Did You Know...
...that the x-ray was discovered purely by accident? When German physicist Wilhelm Konrad von Roentgen was experimenting with cathode rays in 1895, he put an activated Crookes tube in a book and went out to lunch. When he returned, he discovered that a key that had also been placed in the book showed up as an image on the developed film!
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| Number | Title | Issue Date |
| 7502096 | Lithographic apparatus, calibration method, device manufacturing method and computer program product Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor. ... | 03/10/2009 |
| 7495744 | Exposure method, exposure apparatus, and method for producing device When exposing a substrate by projecting a pattern image onto the substrate via a projection optical system (PL) and liquid (1), an exposure method includes a determination of a liquid immersion condition to be performed to the substrate, such as a liquid type... | 02/24/2009 |
| 7495743 | Immersion optical lithography system having protective optical coating An immersion lithography system is provided which includes an optical source operable to produce light having a nominal wavelength and an optical imaging system. The optical imaging system has an optical element in an optical path from the optical source to an artic... | 02/24/2009 |
| 7492440 | Lithographic apparatus and device manufacturing method A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in ... | 02/17/2009 |
| 7492441 | Lithographic apparatus and device manufacturing method incorporating a pressure shield A lithographic apparatus is disclosed that has a movable article support configured to hold and move an article, a radiation control system configured to control a beam of radiation to be targeted onto the article, the article support, or both, the article to be mov... | 02/17/2009 |
| 7486380 | Wafer table for immersion lithography Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has ... | 02/03/2009 |
| 7486379 | Exposure apparatus, method applied to the apparatus, and device manufacturing method An exposure apparatus for exposing a substrate to light via an original plate. A projection optical system projects a pattern of the original plate onto the substrate, a liquid immersion mechanism generates a liquid immersion state in which a gap between the final s... | 02/03/2009 |
| 7483118 | Lithographic projection apparatus and device manufacturing method A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With ... | 01/27/2009 |
| 7483120 | Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the s... | 01/27/2009 |
| 7483119 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when ... | 01/27/2009 |
| 7480029 | Exposure apparatus and method for manufacturing device An exposure apparatus wherein an image of a pattern is projected onto a substrate via a projection optical system to expose the substrate, includes: a substrate moving device that is movable while holding the substrate above the projection optical system; and a liqu... | 01/20/2009 |
| 7480028 | Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of on... | 01/20/2009 |
| 7477354 | Projection exposure apparatus and method for producing a printed circuit board A projection exposure apparatus and a method for producing a printed circuit board wherein, the whole pattern including pieces 10 and coupons 12 to be exposed on a print circuit board 2 is depicted on a photo mask 1 divided in six areas b... | 01/13/2009 |
| 7477353 | Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatu... | 01/13/2009 |
| 7474380 | Projection optical system, exposure apparatus, and device fabrication method The present invention provides a projection optical system which projects an image on a first object plane onto a second object plane, comprising a plurality of optical members inserted in turn from a side of the second object plane, said plurality of optical member... | 01/06/2009 |
| 7474381 | Exposure apparatus and device manufacturing method An exposure apparatus configured to expose a substrate to radiant energy via an original plate while scanning of the original plate and the substrate are performed including a projection optical system configured to project light from the original plate onto the sub... | 01/06/2009 |
| 7474378 | Assembly, a lithographic apparatus, and a device manufacturing method A lithographic apparatus includes a projection optics assembly for projecting a patterned beam onto a target portion of a substrate. The projection optics assembly includes a first element having a predetermined functionality that is positioned with respect to a sec... | 01/06/2009 |
| 7474379 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the... | 01/06/2009 |
| 7471373 | Lithographic apparatus with patterning device position determination A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired patte... | 12/30/2008 |
| 7471374 | Projection optical system, exposure apparatus, and exposure method A projection optical system and exposure method for forming a reduced image of a first surface on a second surface, including forming a projection exposure of a reduced image of a pattern formed on a mask on a photosensitive substrate, the optical path between the p... | 12/30/2008 |
| 7471372 | Exposure apparatus and production method of device using the same An exposure apparatus which transfers a pattern image formed on a mask on to a substrate through a projection optical system, comprising a substrate table which holds said substrate, a first sensor which measures a gap between said substrate surface held by said sub... | 12/30/2008 |
| 7468779 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate ... | 12/23/2008 |
| 7468780 | Exposure apparatus and method An exposure method including the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the... | 12/23/2008 |
| 7466393 | Immersion exposure technique An exposure apparatus which exposes a substrate to a pattern of an original via a projection optical system, with a gap between the projection optical system and the substrate being filled with liquid. The apparatus includes an ejection member configured to eject a ... | 12/16/2008 |
| 7466392 | Exposure apparatus, exposure method, and method for producing device A device manufacturing method includes the steps of providing an immersion liquid between a substrate and at least a portion of a projection system of a lithographic projection apparatus, wherein a non-radiation sensitive material is carried by the substrate, the no... | 12/16/2008 |
| 7463334 | Exposure apparatus and device manufacturing method An exposure apparatus is disclosed. The exposure apparatus has a projection optical system, aligns a reticle and a substrate and projects a pattern of the reticle to the substrate via the projection optical system to expose the substrate to light. The apparatus comp... | 12/09/2008 |
| 7460212 | Collector configured of mirror shells There is provided a collector. The collector includes a first mirror shell positioned inside a second mirror shell that has a chamfered end. ... | 12/02/2008 |
| 7460209 | Advanced mask patterning with patterning layer An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer... | 12/02/2008 |
| 7460211 | Apparatus for wafer patterning to reduce edge exclusion zone An apparatus includes an edge expose unit for exposing an annular area in an edge exclusion zone of a wafer to radiation having a wavelength suitable for removing a film from the wafer in the annular area and a radiation modulator coupled to the edge expose unit for... | 12/02/2008 |
| 7460208 | Lithographic apparatus and device manufacturing method A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus. ... | 12/02/2008 |
| 7460210 | Auto focus system, auto focus method, and exposure apparatus using the same An auto focus system includes a stage on which a substrate is mounted, light sources that irradiate the substrate with a plurality of focus beams directed towards the substrate at different angles, sensors that detect the focus beams reflected from the substrate, an... | 12/02/2008 |
| 7456931 | Device manufacturing method, computer program product and lithographic apparatus A method of optimizing adjustable settings of adjustable elements of a projection system in a lithographic apparatus is disclosed that includes determining an object spectrum for a pattern and an illumination arrangement, determining a symmetry of the object spectru... | 11/25/2008 |
| 7456930 | Environmental system including vacuum scavenge for an immersion lithography apparatus An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that... | 11/25/2008 |
| 7456929 | Exposure apparatus and device manufacturing method An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes first and second stages (ST1, ST2) which can independently move within an XY... | 11/25/2008 |
| 7456928 | Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography, are disclosed. A system in accordance with one embodiment includes a support configured to carry a microfeature workpiece with ... | 11/25/2008 |
| 7453550 | Exposure apparatus, exposure method, and method for producing device An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply m... | 11/18/2008 |
| 7450217 | Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby A coating for sensors and/or parts of an exposure apparatus, for example a sensor on a substrate table of a lithography apparatus, include a semiconductor, a photocatalyst, and/or a metal oxide. ... | 11/11/2008 |
| 7446853 | Exposure method, exposure tool and method of manufacturing a semiconductor device An exposure method is disclosed, which includes forming on a substrate a resist film having first and second exposure fields arranged in a column direction, mounting the substrate on a scanning exposure tool in order to project a design pattern on the first and seco... | 11/04/2008 |
| 7446854 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a first control system to control a first physical quantity in the lithographic apparatus. A parameter in the first control system is dependent on a value of a further physical quantity in the lithographic apparatus. The parameter m... | 11/04/2008 |
| 7442474 | Reticle for determining rotational error A method for determining rotational error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a first pattern and an error-free fine alignment t... | 10/28/2008 |
