Did You Know...
...that when IBM conducted a market study of Chester Carlson's invention in 1959, the company concluded that it would take only 5000 units of his new product to saturate the market? IBM therefore declined to be part of the new product introduction. Too bad for IBM. Carlson's invention was the xerography process, and his new product was the beginning of the Xerox Corporation. It is estimated that every day, worldwide, 3,000,000,000 copies are made!!
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| Number | Title | Issue Date |
| 7126766 | Optical stop apparatus and exposure apparatus having the same An optical stop unit includes plural light blocking plates, and a cam mechanism for driving the plural light blocking plates to vary an aperture diameter, the cam mechanism including a cam follower and a cam groove, wherein the cam follower and cam groove have mutua... | 10/24/2006 |
| 7126669 | Method and system for automated process correction using model parameters, and lithographic apparatus using such method and system A method for aligning a substrate in a lithographic apparatus is presented. The substrate includes a plurality of alignment marks. The alignment marks have been defined by a second lithographic apparatus and are arranged to provide a substrate grid as a coordinate s... | 10/24/2006 |
| 7126137 | Illumination system with field mirrors for producing uniform scanning energy This invention relates to an Ilumination system for scanning lithography especially for wavelengths≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in tha... | 10/24/2006 |
| 7126665 | Print processing method, printing order receiving machine and print processing device A method and a device are provided for automating receipt of orders for additional printing of a photographic print, including order information relating to desired image processing. In a print order receiving machine, when a photographic print is inserted, an image... | 10/24/2006 |
| 7126689 | Exposure method, exposure apparatus, and method for producing device An exposure apparatus for exposing a substrate with an exposure light beam passing through a mask comprises a movable stage for moving the substrate, a stage chamber for accommodating the movable stage, a transport system for transporting the substrate into the stag... | 10/24/2006 |
| 7120895 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/10/2006 |
| 7119881 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus, an isolator is provided between the substrate table and the projection system to, for example, prevent currents in the liquid exerting forces on the projection system that might tend to distort the reference frame to which said... | 10/10/2006 |
| 7116404 | Lithographic apparatus and device manufacturing method A system and method for use in a lithographic environment include an illumination system, an array of individually controllable elements, a projection system, and a substrate. The projection system comprises an array of lenses. The apparatus also includes a sensor s... | 10/03/2006 |
| 7117478 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/03/2006 |
| 7116398 | Lithographic apparatus and device manufacturing method A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pa... | 10/03/2006 |
| 7116450 | System and method for selecting photographic images using index prints A method for remotely selecting and ordering photographic prints, includes the steps of: sending a photographic film bearing a plurality of latent images to a photofinisher; developing the photographic film to produce visible images and scanning the visible images t... | 10/03/2006 |
| 7117477 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/03/2006 |
| 7116411 | Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems A method of optimizing a process for use with a plurality of lithography systems. The method includes the steps of: (a) determining a calibrated resist model for a given process and a target pattern utilizing a first lithography system; (b) selecting a second lithog... | 10/03/2006 |
| 7114145 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 09/26/2006 |
| 7113627 | Location of extended linear defects A method of locating a linear defect on a photographic element, the element having a useful imaging width and the defect aligned with length of the element, includes the steps of: exposing a region of the element to create a latent image which is substantially unifo... | 09/26/2006 |
| 7113259 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have different first and second indices of refraction, respectively. The first fl... | 09/26/2006 |
| 7111277 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 09/19/2006 |
| 7109508 | Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus An exposure apparatus and method in which a mark on an object is illuminated, and plural pairs of two diffractive beams of same order are generated and directed to different reference gratings to detect positional information of the mark. Beams received from the dif... | 09/19/2006 |
| 7109497 | Illumination system particularly for microlithography There is provided an illumination system, particularly for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optic... | 09/19/2006 |
| 7110491 | Measurement of critical dimensions using X-ray diffraction in reflection mode A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in t... | 09/19/2006 |
| 7106414 | Exposure system and method for manufacturing device An exposure system is provided which can maintain a predetermined performance of the exposure apparatus stably by maintaining a cooling capacity by preventing a negative pressure from being generated in a circulation path of the liquid and preventing the back pressu... | 09/12/2006 |
| 7102748 | Lithographic apparatus, device manufacturing method, and computer program A lithographic production process according to one embodiment comprises an input section, pre-imaging processes, measurement of a substrate, exposure of the substrate, post-imaging processes, and output. A controller controls the time spent processing in the scanner... | 09/05/2006 |
| 7102728 | Imaging optical system evaluation method, imaging optical system adjustment method, exposure apparatus and exposure method The evaluation method comprises a step (S11) of setting an aberration polynomial that generally expresses the aberration of the imaging optical system as a function of the image plane coordinates and pupil coordinates, a measurement step (S12) of measu... | 09/05/2006 |
| 7102731 | Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108... | 09/05/2006 |
| 7102732 | Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam. ... | 09/05/2006 |
| 7102736 | Method of calibration, calibration substrate, and method of device manufacture A method of calibration according to one embodiment includes moving a table to a plurality of exposure positions. At each position, a first part of a measurement system measures a position of the table along each of two orthogonal axes in the plane, and a mark is ex... | 09/05/2006 |
| 7098944 | Image processing apparatus and method In converting image sensing data into image data, a plurality of image sensing data meeting a predetermined condition are processed as a group of image sensing data. An image reproduction parameter is obtained from this image sensing data group, and each image sensi... | 08/29/2006 |
| 7099010 | Two-dimensional structure for determining an overlay accuracy by means of scatterometry A two-dimensional periodic pattern that is symmetrical with respect to a first and a second direction allows the determination of an overlay accuracy that is obtained during the fabrication of the two-dimensional structure. Due to the symmetry of the structure, the ... | 08/29/2006 |
| 7099011 | Method and apparatus for self-referenced projection lens distortion mapping A projection lens distortion error map is created using overlay targets and a special numerical algorithm. A reticle including an array of overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic stepper. After expos... | 08/29/2006 |
| 7095525 | Image processing apparatus and image processing method When reading image data stored on a detachable storage medium such as a magneto-optical disk and outputting the data using an image outputting device, data regarding modes in which the image data is to be output is stored in advance on a storage medium by an apparat... | 08/22/2006 |
| 7095481 | Exposure method and apparatus An exposure method for projecting, through a projection optical system, a predetermined pattern formed on a mask onto an object to be exposed. The exposure method includes the steps of dividing an effective light source area for illuminating the mask into plural poi... | 08/22/2006 |
| 7095484 | Method and apparatus for maskless photolithography A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a ... | 08/22/2006 |
| 7094506 | Lithographic apparatus and device manufacturing method A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced fr... | 08/22/2006 |
| 7092068 | Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device A reticle includes a first mask portion including a first opaque portion, first and second exposure monitor patterns provided within first and second window portions in the first opaque portion, increasing transmittances in a first direction and a direction reverse ... | 08/15/2006 |
| 7092071 | Exposure apparatus and method, and device fabricating method using the same An exposure apparatus includes a projection optical system for exposing and transferring a pattern on a mask onto an object, an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in the projection optical sy... | 08/15/2006 |
| 7088432 | Dynamic mask projection stereo micro lithography Three-dimensional structures are fabricated by a process in which a 3D solid model is designed by software at a PC and sliced into a series of 2D layers. Each 2D layer is displayed at a dynamic mask via micro-mirror deflections projected onto a photoresist to form a... | 08/08/2006 |
| 7088425 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus An exposure apparatus includes a plurality of projection optical systems and a substrate stage. Each of the plurality of projection optical systems forms an exposure field on the substrate. The substrate stage holds the substrate and moves in at least a scanning dir... | 08/08/2006 |
| 7088426 | Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method When a pattern is transferred via a projection optical system, a size of an image of the pattern varies depending on a defocus amount of a transferring position from the best focus position, and a flucuation curve showing the variation (the so-called CD-focus curve)... | 08/08/2006 |
| 7088423 | Edge exposing apparatus An edge exposing apparatus includes a photo detector and a lighting time measuring circuit for detecting a decrease in performance of light source units. The lighting time measuring circuit detects a ready state ((stabilization of luminous intensity) of the light so... | 08/08/2006 |
| 7088422 | Moving lens for immersion optical lithography An apparatus for immersion optical lithography having a lens capable of relative movement in synchrony with a horizontal motion of a semiconductor wafer in a liquid environment where the synchronous motion of the lens apparatus and semiconductor wafer advantageously... | 08/08/2006 |
