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| Number | Title | Issue Date |
| 7372542 | Immersion exposure technique An exposure apparatus for exposing a substrate to light via a reticle. The apparatus includes a substrate stage configured to hold the substrate and to move, a projection optical system configured to project a pattern of the reticle onto the substrate, a flat plate ... | 05/13/2008 |
| 7372059 | Plasma-based EUV light source Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can prod... | 05/13/2008 |
| 7372048 | Source multiplexing in lithography An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask. ... | 05/13/2008 |
| 7372541 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.... | 05/13/2008 |
| 7368741 | Extreme ultraviolet light source The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line wit... | 05/06/2008 |
| 7368723 | Diamond radiation detector A method of detecting radiation that includes providing a layer of high purity single crystal CVD diamond, applying an electric field of no greater than 0.5 V/μm to the layer, exposing the layer to the radiation thereby generating a signal, and detecting the signal... | 05/06/2008 |
| 7368744 | Photon sieve for optical systems in micro-lithography The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color correction system in the projection system; or as a transmitting diffrac... | 05/06/2008 |
| 7369327 | Variable optical-property element and optical apparatus including the same A variable optical-property element includes a liquid crystal the pitch of twist is less than 60 times the wavelength of light used, so that a spatially uneven electric or magnetic field or temperature is applied to the liquid crystal to thereby form an index distri... | 05/06/2008 |
| 7368151 | Antiscattering grid and a method of manufacturing such a grid An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions that together define a plurality of cells distributed over the substrate. The partitions allow passage of the X-rays emitted from a s... | 05/06/2008 |
| 7365349 | EUV light source collector lifetime improvements An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas... | 04/29/2008 |
| 7365345 | Lithographic apparatus, radiation system and filter system A filter system for filtering debris particles out of a predetermined cross-section of the radiation emitted by a radiation source of a lithographic apparatus includes a first set of foils and a second set of foils for trapping the debris particles, and a first heat... | 04/29/2008 |
| 7365351 | Systems for protecting internal components of a EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 04/29/2008 |
| 7361204 | Generator for flux specific bursts of nano-particles Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a ... | 04/22/2008 |
| 7361910 | Movable stage apparatus A movable stage apparatus includes a reticle stage on which a reflecting reticle is to be mounted, in which when a space is divided by a plane including a reflection surface of the reticle, a guide surface to guide movement of the master reticle stage is arranged in... | 04/22/2008 |
| 7362414 | Optical system having an optical element that can be brought into at least two positions There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle imp... | 04/22/2008 |
| 7361918 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 04/22/2008 |
| 7361911 | Lithographic apparatus and device manufacturing method A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas... | 04/22/2008 |
| 7359029 | Lithographic apparatus and method of reducing thermal distortion A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the patterning device and a controller configured to effect an optical correction... | 04/15/2008 |
| 7354500 | Mask and apparatus using it to prepare sample by ion milling A mask for use with a sample preparation apparatus that prepares an ion-milled sample adapted to be observed by an electron microscope is offered. It is possible to prepare the sample having a desired cross section by the use of the mask. The mask, which defines the... | 04/08/2008 |
| 7355678 | Projection system for EUV lithography An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a sec... | 04/08/2008 |
| 7355191 | Systems and methods for cleaning a chamber window of an EUV light source Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation.... | 04/08/2008 |
| 7355190 | Debris mitigation device Numerous embodiments of a debris mitigation device are disclosed. One embodiment of the claimed subject matter may comprise a debris mitigation device for use in photolithography processes. In one embodiment, the debris mitigation device comprises a foil trap device... | 04/08/2008 |
| 7353145 | Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor device A computer implemented method for correcting a mask pattern, includes: preparing a designed mask pattern; obtaining a rough corrected mask pattern from the designed mask pattern by applying a rough correction; and obtaining a precision corrected mask pattern from th... | 04/01/2008 |
| 7352842 | X-ray generator and exposure apparatus having the same An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light sources and for reflecting the X-ray from one of the plural light so... | 04/01/2008 |
| 7352268 | High intensity radial field magnetic actuator At least one set of two magnets is provided, at least one of the magnets having an outer magnet portion, a middle magnet portion, and an inner magnet portion. The outer magnet portion has a magnetization pointing in an at least partially axial direction. The middle ... | 04/01/2008 |
| 7352438 | Lithographic apparatus and device manufacturing method The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps... | 04/01/2008 |
| 7352440 | Substrate placement in immersion lithography A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position o... | 04/01/2008 |
| 7349063 | Reflection mirror apparatus, exposure apparatus and device manufacturing method A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for r... | 03/25/2008 |
| 7349524 | X-ray generator and exposure apparatus An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths. ... | 03/25/2008 |
| 7348695 | Linear motor, moving stage system, exposure apparatus, and device manufacturing method A linear motor includes a coil and a plurality of magnets disposed along a central axis of the coil. The magnetization directions of the plurality of magnets have different tilts with respect to the central axis. ... | 03/25/2008 |
| 7348565 | Illumination system particularly for microlithography There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element ... | 03/25/2008 |
| 7342237 | Lithographic apparatus and device manufacturing method A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for cont... | 03/11/2008 |
| 7340035 | X-ray tube cathode overvoltage transient supression apparatus An imaging tube (30) includes multiple high voltage elements (64). A voltage-clamping device (70) is coupled between the high voltage elements (64) and prevents the occurrence of overvoltage transients in the minor insulation of an imagin... | 03/04/2008 |
| 7336342 | Projection method including pupillary filtering and a projection lens therefor A catadioptric lens with optical elements, which are arranged along an optical axis and with at least one concave mirror located in the vicinity of a pupillar surface of the projection lens. The concave mirror is sub-divided into a number of annular or honeycomb mir... | 02/26/2008 |
| 7331714 | Optomechanical structure for a multifunctional hard x-ray nanoprobe instrument A multifunctional hard x-ray nanoprobe instrument for characterization of nanoscale materials and devices includes a scanning probe mode with a full field transmission mode. The scanning probe mode provides fluorescence spectroscopy and diffraction contrast imaging.... | 02/19/2008 |
| 7332731 | Radiation system and lithographic apparatus A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a contamination barrier that includes a plurality of closely packed foil plate... | 02/19/2008 |
| 7333867 | Substrate processing system managing apparatus information of substrate processing apparatus A substrate processing system comprises a substrate processing apparatus and a support computer, which are connected to a network respectively. Updated countermeasure information is accumulated in the support computer by a system administrator. When the substrate pr... | 02/19/2008 |
| 7333178 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes an illumination system including a field faceted mirror including a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil ... | 02/19/2008 |
| 7329886 | EUV illumination system having a plurality of light sources for illuminating an optical element There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ≦193 nm, and an optical element. The first light source illuminates a first area of... | 02/12/2008 |
| 7330238 | Lithographic apparatus, immersion projection apparatus and device manufacturing method A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid betwee... | 02/12/2008 |
