a partilce beam and an optical beam The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing devic... | 05/16/2006 |
| 7046335 | Exposure apparatus and device fabrication method An exposure apparatus illuminates a pattern on an original form, introduces light from the pattern to a plate, and exposes the plate. The exposure apparatus includes at least one optical element, and forcing member that applies a force to the at least one optical el... | 05/16/2006 |
| 7046338 | EUV condenser with non-imaging optics An illumination system and condenser for use in photolithography in the extreme ultraviolet wavelength region has a first non-imaging optic element collecting electromagnetic radiation from a source and creates a desired radiance distribution. A second non-imaging o... | 05/16/2006 |
| 7040526 | Electronic parts assembling and testing method, and electronic circuit baseboard manufactured by the method A method for assembling and testing an electronic circuit baseboard includes at least a step of soldering at least one electronic part to an electronic circuit baseboard using Pb excluded solder. One of erroneous wiring, erroneous mounting, malfunction, and defectiv... | 05/09/2006 |
| 7038759 | Exposure apparatus An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation ... | 05/02/2006 |
| 7034918 | Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory An exposure apparatus includes a reticle stage which holds a reticle, a projection optical system which projects a pattern of the reticle onto a substrate, a reticle surface plate which is a base plate disposed between the reticle and the projection optical system a... | 04/25/2006 |
| 7034308 | Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contaminati... | 04/25/2006 |
| 7031428 | Substrate material for X-ray optical components There is provided a substrate material for an optical component for X-rays of wavelength λR. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcr... | 04/18/2006 |
| 7030375 | Time of flight electron detector Methods and apparatus for determining the material composition of a semiconductor device at an area of interest are described. An electron time-of-flight spectrometer is used within a semiconductor inspection system. The spectrometer is placed on the opposite side o... | 04/18/2006 |
| 7030958 | Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a sca... | 04/18/2006 |
| 7030964 | Stage system, exposure apparatus, and device manufacturing method A stage system including a first fixed guide having a first guide surface being parallel to a first direction and a second direction being orthogonal to the first direction, a first movable guide to be guided by the first fixed guide and having three freedoms of str... | 04/18/2006 |
| 7027943 | Method, device, computer-readable storage medium and computer program element for the computer-aided monitoring of a process parameter of a manufacturing process of a physical object In the case of the method for the computer-aided monitoring of process parameters of a manufacturing process of a physical object, object data which identify the physical object are assigned to various hierarchical levels, object data of various hierarchical levels ... | 04/11/2006 |
| 7026259 | Liquid-filled balloons for immersion lithography A liquid-filled balloon may be positioned between a workpiece, such as a semiconductor structure covered with a photoresist, and a lithography light source. The balloon includes a thin membrane that exhibits good optical and physical properties. Liquid contained in ... | 04/11/2006 |
| 7027127 | Exposure apparatus, device manufacturing method, stage apparatus, and alignment method An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the orig... | 04/11/2006 |
| 7027132 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes an article support for supporting a substantially flat article to be placed in a beam path of a beam of radiation. The article support includes a plurality of supporting protrusions that define a support zone for providing a plane o... | 04/11/2006 |
| 7023961 | Method and apparatus for generating X-ray A method and an apparatus for generating X-rays in which continuous X-rays can be generated by irradiating a focused laser in the air using a liquid as a target, thereby generating plasma. A high concentration electrolyte aqueous solution, such as CsCl and RbCl, is ... | 04/04/2006 |
| 7022164 | Filters employing porous strongly acidic polymers A clean, high efficiency, low pressure drop, adsorptive filter material that is porous and includes an acidic functional group. The filter can include, for example, a non-woven filter composite has a porous sulfonated divinyl benzene styrene copolymer beads having s... | 04/04/2006 |
| 7022614 | Method of etching back of semiconductor wafer A resist pattern is formed at an outermost peripheral end of the surface of a wafer. Thereafter, the back of the wafer is back-etched using chemicals to thin the wafer. A passivation film is left behind only at scribe lines for separating semiconductor chips located... | 04/04/2006 |
| 7023953 | Illumination system and exposure apparatus and method An optical apparatus and method guide EUV radiation to a predetermined surface. A radiation source supplies EUV radiation having a certain dispersion angle. An illumination optical system having a reflective integrator forms a secondary radiation source having a pre... | 04/04/2006 |
| 7024266 | Substrate processing apparatus, method of controlling substrate, and exposure apparatus A substrate processing apparatus includes a first chamber, a second chamber which has a first valve, a second valve and a chuck, wherein a substrate is transferred to the second chamber through the first valve, held by the chuck in the second chamber, and then trans... | 04/04/2006 |
| 7023955 | X-ray fluorescence system with apertured mask for analyzing patterned surfaces Measurement technique and apparatus for examining a region of a patterned surface such as an integrated circuit (IC). Excitation x-ray, neutron, particle-beam or gamma ray radiation is directed toward a two-dimensional sample area of the IC. Emissions (e.g., x-ray f... | 04/04/2006 |
| 7022443 | Compensation of reflective mask effects in lithography systems Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location o... | 04/04/2006 |
| 7023523 | Exposure system and exposure method Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the image-forming performance of the projection-optical system. The systems transfer... | 04/04/2006 |
| 7023524 | Lithographic apparatus and device manufacturing method A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or adjacent an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system ... | 04/04/2006 |
| 7016390 | Ultrabright tunable coherent multikilovolt x-ray source The generation of ultrabright, multikilovolt coherent tunable x-radiation resulting from amplification on hollow atom transition arrays is described. Amplification has been demonstrated by physical evidence including (a) the observation of selected spectral componen... | 03/21/2006 |
