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| Number | Title | Issue Date |
| 7359034 | Exposure apparatus and device manufacturing method An exposure apparatus in which by filling at least a portion between a projection optical system and a substrate with a liquid and by projecting an image of a pattern onto the substrate via said projection optical system and said liquid, said substrate is exposed, s... | 04/15/2008 |
| 7348565 | Illumination system particularly for microlithography There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element ... | 03/25/2008 |
| 7329886 | EUV illumination system having a plurality of light sources for illuminating an optical element There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ≦193 nm, and an optical element. The first light source illuminates a first area of... | 02/12/2008 |
| 7312919 | Wide field of view and high speed scanning microscopy A wide field of view scanning microscope includes a light source, a light detector, optics, a scanning assembly, a translation system, and a data collection control and processing unit. The scanning assembly is constructed to provide from the light source a light be... | 12/25/2007 |
| 7304005 | Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device A second laser light of a continuous wave oscillation is irradiated to a region melted by a first laser light of a pulsed oscillation having a harmonic. Specifically, the first laser light has a wavelength not longer than that of visible light (830 nm, preferably no... | 12/04/2007 |
| 7282819 | Stage apparatus, exposure apparatus, and device manufacturing method A stage apparatus in which support units supporting a counter-mass surface plate on a reference surface each include a first permanent magnet disposed on one of the surface plate and the reference surface, and a pair of second permanent magnets disposed on the other... | 10/16/2007 |
| 7269371 | Imaging apparatus having interface device for print mode selection An imaging apparatus includes a print engine operable in a plurality of print modes. An interface device is communicatively coupled to the print engine. The interface device includes a control lever having a plurality of positions. The plurality of positions corresp... | 09/11/2007 |
| 7253885 | Wavelength selecting method, position detecting method and apparatus, exposure method and apparatus, and device manufacturing method A wavelength selecting method for selecting a wavelength of light, the light being used to detect a position of a target with a signal from an image of an alignment mark covered with resist, includes the steps of obtaining a reflectance of the resist at a position o... | 08/07/2007 |
| 7251020 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, a substrate table for supporting a substrate, and a projection system that projects the patterned beam o... | 07/31/2007 |
| 7248667 | Illumination system with a grating element An illumination system, particularly for wavelengths ≦100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object pl... | 07/24/2007 |
| 7246342 | Orientation dependent shielding for use with dipole illumination techniques A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component ma... | 07/17/2007 |
| 7199863 | Method of imaging using lithographic projection apparatus A method is provided for compensating for the effect of flare lithographic apparatus. The method includes establishing a power spectral density (PSD) indicative of the spatial frequency of the stray radiation produced by a projection system, and determining, from th... | 04/03/2007 |
| 7186983 | Illumination system particularly for microlithography There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a s... | 03/06/2007 |
| 7142285 | Illumination system particularly for microlithography There is provided an illumination system for microlithography with wavelengths≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component tr... | 11/28/2006 |
| 7136151 | Reticle gripper barrier system for lithography use A reticle gripper barrier system for use in concert with a reticle gripper device that contacts a lithographic reticle is presented. In a particular embodiment, a reticle gripper barrier device includes a support plate affixed near or to the reticle gripper device a... | 11/14/2006 |
| 7126137 | Illumination system with field mirrors for producing uniform scanning energy This invention relates to an Ilumination system for scanning lithography especially for wavelengths≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in tha... | 10/24/2006 |
| 7109497 | Illumination system particularly for microlithography There is provided an illumination system, particularly for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optic... | 09/19/2006 |
| 7099057 | In-line holographic mask for micromachining A method of fabricating a holographic mask includes the steps of providing an illumination source and a non-opaque object mask. The source is for generating a coherent illumination beam directed along an axis. The object mask is capable of transmitting a portion of ... | 08/29/2006 |
| 7088425 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus An exposure apparatus includes a plurality of projection optical systems and a substrate stage. Each of the plurality of projection optical systems forms an exposure field on the substrate. The substrate stage holds the substrate and moves in at least a scanning dir... | 08/08/2006 |
| 7084961 | Safety mechanism for a lithographic patterning device A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves ... | 08/01/2006 |
| 7071476 | Illumination system with a plurality of light sources There is provided an illumination system for EUV-wavelengths. The illumination system includes a plurality of EUV-light sources and an optical unit combining the plurality of EUV-light sources. ... | 07/04/2006 |
| 7068347 | Apparatus for reducing pellicle darkening Pellicles separated by a distance sufficient to allow a purge gas help repair damage to at least one of the pellicles caused by exposure to an incident radiation and allowing at least a minimum amount of radiation to reach a semiconductor wafer sufficient to perform... | 06/27/2006 |
| 7061589 | Apparatus and method for mounting a hard pellicle An apparatus for mounting at least one hard pellicle to a mask which includes an enclosure having an interior cavity, demounting means for removing a protective cover from a mask, mounting means for mounting at least one hard pellicle to the mask and conduit means f... | 06/13/2006 |
| 7046336 | Scanning exposure apparatus A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in ... | 05/16/2006 |
| 7009689 | Holder of photomask An apparatus suitable for holding a photomask comprises a photomask holder having a plurality of through holes and a plurality of protrusions detachably connected to the photmask holder via the through holes. The photomask is positioned on supporting ridges of the p... | 03/07/2006 |
| 6980276 | Luminous source apparatus, image projecting apparatus and image projection converting apparatus A photosensor detecting light-emission quantity from a light-emission lamp is set up, in order to regulate the current supplied with the light-emission lamp from a power according to a light-quantity detecting signal from the photosensor, so as to make the light-emi... | 12/27/2005 |
| 6965105 | Scanning system and method for scanning a plurality of samples A system for detecting fluorescence emitted from a plurality of samples in a sample tray is provided. The system generally includes a plurality of lenses positioned in a linear arrangement, a linear actuator configured to translate the plurality of lenses, an excita... | 11/15/2005 |
| 6960775 | Lithographic apparatus, device manufacturing method and device manufactured thereby A device manufacturing method using lithographic apparatus, in which method a patterned beam of radiation is projected on to a target portion of a substrate. Prior to exposing the substrate to the patterned beam of radiation a beam of compensating radiation is irrad... | 11/01/2005 |
| 6954259 | Scanning exposure apparatus A scanning exposure apparatus includes a stage unit which supports and moves a substrate, and a control unit which starts exposing the substrate after a start of a second section in an acceleration section of the stage unit sequentially including a first section in ... | 10/11/2005 |
| 6947124 | Illumination system particularly for microlithography There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component t... | 09/20/2005 |
| 6947120 | Illumination system particularly for microlithography There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component t... | 09/20/2005 |
| 6927880 | Image reading device and method An image reading device reads an image of an original mounted on an original mounting base by using an optical scanning unit which is subjected to acceleration drive along the original mounting base until a velocity according to a reading magnification is obtained a... | 08/09/2005 |
| 6927403 | Illumination system that suppresses debris from a light source There is provided an illumination system for wavelengths of ≦193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the con... | 08/09/2005 |
| 6922032 | Electric motor control device In the driving operation of a sensorless three-phase motor to be used in a rotation at a comparatively low speed (approximately 2000 RPM or less) and to be bipolar driven, the number of rotations and a rotating position are accurately detected from an induced voltag... | 07/26/2005 |
| 6915102 | Original document conveyance device A document sheet conveyance device includes a sheet feeding tray on which document sheets are stacked, a stopping member against which leading edges of the stacked document sheets hit, a sheet feeding member for feeding the document sheets in the order from a top th... | 07/05/2005 |
| 6909489 | Luminous source apparatus, image projecting apparatus and image projection converting apparatus A luminous source apparatus, an image projecting apparatus, and an image projection converting apparatus to prevent a projected image, or an electronic image obtained through electronization of the projected image from intensity variations. A photosensor detects the... | 06/21/2005 |
| 6829034 | Exposure apparatus and device manufacturing method An exposure apparatus to be used with an excimer laser as a light source includes an optical system disposed along a path of excimer laser light, a chamber for accommodating the optical system therein and having an inside space being able to be replaced by a predete... | 12/07/2004 |
| 6768537 | Projection optical system, exposure apparatus, and exposure method A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern a... | 07/27/2004 |
| 6304315 | High speed high resolution continuous optical film printer for duplicating motion films A high speed, high resolution, continuous optical film printer (25) is disclosed for copying negative intermediate film (11) onto a print film (12). The two films are placed side by side on a common transport shaft (13) and moved past an illumination syst... | 10/16/2001 |
| 6219154 | Exposure control technique for imagesetting applications An article of manufacture includes a medium having a plurality of checkerboard patches recorded thereon. Each of the patches is of equal nominal tint and formed of dots. The dots of each of the patches are of equal nominal size with the size being differe... | 04/17/2001 |
