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| Number | Title | Issue Date |
| 7443482 | Liquid jet and recovery system for immersion lithography A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each ... | 10/28/2008 |
| 7442474 | Reticle for determining rotational error A method for determining rotational error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a first pattern and an error-free fine alignment t... | 10/28/2008 |
| 7443484 | Method for exposing a semiconductor wafer by applying periodic movement to a component A method of focus variation is described herein to achieve a one-step exposure of a wafer without the limitation of applying a complex y-tilt to a wafer stage. The position of the wafer surface to be exposed is periodically varied with respect to the focal plane, or... | 10/28/2008 |
| 7443487 | Exposure apparatus The exposure apparatus includes: a light source which emits parallel light having a wavelength used for exposure; a photomask which includes a substrate, an optical shielding layer and an optical selective layer, the substrate being capable of transmitting the light... | 10/28/2008 |
| 7439531 | Alignment systems and methods for lithographic systems An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determi... | 10/21/2008 |
| 7440077 | Exposure apparatus The exposure apparatus of the invention includes a chamber 1 housing an exposure apparatus body 6 provided with an illumination optical system 2, a reticle 3, a projection lens 4 and a stage 5, gas supply units 7, 13, 17 | 10/21/2008 |
| 7440076 | Lithographic apparatus, device manufacturing method and device manufactured thereby A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the sub... | 10/21/2008 |
| 7440078 | Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference ... | 10/21/2008 |
| 7440081 | Lithographic apparatus, device manufacturing method, and substrate table A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the ... | 10/21/2008 |
| 7436491 | Exposure system, exposure method and method for manufacturing a semiconductor device An exposure system includes: an illumination optical system defining, in an effective illumination source plane, a center region forming a perpendicularly incident light and first and second eccentric regions forming obliquely incident lights having a perpendicular ... | 10/14/2008 |
| 7436487 | Exposure apparatus and method for producing device An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the... | 10/14/2008 |
| 7436488 | Wide-angle lens and zoom lens At least one exemplary embodiment is directed to a projection optical system which includes at least one prism and at least one positive lens. In a projection lens included in the projection optical system, the dispersion properties of the prism and the positive len... | 10/14/2008 |
| 7436486 | Exposure apparatus and device manufacturing method A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate ta... | 10/14/2008 |
| 7436521 | Optical measuring apparatus and operating method for imaging error correction in an optical imaging system A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is ... | 10/14/2008 |
| 7436485 | Lithographic apparatus, patterning assembly and contamination estimation method A lithographic apparatus includes a pattern support to support a patterning device, the patterning device to impart a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a position measur... | 10/14/2008 |
| 7435984 | Imaging optical system and exposure apparatus An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical system having a magnification α in a vacuum atmosphere, and a second im... | 10/14/2008 |
| 7436484 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parall... | 10/14/2008 |
| 7433050 | Exposure apparatus and exposure method Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in rel... | 10/07/2008 |
| 7433017 | Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a proj... | 10/07/2008 |
| 7433018 | Pattern alignment method and lithographic apparatus A method for aligning a substrate in a lithographic apparatus, the method including irradiating a first target portion of the substrate with a first patterned beam to form a first pattern on the substrate. Then, a second target portion of the substrate is irradiated... | 10/07/2008 |
| 7433015 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection ... | 10/07/2008 |
| 7433016 | Lithographic apparatus and device manufacturing method An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap. ... | 10/07/2008 |
| 7429845 | System and method for controlling a stage assembly A stage assembly (220) that moves a work piece (200) a movement step (257) includes a first stage (238), a first mover assembly (242), a second stage (240), and a second mover assembly (244). The first mover assembly ... | 09/30/2008 |
| 7430036 | Maskless exposure apparatus using optical modulator, and method for monitoring pattern generating performance by the optical modulator A pattern monitoring method for an exposure apparatus that includes an optical modulator having at least one element that provides incident light with plural phase differences, and a projection optical system that uses first diffracted light among lights exited from... | 09/30/2008 |
| 7430037 | Reticle cassette and exposure apparatus using reticle cassette A reticle cassette includes a bearing portion and a cover, a reticle being disposed on the bearing portion and accommodated in a space between the bearing portion and the cover. The bearing portion includes electrodes for attracting using an electrostatic force and ... | 09/30/2008 |
| 7428037 | Optical component that includes a material having a thermal longitudinal expansion with a zero crossing There is provided an optical component. The optical component includes a material having a surface that heats to a maximum temperature (Tmax) when subjected to radiation. The material has a temperature-dependent coefficient of thermal expansion (α(T)) of... | 09/23/2008 |
| 7428039 | Method and apparatus for providing uniform illumination of a mask in laser projection systems An optical system for projecting a laser-beam on a mask to illuminate the mask includes a beam homogenizing arrangement including spaced arrays of microlenses. The beam homogenizing arrangement redistributes light in the laser beam such that the intensity of light i... | 09/23/2008 |
| 7428038 | Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid A lithographic apparatus is disclosed that has a semi-permeable membrane, a liquid inlet adapted to supply liquid to a first side of the membrane, and a gas inlet adapted to supply to a second side of the membrane either: (a) a vapor of the liquid, or (b) a gas whic... | 09/23/2008 |
| 7426017 | Focus test mask, focus measurement method and exposure apparatus This focus test mask is provided with a test pattern that is projected onto a wafer via a projection optical system. This test pattern includes: a plurality of line patterns that are lined up in a direction of measurement; phase shift sections that are provided in a... | 09/16/2008 |
| 7426016 | Exposure apparatus and exposure method According to an exposure apparatus and an exposure method in the present invention, based on a focus value and a leveling value in each exposure shot calculated based on measurements by a focus sensor, differential absolute value for respective value are calculated.... | 09/16/2008 |
| 7426015 | Device manufacturing method and lithographic apparatus A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for ... | 09/16/2008 |
| 7426011 | Method of calibrating a lithographic apparatus and device manufacturing method In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling. ... | 09/16/2008 |
| 7426013 | Exposure apparatus and device fabrication method An exposure apparatus illuminates a pattern on an original form, introduces light from the pattern to a plate, and exposes the plate. The exposure apparatus includes at least one optical element, and forcing member that applies a force to the at least one optical el... | 09/16/2008 |
| 7426014 | Dynamic fluid control system for immersion lithography A dynamic fluid control system and method capable of reducing dynamic forces from the fluid on the last optical element (20) and substrate stage (14) caused by the motion of the immersion fluid. The system includes an imaging element (12) that d... | 09/16/2008 |
| 7426012 | Exposure device for immersion lithography and method for monitoring parameters of an exposure device for immersion lithography A method for monitoring parameters of an exposure device for immersion lithography and an exposure device for immersion lithography are provided. In the course of the immersion lithography, the immersion liquid is fed to an analysis device as early as during the exp... | 09/16/2008 |
| 7423721 | Lithographic apparatus A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing... | 09/09/2008 |
| 7422841 | Exposure control for phase shifting photolithographic masks Mask and integrated circuit fabrication approaches are described to facilitate use of masks where substantially all of a layout is defined using phase shifting. Exposure settings including relative dosing between the phase shift mask and the trim masks are described... | 09/09/2008 |
| 7423720 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater t... | 09/09/2008 |
| 7423722 | Lithographic apparatus and device manufacturing method A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing ... | 09/09/2008 |
| 7423765 | Optical system of a microlithographic projection exposure apparatus In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various point... | 09/09/2008 |
