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| Number | Title | Issue Date |
| 7312865 | Method for in situ monitoring of chamber peeling A method for in situ monitoring of particles generated by a reaction by-product film peeling from an interior wall of a reaction chamber of a semiconductor fabrication apparatus to determine reaction chamber condition. The method includes the steps of: exciting the ... | 12/25/2007 |
| 7312920 | Confocal microscope A confocal microscope including a first condenser optical system that condenses light from a light source onto a sample; a pinhole member having a pinhole; a second condenser optical system that condenses light from the sample into the pinhole; a polygon mirror havi... | 12/25/2007 |
| 7310140 | Method and apparatus for inspecting a wafer surface In a method and an apparatus for inspecting a wafer surface, a wafer is loaded into a chamber. An incident light including a first light for sensing a vertical position of the wafer and a second light for inspecting the wafer surface is irradiated onto the wafer. Th... | 12/18/2007 |
| 7310141 | Inspection device and inspection method for pattern profile, exposure system Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the p... | 12/18/2007 |
| 7307713 | Apparatus and method for inspection of a wafer The invention concerns an apparatus and a method for inspection of a wafer. The apparatus encompasses at least one stroboscopic incident-light illumination device for emitting a pulsed illuminating light beam onto a surface of the wafer and for illuminating a... | 12/11/2007 |
| 7307712 | Method of detecting mask defects, a computer program and reference substrate A method of detecting mask defects in which a reference substrate is patterned by the mask immediately after manufacture of the mask is disclosed. The reference substrate is stored in clean conditions while IC manufacture takes place. When a mask defect is suspected... | 12/11/2007 |
| 7308127 | Method for determining and evaluating defects in a sample surface In this method, the surface to be investigated is first of all exposed to collimated light and the radiation rejected therefrom supplied to a position-resolving image processing means. Then, a mask is generated on the basis of the image supplied by the image process... | 12/11/2007 |
| 7305119 | Test head for optically inspecting workpieces Apparatus for simultaneously optically inspecting top and bottom surfaces of a workpiece comprise upper and lower test heads, each head comprising at least one laser for providing a laser beam that scans its associated workpiece surface and at least one detector for... | 12/04/2007 |
| 7304310 | Methods and systems for inspecting a specimen using light scattered in different wavelength ranges Methods and systems for inspecting a specimen are provided. One method includes directing ultraviolet light to a specimen. The method also includes detecting light scattered from the specimen having a selected wavelength range. In addition, the method includes detec... | 12/04/2007 |
| 7304731 | Systems and methods for providing illumination of a specimen for inspection Systems and methods for providing illumination of a specimen for inspection are provided. One system includes one or more first optical elements configured to illuminate a diffuser with a predetermined pattern of coherent light. The system also includes one or more ... | 12/04/2007 |
| 7304730 | Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a f... | 12/04/2007 |
| 7302360 | Defect size projection A system and method of inspecting semiconductor wafers that is capable of determining a scattering power associated with a wafer surface defect whether or not the scattering power associated with the defect exceeds the dynamic range of the system. The scattering pow... | 11/27/2007 |
| 7301606 | Supporting plate, stage device, exposure apparatus, and exposure method For example, to control an effect due to entrance and leakage of liquid for exposure and allow a preferable exposure processing, a support surface is provided which supports an object. The support surface is liquid repellant, and a collection device is provided whic... | 11/27/2007 |
| 7301165 | Methods and apparatus for inspecting an object A method for inspecting an object using a structured light measurement system that includes a light source for projecting light onto a surface of the object and an imaging sensor for receiving light reflected from the object. The method includes determining a positi... | 11/27/2007 |
| 7301620 | Inspecting apparatus, image pickup apparatus, and inspecting method An inspecting apparatus includes an illuminating optical system which irradiates irradiation light onto an object to be inspected, an object placing stage which moves the object along a first direction, an accumulative sensor which converts a transmitted image of th... | 11/27/2007 |
| 7301871 | Method and device for detecting the signal on a disc having a defect by utilizing an RF signal and its derivatives The device includes a servo control unit, a data path control unit, a defect detection unit, and a logic combination unit. The data path control unit further includes a preamplifier receiving data from a lens and generating RF signals for data process. The defect de... | 11/27/2007 |
| 7301634 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an in... | 11/27/2007 |
| 7298471 | Surface inspection apparatus and surface inspection method A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the subst... | 11/20/2007 |
| 7298470 | Defect inspection device for metal ring end faces of a continuously variable transmission belt A defect inspection device for metal ring end faces of a Continuously Variable Transmission (CVT) V-belt which enables automated inspection of end face defects in the metal rings along with acquiring improved efficiency, superb precision and reproducibility. When en... | 11/20/2007 |
| 7298496 | Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry Methods and apparatus based on optical homodyne displacement interferometry, optical coherent-domain reflectometry (OCDR), and optical interferometric imaging are disclosed for overlay, alignment mark, and critical dimension (CD) metrologies that are applicable to m... | 11/20/2007 |
| 7295330 | Film mapping system A materials properties measuring system for using electromagnetic radiation interactions with selected materials positioned at a measuring location to determine selected properties thereof having an electromagnetic radiation source along with a plurality of radiatio... | 11/13/2007 |
| 7295301 | Dual stage defect region identification and defect detection method and apparatus A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a ... | 11/13/2007 |
| 7295300 | Detecting surface pits A system to detect pits in a surface comprises first and second radiation targeting assemblies to target a second radiation beam onto a surface, a first radiation collecting assembly that collects radiation scattered from the surface, a processor coupled to the firs... | 11/13/2007 |
| 7295293 | Apparatus and method for testing a reflector coating A method of testing a coating on a reflector having a first focal point includes placing a mirror at the first focal point of the reflector and angled to orient with an area on the coating. Electromagnetic (EM) radiation is directed to the mirror which then directs ... | 11/13/2007 |
| 7295299 | Device for optically measuring surface properties An apparatus for optical measurement of surface properties wherein a light spot is produced by an illumination device and reflected light is measured by a multiplicity of optical sensors. In the evaluation, the individual signals of sensors, at least a multiplicity ... | 11/13/2007 |
| 7291856 | Sensor and methods for measuring select components in moving sheet products A compact, long lasting sensor for measuring components such as moisture in moving sheets including paper in a papermaking apparatus employs light sources that produce radiation within defined wavelength regions of interest and the light sources are modulated at hig... | 11/06/2007 |
| 7292341 | Optical system operating with variable angle of incidence An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for c... | 11/06/2007 |
| 7292330 | Wafer inspection with a customized reflective optical channel component A method is described that adjusts the position of a item and sets a tilt angle for each of a plurality of micro-mirrors of a digital micro-mirror device. The setting of the tilt angles is to establish a filter within the optical channel of an inspection tool that i... | 11/06/2007 |
| 7292393 | Variable illuminator and speckle buster apparatus Disclosed is an apparatus for illuminating a sample. In one embodiment, this apparatus includes a laser for outputting an incident laser beam towards a sample and a first diffractive element having a plurality of diffraction pattern portions. The first diffractive e... | 11/06/2007 |
| 7292949 | Method and apparatus for estimating surface moisture content of wood chips Method and apparatus for estimating surface moisture content of wood chips employing a surface moisture measurement obtained from a non-contact surface moisture sensor, which measurement is calibrated with values of a set of optical parameters, such as HSL color cam... | 11/06/2007 |
| 7292329 | Test head for optically inspecting workpieces comprising a lens for elongating a laser spot on the workpieces An optical test head comprises a laser source for providing a laser beam. The laser beam passes through a cylindrical lens for modifying the shape of the beam and a spherical lens for concentrating the beam onto a workpiece (typically a magnetic disk platter). The c... | 11/06/2007 |
| 7292335 | Optical measurements of patterned structures A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator (8) for g... | 11/06/2007 |
| 7292320 | Laser crystallization apparatus and laser crystallization method A laser crystallization apparatus, which enables an observation of a high spatial resolution with several μm and a high temporal resolution with several nanoseconds, comprising a crystallization optical system to irradiate a laser light to a thin film provided on a... | 11/06/2007 |
| 7292328 | Method for inspection of a wafer Defects on a wafer (26) can be detected using bright-field and/or dark-field illumination. The radiation incident onto the wafer (26) has, in this context, a substantial influence on the reliability of the measurement results. To improve the reliabilit... | 11/06/2007 |
| 7292327 | Circuit-pattern inspection apparatus The disclosed subject matter is related to a circuit pattern inspection apparatus for detecting a gradual changing of defect expanding over a large area of the semiconductor wafer. In order to detect a gradual changing of a defect related condition expanding over a ... | 11/06/2007 |
| 7289200 | Confocal reflectommeter/ellipsometer to inspect low-temperature fusion seals A device and method for measuring a fusion seal quality within a structure comprising a source for providing a focused optical beam of a known intensity to a fusion seal within a structure, the fusion seal reflecting the optical beam according to the fusion seal qua... | 10/30/2007 |
| 7289234 | Method and system for thin film characterization A method and system are presented for optical measurements in multi-layer structures to determine the properties of at least some of the layers. The structure is patterned by removing layer materials within a measurement site of the structure from the top layer to t... | 10/30/2007 |
| 7289202 | Methods for testing durable optical elements A method includes providing a polymerized optical film structure having a microstructured surface, forming a scratch having a length on the microstructured surface to form a scratched optical film, illuminating the scratched optical film to form an illuminated scrat... | 10/30/2007 |
| 7289213 | Apparatus and methods for detecting overlay errors using scatterometry Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, t... | 10/30/2007 |
| 7289219 | Polarimetric scatterometry methods for critical dimension measurements of periodic structures An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polari... | 10/30/2007 |
