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Mountable Printable Placard With Headband
A resilient headband in a shape for being mounted on the head of the user. The headband is equipped with a longitudinal slotted member for holding a placard.
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| Number | Title | Issue Date |
| 8144830 | Reflective optical element for EUV lithography device A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional int... | 03/27/2012 |
| 8051391 | Method for layout of random via arrays in the presence of strong pitch restrictions Exemplary embodiments provide a method for laying out an integrated circuit (“IC”) design and the IC design layout. In one embodiment, the IC design layout can include a first feature placed on a first intersecting point of a grid. The placed first feature can d... | 11/01/2011 |
| 8050380 | Zone-optimized mirrors and optical systems using same A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation (18) includes a reflective surface (S) having two or more substantially discrete zones (Z1, Z2, . . . Zn) that include respective coatings (C1, C2... | 11/01/2011 |
| 7903780 | X-ray ablation of hyaluronan hydrogels Disclosed is a method for ablating hyaluronan-based hydrogels with X-rays, the method comprising the steps of: (a) preparing hyaluronan-based hydrogels; and (b) performing X-ray irradiation to the hyaluronan-based hydrogels to induce a degradation of the hyaluronan-... | 03/08/2011 |
| 7443948 | Illumination system particularly for microlithography There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third r... | 10/28/2008 |
| 7440078 | Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference ... | 10/21/2008 |
| 7433019 | Exposure apparatus and device manufacturing method An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and... | 10/07/2008 |
| 7433015 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection ... | 10/07/2008 |
| 7433017 | Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a proj... | 10/07/2008 |
| 7433447 | X-ray generator and exposure apparatus An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths. ... | 10/07/2008 |
| 7429116 | Projection objective and method for its manufacture A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to ... | 09/30/2008 |
| 7428037 | Optical component that includes a material having a thermal longitudinal expansion with a zero crossing There is provided an optical component. The optical component includes a material having a surface that heats to a maximum temperature (Tmax) when subjected to radiation. The material has a temperature-dependent coefficient of thermal expansion (α(T)) of... | 09/23/2008 |
| 7428040 | Lithographic apparatus and device manufacturing method Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate. ... | 09/23/2008 |
| 7425713 | Synchronous raster scanning lithographic system A multi-beam synchronous raster scanning lithography system includes a processor that generates electrical signals representing a desired exposure pattern at an output. A multi-beam source of exposing radiation generates a plurality of exposure beam. A beam modulato... | 09/16/2008 |
| 7426015 | Device manufacturing method and lithographic apparatus A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for ... | 09/16/2008 |
| 7426011 | Method of calibrating a lithographic apparatus and device manufacturing method In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling. ... | 09/16/2008 |
| 7423721 | Lithographic apparatus A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing... | 09/09/2008 |
| 7423728 | Immersion exposure method and apparatus, and manufacturing method of a semiconductor device There is disclosed an immersion exposure method of carrying out an exposure process in a state that liquid is at least partly filled between a substrate to be exposed and a projection optical system of an exposure apparatus carrying out the exposure process, compris... | 09/09/2008 |
| 7420650 | Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium In the present invention, in the photolithography process in which a certain processing condition has been already set, a resist film on a substrate is exposed to light using a mask, which reduces only zero-order light of a light source at a predetermined light redu... | 09/02/2008 |
| 7417707 | Introduction of an intermediary refractive layer for immersion lithography An intermediary layer is introduced between a lens and a wafer for an immersion lithography process. A non-supercritical gas is provided and condensed to form a layer of liquid between the lens and the wafer. The substrate may be irradiated through the lens and inte... | 08/26/2008 |
| 7414700 | Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2... | 08/19/2008 |
| 7411651 | PSM alignment method and device The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to prod... | 08/12/2008 |
| 7412131 | Multilayer optic device and system and method for making same An optic device, system and method for making are described. The optic device includes a first solid phase layer having a first index of refraction with a first photon transmission property and a second solid phase layer having a second index of refraction with a se... | 08/12/2008 |
| 7408617 | Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation bea... | 08/05/2008 |
| 7405871 | Efficient EUV collector designs A collector that includes a laser produced plasma (LPP) extreme ultra violet (EUV) light source and a first optical path from the source to a mirror. The mirror is the first mirror that light emitted from the source and traveling along the first optical path impinge... | 07/29/2008 |
| 7405031 | Lithographic apparatus and device manufacturing method A multi-optical-layer optical element of a lithographic projection apparatus in which at least one optical layer is comprised of an alloy of Mo and Cr. That layer may form the outer most layer of a Mo/Si layer system with an optional protective outer coating of Ru. ... | 07/29/2008 |
| 7405809 | Illumination system particularly for microlithography An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an ima... | 07/29/2008 |
| 7403262 | Projection optical system and exposure apparatus having the same A projection optical system used for an exposure apparatus to projecting a reduced size of an image of an object onto an image plane includes plural refractive elements that dispense with a reflective element having a substantial optical power, wherein the projectio... | 07/22/2008 |
| 7400383 | Environmental control in a reticle SMIF pod The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled environment is maintained substantially free of crystal growth causing contam... | 07/15/2008 |
| 7400699 | Illumination system with raster elements of different sizes There is provided an illumination system for lithography with wavelengths of ≦193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first plane. The first plane defines an x-direction and a y-direction, the... | 07/15/2008 |
| 7397056 | Lithographic apparatus, contaminant trap, and device manufacturing method A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels ... | 07/08/2008 |
| 7388943 | Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus A method of making a gap between first and second objects have a predetermined value includes steps of introducing light to an entry window on the first object, detecting an intensity of light from an exit window on the first object, and positioning the second objec... | 06/17/2008 |
| 7384710 | Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device A method of forming an exposure mask pattern providing edge division points P at edges of a design pattern (1) by predetermined intervals and correcting edge positions for each divided edge portion, wherein, for the design pattern (1), rectangular patt... | 06/10/2008 |
| 7384228 | Insertion device, lithographic apparatus with said insertion device and device manufacturing method A robot arm is configured to insert and remove an object from a conditioned environment using a carrier connected to the robot arm. The robot arm is positioned in a conditionable vessel, a wall of which vessel may deform when the interior is conditioned. Since the t... | 06/10/2008 |
| 7379579 | Imaging apparatus An imaging apparatus having an illuminator configured to condition a beam of radiation having a wavelength equal to or shorter than 365 nm; a support structure to support a programmable patterning device, the programmable patterning device configured to pattern the ... | 05/27/2008 |
| 7375796 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a lo... | 05/20/2008 |
| 7375353 | Lithographic apparatus and device manufacturing method An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the memb... | 05/20/2008 |
| 7375794 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed. The apparatus includes the following components: an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, a substrate support constructed to hold a substrate, and a ... | 05/20/2008 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7372048 | Source multiplexing in lithography An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask. ... | 05/13/2008 |
