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| Number | Title | Issue Date |
| 8139233 | System and method for via structure measurement A system for via structure measurement is disclosed. The system comprises a reflectometer, a simulation unit and a comparing unit. The reflectometer is configured to collect a measured diffraction spectrum of at least a via. The simulation unit is configured to prov... | 03/20/2012 |
| 7929155 | System and method for on-machine 3-D depth measurement The present invention provides a method and system for on-machine 3-D depth measurement. The same image retrieving apparatus measures the first distance for the width of the similar gray-level region of cutting-surface from the first angle, and measures the second d... | 04/19/2011 |
| 7884951 | Apparatus for measuring an internal dimension of a well bore An apparatus for measuring an internal dimension of a well-bore comprising a tool adapted to be positioned inside the well bore. The tool comprises an optical caliper comprising an optical sensor providing a response correlated to the internal dimension of the well ... | 02/08/2011 |
| 7684060 | Quality-control method for laminated-foil packaging system In a sealing machine a pair of juxtaposed foils are sealed together at web regions having oppositely directed outer surfaces between a pair of dies, at least one of which is formed with an array of bumps that taper outwardly toward a respective one of the outer surf... | 03/23/2010 |
| 7440121 | Optically measuring interior cavities A method of measuring the three-dimensional volume or perimeter shape of an interior cavity includes the steps of collecting a first optical slice of data that represents a partial volume or perimeter shape of the interior cavity, collecting additional optical slice... | 10/21/2008 |
| 7440120 | Internal and external measuring device A measuring device for measuring internal or external dimensions of a manufactured or machined component is provided with a laser source, a beam redirection member, and a beam receptor. The beam redirection member is adapted to be positioned within an internal bore ... | 10/21/2008 |
| 7440097 | Laser plasma spectroscopy apparatus and method for in situ depth profiling An in-situ laser plasma spectroscopy (LPS) system for automated near real-time elemental depth profiling of a target including: an optical source configured to generate an optical beam, wherein the optical beam is pulsed; an optical probe system configured to delive... | 10/21/2008 |
| 7400417 | Diffraction method for measuring thickness of a workpart The thickness of a workpart (10) is measured to a high degree of accuracy by passing a coherent light beam (20) through an aperture (16) in the workpart (10). The aperture (16′) can alternatively be created between an edge of the... | 07/15/2008 |
| 7372582 | Method for fabrication semiconductor device The object of this invention is to provide a method for fabricating a semiconductor device in which the yield and productivity are improved. In the method for fabricating a semiconductor device according to the invention, a plasma etching system is prepared which in... | 05/13/2008 |
| 7369225 | Device and method for inspecting surfaces in the interior of holes A device and method for checking surfaces in the interior of holes, depressions, or the like. The device and method are developed in such a manner that a multicolor light beam can be produced with a light source, wherein a light beam, due to the chromatic aberration... | 05/06/2008 |
| 7349083 | Rotary borescopic optical dimensional mapping tool A borescopic device and an associated method are provided that permit the controlled movement of the object under test both angularly and along several different axes, such that the object including its internal surfaces, can be thoroughly inspected in a controlled ... | 03/25/2008 |
| 7336376 | Measuring pyramid size on a textured surface A method for measuring pyramid size of pyramids outwardly extending on a textured surface of an object, which method involves emitting from a light source a light beam along a first direction onto a region of the textured surface, measuring an intensity of light rec... | 02/26/2008 |
| 7333218 | Systems and methods for determining the location and angular orientation of a hole with an obstructed opening residing on a surface of an article Provided are systems 10 and methods 100 for determining both the location and angular orientation of holes 12 with openings 14 on a surface 16 of an article 18 that are at least partially obstructed. In a method of the prese... | 02/19/2008 |
| 7289202 | Methods for testing durable optical elements A method includes providing a polymerized optical film structure having a microstructured surface, forming a scratch having a length on the microstructured surface to form a scratched optical film, illuminating the scratched optical film to form an illuminated scrat... | 10/30/2007 |
| 7289232 | Dimension measurement method, method of manufacturing semiconductor device, dimension measurement apparatus and measurement mark A dimension measurement method includes irradiating a measurement mark on a sample on which a pattern to be measured is formed with light from a measurement direction, detecting reflected diffracted light from the measurement mark to measure intensity thereof, and c... | 10/30/2007 |
| 7253889 | Shaft cone metrology system and method Aspects include metrology methods and systems for determining characteristics of conical shaft portions, such as angle of taper. In an example, a metrology system includes a fixture for supporting a workpiece. The fixture provides for translation in a longitudinal d... | 08/07/2007 |
| 7235474 | System and method for imprint lithography to facilitate dual damascene integration with two imprint acts A system and method are provided to facilitate dual damascene interconnect integration with two imprint acts. The method provides for creation of a pair of translucent imprint molds containing the dual damascene pattern to be imprinted. The first imprint mold of the... | 06/26/2007 |
| 7194896 | Surface hardness distribution measuring method and apparatus It is possible to blast air on a surface portion of a measured object from a hole of pressing means, project illumination light in a concentric pattern with an optical element and shoot the measured object with a CCD so as to visually grasp hardness distribution on ... | 03/27/2007 |
| 7186977 | Method for non-destructive trench depth measurement using electron beam source and X-ray detection A method (and system) for non-destructive measurement of a depth of a feature in a structure, includes using a scanning electron microscope (SEM) image to navigate to find the feature in an X-ray image, using an electron beam to produce a fluorescent emission in the... | 03/06/2007 |
| 7187454 | Measuring device While a ball 14 is inserted into a hole WA of a workpiece W and is moved in the longitudinal direction of the hole WA while automatically centripetally moved, a change of back pressure of a gas injected into the hole WA is detected by a converter 30, a... | 03/06/2007 |
| 7141440 | Apparatus and method for measuring a property of a layer in a multilayered structure A property of a layer is measured by: (1) focusing a heating beam on a region (also called “heated region”) of a conductive layer (2) modulating the power of the heating beam at a predetermined frequency that is selected to be sufficiently low to ensure that at ... | 11/28/2006 |
| 7136159 | Excimer laser inspection system A system and method for inspecting a specimen, such as a semiconductor wafer, including illuminating at least a portion of the specimen using an excimer source using at least one relatively intense wavelength from the source, detecting radiation received from the il... | 11/14/2006 |
| 7120109 | Optical pickup with improved collimating lens for use with long and short wavelength laser beams An optical pickup capable of effectively reducing chromatic aberration that includes a collimating lens, which includes a diverging lens with diverging power and a focusing lens with focusing power, arranged on the optical path between a light source and an objectiv... | 10/10/2006 |
| 7110124 | Method and apparatus for obtaining geometrical data relating to a canal The invention uses light to determine the distance from the tip of a probe to the internal wall of the canal, and based on the position of the probe, this information is used to generate information about the shape of the canal. Light with a first and a second wavel... | 09/19/2006 |
| 7096712 | Material testing system for turbines The wear resistance of impellers used in multi-stage turbine pumps is tested by using a multi-stage turbine pump having impellers with different physical properties to pump a fluid containing small amounts of an abrasive material. After the fluid has been pumped for... | 08/29/2006 |
| 7046356 | Method for processing in situ inspection reformer tube data The present invention relates to a method for processing a signal obtain, from an in situ reformer tube inspection, that includes X, Y, and intensity data sets for each pixel of a sensor from an image sensor receiving a substantially ring shaped image. The method co... | 05/16/2006 |
| 7035507 | Manufacturing method for optical element A manufacturing method for an optical element includes providing a base member for an optical element and a cutting tool from which a blade tip part protrudes, forming an inspecting groove on a surface of the base member by the blade tip part of the cutting tool by ... | 04/25/2006 |
| 7019849 | Depth measuring apparatus A depth measuring apparatus is disclosed that comprises a mover for moving in an optical axis direction an objective lens for condensing a parallel light beam from a light emitter onto a measurement spot of a sample and converting light from the measurement spot to ... | 03/28/2006 |
| 7016052 | Apparatus for measuring characteristics of a hole and associated method The apparatus and method of the present invention provide a quick, simple and accurate manner in which to measure the dimensions or characteristics of a hole without contacting the hole. The apparatus and method of the present invention also automatically detect dif... | 03/21/2006 |
| 7009712 | Leaky guided wave modes used in interferometric confocal microscopy to measure properties of trenches A method of using an interferometric confocal microscope to measure features of a trench or via in a substrate, wherein the interferometric confocal microscope produces a measurement beam, the method involving: focusing the measurement beam at a selected location at... | 03/07/2006 |
| 6978664 | Dual function indenter A dual function indenter for use in a nanoindentation system is disclosed. The indenter of the present invention includes an indentation tip having a machined flat at its distal end forming a compression platen. A sharp imaging probe tip adjacent the machined flat e... | 12/27/2005 |
| 6971791 | Identifying defects in a conductive structure of a wafer, based on heat transfer therethrough Heat is applied to a conductive structure that includes one or more vias, and the temperature at or near the point of heat application is measured. The measured temperature indicates the integrity or the defectiveness of various features (e.g. vias and/or traces) in... | 12/06/2005 |
| 6958814 | Apparatus and method for measuring a property of a layer in a multilayered structure An apparatus measures a property of a layer (such as the sheet resistance of a conductive layer) by performing the following method: (1) focusing the heating beam on the heated a region (also called “heated region”) of the conductive layer (2) modulating the pow... | 10/25/2005 |
| 6940592 | Calibration as well as measurement on the same workpiece during fabrication Two more measurements are made on the same workpiece, during fabrication. Each measurement may be made employing a different process. The measurements are used together to determine a property of the workpiece. For example, multiple measurements from a first process... | 09/06/2005 |
| 6911349 | Evaluating sidewall coverage in a semiconductor wafer A sidewall or other feature in a semiconductor wafer is evaluated by illuminating the wafer with at least one beam of electromagnetic radiation, and measuring intensity of a portion of the beam reflected by the wafer. Change in reflectance between measurements provi... | 06/28/2005 |
| 6906801 | Measuring a property of a layer in multilayered structure An apparatus measures a property of a layer (such as the sheet resistance of a conductive layer or thermal conductivity of a dielectric layer that is located underneath the conductive layer) by performing the following method: (1) focusing the heating beam on the he... | 06/14/2005 |
| 6882436 | Non-contact hole depth gage Disclosed is a method that utilizes optics to measure a hole depth in a workpiece. The method involves placing a light recording apparatus and a light source apparatus proximate a hole. Light is then emitted from the light source apparatus and is directed into the h... | 04/19/2005 |
| 6878301 | Methods and apparatuses for trench depth detection and control A method for optically detecting a trench depth includes detecting a first maxima in an intensity of multi-wavelength light. A portion of the multi-wavelength light is reflected from a top trench surface. A second maxima in an intensity of multi-wavelength light is ... | 04/12/2005 |
| 6806969 | Optical measurement for measuring a small space through a transparent surface The invention provides a system and method for reliably and accurately measuring the gap between two materials when the depth of gap is less than the smallest distance that an optical thickness gauge (OTG) is able to measure. The invention is practiced by forming a ... | 10/19/2004 |
| 6795201 | Method of objectively evaluating a surface mark A method of objectively evaluating a surface mark provides an objective test methodology for the optical quantification of surface marks. The method may include the steps of reproducibly producing a surface mark on an object and optically evaluating the surface mark... | 09/21/2004 |
