Bizarre Patents
Behavior Modification Wristwatch
A wristwatch including a watch band and a watch body having an octagon shaped perimeter and being red in color and having the word STOP thereon to resemble a stop sign.
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| Number | Title | Issue Date |
| 4187431 | Method for the adjustment of a semiconductor disc relative to a radiation mask in X-ray photolithography In an illustrative embodiment marks with dual x-ray permeable apertures are at three spaced locations on the mask and transmit x-ray beams which are directed obliquely to the semiconductor surface. In this case, the marks on the semiconductor disc may be ... | 02/05/1980 |
| 4185202 | X-ray lithography X-ray lithographic systems as heretofore constructed include a low-attenuation chamber for propagating x-rays from a source toward a mask member that is positioned in close proximity to a resist-coated wafer. Both the mask and the wafer are included in th... | 01/22/1980 |
| 4184078 | Pulsed X-ray lithography A method and means for x-ray lithography which utilizes means for producing n a vacuum system a high-temperature plasma from which soft x-rays are emitted. The x-rays pass through a mask exposing an x-ray resist on a substrate to produce the desired patter... | 01/15/1980 |
| 4176281 | Method for adjusting a semiconductor disk relative to a radiation mask in x-ray photolithography In the illustrative disclosure, alignment of x-ray masks, with elements in the submicron range for x-ray lithographic replication, is carried out with the use of through-bores in the set of masks and in the substrates. A single point x-ray source may be u... | 11/27/1979 |
| 4171489 | Radiation mask structure The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing su... | 10/16/1979 |
| 4152601 | X-ray lithography mask and method for manufacturing the same An x-ray lithography mask including a thick silicon peripheral rib with a window formed therein and a multi-layered membrane transparent to x-rays and visible light supported by the rib and covering the window. The membrane consists essentially of at leas... | 05/01/1979 |
| 4151421 | Method for compressing pattern data and data compression processing circuit for radiant beam exposure apparatuses The data corresponding to an IC pattern to be depicted on a semiconductor pellet are compressed and stored in a memory. A plurality of pattern data trains with the same content are compressed into a single pattern data train. A code representing the numbe... | 04/24/1979 |
| 4122335 | Method and apparatus for mask to wafer gap control in X-ray lithography The specification describes a process and apparatus for aligning a mask and semiconductor wafer during X-ray lithography which comprises, among other things, inserting a novel flexible spacer between the mask and wafer so as to maintain a vacuum seal betw... | 10/24/1978 |
| 4119855 | Non vacuum soft x-ray lithographic source A source of electrons or charged particles is contained in a baffled enclosure at less than atmospheric pressure. The source projects the electrons or charged particles to strike a target with a velocity which generates soft x-rays. The target is in a cha... | 10/10/1978 |
| 4109148 | Transparent plates with a radiograph thereon and process for the preparation thereof A transparent plate and a process for the preparation thereof whose transparence at every point is a function of the coordinates of this point. A three-dimensional form representative of said function is made which has a base of a contour homothetic to th... | 08/22/1978 |
| 4088896 | Actinic radiation emissive pattern defining masks for fine line lithography and lithography utilizing such masks An actinic radiation emissive mask for a high resolution lithography emits actinic radiation which originates within the mask. The mask patterns the actinic radiation to expose resist in accordance with a desired pattern. The actinic radiation originating... | 05/09/1978 |
| 4085329 | Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment The specification describes a process wherein short wavelength or "hard" x-rays (less than about 4 Angstroms) are used to align a semiconductor processing mask with a semiconductor wafer without the requirement for thinning the wafer to permit the x-rays ... | 04/18/1978 |
| 4037111 | Mask structures for X-ray lithography It has been observed that the deposition and patterning of metallic layers on a supported X-ray-transparent film to form a mask for X-ray lithography introduce stresses in the mask structure. In turn these stresses cause distortions of the film and of the... | 07/19/1977 |
| 4028547 | X-ray photolithography Photolithography of microcircuits with elements in the micrometer size range is performed with X-ray exposure of photoresist layers through electron beam generated shadow masks. Synchrotron radiation from a particle accelerator is used as an intense sourc... | 06/07/1977 |
| 4008402 | Method and apparatus for electron beam alignment with a member by detecting X-rays A method and apparatus are provided for alignment of an electron beam with precisely located areas of a major surface of a member. Marks of predetermined shape are formed of X-ray producing material and are positioned adjacent the major surface of the mem... | 02/15/1977 |
| 3984680 | Soft X-ray mask alignment system An alignment system for aligning one or more soft X-ray lithographic masks with respect to a substrate to be exposed in a soft X-ray lithographic apparatus includes alignment marks on the masks and corresponding alignment marks on a substrate, and a means... | 10/05/1976 |
| 3974382 | Lithographic mask attraction system An electrical voltage is connected between a flexible soft-X-ray mask and a substrate causing the mask to make intimate contact and thereby conform to slight irregularities of the surface of the X-ray sensitive polymer on the substrate to minimize the eff... | 08/10/1976 |
| 3947687 | Collimated x-ray source for x-ray lithographic system In an X-ray lithographic system, high power X-ray illumination of photo-resist coated substrate members is accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorben... | 03/30/1976 |
