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| Number | Title | Issue Date |
| 8139201 | Exposure apparatus and method of manufacturing device An exposure apparatus includes a light dividing surface which reflects a certain component of the light beam bifurcated by an illumination optical system, and transmits the remaining component of the light beam, a first photoelectric conversion element which detects... | 03/20/2012 |
| 8134688 | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method A controller measures positional information of a stage within an XY plane using three encoders which at least include one each of an X encoder and a Y encoder of an encoder system, and the stage is driven in the XY plane, based on measurement results of the positio... | 03/13/2012 |
| 8102511 | Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a ... | 01/24/2012 |
| 8081294 | Method of evaluating optical beam source of exposure device, method of designing illumination shape of exposure device, and software for optimizing illumination shape of exposure device A method of evaluating an exposure optical beam source of an exposure device used in an exposure process in manufacturing a semiconductor device is disclosed, in which the method includes dividing an exposure optical beam source into a plurality of unit optical beam... | 12/20/2011 |
| 8068212 | Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements A lithographic apparatus configured to apply corrections to the dose, within and/or between fields, to compensate for critical dimension variations due to heating of elements of the projection system is disclosed. ... | 11/29/2011 |
| 7990520 | Microlithography illumination systems, components and methods The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods. ... | 08/02/2011 |
| 7911585 | Measurement apparatus, exposure apparatus, and device manufacturing method A measurement apparatus configured to measure a light intensity distribution in a plane to be measured includes a mask including an opening having a dimension smaller than a wavelength of light for forming the light intensity distribution, and a light-shielding port... | 03/22/2011 |
| 7880862 | Exposure apparatus and device fabrication method An exposure apparatus comprising a projection optical system configured to project a pattern image of an original onto a substrate, and a sensor configured to detect light emerging from the projection optical system, the sensor including a light receiving element ha... | 02/01/2011 |
| 7595862 | Exposure apparatus and method of manufacturing device An exposure apparatus includes a light source; an illumination optical system that illuminates an original with the light; a substrate stage that holds and moves a substrate; a projection optical system that projects the light from the original, the projection optic... | 09/29/2009 |
| 7580116 | Exposure apparatus and device fabrication method The present invention provides an exposure apparatus including a position detection apparatus that detects at least one of a position of a reticle and a position of a substrate. The position detection apparatus includes an optical member whose position can be change... | 08/25/2009 |
| 7466396 | Lithography apparatus and method utilizing pendulum interferometer system Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduce... | 12/16/2008 |
| 7432492 | Image reading apparatus capable of reading infrared and visible images An image reading apparatus includes a light source with a first luminescent portion that outputs light with a first wavelength range and a second luminescent portion that outputs light with a second wavelength range, the wavelength ranges being different from each o... | 10/07/2008 |
| 7417709 | Method and apparatus for exposing semiconductor substrates Provided are methods and apparatus for exposing multiple substrates within a single exposing apparatus using only a single light source wherein a first substrate is exposed in a series of steps or shots during which light transmitted along a primary optical path is ... | 08/26/2008 |
| 7403263 | Exposure apparatus An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between the reticle and the object, a first fluid that has a refractive index ... | 07/22/2008 |
| 7375353 | Lithographic apparatus and device manufacturing method An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the memb... | 05/20/2008 |
| 7372565 | Spectrometer measurement of diffracting structures A normal incidence reflectometer includes a rotatable analyzer/polarizer for measurement of a diffracting structure. Relative rotation of the analyzer/polarizer with respect to the diffracting structure permits analysis of the diffracted radiation at multiple polari... | 05/13/2008 |
| 7373213 | Management system and apparatus, method therefor, and device manufacturing method A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an â€... | 05/13/2008 |
| 7368733 | Contamination barrier and lithographic apparatus comprising same A rotatable contamination barrier for use with an EUV radiation system is disclosed. The contamination barrier has a blade structure configured to trap contaminant material coming from a radiation source, a bearing structure, coupled to a static frame, configured to... | 05/06/2008 |
| 7332731 | Radiation system and lithographic apparatus A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a contamination barrier that includes a plurality of closely packed foil plate... | 02/19/2008 |
| 7333153 | Expanded information capacity for existing communication transmission systems A system for transmitting digital programming includes a program source providing digital information, circuitry for modulating the digital information onto a visual carrier modulated with analog television programming, and a visual transmitter coupled to the modula... | 02/19/2008 |
| 7324187 | Illumination system and exposure apparatus Disclosed is an illumination optical system and an exposure apparatus having the same, and specifically, as an aspect of the invention, an illumination optical system for illuminating a surface to be illuminated, that includes an aperture stop for defining an effect... | 01/29/2008 |
| 7317506 | Variable illumination source An apparatus and method for providing a variable illumination field for use in lithographic imaging for semiconductor manufacturing includes providing a an illumination system including a variable optical element having an array of addressable elements, each address... | 01/08/2008 |
| 7313972 | Mechanical sensing arrangement and crash energy sensor One development described herein relates to a mechanical sensing arrangement, particularly suitable for use in crash detector devices, which converts mechanical motion to a reduced scale compatible with the signal characteristics of a low-grade commercial sensor. An... | 01/01/2008 |
| 7310797 | Method and system for printing lithographic images with multiple exposures System and method is disclosed for breaking an integrated circuit design to be printed into two or more exposures by lithographic equipment, each of the two or more exposures has at least the minimum pitch. Together, these multiple exposures print an integrated circ... | 12/18/2007 |
| 7280678 | Apparatus and method for detecting pupils Methods and apparatus for pupil detection are described. First light is emitted from a first light source at a first illumination angle relative to the axis of a detector. Second light is emitted from a second light source at a second illumination angle relative to ... | 10/09/2007 |
| 7275400 | Washing apparatus The present invention relates to an apparatus for treating, refreshing or cleaning fabric articles, especially articles of clothing, linen and drapery. ... | 10/02/2007 |
| 7265815 | System and method utilizing an illumination beam adjusting system A method and system are used to control a characteristic of a beam. The system comprises an illumination system, at least one optical element, a fluid source, and a pressure and/or fluid concentration controller. The illumination system produces a beam of radiation.... | 09/04/2007 |
| 7265343 | Apparatus and method for calibration of an optoelectronic sensor and for mensuration of features on a substrate The invention is based on an apparatus and a method for calibration of an optoelectronic sensor (3) that at least intermittently also receives UV light. A first response characteristic of the sensor (3) is ascertained by illuminating the sensor (3 | 09/04/2007 |
| 7256865 | Methods and apparatuses for applying wafer-alignment marks Embodiments of the invention provide methods and apparatuses for efficient and cost-effective imaging of alignment marks. For one embodiment, alignment mark imaging is accomplished separately from, and independent of product imaging through use of a relatively low c... | 08/14/2007 |
| 7253909 | Phase shift measurement using transmittance spectra An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range Δλ, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A... | 08/07/2007 |
| 7247866 | Contamination barrier with expandable lamellas A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a ra... | 07/24/2007 |
| 7248232 | Information processing device There is provided an information processing apparatus which occupies a small space and which is capable of supplying image information having high definition and high resolution. An information processing apparatus of the invention employs a head mount display (HMD)... | 07/24/2007 |
| 7245349 | Exposure apparatus An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stag... | 07/17/2007 |
| 7236244 | Alignment target to be measured with multiple polarization states An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns at multiple polarization states and comparing the resulting intensities of the polari... | 06/26/2007 |
| 7233384 | Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable eleme... | 06/19/2007 |
| 7233010 | Radiation system and lithographic apparatus A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping conta... | 06/19/2007 |
| 7230705 | Alignment target with designed in offset An alignment target includes periodic patterns on two elements. The alignment target includes two locations, at least one of which has a designed in offset. In one embodiment, both measurement locations have a designed in offset of the same magnitude but opposite di... | 06/12/2007 |
| 7230220 | Method of determining optical properties and projection exposure system comprising a wavefront detection system A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1... | 06/12/2007 |
| 7227618 | Pattern generating systems A pattern generating system for generating two-dimensional images on a surface includes a light source and one or more Zone Plate Modulator (ZPM) arrays. The ZPM arrays comprise diffractive zone plate modulating elements that are capable of either diffracting or ref... | 06/05/2007 |
| 7221431 | Exposure apparatus An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between the reticle and the object, a first fluid that has a refractive index ... | 05/22/2007 |
