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| Number | Title | Issue Date |
| 4482591 | Polyvinyl butyrate pellicle compositions and pellicles thereof for projection printing A pellicle for use in projection printing comprises a pellicle in which the transparent film is formed from a polyvinyl butyral resin or from a casting composition which is a mixture of a polyvinyl butyral resin and a dispersion of colloidal silica and a ... | 11/13/1984 |
| 4479711 | Mask aligner In a mask aligner, the actual element pattern of a mask is transferred onto a resist applied to the surface of a wafer, while the alignment pattern of the mask is not transferred onto said resist. That is, the line width of the alignment pattern of the ma... | 10/30/1984 |
| 4477182 | Pattern exposing apparatus A pattern exposing apparatus comprising means for projecting a semiconductor device mask pattern onto the photoresist layer coated on a semiconductor substrate, and means for projecting an identification mark which is specific to each substrate onto a par... | 10/16/1984 |
| 4477183 | Automatic focusing apparatus An automatic focusing apparatus according to the present invention is constructed of a base on which a substrate is placed, detection means for detecting a pressure of air which is caused to flow out of an interspace between the substrate and an orifice b... | 10/16/1984 |
| 4473293 | Step-and-repeat projection alignment and exposure system An alignment and exposure system is provided with a main stage movable along orthogonal axes to position either a reference mark, aligned with one of those axes, or a semiconductive wafer directly beneath a projection lens. Another stage is disposed above... | 09/25/1984 |
| 4473292 | Dampening system In a dampening arrangement for oscillations occurring in rapidly stepwise displacements of a cross slide system of a circuit printing machine, the moving part is with one portion thereof immersed in a viscous dampening liquid within a cavity. Between the ... | 09/25/1984 |
| 4468442 | Method for manufacturing half-tone printing plates The proposed method for making half-tone images on printing plates comprises a step of individually controlling light beams to switch them on and off according to whether a reference value representing a photographic density of minute point of an original... | 08/28/1984 |
| 4465368 | Exposure apparatus for production of integrated circuit An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the i... | 08/14/1984 |
| 4464030 | Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system A commercial X-Y positioning table is modified, to limit its dynamic X-positioning error to less than &#b1;0.05 micrometer at rates of speed in the Y direction of up to 20 millimeters per second, by mounting an X direction translation stage having fast in... | 08/07/1984 |
| 4443096 | On machine reticle inspection device A device is disclosed for use on a projection type semiconductive wafer precision step-and-repeat alignment and exposure system for on-machine inspection of a reticle containing the circuitry to be printed on the wafer. Two apertured optical detectors are... | 04/17/1984 |
| 4441808 | Focusing device for photo-exposure system A focusing apparatus for use in a step and repeat photo-exposure system is provided in which air jets are located immediately adjacent the exposure area of the exposure system. Back pressure of the air jets is sensed to determine the distance of the optic... | 04/10/1984 |
| 4437760 | Reusable electrical overlay measurement circuit and process A reusable electric overlay measurement base pattern includes a pair of current pads forming first and second pads adapted to be contacted by point contacts, a first conductor of controlled width extending between the first and second pads, a pair of volt... | 03/20/1984 |
| 4437758 | Alignment apparatus An alignment apparatus effects positional adjustment between the image of a mask and a sensitive member by using a non-sensitive alignment mark image of the mask and an alignment mark formed on the sensitive member. The sensitive alignment mark image of t... | 03/20/1984 |
| 4431304 | Apparatus for the projection copying of mask patterns on a workpiece An apparatus for the projection copying of patterns defined by masks on a workpiece, e.g. a semiconductor wafer coated with a photoresist in the production of integrated circuit units, comprises a stage with a cross-feed for positioning a wafer chuck in t... | 02/14/1984 |
| 4425037 | Apparatus for projecting a series of images onto dies of a semiconductor wafer The apparatus forms one-to-one reticle images on a wafer. The apparatus includes means for holding a reticle containing an image pattern corresponding to the size of the desired wafer pattern. An illumination system substantially uniformly illuminates the... | 01/10/1984 |
| 4422754 | Projection-printing apparatus A projection-printing apparatus moves at least one of a mask and a wafer with precise rectilinearity along a guide relative to an optical system for projecting the image of the mask upon the wafer, and in a plane perpendicular to the optical axis of the o... | 12/27/1983 |
| 4408875 | Method of projecting circuit patterns A method of exposure used to form circuit patterns of a circuit chip of, for example, a magnetic bubble memory device or a semiconductor IC device whose circuit patterns are composed of a plurality of partially different circuit patterns. In this method, ... | 10/11/1983 |
| 4405229 | Method of projecting printing on semiconductor substrate and workpiece including such substrate In the projection-copying of a mask on a workpiece including a light-reflecting semiconductor substrate, the alignment of mask and workpiece is effected by illuminating marks on the substrate which appear dark relative to a surrounding area. To provide ea... | 09/20/1983 |
| 4402596 | Projection type exposure device A projection type exposure device includes a main projection objective lens for projecting onto a wafer a predetermined pattern on a negative plate to be projected, a main illuminating optical system including a condenser lens for illuminating the negativ... | 09/06/1983 |
| 4397543 | Mask for imaging a pattern of a photoresist layer, method of making said mask, and use thereof in a photolithographic process The invention relates to a mask for imaging a pattern on a photoresist layer, with at least one alignment mark, to a method of making such a mask, and use of these masks for making semiconductor components. The masks made in accordance with the invention are o... | 08/09/1983 |
| 4396282 | Disc film holder for photographic printer A disc film holder holds a generally disc-like photographic film unit having a plurality of image frames and indexes and disc-like photographic film unit to position selected image frames at a predetermined position, such as a print gate aperture in a pho... | 08/02/1983 |
| 4396283 | Neghold assembly for photographic printer A neghold assembly permits withdrawal of a disc-like film unit from a clamping aperture assembly stationarily positioned on the photographic printer that holds a selected film frame at the print gate aperture. The disc-like film unit is held on a movable ... | 08/02/1983 |
| 4383757 | Optical focusing system An optical focusing system is provided for accurately focusing a wafer surface, thereby enabling the production of sharp microcircuit images. Accurate focusing is achieved despite non-parallel and non-flat wafer surfaces, despite differences in reflectivi... | 05/17/1983 |
| 4370054 | Projection exposure apparatus A projection exposure apparatus in which a mask and a wafer are displaced in a plane perpendicular to the optical axis of the projection optical system to form circuit patterns on the entire surface of the wafer. The mask and wafer are displaced along gui... | 01/25/1983 |
| 4367046 | Optical system for aligning two patterns and a photorepeater embodying such a system An optical system for aligning two patterns in which the alignment takes place in two phases. In the first phase, the first pattern is aligned with respect to a third fixed intermediate pattern, forming a reference, and during the second phase the second ... | 01/04/1983 |
| 4362385 | Process and arrangement for copying masks on a workpiece with arrangement for correction of alignment errors In a process and an arrangement for the copying of masks on a workpiece, especially for the projection copying on a semiconductor substrate for the production of integrated circuitries, a mask pattern is imaged on respective different, predetermined areas... | 12/07/1982 |
| 4358198 | Apparatus for moving table on stage An apparatus for moving a table or a stage having movable parts adapted to be guided by guide rail means slidingly and rectilinearly. At least the movable parts are made of a non-iron light metal material. The sliding surfaces of the movable parts making ... | 11/09/1982 |
| 4345836 | Two-stage wafer prealignment system for an optical alignment and exposure machine In an optical alignment and exposure machine, particularly suited for aligning semiconductive wafers with and exposing them to microelectronic circuit patterns, two stages of mechanical prealignment of the wafers are performed. In the first stage of mecha... | 08/24/1982 |
| 4343543 | Multiple image roll film camera A multiple image camera sequentially exposes upon a section of a roll film a number of images of an oscilloscope that displays images of a patient subjected to a scanning device. The oscilloscope, together with a folded optical system, is mounted to move ... | 08/10/1982 |
| 4325629 | Image forming method and apparatus therefor Image forming methods and apparatus for forming an image, using an image forming sheet which has on an organic substrate to heat-developable image forming layer that is normally non-photosensitive but is rendered photosensitive by preheating prior to expo... | 04/20/1982 |
| 4298273 | Projection aligner and method of positioning a wafer A wafer projection aligner comprises an optical system for projecting a radiation pattern onto a surface of a semiconductor wafer and a wafer position setting apparatus for positioning the wafer at a position within a focal depth of the optical system for... | 11/03/1981 |
| 4285592 | Multidirectional photographic compound stage A multidirectional photographic compound stage having a base including a circular opening, a first carriage having rollers engaging the wall of the opening for rotary motion of the carriage, a second carriage having rollers for engaging parallel tracks on... | 08/25/1981 |
| 4285587 | Compact multiple image camera A multi-image camera sequentially exposes upon a film sheet a number of images of an oscilloscope that displays images of a patient subjected to a scanning device. Camera optics and motion of parts are arranged to provide a lightweight and compact package... | 08/25/1981 |
| 4240725 | Electrostatic camera A camera with gas cushion film feed in which an imaging fluid is injected into the cushion so that imaging can take place after exposure of the film which may be either an electrostatic film or silver halide film.... | 12/23/1980 |
| 4239381 | Optical projection system equipped with a plate positioner In order to position a sensitized plate in the image plane of a projection lens, the optical projection system is provided with a set of extensible jacks placed in a circle around the lens, the desired image plane being defined by the ends of the jacks wh... | 12/16/1980 |
| 4230978 | Impulse drive system Disclosed is an impulse drive device that includes at least one stator having magnetic means to define an array of parallel spaced apart regions of magnetic field with a major component perpendicular to the plane of the stator; a slidor incorporating seri... | 10/28/1980 |
| 4226526 | Transport and positioning mechanism Substrates such as printed circuit boards are transported between and precisely indexed at work stations by means of a gas cushion formed on a plate. The substrate is transported and shifted from position to position by means of ducted gas jets or sweeps ... | 10/07/1980 |
| 4225225 | High registration photomask machine and computerized numerical control system A photographic system and a microcomputer based control system are provided for providing photographic exposures. An illumination control system for generating high registration photomasks is provided. A control system implemented with a monolithic microc... | 09/30/1980 |
| 4197004 | Scrolling microfiche and method of producing the same In contrast to standard microfiche devices in which discrete areas of information storage are provided in an x-y array, a scrolling microfiche includes a plurality of parallel rows of information storage areas in which, in at least one of the rows, a plur... | 04/08/1980 |
| 4189230 | Wafer holder with spring-loaded wafer-holding means A semiconductor wafer holder, for use in discharge and other processing apparatus, comprised of a non-magnetic frame having an opening defined by an inner wall for receiving a wafer. A non-magnetic circular flange extends out from the frame body over the ... | 02/19/1980 |
