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| Number | Title | Issue Date |
| 7058202 | Authentication with built-in encryption by using moire intensity profiles between random layers This invention discloses new methods, security devices and apparatuses for authenticating documents and valuable articles which may be applied to any support, including transparent synthetic materials and traditional opaque materials such as paper. The invention rel... | 06/06/2006 |
| 7057708 | Projection optical system, exposure apparatus and device fabrication method A projection optical system includes a first optical element that orients an axis [1 1 1] as a crystal orientation in a cubic system crystal parallel to an optical axis, and a second optical element that orients an axis [1 0 0] as the crystal orientation in the cubi... | 06/06/2006 |
| 7057709 | Printing a mask with maximum possible process window through adjustment of the source distribution A lithographic mask is illuminated with light from different directions such that intensities of a plurality of incident beams of light provide a largest possible integrated process window defined in terms of an allowed range for defining shapes. Constrained sets of... | 06/06/2006 |
| 7053390 | Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus In an exposure apparatus and method, an object is exposed through a projection optical system with an exposure beam irradiated on a mask. An illumination system illuminates a mark on the object and a detecting system detects the illuminated mark. Various illuminatio... | 05/30/2006 |
| 7054007 | Calibration wafer for a stepper There is a method for manufacturing wafers. In an example embodiment, the method employs a stepper with a reticle, lens, and stage movement parameters that comprise providing a set of intentionally-misaligned calibration wafers with predetermined input corrections, ... | 05/30/2006 |
| 7053991 | Differential numerical aperture methods Methods for differential numerical aperture analysis of samples, utilizing angle-of-incidence measurements resulting from variable illumination or observation numerical apertures, or both. Metrology applications are provided, and more particularly including scattero... | 05/30/2006 |
| 7053984 | Method and systems for improving focus accuracy in a lithography system A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sens... | 05/30/2006 |
| 7050156 | Method to increase throughput in a dual substrate stage double exposure lithography system A lithography system and method are used to increase throughput using multiple reticles to pattern multiple substrates that are positioned with respect to one another according to a predetermined sequence. For example, during a first exposure period a first reticle ... | 05/23/2006 |
| 7050151 | Exposure apparatus, exposure method, and device manufacturing method To provide an exposure apparatus with which a wafer surface to be exposed can be aligned with a best imaging plane with respect to a reduced focal depth and a high resolution can be attained. The exposure apparatus for exposing a pattern formed on a reticle to an ob... | 05/23/2006 |
| 7050155 | Advanced exposure techniques for programmable lithography Advanced techniques for programmable photolithograhy provide enhanced resolution and other aspects of a photolithography system. The pseudo-inverse of a matrix is applied to the results of a calculation to control exposure energies. ... | 05/23/2006 |
| 7046341 | Method and apparatus for forming pattern on thin substrate or the like A substrate processing apparatus of the present invention has a retaining base which retains a substrate, a device detecting undulation or thickness unevenness, and a control device which operates the detecting device. The substrate is deformed in a range of a field... | 05/16/2006 |
| 7046331 | Lithographic apparatus, device manufacturing method, and device manufactured thereby A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a subs... | 05/16/2006 |
| 7042602 | Image correction apparatus and recording medium having image correction program An image correction apparatus includes: an image obtaining unit that obtains image data from outside constituted of a plurality of pixels each having a value in a color component among a plurality of color components; an average value calculation unit that calculate... | 05/09/2006 |
| 7041989 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide... | 05/09/2006 |
| 7042496 | Photo service system and digital camera A photo service system according to the present invention is structured in an area such as a theme park. The photo service system comprises digital cameras that transmit image data of images captured by the digital cameras, base stations that receive the image data ... | 05/09/2006 |
| 7042550 | Device manufacturing method and computer program System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5 astigmatism, Z9 spherical, and Z12 | 05/09/2006 |
| 7042551 | Method of patterning process metrology based on the intrinsic focus offset A method of controlling imaging and process parameters in a lithographic process comprises providing a control pattern having an isolated feature with a pitch greater than twice a width of an individual feature, and exposing and developing a calibration resist layer... | 05/09/2006 |
| 7038762 | Method and apparatus for irradiating a microlithographic substrate A method and apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation. The method can include directing the radiation along a radiation path in a first direction toward a reticle, passing the radiation from the r... | 05/02/2006 |
| 7034921 | Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant An exposing apparatus for projecting a pattern on an original plate stage onto a substrate of a substrate stage via a projection lens. The apparatus includes a mark detecting apparatus for detecting one or both of a positioning mark on the original plate stage and a... | 04/25/2006 |
| 7034881 | Camera provided with touchscreen An electronic camera is provided with a touchscreen. When a cameraman touches the touchscreen on a principal subject in a captured image shown on the touchscreen, the touched portion is determined and the focus and exposure are adjusted in conformity with the princi... | 04/25/2006 |
| 7034924 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least... | 04/25/2006 |
| 7031020 | Image processing method, apparatus and controller An image forming apparatus and method in which a controller is capable of executing image processing of its own are disclosed. The controller has an RF unit for processing image information, a halftone image processor, a density corrector and a patch generator. The ... | 04/18/2006 |
| 7030962 | Projection exposure mask, projection exposure apparatus, and projection exposure method A projection exposure apparatus includes a projection exposure mask. The projection exposure mask includes a first mask pattern for exposing a member to form a continuous pattern thereon and a second mask pattern for exposing the member to form a discontinuous patte... | 04/18/2006 |
| 7030966 | Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a ... | 04/18/2006 |
| 7031035 | System and method for selecting photographic images using index prints A method for selecting and ordering photographic prints, includes the steps of: obtaining a digital image file containing a plurality of images; employing the digital image file to produce an index print having the plurality of images along with an index number asso... | 04/18/2006 |
| 7027636 | Method of detecting measurement error in measurement system A method of detecting measurement errors in a measurement system includes: a) imaging a pattern, the imaged pattern including a plurality of critical dimension measurement dots, and b) automatically detecting a non-smooth connection of the plurality of the critical ... | 04/11/2006 |
| 7027128 | Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory A scanning exposure apparatus for exposing a substrate to a pattern of a reticle. The apparatus includes an exposure system which exposes the substrate to the pattern with respect to a unit region, to which the pattern is transferred, of the substrate, by relatively... | 04/11/2006 |
| 7027127 | Exposure apparatus, device manufacturing method, stage apparatus, and alignment method An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the orig... | 04/11/2006 |
| 7027195 | Color image processing apparatus and color image processing method Present invention relates to a color image processing apparatus including an input color chip making unit for making a color chip of the selected color signal as an input color chip, an output color chip making unit for subjecting the selected color signal to the un... | 04/11/2006 |
| 7024047 | Apparatus, method, and computer program product for image processing An apparatus for image processing including a region detector, a density conversion unit, a compression unit, and an expansion unit. The region detector detects an edge region in an image data. The density conversion unit reduces a density difference within the edge... | 04/04/2006 |
| 7023885 | Laser apparatus and method for controlling the same A laser apparatus includes a laser element that emits the laser beam. A detector detects the laser beam emitted from the laser element. A controller controls the laser element such that the laser beam is oscillated subject to multiple conditions, such as the emissio... | 04/04/2006 |
| 7023525 | Imaging apparatus An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate... | 04/04/2006 |
| 7023529 | Method for overlay measurement in exposure process A method for overlay measurement in an exposure process uses a multiplex filter having a plurality of filters. A first filter is selected from the plurality of filters and positioned underneath a lens of an overlay measurement apparatus. Next, a determination is mad... | 04/04/2006 |
| 7023530 | Dual source lithography for direct write application A dual exposure source lithography system forms a first and a second portion of a pattern on a wafer. An optical lithography module forms the first portion of the pattern. A non-optical lithography module forms the second portion of the pattern using a non-optical l... | 04/04/2006 |
| 7019856 | System and method for recording/outputting personal image information There is provided a personal image information recording/outputting system capable of inexpensively acquiring an output matter (a printed matter of a photographic image or the like) of personal image information (digital image data) such as a facial photographic ima... | 03/28/2006 |
| 7020331 | Color reproducing system capable of performing selection about whether or not predetermined processing is performed on color image data A color reproducing system includes a color image input section. A color image processing device has an image processing section for performing a predetermined processing on color image data input through the color image input section. A storage section stores there... | 03/28/2006 |
| 7019814 | Lithographic projection mask, device manufacturing method, and device manufactured thereby A method according to one embodiment of the invention may be used in determining relative positions of developed patterns on a substrate (exposed e.g. using the step mode). Such a method uses reference marks which are located within or even superimposed on device pa... | 03/28/2006 |
| 7020350 | Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections The present invention provides a high-precision alignment method, device and code for inspections that compare an inspection image with a reference image and detect defects from their differences. In one embodiment an inspection image and a reference image are divid... | 03/28/2006 |
| 7016017 | Lithographic apparatus and method for optimizing an illumination source using isofocal compensation A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using isofocal compensation, the lithographic apparatus including an illuminator, a projection system and a mask having at least one pattern to be printed on a sub... | 03/21/2006 |
| 7016015 | Lithographic apparatus and device manufacturing method A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substra... | 03/21/2006 |
