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| Number | Title | Issue Date |
| 8054473 | Measurement method for determining dimensions of features resulting from enhanced patterning methods A measurement mark on a substrate has a first section with first primary and first secondary lines. The first primary lines have a first width and are arranged at a first pitch and in alternating order with the first secondary lines. A second section comprises secon... | 11/08/2011 |
| 8035824 | Differential critical dimension and overlay metrology apparatus and measurement method A method is described for measuring a dimension on a substrate, wherein a target pattern is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal to the primary direction. The targ... | 10/11/2011 |
| 7567353 | Automated process control using optical metrology and photoresist parameters To control a photolithography cluster using optical metrology, a structure is fabricated on a wafer using the photolithography cluster. A measured diffraction signal off the structure is obtained. The measured diffraction signal is compared to a simulated diffractio... | 07/28/2009 |
| 7522295 | Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer Structures formed on a semiconductor wafer are consecutively measured by obtaining first and second measured diffraction signals of a first structure and a second structure formed abutting the first structure. The first and second measured diffraction signals were c... | 04/21/2009 |
| 7433037 | System for measuring periodic structures A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic stru... | 10/07/2008 |
| 7430052 | Method for correlating the line width roughness of gratings and method for measurement A method for correlating line width roughness of gratings first performs a step (a) generating a characteristic curve of a predetermined grating having a known line width, and a step (b) performing a comparing process to select a matching spectrum from a plurality o... | 09/30/2008 |
| 7423269 | Automated feature analysis with off-axis tilting One embodiment relates to a method of automated microalignment using off-axis beam tilting. Image data is collected from a region of interest on a substrate at multiple beam tilts. Potential edges of a feature to be identified in the region are determined, and compu... | 09/09/2008 |
| 7417750 | Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometer Structures formed on a semiconductor wafer are consecutively measured by obtaining first and second measured diffraction signals of a first structure and a second structure formed abutting the first structure. The first and second measured diffraction signals were c... | 08/26/2008 |
| 7409309 | Method of deciding the quality of the measurement value by the edge width A method of deciding the quality of a measurement value of the line width, the line interval or the like of a pattern on an object to-be-measured, including acquiring the signal intensity distribution of the pattern on the object to-be-measured, detecting the edge p... | 08/05/2008 |
| 7405032 | Combination of non-lithographic shrink techniques and trim process for gate formation and line-edge roughness reduction The present invention relates generally to photolithographic systems and methods, and more particularly to systems and methodologies that facilitate the reduction of line-edge roughness (LER) during gate formation in an integrated circuit. Systems and methods... | 07/29/2008 |
| 7391524 | System and method for efficient characterization of diffracting structures with incident plane parallel to grating lines A system and a method for optical characterization of a symmetric grating illuminated at off-normal incident angle are provided, where the plane of incidence is parallel to the grating lines. In this case corresponding positive and negative diffraction orders have t... | 06/24/2008 |
| 7375831 | Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit In optical line width measurement performed using the scatterometry technique, the present invention measures the line width formed on a substrate more accurately than in the prior art. After a predetermined pattern is formed in a resist film on a substrate, the ref... | 05/20/2008 |
| 7369233 | Optical system for measuring samples using short wavelength radiation In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measureme... | 05/06/2008 |
| 7362448 | Characterizing residue on a sample A residue detection system collects at least one of the spectrum and image from a measurement region on a sample. Spectral analysis is performed on the collected spectrum to determine whether residue is present and if so the thickness of the residue. The spectral an... | 04/22/2008 |
| 7349106 | Apparatus and method for thin-layer metrology An apparatus (1) and a method for thin-layer metrology of semiconductor substrates (16) are disclosed. The semiconductor substrates (16) are delivered or transported to the apparatus (1) by means of at least one cassette element. A measur... | 03/25/2008 |
| 7333198 | Sample orientation system and method Disclosed are systems and methodology for orienting the vertical position, and tilt, of samples, as applied in ellipsometer and the like systems. ... | 02/19/2008 |
| 7333200 | Overlay metrology method and apparatus using more than one grating per measurement direction A method of controlling the lithography process used to fabricate patterns on layers of a semiconductor wafer is disclosed. The method includes providing at least two scatterometry targets, each target having a first pattern formed in an upper layer substantially al... | 02/19/2008 |
| 7317523 | Method for calibrating a metrology tool and a system A method for calibrating a metrology tool, the method includes: determining a relationship between an upper portion of a milled reference structural element and between a lower portion of the milled reference structural element; and defining a calibration parameter ... | 01/08/2008 |
| 7310155 | Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structures A system that facilitates extraction of line edge roughness measurements that are independent of proprietorship of a metrology device comprises a structure patterned onto silicon with known line edge roughness values associated therewith. A metrology device obtains ... | 12/18/2007 |
| 7289232 | Dimension measurement method, method of manufacturing semiconductor device, dimension measurement apparatus and measurement mark A dimension measurement method includes irradiating a measurement mark on a sample on which a pattern to be measured is formed with light from a measurement direction, detecting reflected diffracted light from the measurement mark to measure intensity thereof, and c... | 10/30/2007 |
| 7285781 | Characterizing resist line shrinkage due to CD-SEM inspection A CD-SEM (critical dimension-scanning electron microscope) system may utilize a technique for characterizing and reducing shrinkage carryover due to CD-SEM measurements. The system may identify the affects of CD-SEM measurements on the resist and adjust the operatin... | 10/23/2007 |
| 7274472 | Resolution enhanced optical metrology A resolution enhanced optical metrology system to examine a structure formed on a semiconductor wafer includes a source configured to direct an incident beam at the structure through a coupling element. The coupling element is disposed between the source and the str... | 09/25/2007 |
| 7253909 | Phase shift measurement using transmittance spectra An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range Δλ, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A... | 08/07/2007 |
| 7253891 | Method and apparatus for simultaneous 2-D and topographical inspection Apparatus for sensing information regarding a surface including a first plurality of optical elements arranged to acquire two dimensional information about a surface, a second plurality of optical elements arranged to acquire topographical information about the surf... | 08/07/2007 |
| 7248375 | Critical dimension analysis with simultaneous multiple angle of incidence measurements A method and apparatus are disclosed for evaluating relatively small periodic structures formed on semiconductor samples. In this approach, a light source generates a probe beam which is directed to the sample. In one preferred embodiment, an incoherent light source... | 07/24/2007 |
| 7206006 | Real size display system Disclosed is a real size display system comprising a real size display system comprising a photographing unit for photographing an image of a subject, and outputting first image information that includes measurement information of the subject; a flat panel display u... | 04/17/2007 |
| 7184152 | Optical measurements of line edge roughness A method and system for optical measurements of line edge roughness (LER) of patterned structures based on illuminating the structure with incident radiation and detecting a spectral response of the structure, and further applying software and/or hardware utilities ... | 02/27/2007 |
| 7177019 | Apparatus for imaging metrology This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging came... | 02/13/2007 |
| 7158239 | Optical method of examining reliefs on a structure A method for studying a surface provided with relief features, wherein a measurement spectrum is taken and then compared with test spectra representative of arbitrary structures that are adjusted stepwise. A correlation over representative points of the spectra is s... | 01/02/2007 |
| 7145664 | Global shape definition method for scatterometry A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion whe... | 12/05/2006 |
| 7139083 | Methods and systems for determining a composition and a thickness of a specimen Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. ... | 11/21/2006 |
| 7136173 | Method and apparatus for end-point detection An apparatus for detecting the end-point of an electropolishing process of a metal layer formed on a wafer (1004) includes an end-point detector. The end-point detector is disposed adjacent the nozzle (1008) used to electropolish the wafer. In one embo... | 11/14/2006 |
| 7130063 | Micropattern shape measuring system and method A test pattern formed in a scribe line area of a wafer is irradiated with a light beam to measure the width thereof; the test pattern is irradiated with an electron beam so as to measure the width thereof; an amount of change in the width of the test pattern is calc... | 10/31/2006 |
| 7130762 | Method and system for handling substrates in a production line including a cluster tool and a metrology tool In a production line, a cluster tool having a plurality of substantially identical process modules and a metrology tool includes a control unit that allows one to receive, store and process information that indicates in which process module which substrates have bee... | 10/31/2006 |
| 7119879 | Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method A stage alignment apparatus includes a first moving member which moves in a first direction, a second moving member which moves in a second direction different from the first direction, a stage which is slidably supported by the first moving member and the second mo... | 10/10/2006 |
| 7084988 | System and method for creation of semiconductor multi-sloped features A system and method for monitoring the creation of semiconductor features with multi-slope profiles by employing scatterometry is provided. The system includes a wafer partitioned into one or more portions and one or more light sources, each light source directing l... | 08/01/2006 |
| 7084978 | Sample orientation system and method Disclosed are systems and methodology for orienting the vertical position, and tilt, of samples, as applied in ellipsometer and the like systems. ... | 08/01/2006 |
| 7084990 | Method and its apparatus for measuring size and shape of fine patterns In size measurement of a semiconductor device, profiles of a pattern formed in a resist process are determined through an exposure/development simulation in respect of individual different combinations of exposure values and focus values to form a profile matrix and... | 08/01/2006 |
| 7076320 | Scatterometry monitor in cluster process tool environment for advanced process control (APC) Systems and methods that improve process control in semiconductor manufacturing are disclosed. According to an aspect of the invention, conditions in a cluster tool environment and/or a wafer therein can be monitored in-situ via, for example, a scatterometry system,... | 07/11/2006 |
| 7069153 | CD metrology method A method for rapidly analyzing data gathered during scatterometry and related methods uses a combination of database lookup, database interpolation and theoretical model evaluation. Database lookup is used to provide an initial mapping between a measured optical res... | 06/27/2006 |
