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| Number | Title | Issue Date |
| 7330236 | Exposure apparatus, and device manufacturing method using the same Disclosed is an exposure apparatus having a specific structure that includes a cold trap plate for attracting contaminant substances which might cause a decrease of reflectance of a mirror when adhered thereto, and a radiation shield member for preventing excessive ... | 02/12/2008 |
| 7327449 | Exposure apparatus inspection method and exposure apparatus An inspection method for an exposure apparatus for illuminating a photomask on a first installation member by an illumination optical system, and for projecting an image of a pattern of the photomask onto a substrate on a second installation member through a project... | 02/05/2008 |
| 7327436 | Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product A method for evaluating a local flare in an exposure tool, includes: measuring a projection light intensity distribution by transferring a monitor mask pattern onto a semiconductor substrate; calculating a first ratio between an illumination light intensity on the m... | 02/05/2008 |
| 7327435 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assemb... | 02/05/2008 |
| 7324186 | Lithographic apparatus and device manufacturing method An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substra... | 01/29/2008 |
| 7321415 | Environmental system including vacuum scavenge for an immersion lithography apparatus An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that... | 01/22/2008 |
| 7321418 | Stage apparatus, exposure apparatus, and device manufacturing method A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on... | 01/22/2008 |
| 7321419 | Exposure apparatus, and device manufacturing method A hydrostatic bearing is provided opposite to a wafer on a table. The hydrostatic bearing maintains the distance between the bearing surface and the wafer in the direction of the optical axis of a projection optical system at a predetermined value. ... | 01/22/2008 |
| 7319260 | Hinged bonding of micromechanical devices A locked hinge based technique for controllably holding surface-micromachined modules off the edge of a substrate for subsequent processing. The mechanism enables reliable, accurate, and low-cost fabrication of even complex multi layer flip-chip MEMS devices using f... | 01/15/2008 |
| 7317504 | Lithographic apparatus and device manufacturing method A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in th... | 01/08/2008 |
| 7317505 | Exposure apparatus and device manufacturing method An exposure apparatus having a projection optical system and configured to expose a substrate to light via a pattern of a mask and the projection optical system. The apparatus includes a chamber to hermetically contain at least part of the projection optical system,... | 01/08/2008 |
| 7317509 | Method and system for automated process correction using model parameters, and lithographic apparatus using such method and system A method for aligning a substrate in a lithographic apparatus is presented. The substrate includes a plurality of alignment marks. The alignment marks have been defined by a second lithographic apparatus and are arranged to provide a substrate grid as a coordinate s... | 01/08/2008 |
| 7317510 | Lithographic apparatus and device manufacturing method A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose patter... | 01/08/2008 |
| 7315349 | Exposure equipment with optical system positioning mechanism and related exposure method Exposure equipment useful in the manufacture of semiconductor devices and a related method of operation are disclosed. The exposure equipment directs light through a reticle and an optical system positioned above a wafer onto a target portion of the wafer, and the w... | 01/01/2008 |
| 7315346 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes... | 01/01/2008 |
| 7315033 | Method and apparatus for reducing biological contamination in an immersion lithography system Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting element and/or an irradiating element is used to direct radiation to kill b... | 01/01/2008 |
| 7312850 | Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator. ... | 12/25/2007 |
| 7310146 | Mark position measuring method and apparatus A method of measuring a position of a mark in a chamber in which a pressure inside the chamber is different from a pressure outside the chamber. The method includes a first detection step of detecting a reference mark fixedly disposed in the chamber, through a windo... | 12/18/2007 |
| 7310129 | Method for carrying out a double or multiple exposure The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Altern... | 12/18/2007 |
| 7307690 | Device manufacturing method, computer program product and lithographic apparatus A method of optimizing adjustable settings of adjustable elements of a projection system in a lithographic apparatus is disclosed that includes determining an object spectrum for a pattern and an illumination arrangement, determining a symmetry of the object spectru... | 12/11/2007 |
| 7304718 | Lithographic apparatus and device manufacturing method An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a contr... | 12/04/2007 |
| 7301602 | Stage apparatus and exposure apparatus A moving element to be propelled across a stator includes a coil unit, including coils, for generating a force to propel the moving unit, and a cooling unit for cooling the coil unit. A thermal conductive member, arranged between the cooling unit and the coil unit, ... | 11/27/2007 |
| 7301622 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This i... | 11/27/2007 |
| 7301607 | Wafer table for immersion lithography Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has ... | 11/27/2007 |
| 7298459 | Wafer handling method for use in lithography patterning A method utilizing a lithography system comprises a lithography patterning chamber, a wafer exchange chamber separated from the lithography patterning chamber by a first gate valve, and at least one alignment load-lock separated from the wafer exchange chamber by a ... | 11/20/2007 |
| 7298453 | Method and apparatus for irradiating a microlithographic substrate A method and apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation. The method can include directing the radiation along a radiation path in a first direction toward a reticle, passing the radiation from the r... | 11/20/2007 |
| 7295284 | Optical system, exposure apparatus using the same and device manufacturing method An exposure apparatus includes an optical system for guiding light with a central wavelength between 5 and 20 nm from a light source to an object to be exposed, the optical system including a first mirror and a second mirror, a first controller for controlling a tem... | 11/13/2007 |
| 7295179 | Flat panel display having multiple display areas on one glass substrate A flat panel display having a single back glass substrate and a single color filter passive plate divided into multiple, electrically isolated, separately addressable, functional sections having no visible seam between sections. ... | 11/13/2007 |
| 7295291 | Apparatus and process for the determination of static lens field curvature A process for the determination of focal plane deviation uniquely due to the lens field curvature associated with a photolithographic projection tool is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a stepper or sc... | 11/13/2007 |
| 7292310 | Lithographic apparatus and a device manufacturing method A lithographic apparatus and device manufacturing method are disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of... | 11/06/2007 |
| 7292313 | Apparatus and method for providing fluid for immersion lithography Systems and methods control the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space between a lens and a substrate during the immersion lithography process. Fluid is supplied to the space and is recovered fr... | 11/06/2007 |
| 7289212 | Lithographic apparatus, device manufacturing method and device manufacturing thereby The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be... | 10/30/2007 |
| 7286219 | Exposure system, semiconductor device, and method for fabricating the semiconductor device In order to link a defect inspection process before forming contact holes with an exposure process for forming the contact holes, a position (physical coordinates) of a defect on a wafer is stored, the defect having been detected in the defect inspection process bef... | 10/23/2007 |
| 7286267 | Method for rendering an image comprising multi-level pixels A halftoning method utilizes staged, overlapping pixel intensity growth in a halftone cell in rendering a halftone image with multi-level pixels. ... | 10/23/2007 |
| 7286216 | Exposure apparatus inspection method and exposure apparatus An inspection method for an exposure apparatus for illuminating a photomask on a first installation member by an illumination optical system, and for projecting an image of a pattern of the photomask onto a substrate on a second installation member through a project... | 10/23/2007 |
| 7286155 | Optical engine using one-dimensional MEMS device In one embodiment disclosed, an optical engine includes a light modulator coupled to illumination optics and imaging optics. The light modulator may be located at about an object plane. The imaging optics may include a scanner and a spatial filter located at about a... | 10/23/2007 |
| 7283210 | Image shift optic for optical system An apparatus for adjusting image formation includes a first stage, a second stage, an optical element, a counterweight, and an actuator. The first stage is operable to project an original image. A final image corresponding to the original image is formed on the seco... | 10/16/2007 |
| 7283204 | Method of producing an optical imaging system A method of producing an optical imaging system having a plurality of optical elements after the imaging system is initially assembled and adjusted. During a subsequent measurement of the imaging system, the wavefront errors in the exit pupil, or an area conjugate t... | 10/16/2007 |
| 7283236 | Alignment system and lithographic apparatus equipped with such an alignment system A marker structure on a substrate includes line elements and trench elements, the line elements and trench elements each having a length in a first direction and being arranged in an alternating repetitive sequence in a second direction perpendicular to the first di... | 10/16/2007 |
| 7280184 | Assembly and adjusting method of optical system, exposure apparatus having the optical system An adjusting method of an optical system composed plural optical elements each having a multilayer film, said adjusting method that includes a first measuring step that obtains, for each optical element, a difference between a phase distribution of which an EUV ligh... | 10/09/2007 |
