Celebrity Inventors
Actor Marlon Brando has four patents, all named "Drumhead tensioning device and method."
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8125650 | Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method A reflecting member has: a first reflecting surface, which extends in a second direction that includes a first direction component; a second reflecting surface, which extends in a third direction that includes the first direction component, that is substantially sym... | 02/28/2012 |
| 8064067 | Exposure apparatus and exposure method Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in rel... | 11/22/2011 |
| 7978340 | System and method for determining positions of structures on a substrate A system and a method for determining positions of structures on a substrate are disclosed. The system includes at least one measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9) and... | 07/12/2011 |
| 7978339 | Lithographic apparatus temperature compensation A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination syste... | 07/12/2011 |
| 7969580 | Method and system for step-and-align interference lithography A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measur... | 06/28/2011 |
| 7961334 | Coordinate measuring machine for measuring structures on a substrate A coordinate measuring machine (1) for measuring structures (3) on a substrate (2) including a measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9), at least on... | 06/14/2011 |
| 7948635 | Method for determining positions of structures on a substrate A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit... | 05/24/2011 |
| 7929149 | Coordinate measuring machine and a method for correcting non-linearities of the interferometers of a coordinate measuring machine A method and a coordinate measuring machine (1) are provided, wherein the non-linearities of an interferometer (24) can be corrected. A measuring stage (20) traversable in a plane (25a) is provided for measurement. The substrate ( | 04/19/2011 |
| 7907287 | Positioning apparatus, exposure apparatus and device manufacturing method in which a correction unit corrects a value measured by a selected measuring device A positioning apparatus, which positions a stage, includes a measurement system that measures a position of the stage. The measurement system includes a plurality of measuring devices that are spaced apart from each other along a first direction and measure a positi... | 03/15/2011 |
| 7903259 | Device for determining the position of at least one structure on an object, use of an illumination apparatus with the device and use of protective gas with the device A device for determining the position of a structure (3) on an object (2) in relation to a coordinate system is disclosed. The object (2) is placed on a measuring table (20) which is movable in one plane (25a), wherein a blo... | 03/08/2011 |
| 7903258 | System and method for positioning a product using a laser interferometer A system for positioning a product, comprising a chuck for supporting the product, an intermediate stage supporting said chuck, and a stationary base supporting said intermediate stage. The chuck can move with respect to the intermediate stage in a first direction X... | 03/08/2011 |
| 7876452 | Interferometric position-measuring devices and methods Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includ... | 01/25/2011 |
| 7872763 | Device for measuring the position of at least one structure on a substrate A device for measuring the position of at least one structure on a substrate is disclosed. The substrate to be measured is positioned in a mirror body. A flat insert is provided in the mirror body and is formed such that the substrate and the insert together always ... | 01/18/2011 |
| 7864337 | Positioning apparatus, exposure apparatus, and device manufacturing method A positioning apparatus comprises a first measuring device measuring a position of the stage in a first measuring range, a second measuring device measuring a position of the stage in a second measuring range having an overlapping range overlapping the first measuri... | 01/04/2011 |
| 7835011 | Systems and methods for determining a position of a support A method for determining a change in a position of a support is described. The method includes determining the change in the position of the support used in an imaging system, where determining the change includes computing the position by operating a photodetector ... | 11/16/2010 |
| 7826063 | Compensation of effects of atmospheric perturbations in optical metrology In general, in a first aspect, the invention features a method that includes using an interferometry assembly to provide three different output beams, each output beam including an interferometric phase related to an optical path difference between a corresponding f... | 11/02/2010 |
| 7812965 | Multiple-degree of freedom interferometer with compensation for gas effects The disclosure features multiple degree-of-freedom interferometers (e.g., non-dispersive interferometers) for monitoring linear and angular (e.g., pitch and/or yaw) displacements of a measurement object with compensation for variations in the optical properties of a... | 10/12/2010 |
| 7812964 | Distance measuring interferometer and encoder metrology systems for use in lithography tools In general, in one aspect, the invention features a system that includes a moveable stage, an interferometer configured to provide information about a first degree of freedom of the stage, an encoder configured to provide information about a second degree of freedom... | 10/12/2010 |
| 7751060 | Position measuring method, position measuring system, and exposure apparatus A position measuring system includes a laser interferometer, and a wavelength detection unit detecting the wavelength change of a laser beam. A phase compensation unit compensates for the wavelength change detected by the wavelength detection unit based on the phase... | 07/06/2010 |
| 7751059 | Method for correcting disturbances in a level sensor light path A level sensor for determining a height of a substrate. In one configuration, the level sensor forms part of a lithographic apparatus that includes a projection lens system. The level sensor generates one or more measurement beams and directs the measurement beam to... | 07/06/2010 |
| 7738114 | Exposure apparatus configured to minimize effects of mechanism for measuring stage position on peripheral mechanism and device-manufacturing method An exposure apparatus includes a stage configured to hold an original thereon and to move in a horizontal direction, a first interferometer configured to emit first measurement light used for measuring a position of the stage in a vertical direction thereof, a first... | 06/15/2010 |
| 7733498 | Exposure apparatus, method of controlling the same, and manufacturing method An exposure apparatus comprises an optical system support supporting a projection optical system, a stage surface plate, first stage and second stages, a first interferometer configured to measure stage position in a first area, a second interferometer configured to... | 06/08/2010 |
| 7646488 | Positioning apparatus, exposure apparatus, and device manufacturing method A positioning apparatus includes a stage base, a stage moving along a surface of the stage base, a cable having one end connected to the stage, and a straightening structure configured to straighten air currents around the cable. The straightening structure is provi... | 01/12/2010 |
| 7636166 | Interferometer system for monitoring an object In general, in one aspect, the invention features a system that includes a first object mounted relative to a second object, the first object being moveable with respect to the second object. The system includes a plurality of interferometers each configured to deri... | 12/22/2009 |
| 7616322 | Cyclic error compensation in interferometry systems An interference signal S(t) is provided from interference between two beams directed along different paths. The signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive inde... | 11/10/2009 |
| 7548322 | Multi-axis interferometers and methods and systems using multi-axis interferometers In general, in one aspect, the invention features an apparatus including a multi-axis interferometer configured to produce at least three output beams each including interferometric information about a distance between the interferometer and a measurement object alo... | 06/16/2009 |
| 7548321 | Method for enhancing the measuring accuracy when determining the coordinates of structures on a substrate A method for the high-precision measurement of coordinates on a substrate is disclosed. The substrate is placed on a stage moveable in X/Y coordinate directions. First, a plurality of images of a structure on a substrate are imaged by means of a 2-dimensional detect... | 06/16/2009 |
| 7528960 | Method for enhancing the measuring accuracy when determining the coordinates of structures on a substrate A method for the high-precision measurement of coordinates of at least one structure on a substrate. A stage traversable in X/Y coordinate directions is provided, which is placed in an interferometric-optical measuring system. The structure on the substrate is image... | 05/05/2009 |
| 7518732 | Multi-axis interferometer system using independent, single axis interferometers Improved systems, apparatus, and methods for detecting positions of moving stages and a reference position of a beam column are provided. For some embodiments, independent discrete interferometers may be utilized for distance measurements in each axis, rather than a... | 04/14/2009 |
| 7515277 | Stage apparatus, control system, exposure apparatus, and device manufacturing method A stage apparatus includes X- and Y-axis laser interferometers each of which measures the position a stage, a wavelength compensator which compensates for the wavelength change of a laser beam from each of the X- and Y-axis laser interferometers, a fan duct which is... | 04/07/2009 |
| 7495771 | Exposure apparatus In an exposure apparatus having a plurality of substrate stages moving between a plurality of stations, errors due to the combination of the stage and a position measuring unit, such as Abbe error and errors due to the surface configuration of a reflection mirror, a... | 02/24/2009 |
| 7474409 | Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof An improved lithographic interferometer system, is presented herein. The lithographic interferometer system comprises a beam generating mechanism, mirrors which reflect those beams, and detection devices for detecting an interference pattern of overlapping reflected... | 01/06/2009 |
| 7450246 | Measuring device and method for determining relative positions of a positioning stage configured to be moveable in at least one direction A measuring apparatus for determining relative positions of a positioning stage arranged in a moveable fashion in at least one direction by a predeterminable maximum traversing path. The measuring device comprises at least one interferometric measuring means and at ... | 11/11/2008 |
| 7443511 | Integrated plane mirror and differential plane mirror interferometer system A lithographic interferometer system includes a beam generating mechanism, mirrors which reflect those beams, and detection devices configured to detect an interference pattern of overlapping reflected beams. The beam generating mechanism includes a beam-splitter, w... | 10/28/2008 |
| 7433050 | Exposure apparatus and exposure method Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in rel... | 10/07/2008 |
| 7433048 | Interferometer systems for measuring displacement and exposure systems using the same Interferometer systems for measuring displacement include a displacement interferometer. This interferometer includes a displacement converter responsive to a measuring beam of light. The displacement converter is configured to transform movement thereof in a direct... | 10/07/2008 |
| 7433049 | Multi-axis interferometer with procedure and data processing for mirror mapping In general, in one aspect, the invention features methods that include locating a plurality of alignment marks on a moveable stage, interferometrically measuring a position of a measurement object along an interferometer axis for each of the alignment mark locations... | 10/07/2008 |
| 7433018 | Pattern alignment method and lithographic apparatus A method for aligning a substrate in a lithographic apparatus, the method including irradiating a first target portion of the substrate with a first patterned beam to form a first pattern on the substrate. Then, a second target portion of the substrate is irradiated... | 10/07/2008 |
| 7397039 | Real-time compensation of mechanical position error in pattern generation or imaging applications Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some embodiments, rather than rely on two dimensional position measurements, measurem... | 07/08/2008 |
| 7382469 | Exposure apparatus for manufacturing semiconductor device, method of exposing a layer of photoresist, and method of detecting vibrations and measuring relative position of substrate during an exposure process Defects are prevented from occurring during an exposure process by detecting vibration of and measuring the relative position of components of the exposure apparatus. The exposure apparatus includes an external frame on which a reference mirror is disposed, a projec... | 06/03/2008 |
