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| Number | Title | Issue Date |
| 7423729 | Method of monitoring the light integrator of a photolithography system A method of monitoring a light integrator of a photolithography system, wherein the photolithography system comprises a light source for illuminating different fields of a photosensitive layer and a light integrator for measuring the actual exposure doses of the ill... | 09/09/2008 |
| 7423726 | Exposure apparatus and device manufacturing method An exposure apparatus for exposing a substrate. A stage holds and moves the substrate, a measuring device measures a position of a surface of the substrate, and a controller defines an arrangement of measurement points with respect to each of a plurality of shot reg... | 09/09/2008 |
| 7423724 | Exposure apparatus and device manufacturing method An exposure apparatus exposes a substrate to light via a reticle in a vacuum. A projection optical system projects a pattern of the reticle onto the substrate, a stage holds the substrate and moves, and first and second partitions define an exhaust space between a f... | 09/09/2008 |
| 7423725 | Lithographic method In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate ... | 09/09/2008 |
| 7423732 | Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane A lithography system comprises an illumination system that supplies radiation and a projection system comprising an optical system and a patterning device located at a pupil plane. The patterning device patterns the radiation and the optical system projects the patt... | 09/09/2008 |
| 7423765 | Optical system of a microlithographic projection exposure apparatus In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various point... | 09/09/2008 |
| 7420188 | Exposure method and apparatus for immersion lithography A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a... | 09/02/2008 |
| 7420650 | Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium In the present invention, in the photolithography process in which a certain processing condition has been already set, a resist film on a substrate is exposed to light using a mask, which reduces only zero-order light of a light source at a predetermined light redu... | 09/02/2008 |
| 7420651 | Immersion exposure technique An exposure apparatus which exposes a substrate to a pattern of an original via a projection optical system, with a gap between the projection optical system and the substrate being filled with liquid. The apparatus includes a substrate stage, movable with respect t... | 09/02/2008 |
| 7420652 | Immersion lithography method and device for illuminating a substrate The invention relates to an immersion lithography method which illuminates a substrate positioned on a carrier. When a substrate is illuminated, an immersion fluid is introduced between a reproducing element and the substrate and the field depth or the resolution, o... | 09/02/2008 |
| 7420654 | Method of varying dimensions of a substrate during nano-scale manufacturing The present invention is directed toward a method to vary dimensions of a substrate supported by a chuck. The method includes applying compressive forces to the substrate with the actuator assembly while facilitating movement of the actuator assembly with respect to... | 09/02/2008 |
| 7420653 | Lithographic projection apparatus, mirror, method of supplying a protective cap layer, device manufacturing method and device manufactured accordingly A lithographic projection apparatus includes a radiation system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to pattern the beam according to the desired pattern; a substrate table c... | 09/02/2008 |
| 7417710 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a liquid supply system to supply an immersion liquid between a downstream lens of a projection system of the lithographic apparatus and a substrate. The lithographic apparatus further includes a closing element to close an underside... | 08/26/2008 |
| 7417707 | Introduction of an intermediary refractive layer for immersion lithography An intermediary layer is introduced between a lens and a wafer for an immersion lithography process. A non-supercritical gas is provided and condensed to form a layer of liquid between the lens and the wafer. The substrate may be irradiated through the lens and inte... | 08/26/2008 |
| 7417709 | Method and apparatus for exposing semiconductor substrates Provided are methods and apparatus for exposing multiple substrates within a single exposing apparatus using only a single light source wherein a first substrate is exposed in a series of steps or shots during which light transmitted along a primary optical path is ... | 08/26/2008 |
| 7417708 | Extreme ultraviolet exposure apparatus and vacuum chamber An extreme ultraviolet exposure apparatus comprising a light source that emits extreme ultraviolet light, a plurality of illumination reflective mirrors that direct the extreme ultraviolet light emitted from the light source to a mask, a plurality of projection refl... | 08/26/2008 |
| 7417711 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at le... | 08/26/2008 |
| 7417714 | Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measuremen... | 08/26/2008 |
| 7413586 | In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier may include in-line sensors for in-situ monitoring of contamination. Gr... | 08/19/2008 |
| 7414699 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate. ... | 08/19/2008 |
| 7414700 | Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2... | 08/19/2008 |
| 7411653 | Lithographic apparatus Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed an... | 08/12/2008 |
| 7411652 | Lithographic apparatus and device manufacturing method One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuator... | 08/12/2008 |
| 7411654 | Lithographic apparatus and device manufacturing method A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of o... | 08/12/2008 |
| 7411655 | Load-lock technique A load-lock apparatus has a housing to enclose a first space and to accommodate a substrate, an exhaust pipe to exhaust a gas in the first space, a first gate valve provided in the housing to openably close to separate the first space and a second space, outside the... | 08/12/2008 |
| 7411651 | PSM alignment method and device The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to prod... | 08/12/2008 |
| 7411656 | Optically polarizing retardation arrangement, and a microlithography projection exposure machine A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the ... | 08/12/2008 |
| 7411657 | Lithographic apparatus and device manufacturing method A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding struc... | 08/12/2008 |
| 7411658 | Lithographic apparatus and device manufacturing method A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere betwe... | 08/12/2008 |
| 7408616 | Microlithographic exposure method as well as a projection exposure system for carrying out the method In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarizati... | 08/05/2008 |
| 7408617 | Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation bea... | 08/05/2008 |
| 7408618 | Lithographic apparatus substrate alignment A method for aligning a substrate in a lithographic apparatus includes determining from a geometric reference of the substrate a position of a window on the substrate. The window indicates an area in which an alignment mark of the substrate may be expected. Then, a ... | 08/05/2008 |
| 7408624 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. T... | 08/05/2008 |
| 7408622 | Illumination system and polarizer for a microlithographic projection exposure apparatus An illumination system for a microlithographic projection exposure apparatus includes a light source (1) for generating projection light, a masking arrangement (5) for masking a reticle (R) and a masking objective (6) for imaging the masking arr... | 08/05/2008 |
| 7408621 | Projection exposure system A projection exposure system, intended in particular for microlithography, is used for generating, in an image plane, an image of a mask arranged in an object plane. The projection exposure system has a light source emitting projection light and projection optics ar... | 08/05/2008 |
| 7408620 | Exposure apparatus An exposure apparatus includes a illumination optical system for illuminating a reticle with light from a light source, and a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to ... | 08/05/2008 |
| 7408631 | Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum sca... | 08/05/2008 |
| 7408619 | Photolithographic method using exposure system for controlling vertical CD difference An exposure system for adjusting the critical dimension difference between vertical patterns and horizontal patterns includes a light source for generating a light beam having a predetermined wavelength, a lens for transforming the shape of the light beam generated ... | 08/05/2008 |
| 7408615 | Lithographic apparatus and device manufacturing method A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provi... | 08/05/2008 |
| 7405802 | Large field of view 2X magnification projection optical system for FPD manufacture An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification th... | 07/29/2008 |
