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| Number | Title | Issue Date |
| 8189168 | Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain mem... | 05/29/2012 |
| 8184261 | Exposure apparatus An exposure apparatus includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages which can be swapped between the alignment station and the exposure station. A first blo... | 05/22/2012 |
| 8179517 | Exposure apparatus and method, maintenance method for exposure apparatus, and device manufacturing method An exposure apparatus (EX) includes a setting apparatus (45) that sets an irradiation region (AR) of exposure light (EL) in a first state in which the irradiation light (EL) is irradiated onto a substrate (P) and irradiates, in a second state in which the exp... | 05/15/2012 |
| 8179516 | Protective layer on objective lens for liquid immersion lithography applications Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of protective coating (P... | 05/15/2012 |
| 8174668 | Exposure apparatus and method for producing device A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system whic... | 05/08/2012 |
| 8174669 | Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersi... | 05/08/2012 |
| 8169591 | Exposure apparatus, exposure method, and method for producing device An exposure apparatus is provided with a projection optical system, and the projection optical system includes a first optical element disposed most closely to an image plane of the projection optical system. The exposure apparatus includes a first liquid immersion ... | 05/01/2012 |
| 8169590 | Exposure apparatus and device fabrication method An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member (70) having a supply outlet... | 05/01/2012 |
| 8164734 | Vacuum system for immersion photolithography A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from... | 04/24/2012 |
| 8164735 | Regulating device, exposure apparatus and device manufacturing method The present invention is a regulating device configured to regulate a temperature T2 of a first medium in accordance with a target temperature. The regulating device comprises a heat exchanger 16, a control valve 14, temperature sensors 2... | 04/24/2012 |
| 8149379 | Lithographic apparatus and device manufacturing method The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed. ... | 04/03/2012 |
| 8149378 | Cleaning apparatus for exposure apparatus and exposure apparatus A cleaning apparatus for an exposure apparatus that projects a pattern of an exposing mask onto a substrate with first light through an optical element is provided. The cleaning apparatus cleans the optical element with second light having a wavelength different fro... | 04/03/2012 |
| 8144306 | Reverse flow gas gauge proximity sensor A gas gauge proximity sensor supplying gas in a reverse flow direction from the injection chamber to the measurement chamber. Supplying gas in a reverse flow direction enables the transient behavior in the sensor to more rapidly stabilize, with a resulting increase ... | 03/27/2012 |
| 8144305 | Lithographic apparatus and device manufacturing method An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate. ... | 03/27/2012 |
| 8134682 | Exposure apparatus and method for producing device A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is pr... | 03/13/2012 |
| 8130359 | Lithographic apparatus and a vacuum chamber A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern in its cross-section to form a... | 03/06/2012 |
| 8125610 | Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substr... | 02/28/2012 |
| 8125611 | Apparatus and method for immersion lithography Immersion lithography apparatus and method using a shield module are provided. An immersion lithography apparatus including a lens module having an imaging lens, a substrate table positioned beneath the lens module and configured for holding a substrate for processi... | 02/28/2012 |
| 8115899 | Lithographic apparatus and device manufacturing method A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. A cleaning device may be provided in the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid. ... | 02/14/2012 |
| 8115902 | Exposure apparatus, device manufacturing method, maintenance method, and exposure method An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, and incl... | 02/14/2012 |
| 8115901 | Exposure apparatus An exposure apparatus is configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light. The exposure apparatus includes a stage configured to move at the time of exposure, an electrostatic chuck which is provided on the stage ... | 02/14/2012 |
| 8115900 | Lithographic apparatus and device manufacturing method A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and o... | 02/14/2012 |
| 8102502 | Lithographic apparatus and device manufacturing method Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts ... | 01/24/2012 |
| 8102500 | Stage device, exposure apparatus, and microdevice manufacturing method A stage device includes a base, and a stage movable portion being movable along a surface of the base. An interferometer measures a position of the stage movable portion, and at least one of a piping element and a wiring element is connected to the stage movable por... | 01/24/2012 |
| 8102501 | Immersion lithography fluid control system using an electric or magnetic field generator An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates ... | 01/24/2012 |
| 8094287 | Lithographic appararus and method A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The a... | 01/10/2012 |
| 8089608 | Exposure apparatus, exposure method, and device manufacturing method An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresse... | 01/03/2012 |
| 8089609 | Lithographic apparatus and device manufacturing method A lithographic apparatus comprises an immersion fluid system and an interferometric temperature detection system. The immersion fluid system is configured to provide immersion fluid to an exposure system. The interferometric temperature detection system is configure... | 01/03/2012 |
| 8085381 | Cleanup method for optics in immersion lithography using sonic device A megasonic immersion lithography exposure apparatus includes an optical transfer chamber for containing an exposure liquid, at least one megasonic plate operably engaging said optical transfer chamber for propagating sonic waves through the exposure liquid, and an ... | 12/27/2011 |
| 8077287 | Method of preparing components, prepared component, lithographic apparatus and device manufacturing method A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably... | 12/13/2011 |
| 8072575 | Lithographic apparatus with temperature sensor and device manufacturing method In an embodiment, a lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus includes an air shower and a temperature sensor positioned near the air shower for measuring the temperature of... | 12/06/2011 |
| 8068208 | System and method for improving immersion scanner overlay performance System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner including a wafer table having lens cooling water (“LCW”) disposed in a wate... | 11/29/2011 |
| 8064037 | Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply system ... | 11/22/2011 |
| 8059257 | Exposure apparatus and device manufacturing method An exposure apparatus includes a projection optical system configured to project light from an original, wherein the apparatus exposes a substrate to light through liquid filled in a gap between the last surface of the projection optical system and the substrate; an... | 11/15/2011 |
| 8054446 | EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface The invention relates to an EUV lithography apparatus with at least one EUV-reflective optical surface and a cavity ringdown reflectometer adapted to determine the contamination status of the EUV-reflective optical surface for at least one contaminating substance by... | 11/08/2011 |
| 8054445 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors. ... | 11/08/2011 |
| 8054444 | Lens cleaning module for immersion lithography apparatus A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is provided. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the ... | 11/08/2011 |
| 8045134 | Lithographic apparatus, control system and device manufacturing method An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the... | 10/25/2011 |
| 8045135 | Lithographic apparatus with a fluid combining unit and related device manufacturing method A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may b... | 10/25/2011 |
| 8040489 | Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid A substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the sub... | 10/18/2011 |
