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| Number | Title | Issue Date |
| 7956983 | Exposure equipment having auxiliary photo mask and exposure method using the same Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source and a first photo mask spaced apart from the light source by a desired distance. A second photo mask may inc... | 06/07/2011 |
| 7916270 | Exposure apparatus, exposure method, and device manufacturing method An exposure apparatus includes a projection optical system that has a first object field area and a second object field area different from the first object field area and that projects an image of a pattern onto a first image field and a second image field. The ima... | 03/29/2011 |
| 7787102 | Real-time configurable masking Methods, systems, and media to define a portion of a circuit pattern with a source of real-time configurable imaging are disclosed. Embodiments include hardware and/or software for directing a beam through a mask onto a wafer surface to outline a circuit pattern hav... | 08/31/2010 |
| 7372543 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the s... | 05/13/2008 |
| 7372544 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the s... | 05/13/2008 |
| 7349070 | Multiple level photolithography A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region,... | 03/25/2008 |
| 7338168 | Particle analyzing system and methodology An imaging system, methodology, and various applications are provided to facilitate optical imaging performance. The system contains a sensor having one or more receptors and an image transfer medium to scale the sensor and receptors in accordance with resolvable ch... | 03/04/2008 |
| 7310129 | Method for carrying out a double or multiple exposure The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Altern... | 12/18/2007 |
| 7294399 | Weather-resistant, high-impact strength acrylic compositions Disclosed is an improved weatherable thermoplastic composition. The composition is comprised of a copolymer of an alkyl acrylate or alkyl methacrylate and (methyl)methacrylate and a multi-stage, sequentially-polymerized impact modifier polymer. The copolymer is char... | 11/13/2007 |
| 7230672 | Image recording apparatus and image recording method A movable guide is switchable between a guide position for regulating a flexure of a cut paper, and a release position for allowing the flexure of the cut paper. The movable guide is disposed between an exposure feed-roller pair and a guiding/carrying roller pair, w... | 06/12/2007 |
| 7209217 | Lithographic apparatus and device manufacturing method utilizing plural patterning devices A lithographic apparatus includes an illumination system, a patterning system, a projection system, and a combining system. The illumination system supplies a beam of radiation. The patterning system patterns the beam. The patterning system includes at least two arr... | 04/24/2007 |
| 7190434 | Lithographic apparatus and device manufacturing method Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate. ... | 03/13/2007 |
| 7170614 | Image forming apparatus A printer is disclosed which automatically unifies the layout of output to each of mail bins. This printer sets the layout for each of the discharged paper trays (mail bins). The information of layout designated by a personal computer is invalidated when the layout ... | 01/30/2007 |
| 7161707 | Digital printer Comprising a data reader 31 for reading digital camera image data, a means 32 for setting, for example, the number of prints, a plurality of printers 33, a printer selector 34 for selecting which of the plurality of printers to use, and a... | 01/09/2007 |
| 7155725 | Apparatus and method for coordinating multiple e-mail accounts A method for coordinating messages between an internal e-mail account and an external e-mail account is described comprising: retrieving specified e-mail messages from the external e-mail account and storing the messages in the internal e-mail account; mapping inter... | 12/26/2006 |
| 7139095 | User interface for instant and full-featured index page printing from a direct-connect printer A user interface for a printer is disclosed for printing image files. The user interface includes a display for displaying information, including messages to a user, an input device for enabling the user to respond to the displayed messages, an interface to a detach... | 11/21/2006 |
| 7132636 | Imaging system and methodology employing reciprocal space optical design An imaging system and methodology is provided to facilitate optical imaging performance. The system includes a sensor having one or more receptors and an image transfer medium to scale the sensor and receptors to an object field of view. A computer, memory, and/or d... | 11/07/2006 |
| 7129982 | Color image sensor with integrated binary optical elements An integrated pixel sensor structure having a light sensitive diode including a transparent conductor. In addition, a protective layer is also placed over the transparent conductor, the protective layer including a set of diffraction grating elements for producing c... | 10/31/2006 |
| 7088425 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus An exposure apparatus includes a plurality of projection optical systems and a substrate stage. Each of the plurality of projection optical systems forms an exposure field on the substrate. The substrate stage holds the substrate and moves in at least a scanning dir... | 08/08/2006 |
| 7061637 | Method and apparatus for image forming capable of effectively collating a stack of single-/double-sided recording sheets in a desired ejection tray An image forming apparatus includes first and second image carrying members, ejection trays, and a sheet transferring mechanism. The first image carrying member carries images in increasing order of corresponding sheet numbers. The second image carrying member carri... | 06/13/2006 |
| 7023527 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optical... | 04/04/2006 |
| 7023530 | Dual source lithography for direct write application A dual exposure source lithography system forms a first and a second portion of a pattern on a wafer. An optical lithography module forms the first portion of the pattern. A non-optical lithography module forms the second portion of the pattern using a non-optical l... | 04/04/2006 |
| 7023522 | Multiple exposure method An exposure apparatus including a first exposure device for illuminating a predetermined mask with light of a predetermined wavelength under a first mask-illumination condition, to print a first pattern on a predetermined exposure region, and a second exposure devic... | 04/04/2006 |
| 6980280 | Two level image writer A two level image writer (10) forms an image from digital data onto a photosensitive medium. A first level illumination system has a first source (20) for emitting a first polarized light beam having a first color; a second source (22) for emitt... | 12/27/2005 |
| 6967710 | Projection exposure apparatus and method An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illum... | 11/22/2005 |
| 6950120 | Camera layout for acquiring images used in panoramic synthesis An image recording apparatus for recording images sensed by at least two cameras attached to a vehicle, has a first camera which is arranged to have an image sensing direction agreeing with a first direction of a vehicle, a second camera which is arranged at a posit... | 09/27/2005 |
| 6930754 | Multiple exposure method An exposure apparatus includes a first exposure device for illuminating a predetermined mask with light of a predetermined wavelength under a first illumination condition, to print a first pattern on a predetermined exposure region, and a second exposure device for ... | 08/16/2005 |
| 6894762 | Dual source lithography for direct write application A dual exposure source lithography system forms a first and a second portion of a pattern on a wafer. An optical lithography module forms the first portion of the pattern. A non-optical lithography module forms the second portion of the pattern using a non-optical l... | 05/17/2005 |
| 6873398 | Method and apparatus for multi-track imaging using single-mode beams and diffraction-limited optics An imaging apparatus includes a laser to generate a single-mode laser beam of energy, a multichannel spatial light modulator (SLM) accepting a plurality of modulating signals, and a beam multiplier between the radiation source and the SLM. The multiplier accepts the... | 03/29/2005 |
| 6823154 | Image forming apparatus An image forming apparatus which includes: an image forming apparatus main body provided with an image forming portion for forming an image on a sheet; an upstream-side sheet feed unit which is juxtaposed to the image forming apparatus main body and feeds a sheet co... | 11/23/2004 |
| 6795169 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage... | 09/21/2004 |
| 6791663 | Image forming apparatus An image forming apparatus for suppressing deviations in the application position of light emitted from an optical box, thus preventing an image from being deteriorated, has an image bearing body, a light source, a deflecting device for deflecting a light emitted fr... | 09/14/2004 |
| 6778256 | Image recording device having a conveying mechanism An image recording device which cuts an elongated photosensitive material, and disposes plural rows of photosensitive material sheets in parallel, and simultaneously conveys the photosensitive material sheets. The elongated photosensitive material pulled-out from a ... | 08/17/2004 |
| 6778259 | Photo film advancing device having a guide holder and a photo film carrier A photo film cassette contains IX240 type of photo film in a manner movable out through a photo film passageway. A photo film carrier has a feeding path with an entrance, toward which the photo film is advanced. The photo film carrier includes a carrier base plate d... | 08/17/2004 |
| 6710851 | Multi pattern reticle A reticle includes multiple different layer patterns selected from a group comprising same circuit layer patterns and different circuit layer patterns. The layer patterns are positioned on the reticle within borders and within a portion of a defined x by y array on ... | 03/23/2004 |
| 6665054 | Two stage method The method for positioning two stages during semiconductor wafer processing facilitates the use of two stages to improve system throughput by decreasing the rest-time of certain system components. While a typical single-stage apparatus requires that each ... | 12/16/2003 |
| 6629292 | Method for forming graphical images in semiconductor devices High resolution gray scale graphical images are formed in a semiconductor substrate by the use of two or more levels of indicia having a plurality of image segments and having a continuous conductive line formed in the surface of the substrate, each image... | 09/30/2003 |
| 6611316 | Method and system for dual reticle image exposure The present invention provides a method and system for simultaneously imaging at least two reticles onto a substrate. According to the present invention, the wafer is passed through the exposure sequence once with images from the reticles being exposed si... | 08/26/2003 |
| 6593996 | System for projecting or displaying images The invention relates to a system for projecting or displaying images comprising a valve exhibiting a plurality of image-forming elements having a light transmission coefficient which can be controlled so as to present the image, and a means of illuminati... | 07/15/2003 |
| 6480262 | Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein An illumination optical apparatus and method forms a plurality of illumination regions on a first object, and positional relationships between the plurality of illumination regions can be adjusted. An exposure apparatus that includes the illumination opti... | 11/12/2002 |
