Did You Know...
...that in 1800 ether was first used by partyers as a fun diversion? Sniffing the gas led to hilarious and raucous laughter as people watched each other become more and more intoxicated and silly. Several doctors independently realized the value ether would have to anesthetize surgery patients. Of those who claimed rights to the "discovery," none had a happy ending. One had a seizure and died defending his rights. Another spent his life in an asylum because he had been denied acclaim. A third became addicted to chloroform and, in a New York City jail, he soaked a cloth in the drug, severed an artery and bled to death.
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| Number | Title | Issue Date |
| 7369234 | Method of performing optical measurement on a sample The invention relates to a method of performing an optical measurement on a sample, such as an ellipticity measurement. The sample is irradiated with a polarized irradiation beam and a return beam is linearly polarized. The irradiation or return beam is modulated wi... | 05/06/2008 |
| 7364355 | Method and apparatus for obtaining a temperature measurement using an InGaAs detector A method of linearizing the output a infrared camera having an InGaAs includes determining the an equivalent black body temperature of an object by utilizing a plurality of calibration constants determined by collecting data from a number of temperatures of the obje... | 04/29/2008 |
| 7361230 | Substrate processing apparatus In the substrate processing apparatus, a ceramic module for mounting a substrate has a flat plate portion having an electric circuitry and a ceramic base body, and as at least a part of a surface of the flat plate portion other than the surface mounting the substrat... | 04/22/2008 |
| 7346386 | Temporal artery temperature detector Body temperature measurements are obtained by scanning a thermal radiation sensor across the side of the forehead over the temporal artery. A peak temperature measurement is processed to compute an internal temperature of the body as a function of ambient temperatur... | 03/18/2008 |
| 7341673 | Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission A method in a plasma processing system of determining the temperature of a substrate. The method includes providing a substrate comprising a set of materials, wherein the substrate being configured to absorb electromagnetic radiation comprising a first set of electr... | 03/11/2008 |
| 7325971 | Method and apparatus for locating hydrocarbon deposits A method and apparatus for locating hydrocarbon deposits includes temperature 16 sensor for measuring earth surface temperature at each of a plurality of locations, and a solar absorption sensor 14 for measuring the absorption coefficient of the earth'... | 02/05/2008 |
| 7316505 | Method of defining the emission coefficient of a surface to be heated A method of defining the emission coefficient of a surface to be heated by measuring the temperature of a heating surface and the flow of heat from the heating surface to a surface to be heated to derive a pair of values representative thereof and of selecting a pre... | 01/08/2008 |
| 7313501 | Method and system for determining the location of a potential defect in a device based on a temperature profile According to one embodiment of the invention a method for determining the location of a potential defect in a device includes scanning a surface of the device with a temperature sensor while operating the device. The method also includes measuring a temperature of t... | 12/25/2007 |
| 7293915 | Assembly method and structure of an electronic clinical thermometer An assembly method and structure of an electronic clinical thermometer is disclosed. The thermometer can be disassembled or assembled as required, wherein one of the detachable modules such as the measuring body has an incomplete electronic clinical thermometer circ... | 11/13/2007 |
| 7283218 | Method and apparatus for the determination of characteristic layer parameters at high temperatures A method for the determination of characteristic layer parameters by means of spectral-optical measurements, that allow for precise measurements of the sample temperature even under the conditions of industrial growth processes and furthermore avoids the detection o... | 10/16/2007 |
| 7274867 | System and method for determining the temperature of a semiconductor wafer A system and method for determining the temperature of a semiconductor wafer at the time of thermal contact of the semiconductor wafer with a temperature sensing element. According to the invention, a temperature profile of the temperature sensing element is recorde... | 09/25/2007 |
| 7234862 | Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy An apparatus (295) using specular reflection spectroscopy to measure a temperature of a substrate (135). By reflecting light (100) from a substrate, the temperature of the substrate can be determined using the band-edge characteristics of the su... | 06/26/2007 |
| 7231307 | Temperature measuring apparatus, and temperature correction processing device In some embodiments, a temperature measuring apparatus is provided with a light receiving portion having a plurality of light receiving units for measuring heat quantity of divided temperature detecting area in a noncontact manner, a thermal sensor for detecting tem... | 06/12/2007 |
| 7222043 | Electronic device environmental effect prediction An apparatus in one example comprises one or more control components that regulate one or more thermal test components to adjust one or more emulated operational characteristics for one or more electronic devices. The thermal test components are coupled with one or ... | 05/22/2007 |
| 7212950 | Methods and apparatus for equipment matching and characterization Computer program products, methods, systems, and apparatus for fingerprinting and process matching process tools such as process tools used for processing workpieces are described. One embodiment includes a method to determine process matching of one or more process... | 05/01/2007 |
| 7186947 | Process monitor for laser and plasma materials processing of materials A method for monitoring the processing of a workpiece includes directing an incident laser beam onto the workpiece and measuring a signal emitted from the workpiece. At least two signals are generated by a detector based upon the emitted signal. A workpiece processi... | 03/06/2007 |
| 7186978 | Compact emissivity and temperature measuring infrared detector A hand-held, fleet deployable infrared camera with integrated hardware and software providing real time processing of infrared images. The camera senses variable temperature images over a selected object of interest and senses variable emissivities over the object. ... | 03/06/2007 |
| 7173447 | Method and apparatus for diagnosing fault in semiconductor device An apparatus for diagnosing a fault in a semiconductor device includes an laser applying unit, a detection/conversion unit, and a fault diagnosis unit. The semiconductor device is held at a state where no bias voltage is applied thereto. The laser applying unit then... | 02/06/2007 |
| 7169717 | Method of producing a calibration wafer A method of producing a calibration wafer having at least a predetermined emissivity, including providing a wafer of semiconductor material; subjecting the bulk material of the wafer to doping with foreign atoms and/or generating lattice defects to obtain the predet... | 01/30/2007 |
| 7163336 | Instrument for non-contact infrared temperature measurement having current clamp meter functions A handheld instrument that accomplishes infrared (IR) temperature measurement and non-contact electrical current measurement. The instrument has a case, a current-sensing device coupled to the case and operable to be placed around a conductor, for generating an outp... | 01/16/2007 |
| 7155363 | Thermal imaging for semiconductor process monitoring The method measures the temperature, emissivity, and other properties of relatively smooth surfaces radiating thermal energy, and is especially adapted for monitoring semiconductor fabrication processes. Temperature is determined by relating measured radiance to the... | 12/26/2006 |
| 7145667 | Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, semiconductor device manufacturing system, and cleaning method for semiconductor device manufacturing apparatus There is here disclosed a semiconductor device manufacturing method, comprising arranging at least one subject piece in a processing chamber, and starting a predetermined processing, applying a light having a predetermined wavelength to a monitoring section which is... | 12/05/2006 |
| 7140765 | Device and method for discrete and continuous measurement of the temperature of molten metal in a furnace or recepient for its production or treatment A device (10) for continuous measurement of the temperature of molten metal in a furnace or recipient for its production and treatment comprises a heat analysis instrument (14) placed in a lance (12) which blows inert gas and/or high-pressure co... | 11/28/2006 |
| 7142306 | Optical probes and probe systems for monitoring fluid flow in a well Several optical probes useful in downhole applications are provided. A first probe has a tip in the form of a cubical corner with the diagonal of the cubical corner aligned with the axis of the probe. A second probe has a tip formed in a 45° cone. In these designs,... | 11/28/2006 |
| 7114846 | Two-color radiation thermometer A two-color radiation thermometer includes an image pickup device having micro photo receiving units arranged two-dimensionally; a light diverging device for diverging incident light coming from a measuring object into two paths and irradiating the light on two diff... | 10/03/2006 |
| 7108419 | Thermal tympanic thermometer tip The present disclosure provides a tympanic thermometer including a heat sensing probe defining a longitudinal axis and an outer surface extending from a distal end of the tympanic thermometer. The heat sensing probe includes a sensor housing extending to a distal en... | 09/19/2006 |
| 7109443 | Multi-zone reflecting device for use in flash lamp processes A method, apparatus, and system including a reflecting device having a plurality of reflecting zones with associated reflectivities for reflecting light from a flash lamp, are described herein. ... | 09/19/2006 |
| 7085675 | Subband domain signal validation A system, method and program product for predictive condition monitoring of a monitored system by means of sub-band decomposition of a complex monitored signal. Features of the decomposed signal are extracted for modeling estimation and detection of deviations in th... | 08/01/2006 |
| 7063747 | Coating control system for use on a spherical object A coating control system and method for monitoring and potentially adjusting system at least one spray property at various stages of the painting process, thereby also providing an efficient set-up and monitoring process involving less manual labor, less waste, and ... | 06/20/2006 |
| 7056012 | Multimeter with non-contact temperature measurement A multimeter with non-contact temperature measurement capability. The multimeter is contained in a housing, and has outputs relating to measured electrical parameters. There is also an output display contained in the housing, for displaying results to a user. A non-... | 06/06/2006 |
| 7044637 | Temperature measuring apparatus A temperature measurement apparatus allows for accurate temperature measurement in both the sun and the shade using two different thermal sensors. A black sensor has an infrared absorbent surface and a white sensor has an infrared reflecting surface. Using the measu... | 05/16/2006 |
| 7041931 | Stepped reflector plate In a system for thermal processing of a semiconductor substrate, a reflector plate has a stepped surface facing the substrate during heating and cooling of the substrate. The raised surface of the reflector plate has reduced reflectivity, providing advantages during... | 05/09/2006 |
| 7037733 | Method for measuring temperature, annealing method and method for fabricating semiconductor device When the emissivity ε on the reverse face of a substrate 10 is measured during annealing processing for the substrate 10, films made from a material that varies the emissivity ε, such as a first DPS film 15 used for forming a plug 15A, ... | 05/02/2006 |
| 7038174 | Heating device for heating semiconductor wafers in thermal processing chambers A novel apparatus for heat treating semiconductor wafers includes a heating device which comprises an assembly of light energy sources for emitting light energy onto a wafer. The light energy sources can be placed in various configurations. The tuning devices adjust... | 05/02/2006 |
| 7036978 | Pyrometer A first thermistor 8 and a second thermistor 9 are arranged forwardly and rearwardly of a thermopile sensor 5. A thermopile chip 55 is arranged and interposed between the first thermistor 8 and an integrated thermistor 57. A... | 05/02/2006 |
| 7037797 | Localized heating and cooling of substrates The present invention is directed to an apparatus and process for locally heating and/or cooling of semiconductor wafers in thermal processing chambers. In particular, the apparatus of the present invention includes a device for heating or cooling localized regions ... | 05/02/2006 |
| 7033070 | Method and apparatus for measuring temperature Temperature of molten silicon 1 in an infrared image furnace 2 including a halogen lamp 8 as a heating source to grow a single crystal of silicon in a floating-zone method is measured with high precision according to light radiated from the molt... | 04/25/2006 |
| 7016754 | Methods of and apparatus for controlling process profiles Presented are methods and apparatus for controlling the processing of a substrate during a process step that is sensitive to one or more process conditions. One embodiment includes a method performed with corresponding apparatus that includes a controller. One step ... | 03/21/2006 |
| 7009705 | Active remote sensing using lock-in amplifiers and beam steering A remote sensing platform for sensing a target may include a source configured to emit optical radiation toward the target. A device may be configured to dither the emitted optical radiation to alternately illuminate a number of locations on the target. A first dete... | 03/07/2006 |
| 6979804 | Automated oven calibration system A cooking appliance includes an oven cavity, an electric heating element, a control element for selecting an oven cavity temperature, a timer and a calibration system for regulating operational parameters of the cooking appliance. The calibration system adjusts oper... | 12/27/2005 |
