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Class 372/90 - Gas dynamic


Subclass of Class 372 - Coherent light generators
Definition: Subject matter wherein the necessary conditions for lasing
No. of patents: 123
Last issue date: 07/13/2010


1        
NumberTitleIssue Date
7756185Hardened pump laser and method of making the same
A hardened pump laser comprises a hardened pump chamber that combines the functions of a conventional flash lamp and a conventional laser cavity flow tube. The hardened pump chamber comprises a hardened filter tube and electrodes. The electrodes are sealed to the ha...
07/13/2010
7372056LPP EUV plasma source material target delivery system
An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt...
05/13/2008
7365349EUV light source collector lifetime improvements
An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas...
04/29/2008
7355191Systems and methods for cleaning a chamber window of an EUV light source
Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation....
04/08/2008
7317179Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective el...
01/08/2008
7295591Long-pulse pulse power system for gas discharge laser
A long pulse pulse power system for gas discharge lasers. The system includes a sustainer capacitor for accepting a charge from a high voltage pulse power source. A peaking capacitor with a capacitance value of less than half the sustainer capacitance provides the h...
11/13/2007
7277188Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the ...
10/02/2007
7274724Method, system and apparatus for an enhanced electrically pumped oxygen iodine laser
In one embodiment of the present invention an oxygen iodine laser includes a gas mixing section. Ground state oxygen and a carrier gas are introduced into the first gas mixing section, sometimes separately. The laser includes a discharge region to generate at least ...
09/25/2007
7224868Radiation-free optical cavity
The present invention provides a micro-resonator including a plurality of waveguides forming optic junctions therebetween, with adjacent waveguides having different core permittivities and different cladding permittivities. Adjacent waveguides are mode-matched throu...
05/29/2007
7217941Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one ...
05/15/2007
7215697Matched impedance controlled avalanche driver
Controlled avalanche driver circuits and apparatuses for gas lasers. One embodiment typically delivers short, rapid, high voltage ionizing pulses in combination with an electric field whose magnitude is too low to sustain a normal glow discharge. The plasma is typic...
05/08/2007
7208767Electron-jump chemical energy converter
A method and a device for converting energy uses chemical reactions in close proximity to or on a surface to convert a substantial fraction of the available chemical energy of the shorter lived energized products, such as vibrationally excited chemicals and hot elec...
04/24/2007
7196342Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a...
03/27/2007
7180083EUV light source collector erosion mitigation
An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interac...
02/20/2007
7154931Laser with Brayton cycle outlet pump
A chemical oxygen-iodine laser (COIL) comprises an oxygen generator and a nozzle for accelerating generated oxygen to a high or supersonic velocity. A laser cavity is coupled to the nozzle, wherein the accelerated fluid, with injected iodine, is employed as a laser ...
12/26/2006
7141806EUV light source collector erosion mitigation
An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials creat...
11/28/2006
7116696Efficient method and apparatus for generating singlet delta oxygen at an elevated pressure
An improved singlet delta oxygen generator (SOG) and method of its use are disclosed. The improved SOG is compact and scalable, capable of operating in a zero-gravity or low gravity environment, requires no gaseous diluent or buffer gas, and is capable of operating ...
10/03/2006
7088759Resonator box to laser cavity interface for chemical laser
A laser system (52A) is illustrated having a laser cavity (54) that generates a laser beam (78). An outcoupling resonator box (62) has a reflective mirror (70) therein. A return resonator box (64) has a reflective mirror (
08/08/2006
7088758Relax gas discharge laser lithography light source
An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a disp...
08/08/2006
7079565Systems and methods utilizing laser discharge electrodes with ceramic spoilers
Arcing can be minimized in a discharge chamber of an excimer or molecular fluorine laser system by utilizing an improved electrode structure. An electrode structure can include at least one ceramic spoiler positioned near the discharge region of the electrode. An in...
07/18/2006
7061959Laser thin film poly-silicon annealing system
A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier confi...
06/13/2006
7039088Enhancement of chemical lasers via control of the ambient radiation environment
A system and method for obtaining improved performance of chemical laser systems by exercising control over the radiation environments of these devices. Proper control of the AERE is achieved through the control of the wall construction including the choice of mater...
05/02/2006
7009140Laser thin film poly-silicon annealing optical system
A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical syste...
03/07/2006
6965624Laser gas replenishment method
A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluor...
11/15/2005
6950453Pulser driven, helium free transversely excited atmospheric-pressure (TEA) CO2 laser
A novel and inexpensive excitation circuit based on a single switch and a single source drives helium-free TEA CO2 lasers, mini to conventional types, providing low divergent output. By varying the partial pressure of either CO2 or N2
09/27/2005
6947454Laser pulse picking employing controlled AOM loading
A laser (126) and an AOM (10) are pulsed at substantially regular and substantially similar constant high repetition rates to provide working laser outputs (40) with variable nonimpingement intervals (50) without sacrificing laser pulse-t...
09/20/2005
6944202Surface catalyst infra red laser
An energy converter reacts hydrocarbons and air on a catalyst configuration to produce a population inversion. A photovoltaic system may extract the radiating energy, and a laser system may extract a significant fraction of the reaction energy in the form of coheren...
09/13/2005
6937635High rep-rate laser with improved electrodes
The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the electrodes is ...
08/30/2005
6922428Gas laser apparatus for lithography
The present invention relates to a long pulse gas laser apparatus for lithography further improved in the laser oscillation efficiency and stability increased by addition of xenon gas. A gas laser apparatus for lithography has a pair of discharge electrodes 2
07/26/2005
6914927Laser discharge chamber passivation by plasma
Methods and apparatus are provided for cleaning and passivating laser discharge chambers with plasmas. In one embodiment, an oxygen based plasma is formed in a plasma source external to the laser discharge chamber by applying a radiofrequency signal to oxygen contai...
07/05/2005
6868106Resonator optics for high power UV lasers
An excimer or molecular fluorine laser system includes a discharge chamber filled with a laser gas mixture at least including a halogen-containing molecular species and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit f...
03/15/2005
6826203High yield DFB laser with effective reject selection
The present invention relates to a high yield DFB laser with an effective reject selection using criteria on threshold current. The demand for high output power often will require use of lasers with asymmetric power distributions with most of the light power coming ...
11/30/2004
6819699Arf excimer laser device, scanning type exposure device and ultraviolet laser device
A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping...
11/16/2004
6813304High energy DF chemical laser gain generator and related method for its fabrication
A DF or HF chemical laser gain generator fabricated by a platelet technique in which internal passages are more easily formed because the generator is made as a stack of thin platelets that are separately etched and then stacked together. The gain generator is water...
11/02/2004
6788714Laser marking system and method
Diamonds are marked by a laser beam having a characteristic that is changeable by positioning a selected aperture in the beam within a resonant cavity of a laser source. Guidelines are positioned in advance on the diamonds, and the marking is subsequently performed ...
09/07/2004
6782031Long-pulse pulse power system for gas discharge laser
A long pulse power system for gas discharge lasers. The system includes a sustainer capacitor for accepting a charge from a high voltage pulse power source. A peaking capacitor with a capacitance value of less than half the sustainer capacitance provides the high vo...
08/24/2004
6768762High repetition rate UV excimer laser
The invention relates to an High Repetition Rate UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, o...
07/27/2004
6693944Sputtering metal ion laser
Internal mirror sputtering metal ion lasers are disclosed which employ laser mirrors and a resonator internal to and integral with the laser plasma tube. Preferred lasers use silver, copper, gold and other metals individually or in combination as opticall...
02/17/2004
6690702Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
In an excimer laser oscillation apparatus including a laser chamber (20) constituted by a laser tube (2) for storing a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, He and F2 ...
02/10/2004
6683900Solid state laser apparatus
A cavity has a longitudinal hollow having opposite open ends. An excitation source, such as a YAG rod, is accommodated in the hollow of the cavity. A hollow, cylindrical rod holder is inserted into each of the opposite open ends of the hollow and is fitte...
01/27/2004
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