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3M employee and church chorister Art Fry needed something to temporarily mark pages in his hymnal. He was in luck because his colleague, Spencer Silver, accidentally developed a glue that was too weak for other purposes. After initially discouraging consumer response, Post-it Notes became a hit in 1979.
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| Number | Title | Issue Date |
| 8189170 | Optical element and exposure apparatus An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a... | 05/29/2012 |
| 8189169 | Cooling apparatus and substrate treating apparatus The object of the present invention is to provide a cooling apparatus which makes it possible to cool a substrate uniformly in a short period of time even if the substrate has a large area. The cooling apparatus 3 comprises a flat-box-shaped body 10, a... | 05/29/2012 |
| 8174673 | Method for wafer alignment A method for wafer alignment includes the following steps. First, a wafer including a first material layer and a second material layer on the top of the first material layer is provided, wherein the first material layer includes a first alignment mark. Then, the waf... | 05/08/2012 |
| 8174671 | Lithographic projection apparatus and method for controlling a support structure A control system controls a support structure of a lithographic apparatus. A first measurement system measures the position of a substrate supported by the support structure, in a first coordinate system. A second measurement system measures the position of the supp... | 05/08/2012 |
| 8169593 | Lithographic apparatus and device manufacturing method A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substr... | 05/01/2012 |
| 8169592 | Exposure apparatus and method for producing device An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a... | 05/01/2012 |
| 8164737 | Lithographic apparatus having an active damping subassembly A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active d... | 04/24/2012 |
| 8164736 | Exposure method, exposure apparatus, and method for producing device An exposure method includes measuring coordinates of alignment marks before and after exposing a first wafer to determine a fluctuation amount of a parameter of the alignment; measuring coordinates of alignment marks before exposing a second wafer to determine a par... | 04/24/2012 |
| 8159650 | Device manufacturing method, device manufacturing system, and measurement/inspection apparatus In the case where measurement/inspection of a wafer is performed in a measurement/inspection instrument before and after exposure is performed in an exposure apparatus, various kinds of conditions of the exposure apparatus and the measurement/inspection instrument a... | 04/17/2012 |
| 8159649 | Exposure method, exposure apparatus, photomask and method for manufacturing photomask There is disclosed an exposure method is a method of projecting patterns (M1, M2) of a mask (M) onto a substrate to effect exposure thereof, through a plurality of projection optical units each having an enlargement magnification, and the exposure meth... | 04/17/2012 |
| 8149382 | Surface position detection apparatus, exposure apparatus, and exposure method A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having pa... | 04/03/2012 |
| 8149381 | Optical element and exposure apparatus An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a... | 04/03/2012 |
| 8149383 | Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology A method for determining the lateral correction as a function of the substrate topology and/or the geometry of the substrate holder is disclosed. The substrate is placed on a measuring stage traversable in the X coordinate direction and Y coordinate direction, which... | 04/03/2012 |
| 8144307 | Image forming method and apparatus An array of phase-shifting micro-mechanical elements are used in a method and device for patterning a workpiece, for exposing a radiation sensitive layer on a workpiece such as a mask or a device substrate. The phase-shifting micro-mechanical elements are individual... | 03/27/2012 |
| 8139199 | Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern fo... | 03/20/2012 |
| 8139198 | Exposure apparatus, exposure method, and method for producing device A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system ... | 03/20/2012 |
| 8134683 | Device manufacturing method, computer program and lithographic apparatus In a lithographic projection apparatus, adjustment of the projection system, e.g. to compensate for lens heating effects, is performed by determining a region of interest for a given pattern and illumination arrangement, the region of interest being a non-circular r... | 03/13/2012 |
| 8134684 | Immersion lithography using hafnium-based nanoparticles Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or equal to about 15 nanometers. The apparatus includes the composition ... | 03/13/2012 |
| 8134686 | Immersion exposure apparatus and device manufacturing method An exposure apparatus includes a projection optical system configured to project a pattern of an original onto a substrate via a liquid, to expose the substrate to light, a stage mechanism including a stage configured to hold the substrate, an immersion unit configu... | 03/13/2012 |
| 8134685 | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the se... | 03/13/2012 |
| 8130361 | Exposure apparatus, exposure method, and method for producing device An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stag... | 03/06/2012 |
| 8130362 | Correction method and exposure apparatus At Step 602, the grid of a wafer loaded into an exposure apparatus is approximated by a mathematical function fitting up to, for example, a cubic function, and at Step 612, the magnitude of a residual error between the position of a sample shot area ob... | 03/06/2012 |
| 8130363 | Exposure apparatus and method for producing device A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface ... | 03/06/2012 |
| 8125612 | Exposure apparatus and method for producing device There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an i... | 02/28/2012 |
| 8125613 | Exposure apparatus, exposure method, and device manufacturing method An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical axis center of the projection optical system is set to a position diff... | 02/28/2012 |
| 8125614 | Exposure apparatus and device manufacturing method An exposure apparatus includes a shutter, an exposure dose sensor configured to detect an exposure dose on a substrate, and a controller configured to control an exposure operation in accordance with control modes of the shutter, which include a first mode in which ... | 02/28/2012 |
| 8120751 | Coupling apparatus, exposure apparatus, and device fabricating method An exposure apparatus fills a space between a projection optical system and a substrate with a liquid and projects a pattern image onto the substrate to expose the substrate. The projection optical system has a first group including an optical member that comes into... | 02/21/2012 |
| 8120749 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the... | 02/21/2012 |
| 8120750 | Exposure apparatus and method of manufacturing device When a substrate stage is located in a first area, a first measurement device measures the same portion of the substrate at the plural measurement points both before and after the stage is horizontally driven. A controller calculates a first difference of the stage ... | 02/21/2012 |
| 8115903 | Lithographic apparatus and device manufacturing method An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap. ... | 02/14/2012 |
| 8111377 | Lithographic apparatus with an encoder arranged for defining a zero level A lithographic apparatus includes a position measuring system configured to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least one direction of an orthogonal x-y-z coordinate system of the moveable ob... | 02/07/2012 |
| 8111375 | Exposure apparatus and method for manufacturing device An exposure apparatus wherein an image of a pattern is projected onto a substrate via a projection optical system to expose the substrate, includes: a substrate moving device that is movable while holding the substrate above the projection optical system; and a liqu... | 02/07/2012 |
| 8111374 | Analysis method, exposure method, and device manufacturing method An analysis method includes a developing process (SA60), which develops the substrate, a first measuring process (SA50), which measures the abnormalities of the pre-development substrate, a second measuring process (SA70), which measures the abn... | 02/07/2012 |
| 8111376 | Feedforward/feedback litho process control of stress and overlay A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a lithographic patterning process on the substrate. One or more correctables to the lithographic patternin... | 02/07/2012 |
| 8111373 | Exposure apparatus and device fabrication method An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member (70) having a supply outlet... | 02/07/2012 |
| 8107053 | Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid An apparatus configured to de-gas a liquid includes a semi-permeable membrane having a first side on which the liquid is provided; and (i) a vaporizer configured to provide vapor of the liquid to a second side of the membrane; or (ii) a gas inlet configured to provi... | 01/31/2012 |
| 8107052 | Exposure apparatus and device manufacturing method An exposure apparatus is configured to expose a substrate to light while the substrate is scanned. The apparatus comprises a stage configured to hold the substrate and to move, a measuring device configured to measure a position of a surface of the substrate held by... | 01/31/2012 |
| 8102506 | Method and device for controlling a plurality of actuators and an illumination device for lithography The present invention relates to a method and a device for controlling multiple actuators with a controller and multiple actuators controllable by the controller. At least several groups of actuators are individually controllable by the controller and to each actuat... | 01/24/2012 |
| 8102504 | Exposure apparatus, exposure method, and method for producing device A lithographic apparatus includes an illuminator configured to condition a radiation beam; a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiat... | 01/24/2012 |
| 8102507 | Lithographic apparatus and device manufacturing method A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system c... | 01/24/2012 |
