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| Number | Title | Issue Date |
| 6963821 | Stage counter mass system A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ide... | 11/08/2005 |
| 6960773 | System and method for maskless lithography using an array of improved diffractive focusing elements A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embod... | 11/01/2005 |
| 6957149 | Computer-aided probability base calling for arrays of nucleic acid probes on chips A computer system for analyzing nucleic acid sequences is provided. The computer system is used to calculate probabilities for determining unknown bases by analyzing the fluorescence intensities of hybridized nucleic acid probes on biological chips. Additionally, in... | 10/18/2005 |
| 6956222 | Lithographic apparatus and method of manufacturing a device A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection... | 10/18/2005 |
| 6954255 | Exposure apparatus An exposure apparatus which projects a pattern formed on a mask onto a substrate by using exposure light. The apparatus includes a shielding member which surrounds a light path space through which exposure light passes and has a passage which makes the light path sp... | 10/11/2005 |
| 6953751 | Micro device and process for producing it A micro device comprising a SU-8 photoresist layer adhered to a thin layer of, for example, silicon nitride, silicon oxide, metal, and diamond. The SU-8 layer is clamped on the thin layer by using an under-etching technique. ... | 10/11/2005 |
| 6954041 | Supporting apparatus having a plurality of magnets that generate a floating force and method, stage apparatus, and exposure apparatus Compatibility of a small spring constant and large supporting load is realized, so that a stable operation is assured even if a fine-movement linear motor fails. A supporting unit, having a plurality of magnets whose same poles are arranged facing each other, is ada... | 10/11/2005 |
| 6952254 | Supporting system in exposure apparatus An exposure apparatus includes a carrying member for carrying thereon a workpiece and a supporting mechanism having a magnet, for supporting a weight of the carrying member. A force to be applied to the magnet does not change with a shift of the carrying member alon... | 10/04/2005 |
| 6951766 | Correcting device, exposure apparatus, device production method, and device produced by the device production method A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production method. The correcting device includes a gas flow path including a first ... | 10/04/2005 |
| 6947120 | Illumination system particularly for microlithography There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component t... | 09/20/2005 |
| 6947124 | Illumination system particularly for microlithography There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component t... | 09/20/2005 |
| 6947210 | Catoptric projection optical system, exposure apparatus and device fabrication method using same A catoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first, second, third and fourth mirrors serving substantially as a coaxial system... | 09/20/2005 |
| 6946757 | Stage apparatus and method of controlling the same A stage apparatus includes a first-direction guide which extends in a first direction and can move in a second direction perpendicular to the first direction, a first driving mechanism which moves the first-direction guide in the second direction, a movable body whi... | 09/20/2005 |
| 6947518 | X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device An X-ray exposure apparatus comprises an X-ray mirror containing a material having an absorption edge only in at least either one of a wavelength region of less than 0.45 nm and a wavelength region exceeding 0.7 nm as to X-rays. ... | 09/20/2005 |
| 6947519 | X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure An X-ray exposure apparatus extracts exposure X-rays from light called synchrotron radiation from a synchrotron radiation source by an optical path including an X-ray mirror and performs exposure using the extracted X-rays. The X-ray mirror contains a material havin... | 09/20/2005 |
| 6940583 | Method and apparatus for amplitude filtering in the frequency plane of a lithographic projection system A method of projecting a pattern from a mask onto a substrate comprises providing an energy source, a substrate, and a mask containing a pattern of features to be projected onto the substrate, and projecting an energy beam from the energy source though the mask towa... | 09/06/2005 |
| 6937319 | Exposure method and apparatus with vibration-preventative control A high exposure accuracy is obtained while mitigating the influence of vibration by using an exposure method and an exposure apparatus. Columns (59A, 59B) are installed on a base plate (12), a reticle base (62) is supported at the inside ... | 08/30/2005 |
| 6937754 | Inspection equipment To inspect a finer device pattern formed in a semiconductor wafer, there is provided an inspection equipment including means for supporting a semiconductor wafer as a specimen and moving it to a predetermined position of inspection, means for projecting an ultraviol... | 08/30/2005 |
| 6937317 | Active damping apparatus, exposure apparatus and device manufacturing method An active damping apparatus including an isolation table mounting a stage and a counter-mass, an isolation table controller operatively connected to the isolation table for supporting the isolation table and adjusting a position and an attitude of the isolation tabl... | 08/30/2005 |
| 6934003 | Exposure apparatus and device manufacturing method An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space whi... | 08/23/2005 |
| 6927901 | Reflective projection lens for EUV-photolithography A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axi... | 08/09/2005 |
| 6927887 | Holographic illuminator for synchrotron-based projection lithography systems The effective coherence of a synchrotron beam line can be tailored to projection lithography requirements by employing a moving holographic diffuser and a stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for... | 08/09/2005 |
| 6927403 | Illumination system that suppresses debris from a light source There is provided an illumination system for wavelengths of ≦193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the con... | 08/09/2005 |
| 6924936 | Light scanning apparatus and two-dimensional image forming apparatus A one-dimensional image is formed by reflecting the light from a one-dimensional display device having a plurality of light emitting sections or light emitting sections disposed in one direction by a projection optical system three times or more. Then, a two-dimensi... | 08/02/2005 |
| 6925147 | X-ray optical system and method for imaging a source An X-ray optical system with two X-ray mirrors (A,B) for imaging an X-ray source (S) on a target region is characterized in that the X-ray mirrors (A,B) are mutually tilted by an angle other than 90° such that the combined region of acceptance of the X-ray mirror (... | 08/02/2005 |
| 6925148 | X-ray fluoroscopic apparatus X- and y-axis moving mechanisms are provided for positioning a sample table in the x-axis and the y-axis directions. A yT-axis moving mechanism for moving those moving mechanisms in a direction along a tilting direction of a X-ray camera is provided separately from ... | 08/02/2005 |
| 6924489 | Device for reducing the impact of distortions in a microscope This invention relates to a device for reducing the impact of undesired distortions when studying a sample in an electron microscope, wherein said sample is arranged to be mounted on a micro-positioning device, characterised in that said micro-positioning device is ... | 08/02/2005 |
| 6923892 | Method for electrodeposited film formation, method for electrode formation, and apparatus for electrodeposited film formation A method permitting less energy consumption and efficient formation of high quality electrodes is provided. An electrode is formed as an electrodeposited film by irradiating the surface of an object to be treated, the surface at least permitting generation of charge... | 08/02/2005 |
| 6924492 | Lithographic apparatus, device manufacturing method, and device manufactured thereby Pre-cleaning or in situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating the optical component with microwave and/or infra-red radiation, preferably infra-red radiation having a wavelength or a range of ... | 08/02/2005 |
| 6924882 | Balanced positioning system for use in lithographic apparatus A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly... | 08/02/2005 |
| 6922458 | X-ray exposure method A resist is on a substrate with a lower layer film between the resist and the substrate. The lower layer film includes chemical elements and the element absorbing the largest amount of x-rays is carbon. The thickness of the lower layer film is determined by consider... | 07/26/2005 |
| 6920199 | Mirror element for the reflection of x-rays A mirror element for the reflection of x-rays, particularly for EUVL exposure systems for the manufacture of semiconductor structures, wherein the x-rays reach the mirrors under a certain incident angle, consists of a substrate with a multilayer structure disposed t... | 07/19/2005 |
| 6919951 | Illumination system, projection exposure apparatus and device manufacturing method Disclosed is an illumination system for illuminating an illumination region with uniform illuminance, wherein the light intensity gravity center of light impinging on the illumination region is registered with the center of light rays. The illumination system includ... | 07/19/2005 |
| 6917411 | Method for optimizing printing of an alternating phase shift mask having a phase shift error Optimizing printing of an image from an alternating phase shifting mask having a phase shift error is accomplished using off-axis illumination. By simulating the image using varying off-axis illumination parameters, optimized parameters are selected to compensate fo... | 07/12/2005 |
| 6917047 | Methods and apparatuses for off-axis lithographic illumination Methods and apparatuses for shaping an illumination pattern for off-axis lithography are disclosed. A disclosed apparatus includes a first and second reflecting objective. The first reflecting objective includes a first reflective surface that reflects input light h... | 07/12/2005 |
| 6917046 | Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method A positioning apparatus includes a first stage, capable of moving in a first direction and a second direction which is orthogonal to the first direction, a second stage, arranged on the first stage and moved with the first stage, and capable of moving in the first d... | 07/12/2005 |
| 6913670 | Substrate support having barrier capable of detecting fluid leakage A substrate support has a receiving surface capable of receiving a substrate during processing in a substrate processing chamber. The substrate support has a pedestal having a conduit to circulate a heat transfer fluid therein. A barrier about the conduit includes a... | 07/05/2005 |
| 6915179 | PIPE STRUCTURE, ALIGNMENT APPARATUS, ELECTRON BEAM LITHOGRAPHY APPARATUS, EXPOSURE APPARATUS, EXPOSURE APPARATUS MAINTENANCE METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SEMICONDUCTOR MANUFACTURING FACTORY A pipe structure includes a double pipe having a resin inner pipe and a resin outer pipe covering an outside of the inner pipe, and a discharge mechanism for discharging fluid in a space between the inner pipe and the outer pipe. The double pipe is used in a vacuum ... | 07/05/2005 |
| 6912267 | Erosion reduction for EUV laser produced plasma target sources A laser-plasma EUV radiation source (10) that employs one or more approaches for preventing vaporization of material from a nozzle assembly (40) of the source (10) by electrical discharge from the plasma (30). The first approach includes ... | 06/28/2005 |
| 6912435 | Methods and systems for controlling reticle-induced errors Systems and methods for controlling at least one reticle-induced error in a process system, the systems and methods including adjusting measurement data associated with the process system, where the adjustment can be based on at least one reticle identifier (ID) ass... | 06/28/2005 |
