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| Number | Title | Issue Date |
| 8139234 | Method and apparatus for measuring optical extinction in a thin film during its deposition A method of measuring the extinction of light in a coating including the steps of: directing a light beam to a substrate to be coated at an angle of incidence for which the beam undergoes nominal total internal reflection; depositing a coating on the substrate such ... | 03/20/2012 |
| 7835018 | Optical method for controlling thin film growth A method of determining the rate of change of optical thickness of a thin-film during deposition comprising the steps of illuminating the thin-film with electromagnetic radiation having a range of wavelengths, measuring the transmission spectrum of the thin-film at ... | 11/16/2010 |
| 7755777 | Wavelength selection method, film thickness measurement method, film thickness measurement apparatus, and system for producing thin film silicon device An object is to reduce film thickness measurement error. Illumination light having different wavelengths is radiated onto a plurality of samples in which thin films having different film qualities and film thicknesses are provided on substrates, evaluation values re... | 07/13/2010 |
| 7570373 | System and method to measure parameters distribution in sheet-like objects A measuring device and method are disclosed for parameter distribution measurement over the entire surface of sheet-like objects. The parameters of primary interest are thickness and permeability profiles. The device includes a parameter measuring unit a coordinate ... | 08/04/2009 |
| 7554678 | Device and method for measuring the thickness of a transparent sample The invention relates to device for measuring the thickness of a transparent sample (2), particularly a glass strip or a glass pane, involving the use of: a first light beam (L1), particularly a first laser beam, which strikes upon the front surface ( | 06/30/2009 |
| 7542152 | Method for measuring thickness of thin film, method for forming polycrystal semiconductor thin film, method for manufacturing semiconductor device, apparatus for manufacturing the same, and method for manufacturing image display device A laser light is projected to a thin film deposited on a transparent substrate, and measurement is performed on the entire measurement area of the substrate, and transmission intensity is measured by a transmission light intensity monitor and reflection light intens... | 06/02/2009 |
| 7443518 | Measuring instrument, in particular for transmission measurement in vacuum system A measuring instrument, in particular for transmission measurement with transparent substrates, comprises a measuring head with a light emitting element for emitting a light beam and a light receiver element for recording an incident light beam, and a retro-reflecto... | 10/28/2008 |
| 7433027 | Apparatus and method for detecting lens thickness The present invention relates to a non-contact/non-destructive method and apparatus for measuring the thickness of an ophthalmic lens. The present invention also provides a method for inspecting or measuring the base curve of a lens. ... | 10/07/2008 |
| 7420691 | Method and apparatus for measuring interfacial positions, method and apparatus for measuring layer thickness, and method and apparatus for manufacturing optical discs An interfacial position measuring method for a substrate internally having a plurality of interfaces parallel to one another. A light-convergent line which has converged in only a one-axis direction out of parallel light having an optical axis vertical to the substr... | 09/02/2008 |
| 7417749 | Method and apparatus for protecting an optical transmission measurement when sensing transparent materials A method and apparatus for protecting an optical transmission measurement when sensing transparent materials. Sensing apparatus located in a housing directs a light beam at an upward angle to a sheet of transparent material and detects downward surface reflections o... | 08/26/2008 |
| 7414740 | Method and apparatus for contactless optical measurement of the thickness of a hot glass body by optical dispersion The method measures the thickness of a hot glass body without direct contact with the glass body and is based on chromatic aberration. This method includes focusing a light beam from a light source on the hot glass body using a focusing device immediately after form... | 08/19/2008 |
| 7385710 | Measuring device A method is provided for measuring the wall thickness of transparent articles using uniform diverging light in the form of a small point source or elongated narrow line of light, measuring the spacial separation of the reflections from the nearest and furthest surfa... | 06/10/2008 |
| 7385174 | Apparatus and method for measuring sidewall thickness of non-round transparent containers An apparatus for inspecting sidewall thickness of non-round transparent containers includes a conveyor for holding a container in stationary position and rotating the container around an axis. A light source directs light energy onto a sidewall of the container on t... | 06/10/2008 |
| 7382456 | Spectroscopic sensor for measuring sheet properties A spectroscopic sensor for measuring flat sheet product is disclosed. The disclosed sensor uses a combination of spectrometers and single-channel detectors and filters together with a broadband source of illumination to optimally measure multiple properties of a fla... | 06/03/2008 |
| 7372579 | Apparatus and method for monitoring trench profiles and for spectrometrologic analysis An apparatus for monitoring a trench profile of a substrate includes a radiation-emitting unit for irradiating the substrate with infrared radiation. The intensity and/or polarization state of the infrared radiation reflected from the substrate is measured at a mult... | 05/13/2008 |
| 7372584 | Dual photo-acoustic and resistivity measurement system A measurement system for measuring aspects of a wafer combines an apparatus for performing a conductivity measurement, such as a four-point probe system, with apparatus for performing an optical measurement, such as a photoacoustic measurement system. Results are ob... | 05/13/2008 |
| 7369255 | Apparatus and method for capacitive measurement of materials Method for measuring thicknesses of a film, a foil or a material layer with a measuring head which is spaced away from the film and with which a capacitive thickness measurement is performed, in which an optical distance measurement is performed with a distance meas... | 05/06/2008 |
| 7362448 | Characterizing residue on a sample A residue detection system collects at least one of the spectrum and image from a measurement region on a sample. Spectral analysis is performed on the collected spectrum to determine whether residue is present and if so the thickness of the residue. The spectral an... | 04/22/2008 |
| 7362454 | Method and system for measuring overcoat layer thickness on a thin film disk A method for measuring the thickness of a thin film disk overcoat layer includes radiating x-rays on a thin film disk comprising at least one base layer and an overcoat layer, collecting fluorescence data on electromagnetic radiation fluoresced from the thin film di... | 04/22/2008 |
| 7362501 | Microscope apparatus An objective lens can be reduced in diameter, which allows examination inside a specimen such as a living organism with minimum invasiveness and also reduces costs. The invention provides a microscope apparatus including an objective-lens mounting part for removably... | 04/22/2008 |
| 7358199 | Method of fabricating semiconductor integrated circuits A method of fabricating semiconductor integrated circuits includes (1) providing a spin-on tool comprising a rotatable platen for holding and spinning a wafer disposed thereon, a fluid supply system for providing spin-on solution onto the wafer, and a detector fixed... | 04/15/2008 |
| 7355711 | Method for detecting an end-point for polishing a material An optical surface analysis system for scanning the surface of a (silicon) wafer and detect if any residual material is still on the wafer surface in order to determine an appropriate end-point in a polishing process. An Optical Surface Analyzer (OSA), of the presen... | 04/08/2008 |
| 7353141 | Method and system for monitoring component consumption A method for monitoring consumption of a component, including the steps of emitting a radiation beam onto a first area of the component and detecting a portion of the radiation beam that is refracted by the component. A radiation level signal is generated based at l... | 04/01/2008 |
| 7348192 | Method for monitoring film thickness, a system for monitoring film thickness, a method for manufacturing a semiconductor device, and a program product for controlling film thickness monitoring system A method monitors a thickness of a subject film deposited on an underlying structure, the underlying structure contains at least one thin film formed on a substrate. The method includes determining thickness data of the underlying structure and storing the thickness... | 03/25/2008 |
| 7342661 | Method for noise improvement in ellipsometers A normalization procedure for an ellipsometric system having a rotating optical element such as a polarizer or compensator is disclosed. In operation, a first DC component is extracted from the measured output signals obtained during the first 180 degrees of rotatio... | 03/11/2008 |
| 7339676 | Optical method and system for the characterization of laterally-patterned samples in integrated circuits Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse o... | 03/04/2008 |
| 7333022 | Safety monitoring mechanism of a wafer fabrication platform A safety monitoring mechanism of a wafer fabrication platform is disclosed. The mechanism comprises a vibration sensor mounted at the loading apparatus of the wafer fabrication platform for detecting vibration generated during the operation of the loading apparatus;... | 02/19/2008 |
| 7330244 | Method and apparatus for performing limited area spectral analysis A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the op... | 02/12/2008 |
| 7330259 | Optical measurements of patterned articles A method and system are presented for use in measuring/inspecting a patterned article. Optical measurements are applied to a measurement site on the article by illuminating the measurement site with a plurality of wavelengths at substantially normal incidence of the... | 02/12/2008 |
| 7319531 | Method for measuring a thickness of a coating A method for measuring a thickness of a coating of a constructional unit, in particular a heat-compatible coating on a component of a gas turbine, includes measuring coordinates of the constructional unit three-dimensionally with a measuring device, in particular an... | 01/15/2008 |
| 7315361 | System and method for inspecting wafers in a laser marking system An illumination system is disclosed for use in a semiconductor wafer back side inspection assembly. The illumination system includes an illumination source that is configured to direct illumination toward a highly reflective and directionally reflective surface at a... | 01/01/2008 |
| 7315642 | System and method for measuring thin film thickness variations and for compensating for the variations A method for measuring thin film thickness variations of inspected wafer that includes an upper non-opaque thin film. The method including (i) scanning the wafer and obtain wafer image that includes die images each of which composed of pixels, (ii) identifying regio... | 01/01/2008 |
| 7307740 | Method for measurement of three-dimensional objects by single-view backlit shadowgraphy A method for measuring three-dimensional objects by single view backlit shadowgraphy. To measure at least one geometrical parameter of such an object, for example the thickness of a hollow sphere, translucent or transparent to visible light, optical characteristics ... | 12/11/2007 |
| 7304744 | Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light A thin film thickness measurement apparatus that can measure immediately after film growth thickness of a thin film of a substrate that is grown includes a light receiving/projecting unit directing light substantially perpendicular to the substrate and receiving lig... | 12/04/2007 |
| 7301149 | Apparatus and method for determining a thickness of a deposited material Method and apparatus for determining a thickness of a deposited material. Energy is passed through the deposited material, wherein some of the energy is transmitted. The transmitted energy is received, and the received energy is used to determine a thickness of the ... | 11/27/2007 |
| 7301645 | In-situ critical dimension measurement A method of monitoring a critical dimension of a structural element in an integrated circuit is provided comprising the following steps: collecting an optical interference endpoint signal produced during etching one or more layers to form the structural element; and... | 11/27/2007 |
| 7292349 | Method for biomolecular sensing and system thereof A sensing system and method for biomolecular sensing. The system includes: a receptor for the at least one target, the receptor including a substrate and a transparent coating on the substrate having front and back surfaces; a light source positioned to direct at le... | 11/06/2007 |
| 7289200 | Confocal reflectommeter/ellipsometer to inspect low-temperature fusion seals A device and method for measuring a fusion seal quality within a structure comprising a source for providing a focused optical beam of a known intensity to a fusion seal within a structure, the fusion seal reflecting the optical beam according to the fusion seal qua... | 10/30/2007 |
| 7286242 | Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same The present invention relates to a non-contact, non-destructive measuring apparatus that measures thickness profile and refractive index distribution of a single or multiple layers of thin films by means of the principle of reflectometry. According to the present in... | 10/23/2007 |
| 7283234 | Use of ellipsometry and surface plasmon resonance in monitoring thin film deposition or removal from a substrate surface Improved methodology for monitoring deposition or removal of material to or from a process and/or wittness substrate which demonstrates a negative e1 at some wavelength. The method involves detection of changes in P-polarized electromagnetism ellipsometric DE... | 10/16/2007 |
