Bizarre Patents
An automatic bed maker which uses the expansion of inflatable bladder to straighten, align, and tuck-in bed-cover assembly.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8189171 | Plotting state adjusting method and device It is possible to set an optical magnification capable of making a recording position shift amount with respect to Y direction of the plotting point formed by a micro mirror within an allowance range from the relationship between a Y-direction distance between mirro... | 05/29/2012 |
| 8184265 | Correction method for non-uniform reticle heating in a lithographic apparatus A method that includes conditioning a radiation beam, imparting the radiation beam with a pattern to form a patterned radiation beam by a reticle having a pattern image area and a reticle mark, and projecting the patterned radiation beam onto a target portion of a s... | 05/22/2012 |
| 8184264 | Calibration methods and devices useful in semiconductor photolithography Several embodiments of photolithography devices and associated methods of focal calibration are disclosed herein. In one embodiment, a method for determining a focus shift in a photolithography system include placing a microelectronic substrate on a substrate suppor... | 05/22/2012 |
| 8174675 | Measuring apparatus, optical system manufacturing method, exposure apparatus, device manufacturing method, and processing apparatus The present invention provides a processing apparatus which executes sampling of data and represents the sampled data by linear combination of orthogonal functions, the apparatus including a device configured to execute the sampling, and a processor configured to pr... | 05/08/2012 |
| 8174674 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection ... | 05/08/2012 |
| 8149384 | Method and apparatus for extracting dose and focus from critical dimension data A method for monitoring a photolithography system includes defining a model of the photolithography system for modeling top and bottom critical dimension data associated with features formed by the photolithography system as a function of dose and focus. A library o... | 04/03/2012 |
| 8149385 | Alignment unit and exposure apparatus An alignment unit includes a measurement unit configured to measure a coordinate of a center position of an alignment mark transferred to each layer that is located under an uppermost layer of a substrate, and a controller configured to determine a target coordinate... | 04/03/2012 |
| 8125615 | Optical focus sensor, an inspection apparatus and a lithographic apparatus To detect whether a substrate is in a focal plane of an inspection apparatus, an optical focus sensor is arranged to receive a radiation beam via an objective lens. The optical focus sensor includes a splitter configured to split the radiation beam into a first sub-... | 02/28/2012 |
| 8102509 | Focus and level control method for projection lens unit by comparing intensities of measurement light and reference light A projection lens unit, related exposure apparatus and control method are disclosed in which measurement light irradiates a semiconductor substrate after passing through lenses in the projection lens unit and reference light irradiates the semiconductor substrate wi... | 01/24/2012 |
| 8102508 | Projection optical system, exposure apparatus, and exposure method An imaging optical system that has liquid interposed in an optical path to the image plane to achieve a large effective image-side numerical aperture larger than, for example, 1.4, while a relatively large effective imaging region can be achieved. The imaging optica... | 01/24/2012 |
| 8098364 | Exposure apparatus and method for photolithography process Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length ... | 01/17/2012 |
| 8081292 | Exposure system and method of manufacturing a semiconductor device In an exposure system and semiconductor device manufacturing method relating to the present invention, an image of spatial image mark body through a reduction projection lens is projected onto a spatial image projection plate arranged on a wafer stage by irradiating... | 12/20/2011 |
| 8072577 | Lithography systems and processes An exemplary lithography process may include: receiving a substrate having a photo-sensitive layer; providing a light source capable of causing an exposure of a portion of the photo-sensitive layer; and providing a mask capable of defining at least one pattern that ... | 12/06/2011 |
| 8072579 | Measuring method, adjustment method for stage movement characteristics, exposure method, and device manufacturing method Provided is a measuring method including: transferring a measuring mark disposed on an original to a substrate at a plurality of locations; moving a substrate stage for holding the substrate so that the substrate is rotated by 90 degrees about a rotation axis parall... | 12/06/2011 |
| 8072578 | Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the de... | 12/06/2011 |
| 8064040 | Projection objective, projection exposure apparatus and reflective reticle for microlithography A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optica... | 11/22/2011 |
| 8059260 | Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the de... | 11/15/2011 |
| 8054450 | Stepper system for ultra-high resolution photolithography using photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays A stepper system for ultra-high resolution nano-lithography employs a photolithographic mask which includes a layer of an electrically conductive optically opaque material in which periodic arrays of sub-wavelength apertures are formed. The plasmonic excitation in t... | 11/08/2011 |
| 8035801 | Method for in-situ aberration measurement of optical imaging system in lithographic tools A method for in-situ aberration measurement in an optical imaging system of lithographic tools. According to the method, a reticle pattern is imaged to form an imaged pattern by transmitting beams through a reticle via the optical imaging system. The imaged reticle ... | 10/11/2011 |
| 8027023 | Optical imaging device and method for reducing dynamic fluctuations in pressure difference There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first ... | 09/27/2011 |
| 8009274 | In-die focus monitoring with binary mask Focus monitoring for a photolithographic applications is provided by illuminating a photoresist layer with a light beam transmitted through a first binary mask to define a circuit pattern on an underlying substrate and then illuminating the photoresist layer with an... | 08/30/2011 |
| 8004655 | Automatic focus adjusting mechanism and optical image acquisition apparatus In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the... | 08/23/2011 |
| 7990519 | Exposure apparatus and device manufacturing method An exposure apparatus is configured to project a pattern of an original onto a substrate using a projection optical system, thereby exposing the substrate, and comprises a substrate stage configured to hold the substrate, a first detector configured to detect positi... | 08/02/2011 |
| 7986396 | Exposure apparatus An exposure apparatus includes a projection optical system that projects a pattern image of an original onto a substrate, an original stage that holds and drives the original, a substrate stage that holds and drives the substrate, and a position detecting system tha... | 07/26/2011 |
| 7965377 | Method for adjusting a projection objective A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of... | 06/21/2011 |
| 7956985 | Exposure apparatus An exposure apparatus includes a driver used for one of height, inclination, curvature-of-field, magnification, and rotation corrections, and a controller configured to control a substrate stage so that it can change an exposure area from a first shot to a third sho... | 06/07/2011 |
| 7940374 | Parallel process focus compensation Disclosed are systems, methods, and computer program products for parallel process focus compensation. Such methods may include three steps. First, a first sensor senses a top surface of a wafer to provide first-sensor data which defines a first topographic map of t... | 05/10/2011 |
| 7940373 | Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include ... | 05/10/2011 |
| 7932996 | Exposure apparatus, exposure method, and device fabrication method An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at ... | 04/26/2011 |
| 7924405 | Compensation of reticle flatness on focus deviation in optical lithography A method for lithography patterning includes providing a mask for photolithography patterning; measuring a mask flatness of the mask; calculating focal deviation of imaging the mask to a substrate in a lithography apparatus; adjusting the lithography apparatus to ha... | 04/12/2011 |
| 7864294 | Focus sensitive lithographic apparatus, systems, and methods A system includes an illuminator, a mask, and a measurement device. The illuminator includes a light source. The mask includes at least one focus determination pattern having a first pattern portion and an adjacent second pattern portion. The first pattern portion a... | 01/04/2011 |
| 7834978 | Exposure apparatus, exposure method, and device manufacturing method An exposure apparatus for exposing a substrate to light. A substrate stage holds and moves the substrate, a scope measures a predetermined mark to align the substrate, and a controller controls the position of the substrate stage and the operation of the scope, ther... | 11/16/2010 |
| 7817246 | Optical apparatus An optical apparatus is disclosed that has a convex mirror and a concave mirror with an aperture, wherein, in use, radiation from a radiation emitter passes through the aperture and is incident upon the convex mirror before being incident upon the concave mirror, th... | 10/19/2010 |
| 7804581 | Exposure apparatus and method of manufacturing device An exposure apparatus for exposing a substrate to light during an exposure period. A projection optical system projects light from a pattern of a reticle onto the substrate. The projection optical system includes at least one optical element driven to adjust aberrat... | 09/28/2010 |
| 7728953 | Exposure method, exposure system, and substrate processing apparatus high performance and high quality micro devices, etc. are produced highly efficiently at a high throughput. Before transferring a wafer W to an exposure apparatus 200 for exposing the wafer W, marks formed on the wafer W is measured by an in-line measurement ... | 06/01/2010 |
| 7710543 | Scanning exposure apparatus and device manufacturing method A measurement apparatus includes a measurement unit configured to execute first measurement at each of a plurality of measurement points on a substrate, which are juxtaposed in one of a direction perpendicular to a scanning direction and an oblique direction with re... | 05/04/2010 |
| 7701553 | Surface level detection method, exposure apparatus, and device manufacturing method A wafer surface level detection method includes a first level measurement step of measuring a level of a surface of a substrate having a plurality of shot regions, a position measurement step of measuring a position along the surface of the substrate, a first moveme... | 04/20/2010 |
| 7697113 | Method of determining a focus position for a substrate exposure process and substrate exposure apparatus capable of performing the same In a method of determining a focus position for a substrate exposure process and a substrate exposure apparatus capable of performing the same, a reticle having a light-transmitting region may be illuminated by an off-axis illumination light. A projected light, whic... | 04/13/2010 |
| 7692767 | Projection optical system and exposure apparatus with the same A projection optical system comprises eight reflectors and forms a reduced image of a first surface (4) onto a second surface (7). It comprises a first reflective imaging optical system (G1) for forming an intermediate image of the first surface... | 04/06/2010 |
| 7656503 | Exposure apparatus and image plane detecting method An exposure apparatus including an illumination optical system to illuminate an original with exposure light of plural wavelengths, a projection optical system to project an image of a pattern of the original onto a substrate, an original-side reference pattern prov... | 02/02/2010 |
