Bizarre Patents
A method of swing on a swing is disclosed, in which a user positioned on a standard swing suspended by two chains from a substantially horizontal tree branch induces side to side motion by pulling alternately on one chain and then the other.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7929586 | Electromagnetically pumped alkali metal vapor cell system An electromagnetic pumped alkali metal vapor cell system is provided. The system comprises a vapor cell and windings. The vapor cell contains alkali metal and a buffer. The windings are positioned around the vapor cell and are configured to create an electromagnet f... | 04/19/2011 |
| 7551657 | Magneto-optoelectronic switch and sensor A Magneto-Optoelectronic Device MOD (10) includes a magnetic sensing device (12), such as a magnetoresistive device or a magnetic tunnel junction device, that is combined with a semiconductor light emitter (14), such as a LED or a laser diode, t... | 06/23/2009 |
| 7440479 | Magneto-optoelectronic switch and sensor A Magneto-Optoelectronic Device MOD (10) includes a magnetic sensing device (12), such as a magnetoresistive device or a magnetic tunnel junction device, that is combined with a semiconductor light emitter (14), such as a LED or a laser diode, t... | 10/21/2008 |
| 7440178 | Tunable generation of terahertz radiation A method of tunable generation of terahertz radiation comprising: (A) providing a magnon gain medium; wherein the magnon gain medium supports generation of nonequilibrium magnons; (B) generating terahertz radiation in the magnon gain medium; and (C) tuning frequency... | 10/21/2008 |
| 7430074 | Generation of Terahertz waves A method of THz photon generation comprising: providing a magnon gain medium; wherein the magnon gain medium supports generation of nonequilibrium magnons; and injecting nonequilibrium electrons into the magnon gain medium. Propagation of nonequilibrium electrons in... | 09/30/2008 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7368741 | Extreme ultraviolet light source The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line wit... | 05/06/2008 |
| 7369597 | Laser output light pulse stretcher Providing a high peak power short pulse duration gas discharge laser output pulse comprises a pulse stretcher a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and com... | 05/06/2008 |
| 7365351 | Systems for protecting internal components of a EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 04/29/2008 |
| 7365349 | EUV light source collector lifetime improvements An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas... | 04/29/2008 |
| 7361918 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 04/22/2008 |
| 7355191 | Systems and methods for cleaning a chamber window of an EUV light source Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation.... | 04/08/2008 |
| RE40184 | Refractive surgery and presbyopia correction using infrared and ultraviolet lasers A method and surgical technique for corneal reshaping and for presbyopia correction are provided. The preferred embodiments of the system consists of a scanner, a beam spot controller and coupling fibers and the basic laser having a wavelength of (190-310) nm, (0.5-... | 03/25/2008 |
| 7323703 | EUV light source An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape ha... | 01/29/2008 |
| 7321607 | External optics and chamber support system A gas discharge laser and method of operating same is disclosed which may comprise a gas discharge laser chamber support structure comprising a first support arm attached to a mounting table; a gas discharge laser chamber slideably engaging the first support arm; an... | 01/22/2008 |
| 7317179 | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective el... | 01/08/2008 |
| 7317196 | LPP EUV light source An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target wi... | 01/08/2008 |
| 7317536 | Spectral bandwidth metrology for high repetition rate gas discharge lasers A bandwidth meter apparatus and method for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter which may comprise an optical bandwidth monitor providing a first output representative of a first parameter which is indicati... | 01/08/2008 |
| 7295591 | Long-pulse pulse power system for gas discharge laser A long pulse pulse power system for gas discharge lasers. The system includes a sustainer capacitor for accepting a charge from a high voltage pulse power source. A peaking capacitor with a capacitance value of less than half the sustainer capacitance provides the h... | 11/13/2007 |
| 7291853 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 11/06/2007 |
| 7277464 | Method and apparatus for controlling the output of a gas discharge laser system The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine. ... | 10/02/2007 |
| 7277188 | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the ... | 10/02/2007 |
| 7247870 | Systems for protecting internal components of an EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 07/24/2007 |
| 7244997 | Magneto-luminescent transducer An electronic system includes a three terminal device having a light emitting portion and a magnetically sensitive portion. The magnetically sensitive portion is for modulating light emission from the light emitting portion. The device is a spin valve transistor hav... | 07/17/2007 |
| 7230964 | Lithography laser with beam delivery and beam pointing control The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam ... | 06/12/2007 |
| 7230959 | Tunable laser with magnetically coupled filter Laser apparatus and methods that permit actuation of a tuning element via a magnetically coupled drive assembly, and which provide for isolation of contamination-sensitive optical surfaces within a hermetically sealed enclosure with a magnetically coupled drive asse... | 06/12/2007 |
| 7218661 | Line selected Ftwo chamber laser system An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a pa... | 05/15/2007 |
| 7217941 | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one ... | 05/15/2007 |
| 7217940 | Collector for EUV light source A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second... | 05/15/2007 |
| 7209507 | Method and apparatus for controlling the output of a gas discharge MOPA laser system A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a... | 04/24/2007 |
| 7203216 | Timing control for two-chamber gas discharge laser system Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to... | 04/10/2007 |
| 7196342 | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a... | 03/27/2007 |
| 7193228 | EUV light source optical elements Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in pla... | 03/20/2007 |
| 7190707 | Gas discharge laser light source beam delivery unit A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser... | 03/13/2007 |
| 7180083 | EUV light source collector erosion mitigation An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interac... | 02/20/2007 |
| 7180081 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 02/20/2007 |
| 7167499 | Very high energy, high stability gas discharge laser surface treatment system A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in the substrate of a workpiece is disclosed which may comprise, a multichamber laser system comprising, a first laser unit comprising, a fi... | 01/23/2007 |
| 7164144 | EUV light source A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiati... | 01/16/2007 |
| 7154928 | Laser output beam wavefront splitter for bandwidth spectrum control Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection o... | 12/26/2006 |
| 7154925 | Gas laser oscillator A gas laser oscillator of easy maintenance which is capable of switching a beam mode at high speed. Electric discharge sections in which gas medium is flown are formed in an optical resonating space in an electric discharge tube between a rear mirror and an output m... | 12/26/2006 |
